| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 08/14/2001 | US6274417 Method of forming a semiconductor device |
| 08/14/2001 | US6274416 Method for fabricating a semiconductor device including a latch-up preventing conductive layer |
| 08/14/2001 | US6274415 Self-aligned Vt implant |
| 08/14/2001 | US6274414 Laser anneal method of a semiconductor layer |
| 08/14/2001 | US6274413 Method for fabricating a polysilicon thin film transistor |
| 08/14/2001 | US6274412 Material and method for printing high conductivity electrical conductors and other components on thin film transistor arrays |
| 08/14/2001 | US6274411 Method for manufacturing electronic devices, comprising non-salicided non-volatile memory cells, non-salicided HV transistors, and LV transistors with salicided junctions with few masks |
| 08/14/2001 | US6274410 Method of programming a semiconductor memory |
| 08/14/2001 | US6274409 Method for making a semiconductor device |
| 08/14/2001 | US6274408 Method for producing a plastic molded semiconductor package |
| 08/14/2001 | US6274407 Method and article for attaching high-operating-temperature electronic component |
| 08/14/2001 | US6274406 Semiconductor device and a method of manufacturing the same |
| 08/14/2001 | US6274405 Semiconductor device, method of making the same, circuit board, and film carrier tape |
| 08/14/2001 | US6274404 Multilayered wiring structure and method of manufacturing the same |
| 08/14/2001 | US6274403 Process for producing heteropitaxial diamond layers on Si-substrates |
| 08/14/2001 | US6274402 Method of fabricating a silicon solar cell |
| 08/14/2001 | US6274401 Method of manufacturing a CCD sensor with a deep well |
| 08/14/2001 | US6274400 Tri-layer process for forming TFT matrix of LCD with reduced masking steps |
| 08/14/2001 | US6274399 Method of strain engineering and impurity control in III-V nitride semiconductor films and optoelectronic devices |
| 08/14/2001 | US6274397 Method to preserve the testing chip for package's quality |
| 08/14/2001 | US6274394 Method and system for determining the fail patterns of fabricated wafers in automated wafer acceptance test |
| 08/14/2001 | US6274393 Method for measuring submicron images |
| 08/14/2001 | US6274389 Sealing space between carrier substrate and circuit board with reaction product of epoxy resin, curing agent and plasticizer |
| 08/14/2001 | US6274388 Annealing of a crystalline perovskite ferroelectric cell |
| 08/14/2001 | US6274291 Method of reducing defects in I/C card and resulting card |
| 08/14/2001 | US6274290 Raster scan gaussian beam writing strategy and method for pattern generation |
| 08/14/2001 | US6274287 Positive resist compositions comprising a hydroxyphenyl ketone |
| 08/14/2001 | US6274280 Multilayer attenuating phase-shift masks |
| 08/14/2001 | US6274253 Processing methods for providing metal-comprising materials within high aspect ratio openings |
| 08/14/2001 | US6274245 Foil for use in filing substrate recesses |
| 08/14/2001 | US6274234 Very long and highly stable atomic wires, method for making these wires, application in nano-electronics |
| 08/14/2001 | US6274214 Microelectronic package module with temporary lid |
| 08/14/2001 | US6274198 Providing semiconductor mask with aperture for defining area of substrate to be covered by material, forming pyramidal shaped features with sidewalls; mounting spheres; positioning mask; depositing material through aperture |
| 08/14/2001 | US6274059 Method to remove metals in a scrubber |
| 08/14/2001 | US6274058 Remote plasma cleaning method for processing chambers |
| 08/14/2001 | US6274024 Apparatus and method for plating wafers, substrates and other articles |
| 08/14/2001 | US6274023 Configuring the fluid dynamics and electrostatics of a plating process in order to provide improved uniformity in plating deposition, improved plating rates, and improved step coverage of via holes. |
| 08/14/2001 | US6274013 Electrode semiconductor workpiece holder |
| 08/14/2001 | US6274008 Sputtering, magnetron producing a large volume of plasma, preferably a high-density plasma, long travel path allows large fraction of the sputtered atoms to be ionized so their energy can be controlled by substrate biasing. simultaneous |
| 08/14/2001 | US6274007 Sputtering a silicon surface by a uniform flow of nitrogen molecular ions in an ultra-high vacuum so as to form a periodic wave-like relief, |
| 08/14/2001 | US6273962 Method to reduce the particles in load-lock chamber |
| 08/14/2001 | US6273961 Method for cleaning semiconductor processing equipment by reducing particles |
| 08/14/2001 | US6273959 Method of cleaning semiconductor device |
