Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2001
08/16/2001US20010013627 Integrated photovoltaic switch with integrated power device
08/16/2001US20010013626 Semiconductor device
08/16/2001US20010013624 Semiconductor device and process for producing the same
08/16/2001US20010013623 Simplified method of patterning polysilicon gate in a semiconductor device
08/16/2001US20010013622 Field effect transistor, control method for controling such a field effect transistor and a frequency mixer means including such a field effect transistor
08/16/2001US20010013621 Memory Device
08/16/2001US20010013620 Semiconductor device and method for producing a semiconductor device
08/16/2001US20010013619 Capacitors and dram arrays
08/16/2001US20010013618 Semiconductor device and method of fabricating the same
08/16/2001US20010013617 Semiconductor device and method of manufacturing the same
08/16/2001US20010013616 Integrated circuit device with composite oxide dielectric
08/16/2001US20010013615 Integrated circuit fabrication
08/16/2001US20010013614 Iridium oxide diffusion barrier between local interconnect layer and thin film of layered superlattice material
08/16/2001US20010013611 Semiconductor integrated circuit device and method of manufacturing the same
08/16/2001US20010013608 Semiconductor device, its manufacturing method and substrate for manufacturing a semiconductor device
08/16/2001US20010013607 Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device
08/16/2001US20010013606 Apparatus for mapping scratches in an oxide film
08/16/2001US20010013604 Compound semiconductor device and process for fabricating the same
08/16/2001US20010013602 Apparatus for forming electrode of chip-like electronic part
08/16/2001US20010013601 Semiconductor device and method for manufacturing thereof
08/16/2001US20010013600 Semiconductor device with high-temperature-stable gate electrode for sub-micron applications and fabrication thereof
08/16/2001US20010013599 Method of manufacturing mask read-only memory cell
08/16/2001US20010013598 Semiconductor memory device having memory cell area and peripheral circuit area
08/16/2001US20010013580 Cooling of voice coil motors in lithographic projection apparatus
08/16/2001US20010013578 Ion implantation equipment and implantation method thereof
08/16/2001US20010013577 X-ray image sensor and method for fabricating the same
08/16/2001US20010013555 Liquid processing apparatus and method
08/16/2001US20010013536 Process system and process method for mounting leadframes
08/16/2001US20010013532 Apparatus for positioning a thin plate
08/16/2001US20010013531 Apparatus and method of clamping semiconductor devices using sliding finger supports
08/16/2001US20010013515 Heat and cooling treatment apparatus and substrate processing system
08/16/2001US20010013507 Method for CMP of low dielectric constant polymer layers
08/16/2001US20010013506 Chemical mechanical polishing; microelectronics; semiconductors; eliminating short circuiting
08/16/2001US20010013502 For removing remaining resist layer film after etching without swelling the insulation film (acrylic or polyimide resin); semiconductors; liquid crystal displays
08/16/2001US20010013472 Forming copper film on insulation layer; immersion in solution of plating promoter; removing promoter from copper film leaving it on side walls and bottoms of via holes; electroplating to fill holes; improvement over planarization
08/16/2001US20010013424 Electronic component, method of sealing electronic component with resin, and apparatus therefor
08/16/2001US20010013423 Flip chip attach on flexible circuit carrier using chip with metallic cap on solder
08/16/2001US20010013421 Leaded semiconductor device package for use in nonsoldering assembling
08/16/2001US20010013393 Low molecular weight polyester of a linear aliphatic diol and a dicarboxylic acid reacted with a diisocyanate; high crystallinity; high oxygen and moisture barrier properties
08/16/2001US20010013392 Assembly process for flip chip package having a low stress chip and resulting structure
08/16/2001US20010013371 Gas panel
08/16/2001US20010013363 Apparatus and method for feeding gases for use in semiconductor manufacturing
08/16/2001US20010013355 Fast single-article megasonic cleaning process for single-sided or dual-sided cleaning
08/16/2001US20010013340 Silicon support members for wafer processing fixtures
08/16/2001US20010013316 Conveyorized vacuum injection system
08/16/2001US20010013313 Apparatus for fabricating semiconductor structures and method of forming the structures
08/16/2001US20010013311 Epitaxial compound structure and device comprising same
08/16/2001US20010013172 Process for producing an electrical component having a plurality of soldered-on plug contacts
08/16/2001US20010013161 Substrate processing apparatus and substrate processing method
08/16/2001EP1124310A2 Two-dimensional electric motor, exposure apparatus and semiconductor fabrication method
08/16/2001EP1124270A2 Method for producing piezoelectric films with rotating magnetron sputtering system
08/16/2001EP1124269A2 Method for producing devices having piezoelectric films
08/16/2001EP1124264A2 Method of manufacturing transparent conducting structures and use of transparent conducting oxide layers to pattern transparent conducting regions
08/16/2001EP1124262A2 Multilayer dielectric stack and method
08/16/2001EP1124260A2 Semiconductor device with reverse conducting faculty
08/16/2001EP1124259A2 Cooling device for a high power semiconductor module
