Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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03/29/2001 | WO2001022486A1 Semiconductor device and method for fabricating the same |
03/29/2001 | WO2001022485A1 Control method and system for use when growing thin-films on semiconductor-based materials |
03/29/2001 | WO2001022484A1 Method of manufacturing semiconductor wafer |
03/29/2001 | WO2001022483A1 Semiconductor manufacturing device, and method of heating wafer in semiconductor manufacturing device |
03/29/2001 | WO2001022482A1 Method of producing relaxed silicon germanium layers |
03/29/2001 | WO2001022481A1 Method for producing a mask layer having openings with reduced widths |
03/29/2001 | WO2001022479A1 Gas distribution apparatus for semiconductor processing |
03/29/2001 | WO2001022478A1 Semiconductor processing equipment having radiant heated ceramic liner |
03/29/2001 | WO2001022477A1 Device for loading and unloading substrates |
03/29/2001 | WO2001022476A2 Backside chemical etching and polishing |
03/29/2001 | WO2001022475A2 Method for dicing mesa-diodes |
03/29/2001 | WO2001022474A2 Method for producing a semiconductor device consisting of silicon-carbide and comprising a schottky contact |
03/29/2001 | WO2001022471A1 Semiconductor processing equipment having tiled ceramic liner |
03/29/2001 | WO2001022469A1 Electron-optical lens arrangement with an axis that can be largely displaced |
03/29/2001 | WO2001022449A1 Electronic device of ceramic |
03/29/2001 | WO2001022301A1 Method for circuit design on a spherical semiconductor having critical dimensions |
03/29/2001 | WO2001022183A1 Method of improved estimation of critical dimensions in microelectronic fabrication |
03/29/2001 | WO2001022171A1 A photolithography mask having a subresolution alignment mark window |
03/29/2001 | WO2001022170A1 Method for forming resist pattern having improved dry-etching resistance |
03/29/2001 | WO2001022169A1 System to reduce heat-induced distortion of photomasks during lithography |
03/29/2001 | WO2001022163A2 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof |
03/29/2001 | WO2001022105A1 Method and arrangement for dielectric integrity testing |
03/29/2001 | WO2001022097A1 Measuring probe for measuring high frequencies and a method for producing the same |
03/29/2001 | WO2001022016A1 Supercritical fluid drying system |
03/29/2001 | WO2001021979A1 Stage device |
03/29/2001 | WO2001021865A1 Method for producing czochralski silicon free of agglomerated self-interstitial defects |
03/29/2001 | WO2001021724A1 Slurry solution for polishing copper or tungsten |
03/29/2001 | WO2001006268A8 Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator |
03/29/2001 | WO2000074896A8 Method of modifying a surface of a structured wafer |
03/29/2001 | WO2000067322A3 Self-aligned source and drain extensions fabricated in a damascene contact and gate process |
03/29/2001 | WO2000067316A3 Method for producing a portable electronic device with an integrated circuit protected by a photosensitive resin |
03/29/2001 | WO2000067299A3 Method for generating defects in a grid support of a semiconductor material |
03/29/2001 | WO2000065658A3 Method of structuring a metal or metal-silicide layer and a capacitor produced according to said method |
03/29/2001 | WO2000036652A3 Method of manufacturing a gate electrode |
03/29/2001 | WO2000033388A9 METHOD OF PRODUCING DEVICE QUALITY (Al)InGaP ALLOYS ON LATTICE-MISMATCHED SUBSTRATES |
03/29/2001 | WO2000030181A3 Field effect-controlled transistor and method for producing the same |
03/29/2001 | US20010000079 Fixing by selectively heating and press-contacting a dicing tape of separated integrated circuit chips to an oppositely facing substrate with a wire attached to one of the chips on the tape; thinness; cards; nonbreaking; noncracking; strength |
03/29/2001 | US20010000074 Thin film transistor and method of manufacturing the same |
03/29/2001 | DE19945855A1 High inductance micro-coil constructed on substrate, useful at higher currents is formed using additive- or doping technology with diamond or diamond-like material in insulator |
03/29/2001 | DE10047963A1 Making multilayer thin film component, assembles component units, each carrying component layers on supportive substrates |
03/29/2001 | DE10046052A1 Zuführung von flüssigen Vorläufern zu Halbleiterbearbeitungsreaktoren Introduction of liquid precursors to semiconductor processing reactors |
03/29/2001 | DE10037741A1 Semiconductor chip manufacturing method involves peeling protection tape from wafer surface by removing peeling tape fixed on protection tape, after irradiation of ultraviolet rays on diced wafer |
03/29/2001 | DE10033519A1 Integrated circuit has address converter that generates address of selected memory device, and data generator that generates data signal that is sent to selected memory device, based on clock signal |
03/29/2001 | DE10027176A1 Quarzglas-Schmelztiegel und Verfahren zu seiner Herstellung Quartz glass crucible and a process for its preparation |
03/29/2001 | DE10004067A1 Making bipolar element e.g. transistor operating in high gigahertz region, involves forming base layer, masking layer and second base semiconductor layer carrying ohmic electrode in metallic material |
