| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 08/07/2001 | US6271135 Patterning photoresist; filling with copper; removal photoresist; encapsulation; prevention copper diffusion |
| 08/07/2001 | US6271134 Apparatus for manufacturing semiconductor device method for forming HSG-polysilicon layer using same and method for forming capacitor having electrode of HSG-polysilicon layer |
| 08/07/2001 | US6271133 Optimized Co/Ti-salicide scheme for shallow junction deep sub-micron device fabrication |
| 08/07/2001 | US6271132 Self-aligned source and drain extensions fabricated in a damascene contact and gate process |
| 08/07/2001 | US6271131 Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers |
| 08/07/2001 | US6271130 Semiconductor assisted metal deposition for nanolithography applications |
| 08/07/2001 | US6271129 Method for forming a gap filling refractory metal layer having reduced stress |
| 08/07/2001 | US6271128 Method for fabricating transistor |
| 08/07/2001 | US6271127 Method for dual damascene process using electron beam and ion implantation cure methods for low dielectric constant materials |
| 08/07/2001 | US6271125 Method to reduce contact hole aspect ratio for embedded DRAM arrays and logic devices, via the use of a tungsten bit line structure |
| 08/07/2001 | US6271124 Method of making a dynamic random access memory device utilizing chemical mechanical polishing |
| 08/07/2001 | US6271123 Chemical-mechanical polish method using an undoped silicon glass stop layer for polishing BPSG |
| 08/07/2001 | US6271122 Method of compensating for material loss in a metal silicone layer in contacts of integrated circuit devices |
| 08/07/2001 | US6271121 Applying hydrogen plasma; then hydrogen and tungsten fluoride |
| 08/07/2001 | US6271120 Forming titanium nitride barrier by rapid thermal annealing of titanium silicide |
| 08/07/2001 | US6271119 Method for making semiconductor device |
| 08/07/2001 | US6271118 Method of applying partial reverse mask |
| 08/07/2001 | US6271117 Process for a nail shaped landing pad plug |
| 08/07/2001 | US6271116 Method of fabricating interconnects |
| 08/07/2001 | US6271115 Post metal etch photoresist strip method |
| 08/07/2001 | US6271114 System for adjusting the size of conductive lines based upon the contact size |
| 08/07/2001 | US6271113 Method for forming wiring in semiconductor device |
| 08/07/2001 | US6271112 Interlayer between titanium nitride and high density plasma oxide |
| 08/07/2001 | US6271111 High density pluggable connector array and process thereof |
| 08/07/2001 | US6271110 Bump-forming method using two plates and electronic device |
| 08/07/2001 | US6271109 Substrate for accommodating warped semiconductor devices |
| 08/07/2001 | US6271108 Method of forming a contact in semiconductor device |
| 08/07/2001 | US6271107 Semiconductor with polymeric layer |
| 08/07/2001 | US6271106 Method of manufacturing a semiconductor component |
| 08/07/2001 | US6271105 Method of forming multiple wells in a semiconductor integrated circuit using fewer photolithography steps |
| 08/07/2001 | US6271104 Semiconductor wafer; etching pattern in barrier layer |
| 08/07/2001 | US6271103 Solid state image sensor and method for fabricating the same |
| 08/07/2001 | US6271102 Method and system for dicing wafers, and semiconductor structures incorporating the products thereof |
| 08/07/2001 | US6271101 Process for production of SOI substrate and process for production of semiconductor device |
| 08/07/2001 | US6271100 Chemically enhanced anneal for removing trench stress resulting in improved bipolar yield |
| 08/07/2001 | US6271099 Method for forming a capacitor of a DRAM cell |
| 08/07/2001 | US6271098 Multilayer intermetallic |
| 08/07/2001 | US6271097 Method of fabricating a low base-resistance bipolar transistor |
| 08/07/2001 | US6271096 Method and device for improved salicide resistance on polysilicon gates |
| 08/07/2001 | US6271095 Locally confined deep pocket process for ULSI mosfets |
| 08/07/2001 | US6271094 Method of making MOSFET with high dielectric constant gate insulator and minimum overlap capacitance |
| 08/07/2001 | US6271093 Methods for reducing anomalous narrow channel effect in trench-bounded buried-channel p-MOSFETs |
| 08/07/2001 | US6271092 Method for fabricating a semiconductor device |
| 08/07/2001 | US6271091 Method of fabricating flash memory cell |
| 08/07/2001 | US6271090 Method for manufacturing flash memory device with dual floating gates and two bits per cell |
| 08/07/2001 | US6271089 Method of manufacturing flash memory |
| 08/07/2001 | US6271088 Method for fabricating a buried vertical split gate memory device with high coupling ratio |
| 08/07/2001 | US6271087 Method for forming self-aligned contacts and local interconnects using self-aligned local interconnects |
