| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/17/2001 | US6218259 Capacitor and method for forming the same |
| 04/17/2001 | US6218258 Method for fabricating semiconductor device including capacitor with improved bottom electrode |
| 04/17/2001 | US6218257 Method of forming semiconductor memory device |
| 04/17/2001 | US6218256 Electrode and capacitor structure for a semiconductor device and associated methods of manufacture |
| 04/17/2001 | US6218255 Overcoating with titanium, or nitride thereof, filling channel with electroconductive material; patterning |
| 04/17/2001 | US6218254 Method of fabricating a self-aligned bipolar junction transistor in silicon carbide and resulting devices |
| 04/17/2001 | US6218253 Method of manufacturing a bipolar transistor by using only two mask layers |
| 04/17/2001 | US6218252 Method of forming gate in semiconductor device |
| 04/17/2001 | US6218251 Asymmetrical IGFET devices with spacers formed by HDP techniques |
| 04/17/2001 | US6218250 Method and apparatus for minimizing parasitic resistance of semiconductor devices |
| 04/17/2001 | US6218249 MOS transistor having shallow source/drain junctions and low leakage current |
| 04/17/2001 | US6218248 Semiconductor device and method for fabricating the same |
| 04/17/2001 | US6218247 Method for fabricating mask ROM |
| 04/17/2001 | US6218246 Fabrication method of triple polysilicon flash eeprom arrays |
| 04/17/2001 | US6218245 Method for fabricating a high-density and high-reliability EEPROM device |
| 04/17/2001 | US6218244 Method of fabricating transistor |
| 04/17/2001 | US6218243 Method of fabricating a DRAM capacitor |
| 04/17/2001 | US6218242 Method for fabricating capacitors in semiconductor integrated circuit |
| 04/17/2001 | US6218241 Fabrication method for a compact DRAM cell |
| 04/17/2001 | US6218240 Method of fabricating low voltage coefficient capacitor |
| 04/17/2001 | US6218239 Manufacturing method of a bottom plate |
| 04/17/2001 | US6218238 Method of fabricating DRAM capacitor |
| 04/17/2001 | US6218237 Method of forming a capacitor |
| 04/17/2001 | US6218236 Method of forming a buried bitline in a vertical DRAM device |
| 04/17/2001 | US6218235 Method of manufacturing a DRAM and logic device |
| 04/17/2001 | US6218233 Thin film capacitor having an improved bottom electrode and method of forming the same |
| 04/17/2001 | US6218232 Method for fabricating DRAM device |
| 04/17/2001 | US6218231 Forming iridium dioxide and platinum films; selectively etching |
| 04/17/2001 | US6218230 Method for producing capacitor having hemispherical grain |
| 04/17/2001 | US6218229 Method of fabricating semiconductor device having a dual-gate |
| 04/17/2001 | US6218227 Method to generate a MONOS type flash cell using polycrystalline silicon as an ONO top layer |
| 04/17/2001 | US6218226 Method of forming an ESD protection device |
| 04/17/2001 | US6218224 Nitride disposable spacer to reduce mask count in CMOS transistor formation |
| 04/17/2001 | US6218223 Process for producing electrode for semiconductor element and semiconductor device having the electrode |
| 04/17/2001 | US6218222 Method of manufacturing a semiconductor device with a schottky junction |
| 04/17/2001 | US6218221 Thin film transistor with a multi-metal structure and a method of manufacturing the same |
| 04/17/2001 | US6218220 Method for fabricating thin film transistor |
| 04/17/2001 | US6218219 Semiconductor device and fabrication method thereof |
| 04/17/2001 | US6218218 Method for reducing gate oxide damage caused by charging |
| 04/17/2001 | US6218217 Semiconductor device having high breakdown voltage and method of manufacturing the same |
| 04/17/2001 | US6218215 Methods of encapsulating a semiconductor chip using a settable encapsulant |
| 04/17/2001 | US6218214 Integrated circuit package for flip chip and method of forming same |
| 04/17/2001 | US6218213 Microelectronic components with frangible lead sections |
| 04/17/2001 | US6218212 Apparatus for growing mixed compound semiconductor and growth method using the same |
| 04/17/2001 | US6218207 Nitriding a single crystal metal |
| 04/17/2001 | US6218206 Method for producing thin film transistor and thin film transistor using the same |
| 04/17/2001 | US6218204 Capacitance compensation for topological measurements in a semiconductor device |
| 04/17/2001 | US6218203 Method of producing a contact structure |
| 04/17/2001 | US6218200 Multi-layer registration control for photolithography processes |
| 04/17/2001 | US6218199 Silicon substrate with identification data |
| 04/17/2001 | US6218198 Method and apparatus for evaluating semiconductor film, and method for producing the semiconductor film |
| 04/17/2001 | US6218197 Embedded LSI having a FeRAM section and a logic circuit section |
