Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2001
04/24/2001US6222756 Single transistor cell, method for manufacturing the same, memory circuit composed of single transistor cells, and method for driving the same
04/24/2001US6222753 SRAM cell arrangement and method for manufacturing same
04/24/2001US6222738 Packaging structure for a semiconductor element flip-chip mounted on a mounting board having staggered bump connection location on the pads and method thereof
04/24/2001US6222722 Storage capacitor having undulated lower electrode for a semiconductor device
04/24/2001US6222718 Integrated power modules for plasma processing systems
04/24/2001US6222710 Semiconductor device
04/24/2001US6222695 System and method for a preamplifier write circuit with reduced rise/fall time
04/24/2001US6222615 Exposure control apparatus and method
04/24/2001US6222610 Exposure apparatus
04/24/2001US6222609 Reduction projection aligner free from reaction product tarnishing photo-mask and method for transferring pattern image through the photo-mask
04/24/2001US6222600 Reflective liquid crystal display apparatus with low manufacturing cost
04/24/2001US6222582 Image capture system
04/24/2001US6222410 Semiconductor circuit
04/24/2001US6222379 Conventionally sized temporary package for testing semiconductor dice
04/24/2001US6222339 System and method for controlling attitude of substrate
04/24/2001US6222337 Mechanically clamping robot wrist
04/24/2001US6222305 Chemically inert megasonic transducer system
04/24/2001US6222281 IC chip, IC assembly, liquid crystal device, and electric apparatus
04/24/2001US6222279 Solder bump fabrication methods and structures including a titanium barrier layer
04/24/2001US6222278 Input-output circuit cell and semiconductor integrated circuit apparatus
04/24/2001US6222277 Non-collapsing interconnection for semiconductor devices
04/24/2001US6222274 Bonding wire loop shape for a semiconductor device
04/24/2001US6222273 System having vias including conductive spacers
04/24/2001US6222271 Method of using hydrogen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom
04/24/2001US6222270 Integrated circuit bonding pads including closed vias and closed conductive patterns
04/24/2001US6222269 Semiconductor device and fabrication process thereof
04/24/2001US6222268 Semiconductor device and method for manufacturing the same
04/24/2001US6222266 Miniaturization of a semiconductor chip
04/24/2001US6222265 Method of constructing stacked packages
04/24/2001US6222259 Stack package and method of fabricating the same
04/24/2001US6222257 Etch stop for use in etching of silicon oxide
04/24/2001US6222256 Semiconductor device and method of manufacturing the same
04/24/2001US6222255 Method of creating an interconnect in a substrate and semiconductor device employing the same
04/24/2001US6222254 Thermal conducting trench in a semiconductor structure and method for forming the same
04/24/2001US6222253 Buried oxide layer in silicon
04/24/2001US6222252 Semiconductor substrate and method for producing the same
04/24/2001US6222250 Bipolar transistor device and method for manufacturing the same
04/24/2001US6222249 Semiconductor device
04/24/2001US6222241 Method and system for reducing ARC layer removal by providing a capping layer for the ARC layer
04/24/2001US6222240 Salicide and gate dielectric formed from a single layer of refractory metal
04/24/2001US6222236 Protection circuit and method for protecting a semiconductor device
04/24/2001US6222235 Small geometry high voltage semiconductor device
04/24/2001US6222234 Semiconductor device having partially and fully depleted SOI elements on a common substrate
04/24/2001US6222232 Asymmetric MOS technology power device
04/24/2001US6222230 Method of making an elevated source/drain with enhanced graded sidewalls for transistor scaling integrated with spacer formation
04/24/2001US6222228 Method for reducing gate oxide damage caused by charging
04/24/2001US6222227 Memory cell with self-aligned floating gate and separate select gate, and fabrication process
04/24/2001US6222226 Semiconductor memory device and method for manufacturing the same
04/24/2001US6222225 Semiconductor device and manufacturing method thereof
04/24/2001US6222224 Erasable and programmable nonvolatile semiconductor memory, semiconductor integrated circuit device having the semiconductor memory and method of manufacturing the semiconductor memory