| 08/07/2001 | US6271086 Method for preventing the cluster defect of HSG |
| 08/07/2001 | US6271085 Method for forming a bottom electrode of a storage capacitor |
| 08/07/2001 | US6271084 Method of fabricating a metal-insulator-metal (MIM), capacitor structure using a damascene process |
| 08/07/2001 | US6271083 Method of forming a dram crown capacitor |
| 08/07/2001 | US6271082 Method of fabricating a mixed circuit capacitor |
| 08/07/2001 | US6271081 Semiconductor memory device |
| 08/07/2001 | US6271080 Structure and method for planar MOSFET DRAM cell free of wordline gate conductor to storage trench overlay sensitivity |
| 08/07/2001 | US6271079 Method of forming a trench capacitor |
| 08/07/2001 | US6271078 Simplifying conductive plate/via isolation |
| 08/07/2001 | US6271077 Thin film deposition method, capacitor device and method for fabricating the same, and semiconductor device and method for fabricating the same |
| 08/07/2001 | US6271076 Method for fabricating a novel metallized oxide structure |
| 08/07/2001 | US6271075 Method of manufacturing semiconductor device which can reduce manufacturing cost without dropping performance of logic mixed DRAM |
| 08/07/2001 | US6271074 Process for producing an integrated semiconductor circuit |
| 08/07/2001 | US6271073 Method of forming transistors in a peripheral circuit of a semiconductor memory device |
| 08/07/2001 | US6271072 Method of manufacturing a storage node having five polysilicon bars |
| 08/07/2001 | US6271071 Fabrication process for reduced area storage node junction |
| 08/07/2001 | US6271070 Method of manufacturing semiconductor device |
| 08/07/2001 | US6271069 Transistor |
| 08/07/2001 | US6271068 Method for making improved polysilicon emitters for bipolar transistors on BiCMOS integrated circuits |
| 08/07/2001 | US6271066 Semiconductor material and method for forming the same and thin film transistor |
| 08/07/2001 | US6271065 Method directed to the manufacture of an SOI device |
| 08/07/2001 | US6271064 Thin film transistor and method of manufacturing the same |
| 08/07/2001 | US6271063 Method of making an SRAM cell and structure |
| 08/07/2001 | US6271062 Thin film semiconductor device including a semiconductor film with high field-effect mobility |
| 08/07/2001 | US6271061 Fabrication of insulated gate bipolar devices |
| 08/07/2001 | US6271060 Process of fabricating a chip scale surface mount package for semiconductor device |
| 08/07/2001 | US6271059 Chip interconnection structure using stub terminals |
| 08/07/2001 | US6271058 Method of manufacturing semiconductor device in which semiconductor chip is mounted facedown on board |
| 08/07/2001 | US6271057 Method of making semiconductor chip package |
| 08/07/2001 | US6271050 Method of manufacturing thin film diode |
| 08/07/2001 | US6271048 Process for recycling a substrate from an integrated circuit package |
| 08/07/2001 | US6271047 Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same |
| 08/07/2001 | US6270948 Method of forming pattern |
| 08/07/2001 | US6270947 Printing a pattern |
| 08/07/2001 | US6270944 Thermal transfer element for forming multilayers devices |
| 08/07/2001 | US6270942 Photosensitve polymer containing norbornene units, maleic anhydride units and unsaturated ester |
| 08/07/2001 | US6270939 Radiation-sensitive resin composition |
| 08/07/2001 | US6270929 Damascene T-gate using a relacs flow |
| 08/07/2001 | US6270898 Tool tip and bonding tool comprising the tool tip and control method for the bonding tool |
| 08/07/2001 | US6270879 Release member for use in producing a multi-layer printed wiring board |
| 08/07/2001 | US6270862 Placing substrate on substrate holder in processing chamber, wherein an interior surface of a dielectric member forming a wall of process chamber faces substrate holder; supplying process gas into chamber; energizing to deposit film |
| 08/07/2001 | US6270859 Plasma treatment of titanium nitride formed by chemical vapor deposition |
| 08/07/2001 | US6270857 Method of modifying a surface of an insulator |
| 08/07/2001 | US6270839 Device for feeding raw material for chemical vapor phase deposition and method therefor |
| 08/07/2001 | US6270712 Molding die and marking method for semiconductor devices |
| 08/07/2001 | US6270687 RF plasma method |
| 08/07/2001 | US6270685 Method for producing a semiconductor |
| 08/07/2001 | US6270647 Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operations |
| 08/07/2001 | US6270634 Method for plasma etching at a high etch rate |
| 08/07/2001 | US6270622 Method and apparatus for improving accuracy of plasma etching process |
| 08/07/2001 | US6270621 Etch chamber |
| 08/07/2001 | US6270619 Treatment device, laser annealing device, manufacturing apparatus, and manufacturing apparatus for flat display device |