08/16/2001EP1124258A2 Reduction of orientation dependent oxidation for vertical sidewalls of semiconductor substrates
08/16/2001EP1124257A2 Phosphorous doped copper film
08/16/2001EP1124256A1 Ceramic substrate
08/16/2001EP1124254A2 Easy to remove hard mask layer for semiconductor device fabrication
08/16/2001EP1124253A1 Process for etching trenches in a semiconductor material
08/16/2001EP1124252A2 Apparatus and process for processing substrates
08/16/2001EP1124170A1 Reference voltage generation circuit including a start-up circuit
08/16/2001EP1124078A2 Active anti-vibration apparatus and exposure apparatus
08/16/2001EP1123991A2 Low dielectric constant materials and processes
08/16/2001EP1123753A2 Mesoporous ceramic films having reduced dielectric constants
08/16/2001EP1123639A2 Wafer level burn-in and test thermal chuck and method
08/16/2001EP1123563A1 Techniques for triple and quadruple damascene fabrication
08/16/2001EP1123562A1 Layer processing
08/16/2001EP1123561A1 Method and system to control the concentration of dissolved gas in a liquid
08/16/2001EP1123560A2 Method for producing a wafer support in a high-temperature cvd reactor
08/16/2001EP1123556A1 Fuse circuit having zero power draw for partially blown condition
08/16/2001EP1123512A1 High density printed circuit board
08/16/2001EP1123423A1 High rate silicon deposition method at low pressures
08/16/2001EP1123348A2 Impact-resistant epoxide resin compositions
08/16/2001EP1123166A1 Method of removing organic materials from substrates
08/16/2001EP0980305A4 Method and apparatus for molding plastic packages
08/16/2001EP0953207B1 Method for doping metallic connecting wire
08/16/2001EP0946985B1 Memory cell arrangement and process for manufacturing the same
08/16/2001EP0892991B1 Semiconductor component with adjustable current amplification based on avalanche breakdown controlled by tunnel current
08/16/2001EP0852066B1 Process for generating the source regions of a flash-eeprom storage cell field
08/16/2001DE10106006A1 SJ-Halbleiterbauelement und Verfahren zu dessen Herstellung SJ-semiconductor device and process for its preparation
08/16/2001DE10105920A1 Semiconducting component has anisotropically conductive film connecting semiconducting element to circuit board, film substrate of insulating resin with mutually insulated conducting tracks
08/16/2001DE10105876A1 Anschlußstruktur und zugehöriges Herstellungsverfahren Terminal structure and manufacturing method thereof
08/16/2001DE10104274A1 Contact structure used for e.g. MOSFETs, IGBTs and thyristors has a thin conducting separating layer applied to the exposed surfaces of the side wall spacer elements, and a relatively thick aluminum layer
08/16/2001DE10101090A1 Verfahren des Schneidens von CSP-Substraten Process of cutting of CSP substrates
08/16/2001DE10101067A1 Program execution system of semiconductor test device, has programs in processor which are written in exclusive and general purpose programming languages based on hardware for semiconductor examination
08/16/2001DE10061769A1 Halbleiterspeicherbaustein A semiconductor memory device
08/16/2001DE10060900A1 Surface state measuring device for semiconductor substrate manufacture has control unit which controls position and angle of irradiation of infrared rays to semiconductor wafer
08/16/2001DE10055648A1 Siliziumwafer mit gesteuerter Störstellenverteilung, Verfahren zur Herstellung desselben und Czochralski-Ziehapparate zur Herstellung von Einkristall-Siliziumrohlingen Silicon wafer with a controlled impurity, method for producing the same and Czochralski pulling apparatus for producing single crystal silicon ingots
08/16/2001DE10046911A1 Photo mask for manufacturing semiconductors has monitoring marking with coarse, high density and cross patterns on substrate for assuring dimensions of actual pattern and coincidence
08/16/2001DE10036961A1 Testing semiconducting wafers involves electrically testing each chip on each wafer to identify sub-area with most wafers with more defective chips in sub-area than in surrounding area
08/16/2001DE10008532C1 Method and device for removing the hood of a processing chamber detaches the hood from a support protruding at the side over the hood and fixed with a clamping ring and a tension mechanism for resetting the hood.
08/16/2001DE10006447A1 Miniaturized component has system bearer and crystalline substrate surfaces at defined angle, adhesive fully or partly filling space between distance structures, substrate and system bearer
08/16/2001DE10006215A1 Kühlvorrichtung für ein Hochleistungs-Halbleitermodul A cooling apparatus for a high-power semiconductor module
08/16/2001DE10006108A1 Process for the epitaxial growth of single crystalline aluminum nitride layers on silicon substrates comprises preparing substrate to form terrace layer, vaporizing an aluminum layer
08/16/2001DE10005564A1 Verfahren zur Herstellung definierter polykristalliner Silizium-Bereiche in einer amorphen Siliziumschicht A process for preparing polycrystalline silicon of defined regions in an amorphous silicon layer
08/16/2001DE10005484A1 Forming thin coating for manufacturing semiconducting components involves applying coating to material resistant to melting temperature or cover of material to coating before melting
08/16/2001DE10005442A1 Bipolartransistor Bipolar transistor
08/16/2001DE10005368A1 Electrical contact on semiconductor materials comprises binary or ternary metal alloy having melting point which matches process temperature