03/29/2001 | CA2388586A1 Device for loading and unloading substrates |
03/28/2001 | EP1087444A2 El display device and electronic device |
03/28/2001 | EP1087443A2 Self-aligned non-volatile random access memory cell and process to make the same |
03/28/2001 | EP1087442A2 Floating gate memory array and self-aligned method of fabrication therefor |
03/28/2001 | EP1087441A2 Stacked mosfet protection circuit |
03/28/2001 | EP1087438A2 Semiconductor device and method of manufacturing therof |
03/28/2001 | EP1087437A2 A multistep chamber cleaning process using a remote plasma that also enhances film gap fill |
03/28/2001 | EP1087436A2 Adhesive material and electronic circuit connection method |
03/28/2001 | EP1087435A1 Electro-optic device and method for manufacturing the same |
03/28/2001 | EP1087434A2 Semiconductor device of the flip-chip type and method for manufacturing same |
03/28/2001 | EP1087433A1 Process for the formation of silicon oxide films |
03/28/2001 | EP1087432A1 A method for improving the quality of a metal layer deposited from a plating bath |
03/28/2001 | EP1087431A2 Method and apparatus for forming a sputtered doped seed layer |
03/28/2001 | EP1087430A2 A method and apparatus for integrating a metal nitride film in a semiconductor device |
03/28/2001 | EP1087429A1 Method and apparatus for laser heat treatment, and semiconductor device |
03/28/2001 | EP1087428A1 Method for forming a silicon film and ink composition for ink jet |
03/28/2001 | EP1087427A2 Selective growth process for group III-nitride-based semiconductors |
03/28/2001 | EP1087426A2 Integrated method and apparatus for forming an enhanced capacitor |
03/28/2001 | EP1087424A1 Method for fabricating a self-aligned vertical bipolar transistor |
03/28/2001 | EP1087423A2 Method for etching films on substrates, for cleaning etch chambers, and apparatus therefore |
03/28/2001 | EP1087421A2 Method and apparatus for providing a stable plasma |
03/28/2001 | EP1087366A2 Electroluminescent display device and driving method thereof |
03/28/2001 | EP1087264A1 Method of adjusting projection optical apparatus |
03/28/2001 | EP1087263A2 Photosensitive resin composition, pattering method, and electronic components |
03/28/2001 | EP1087260A1 Photosensitive resin composition |
03/28/2001 | EP1087042A1 Silicon wafer |
03/28/2001 | EP1087041A1 Production method for silicon wafer and silicon wafer |
03/28/2001 | EP1087039A1 Plating jig of wafer |
03/28/2001 | EP1087036A1 Method and apparatus for observing porous amorphous film, and method and apparatus for forming the same |
03/28/2001 | EP1087035A1 Method and apparatus for formation of thin film |
03/28/2001 | EP1087033A1 Extended life sputter targets |
03/28/2001 | EP1086777A1 Ultrasonic bonding apparatus with a sensor for regulating the bonding force |
03/28/2001 | EP1086524A1 Chuck apparatus for clamping a planar substrate in an electrostatic coating method |
03/28/2001 | EP1086520A1 Protective circuit for electronic modules, especially driver modules |
03/28/2001 | EP1086496A2 Nitride based transistors on semi-insulating silicon carbide substrates |
03/28/2001 | EP1086495A1 High-voltage semiconductor component, method for the production and use thereof |
03/28/2001 | EP1086492A1 Method for making a micromodule and a storage medium comprising such a micromodule |
03/28/2001 | EP1086491A1 Self-aligned methods of fabricating silicon carbide power devices by implantation and lateral diffusions |
03/28/2001 | EP1086490A1 Thin film transistors and their manufacture |
03/28/2001 | EP1086489A1 Chemical vapor deposition fabrication of hybrid electrodes for ferroelectric device structures |
03/28/2001 | EP1086488A2 Method for producing semiconductor elements |
03/28/2001 | EP1086487A2 Methods of fabricating silicon carbide power devices by controlled annealing |
03/28/2001 | EP1086486A1 In-situ substrate transfer shuttle |
03/28/2001 | EP1086485A2 Process and manufacturing tool architecture for use in the manufacture of one or more metallization levels on a workpiece |
03/28/2001 | EP1086484A1 Slurry for chemical-mechanical polishing metal surfaces |
03/28/2001 | EP1086481A1 Chamber having improved process monitoring window |
03/28/2001 | EP1086355A1 Ellipsometric method and control device for making a thin-layered component |
03/28/2001 | EP1086353A1 Method and apparatus for determining processing chamber cleaning or wafer etching endpoint |
03/28/2001 | EP1086260A1 Oxygen-argon gas mixture for precleaning in vacuum processing system |
03/28/2001 | EP1086259A1 A method and apparatus for forming a ti doped ta2o5 layer |
03/28/2001 | EP1086258A1 Substrate support and lift apparatus and method |
03/28/2001 | EP1086191A1 Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
03/28/2001 | EP1086030A2 Smif pod including independently supported wafer cassette |
03/28/2001 | EP1085948A1 Micro-environment reactor for processing a microelectronic workpiece |
03/28/2001 | EP0983612A4 A thermal conducting trench in a semiconductor structure and method for forming the same |