Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2001
04/03/2001US6211033 Integrated capacitor bottom electrode for use with conformal dielectric
04/03/2001US6211032 Method for forming silicon carbide chrome thin-film resistor
04/03/2001US6211031 Method to produce dual polysilicon resistance in an integrated circuit
04/03/2001US6211030 Method for fabricating resistors in integrated circuits
04/03/2001US6211029 Process of fabricating a bipolar transistor having lightly doped epitaxial collector region constant in dopant impurity
04/03/2001US6211028 Twin current bipolar device with hi-lo base profile
04/03/2001US6211027 Method for manufacturing PMOS transistor
04/03/2001US6211026 Methods of forming integrated circuitry, methods of forming elevated source/drain regions of a field effect transistor, and methods of forming field effect transistors
04/03/2001US6211025 Method of making elevated source/drain using poly underlayer
04/03/2001US6211024 Method for forming a semiconductor device by using multiple ion implantation sequence to reduce crystal defects and to allow the reduction of the temperature used for a subsequent rapid thermal anneal procedure
04/03/2001US6211023 Method for fabricating a metal-oxide semiconductor transistor
04/03/2001US6211022 Field leakage by using a thin layer of nitride deposited by chemical vapor deposition
04/03/2001US6211021 Method for forming a borderless contact
04/03/2001US6211020 Process for fabricating a common source region in memory devices
04/03/2001US6211019 Read-only memory cell device and method for its production
04/03/2001US6211018 Method for fabricating high density trench gate type power device
04/03/2001US6211017 Method of fabricating floating gate EEPROM
04/03/2001US6211016 Method for forming high density nonvolatile memories with high capacitive-coupling ratio
04/03/2001US6211015 Ultra high density flash memory having vertically stacked devices
04/03/2001US6211014 Three-dimensional, deep-trench, high-density read-only memory (ROM) and its manufacturing method
04/03/2001US6211013 Method for fabricating single electron transistor
04/03/2001US6211012 Method of fabricating an ETOX flash memory
04/03/2001US6211011 Method for fabricating asymmetric virtual ground P-channel flash cell
04/03/2001US6211010 Method of forming hemispherical grains on a surface comprising pre-cleaning the surface in-situ with plasma
04/03/2001US6211009 Manufacturing a capacitor electrode in a semiconductor device
04/03/2001US6211008 Method for forming high-density high-capacity capacitor
04/03/2001US6211007 Process for enhancing refresh in dynamic random access memory devices
04/03/2001US6211006 Method of forming a trench-type capacitor
04/03/2001US6211005 Methods of fabricating integrated circuit ferroelectric memory devices including a material layer on the upper electrodes of the ferroelectric capacitors thereof
04/03/2001US6211004 Semiconductor integrated circuit device and process for manufacturing the same
04/03/2001US6211003 Semiconductor integrated circuit device and process for manufacturing the same
04/03/2001US6211002 CMOS process for forming planarized twin wells
04/03/2001US6211001 Electrostatic discharge protection for salicided devices and method of making same
04/03/2001US6211000 Method of making high performance mosfets having high conductivity gate conductors
04/03/2001US6210999 Method and test structure for low-temperature integration of high dielectric constant gate dielectrics into self-aligned semiconductor devices
04/03/2001US6210998 Semiconductor device formed on an insulator and having a damaged portion at the interface between the insulator and the active layer
04/03/2001US6210997 Semiconductor device and method for manufacturing the same
04/03/2001US6210994 Process for forming an edge structure to seal integrated electronic devices, and corresponding device
04/03/2001US6210992 Controlling packaging encapsulant leakage
04/03/2001US6210991 Metal contact scheme using selective silicon growth
04/03/2001US6210988 Polycrystalline silicon germanium films for forming micro-electromechanical systems
04/03/2001US6210984 Method and apparatus for automatically positioning electronic dice within component packages
04/03/2001US6210983 Method for analyzing probe yield sensitivities to IC design
04/03/2001US6210981 Method for etching a flip chip using secondary particle emissions to detect the etch end-point
04/03/2001US6210980 Inspection pattern and method for semiconductor device
04/03/2001US6210979 Method for fabricating ferroelectric capacitor improving adhesive strength between upper electrode and capping layer without polymer in FRAM device
04/03/2001US6210868 Method for forming a pattern on a chemical sensitization photoresist
04/03/2001US6210866 Method for forming features using self-trimming by selective etch and device formed thereby
04/03/2001US6210865 Collects radiation, here soft x-rays, from a small, incoherent source and couples it to the ringfield of a camera designed for projection lithography. mirrors
04/03/2001US6210856 Si-containing polymeric additive, base polymer, photoacid generator, solvent, polymeric material contains acid sensitive protecting groups and are aqueous base soluble after exposure processing, high image resolution, good image profile and high
04/03/2001US6210855 Positive resist composition suitable for lift-off technique and pattern forming method
04/03/2001US6210846 Exposure during rework for enhanced resist removal