| 04/17/2001 | US6218196 Etching apparatus, etching method, manufacturing method of a semiconductor device, and semiconductor device |
| 04/17/2001 | US6218090 Imagewise exposure; etching; exposure to electron beam radiation; development |
| 04/17/2001 | US6218084 Etching; overcoating with polymer; covering with photoresist; plasma etching |
| 04/17/2001 | US6218082 Method for patterning a photoresist |
| 04/17/2001 | US6218079 Forming metal wiring |
| 04/17/2001 | US6218078 Using layer of hydrogen silsequioxane; patterning; etching |
| 04/17/2001 | US6218077 Exposure a substrate to energy source ; changing depth of focus |
| 04/17/2001 | US6218069 Photosensitive resin composition and making process |
| 04/17/2001 | US6218060 Electron beam exposure method and electron beam exposure apparatus |
| 04/17/2001 | US6218058 Charged particle beam transfer mask |
| 04/17/2001 | US6218057 Radiating a patterned mask; development |
| 04/17/2001 | US6218020 Curing polysiloxane |
| 04/17/2001 | US6217972 Enhancements in framed sheet processing |
| 04/17/2001 | US6217951 Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device |
| 04/17/2001 | US6217949 Marking a semiconductor and exposure to energy |
| 04/17/2001 | US6217937 Organometallic vapor phase epitaxy; a cold wall reactor; inner wall, central cavity with an open and closed end and a heater, outer wall; space between inner and outer provides a reactor cell with a susceptor rotatably mounted |
| 04/17/2001 | US6217936 Semiconductor fabrication extended particle collection cup |
| 04/17/2001 | US6217842 Single crystal SIC and method of producing the same |
| 04/17/2001 | US6217786 Using plasma formed from an etching gas that includes a fluorocarbon gas, a nitrogen reactant gas, an oxygen reactant gas, an inert carrier gas, and a hydrogen-containing additive gas |
| 04/17/2001 | US6217785 Scavenger for fluorine in the electromagnetically coupled planar plasma apparatus improves the etching of oxides with fluorohydrocarbon etchants with respect to the selectivity of etching of the oxide, gives improved anisotropy |
| 04/17/2001 | US6217784 High selectivity etching process for oxides |
| 04/17/2001 | US6217721 Filling plug having high aspect ratio by precoating interior of plug hole or other aperture with liner layer deposited by physical vapor deposition utilizing high-density plasma |
| 04/17/2001 | US6217718 Apparatus having plasma generating coil positioned within processing chamber so as to prevent or minimize variations about center axis of processing chamber in quantity of ions delivered to workpiece |
| 04/17/2001 | US6217715 Coating of vacuum chambers to reduce pump down time and base pressure |
| 04/17/2001 | US6217714 Sputtering apparatus in vacuum chamber having gas supply, having three discrete separated electrodes, with associated targets and magnets, fixed substrate support, variable power supplies connected to electrodes |
| 04/17/2001 | US6217705 Method of holding substrate and substrate holding system |
| 04/17/2001 | US6217703 Plasma processing apparatus |
| 04/17/2001 | US6217667 Method for cleaning copper surfaces |
| 04/17/2001 | US6217665 Method of cleaning substrate using ultraviolet radiation |
| 04/17/2001 | US6217663 Substrate processing apparatus and substrate processing method |
| 04/17/2001 | US6217662 Susceptor designs for silicon carbide thin films |
| 04/17/2001 | US6217661 Plasma processing apparatus and method |
| 04/17/2001 | US6217659 Dynamic blending gas delivery system and method |
| 04/17/2001 | US6217658 Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD Processing |
| 04/17/2001 | US6217655 Stand-off pad for supporting a wafer on a substrate support chuck |
| 04/17/2001 | US6217651 Method for correction of thin film growth temperature |
| 04/17/2001 | US6217650 Epitaxial-wafer fabricating process |
| 04/17/2001 | US6217645 Method of depositing films by using carboxylate complexes |
| 04/17/2001 | US6217430 Pad conditioner cleaning apparatus |
| 04/17/2001 | US6217426 CMP polishing pad |
| 04/17/2001 | US6217420 Grinding machine spindle flexibly attached to platform |
| 04/17/2001 | US6217417 Method for polishing thin plate and plate for holding thin plate |
| 04/17/2001 | US6217416 Abrasive, oxidizer, acetic acid, and film forming agent; integrated circuits; semiconductors; wafers; thin films |
| 04/17/2001 | US6217412 Method for characterizing polish pad lots to eliminate or reduce tool requalification after changing a polishing pad |
| 04/17/2001 | US6217410 Apparatus for cleaning workpiece surfaces and monitoring probes during workpiece processing |
| 04/17/2001 | US6217357 Method of manufacturing two-power supply voltage compatible CMOS semiconductor device |
| 04/17/2001 | US6217343 Multipoint conductive sheet |
| 04/17/2001 | US6217319 Semiconductor manufacturing device and method of processing wafer |