04/24/2001US6222223 Semiconductor device including capacitance element having high area efficiency
04/24/2001US6222222 Methods of forming capacitors and related integrated circuitry
04/24/2001US6222220 Extended trench for preventing interaction between components of stacked capacitors
04/24/2001US6222219 Crown capacitor using a tapered etch of a damascene lower electrode
04/24/2001US6222218 DRAM trench
04/24/2001US6222217 Semiconductor device and manufacturing method thereof
04/24/2001US6222216 Non-volatile and memory fabricated using a dynamic memory process and method therefor
04/24/2001US6222215 DRAM circuitry
04/24/2001US6222214 Plug structure and process for forming stacked contacts and metal contacts on static random access memory thin film transistors
04/24/2001US6222213 Semiconductor integrated circuit device
04/24/2001US6222212 Semiconductor device having programmable interconnect layers
04/24/2001US6222210 Gallium arsenide based complementary pair enhancement mode transistor using a single metallization scheme for both the schottky gate and ohmic contacts
04/24/2001US6222204 Electrode structure and method for fabricating the same
04/24/2001US6222201 Method of forming a novel self-aligned offset thin film transistor and the structure of the same
04/24/2001US6222196 Rotatable workpiece support including cyclindrical workpiece support surfaces for an ion beam implanter
04/24/2001US6222164 Temperature control system for a thermal reactor
04/24/2001US6222161 Heat treatment apparatus
04/24/2001US6222156 Laser repair process for printed wiring boards
04/24/2001US6222118 Semiconductor device and method of manufacturing the same
04/24/2001US6222117 Photovoltaic device, manufacturing method of photovoltaic device, photovoltaic device integrated with building material and power-generating apparatus
04/24/2001US6221818 Hydroxylamine-gallic compound composition and process
04/24/2001US6221814 Aqueous compositions, aqueous cutting fluid using the same, method for preparation thereof, and cutting method using the cutting fluid
04/24/2001US6221794 Method of reducing incidence of stress-induced voiding in semiconductor interconnect lines
04/24/2001US6221793 Process for forming PECVD undoped oxide with a super low deposition rate on a single state deposition
04/24/2001US6221792 Metal and metal silicide nitridization in a high density, low pressure plasma reactor
04/24/2001US6221791 Apparatus and method for oxidizing silicon substrates
04/24/2001US6221790 Stable thin film oxide standard
04/24/2001US6221789 Thin oxides of silicon
04/24/2001US6221788 Semiconductor and a method for manufacturing an oxide film on the surface of a semiconductor substrate
04/24/2001US6221787 Apparatus and method of forming resist film
04/24/2001US6221786 Methods for isolating interconnects
04/24/2001US6221785 Method for forming shallow trench isolations
04/24/2001US6221784 Method and apparatus for sequentially etching a wafer using anisotropic and isotropic etching
04/24/2001US6221783 Method of manufacturing a heterojunction bipolar transistor
04/24/2001US6221782 Adjusting DC bias voltage in plasma chamber
04/24/2001US6221781 Combined process chamber with multi-positionable pedestal
04/24/2001US6221780 Dual damascene flowable oxide insulation structure and metallic barrier
04/24/2001US6221779 Self-aligned process for making contacts to silicon substrates during the manufacture of integrated circuits therein
04/24/2001US6221778 Method of fabricating a semiconductor device
04/24/2001US6221777 Reverse lithographic process for semiconductor vias
04/24/2001US6221776 Anti-reflective coating used as a disposable etch stop
04/24/2001US6221775 Combined chemical mechanical polishing and reactive ion etching process
04/24/2001US6221774 Method for surface treatment of substrates
04/24/2001US6221773 Method for working semiconductor wafer
04/24/2001US6221772 In situ plasma ashing by injecting oxygen and argon
04/24/2001US6221771 Method of forming tungsten silicide film, method of fabricating semiconductor devices and semiconductor manufactured thereby
04/24/2001US6221770 Low temperature plasma-enhanced formation of integrated circuits
04/24/2001US6221769 Method for integrated circuit power and electrical connections via through-wafer interconnects
04/24/2001US6221768 Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringers
04/24/2001US6221767 Method of fabricating a silicide landing pad