04/03/2001US6210842 Method for fabricating stencil mask
04/03/2001US6210813 Disrupted grain structure and smaller grain sizes; increases the resistance of the material to stress cracks in subsequent thermal processing and reduces the overall residual stress of the material
04/03/2001US6210811 Improved heat resistance, improved moisture resistance, low stress property
04/03/2001US6210754 Providing level-adjusting devices mounted on heater platform, wherein the turning of one or more of the level-adjusting devices allows positioning of the heater platform relative to the lower surface of the shower head; integrated circuits
04/03/2001US6210752 All-alkoxide synthesis of strontium-containing metal oxides
04/03/2001US6210749 Applying fillerless coating formulation comprising hydrogen silsesquioxane resin onto substrate to form film; heating film in inert or oxygen containing atmosphere to produce insoluble coating free of cracks; depositing silicon dioxide layer
04/03/2001US6210748 Brush cleaning electrode substrate with hydrogen dissolved in water, forming alignment layer of organic material on substrate, ultrasonic cleaning substrate with hydrogen dissolved in water; controlled oxidation reduction potential
04/03/2001US6210640 Collector for an automated on-line bath analysis system
04/03/2001US6210637 Corrosion resistance after heating for improved long term reliability of contact bonded to the aluminum electrodes of semiconductor device
04/03/2001US6210604 For x-ray image intensifiers
04/03/2001US6210595 Method for producing structures having a high aspect ratio and structure having a high aspect ratio
04/03/2001US6210594 Near substrate reactant homogenization apparatus
04/03/2001US6210592 Deposition of resistor materials directly on insulating substrates
04/03/2001US6210554 Supplying plating solution onto plating surface of wafer so solution flows from center of plating surface of wafer toward periphery; generating electric field between wafer and annular anode to obtain non-uniformly distributed coating that
04/03/2001US6210546 Fixture with at least one trough and method of using the fixture in a plasma or ion beam
04/03/2001US6210541 Process and apparatus for cold copper deposition to enhance copper plating fill
04/03/2001US6210539 For generating plasma to sputter deposit layer of material in fabrication of semiconductor devices
04/03/2001US6210525 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
04/03/2001US6210489 Providing semiconductor substrate; forming in layer of doped silicon dioxide a space extending down through layer of doped silicon dioxide to source/drain region; exposing to etchant solution; forming polysilicon layer; removing polysilicon
04/03/2001US6210486 CVD film forming method in which a film formation preventing gas is supplied in a direction from a rear surface of an object to be processed
04/03/2001US6210485 Chemical vapor deposition vaporizer
04/03/2001US6210484 Heating device containing a multi-lamp cone for heating semiconductor wafers
04/03/2001US6210482 Apparatus for feeding gases for use in semiconductor manufacturing
04/03/2001US6210481 Apparatus and method of cleaning nozzle and apparatus of processing substrate
04/03/2001US6210479 Depositing layer of nitride material such as gallium nitride, aluminum nitride and/or indium nitride, on sapphire substrate; growing semiconductor structure on nitride layer; lifting sapphire substrate by irradiation; remvoing metallic residues
04/03/2001US6210260 Carrier and CMP apparatus
04/03/2001US6210255 Carrier head for chemical mechanical polishing a substrate
04/03/2001US6210254 Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s)
04/03/2001US6209555 Substrate cassette for ultrasonic cleaning
04/03/2001US6209553 Method of and apparatus for washing photomask and washing solution for photomask
04/03/2001US6209551 Methods and compositions for post-etch layer stack treatment in semiconductor fabrication
04/03/2001US6209532 Soft handling process tooling for low and medium volume known good die product
04/03/2001US6209484 Method and apparatus for depositing an etch stop layer
04/03/2001US6209482 Large area microwave plasma apparatus with adaptable applicator
04/03/2001US6209394 Integrated angular speed sensor device and production method thereof
04/03/2001US6209221 Wafer rack provided with a gas distribution device
04/03/2001US6209220 Apparatus for cooling substrates
04/03/2001US6209196 Method of mounting bumped electronic components
04/03/2001US6209194 Apparatus for loading and unloading semiconductor device packages using servo motors
04/01/2001WO2001081525A1 Detergent composition
03/2001
03/29/2001WO2001022786A1 Conductor structure on a dielectric material, and method for producing such a conductor structure
03/29/2001WO2001022717A2 Localizing and isolating an errant process step
03/29/2001WO2001022504A1 Organic electroluminescent device
03/29/2001WO2001022500A1 Recrystallisation of semiconductor material
03/29/2001WO2001022498A1 Silicon-carbide semiconductor device with a schottky contact and method for producing same
03/29/2001WO2001022497A1 Superlattice fabrication for inas/gasb/alsb semiconductor structures
03/29/2001WO2001022491A1 Semiconductive chip having a bond pad located on an active device
03/29/2001WO2001022487A1 Integrated-circuit manufacturing using high interstitial-recombination-rate blocking layer for source/drain extension implant