| 08/14/2001 | US6273958 Substrate support for plasma processing |
| 08/14/2001 | US6273957 Vaporizing device for CVD source materials and CVD apparatus employing the same |
| 08/14/2001 | US6273956 Synchronous multiplexed near zero overhead architecture for vacuum processes |
| 08/14/2001 | US6273954 System for manufacturing a semiconductor device |
| 08/14/2001 | US6273951 Precursor mixtures for use in preparing layers on substrates |
| 08/14/2001 | US6273950 SiC device and method for manufacturing the same |
| 08/14/2001 | US6273946 Method for production of multi-layered epitaxially grown crystal and apparatus therefor |
| 08/14/2001 | US6273944 Silicon wafer for hydrogen heat treatment and method for manufacturing the same |
| 08/14/2001 | US6273806 Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus |
| 08/14/2001 | US6273804 Apparatus for polishing wafers |
| 08/14/2001 | US6273803 Carriers and polishing apparatus |
| 08/14/2001 | US6273802 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device |
| 08/14/2001 | US6273798 Pre-conditioning polishing pads for chemical-mechanical polishing |
| 08/14/2001 | US6273794 Apparatus and method for grinding a semiconductor wafer surface |
| 08/14/2001 | US6273791 Method of producing semiconductor wafer |
| 08/14/2001 | US6273786 Tungsten chemical-mechanical polishing process using a fixed abrasive polishing pad and a tungsten layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
| 08/14/2001 | US6273700 Mold structure used in method of molding circuitry |
| 08/14/2001 | US6273664 Coupling system for the transfer of a confined planar object from a containment pod to an object processing unit |
| 08/14/2001 | US6273543 Aqueous developable high performance curable polymers |
| 08/14/2001 | US6273484 Wafer holding device |
| 08/14/2001 | US6273344 Dispensing nozzle device |
| 08/14/2001 | US6273328 Solder bump forming method and apparatus |
| 08/14/2001 | US6273275 Cassette for loading glass substrates |
| 08/14/2001 | US6273261 Identification structure of a substrate storage container and method of identifying a substrate storage container |
| 08/14/2001 | US6273129 Device for distributing a working gas and installation for supplying a working gas that is equipped with such a device |
| 08/14/2001 | US6273110 Automated semiconductor processing system |
| 08/14/2001 | US6273108 Apparatus and method for processing the surface of a workpiece with ozone |
| 08/14/2001 | US6273107 Positive flow, positive displacement rinse tank |
| 08/14/2001 | US6273104 Processing fluid is supplied to a surface of the substrate while supplying inert gas into a space between the substrate and a blocking plate; no turbulence is created at the surface of substrate preventing pollutant adherence |
| 08/14/2001 | US6273101 Method for post chemical-mechanical planarization cleaning of semiconductor wafers |
| 08/14/2001 | US6273099 Forming marks on a silicon wafer, immersing the wafer in a cleaning solution of ammonium hydroxide, hydrogen peroxide, and water agitated by megasonic energy, transfering to quick dump rinse tank filled of deionized water, and drying wafer |
| 08/14/2001 | US6273098 Extension of the useful life of a chemical bath used to process a substrate |
| 08/14/2001 | US6273023 Plasma processing apparatus capable of reliably, electrostatically attracting and holding and thus fixing semiconductor wafer |
| 08/14/2001 | US6273022 Distributed inductively-coupled plasma source |
| 08/14/2001 | US6272768 Apparatus for treating an object using ultra-violet light |
| 08/14/2001 | US6272763 Staging apparatus and method, and method for manufacturing the staging apparatus, and exposing apparatus using the staging apparatus |
| 08/14/2001 | US6272736 Method for forming a thin-film resistor |
| 08/14/2001 | US6272712 Brush box containment apparatus |
| 08/14/2001 | CA2228507C Optoelectronic material, device using the same, and method for manufacturing optoelectronic material |
| 08/11/2001 | WO2001084608A1 Production method of iii nitride compound semiconductor substrate and semiconductor device |
| 08/09/2001 | WO2001057935A1 Light-emitting thyristor matrix array and driver circuit |
| 08/09/2001 | WO2001057931A1 Field effect transistor and method for the production of a charge carrier injected field effect transistor |
| 08/09/2001 | WO2001057929A1 Group iii nitride based fets and hemts with reduced trapping and method for producing the same |
| 08/09/2001 | WO2001057928A1 High power capacitors from thin layers of metal powder or metal sponge particles |
| 08/09/2001 | WO2001057927A1 Silicon nanoparticle field effect transistor and transistor memory device |
| 08/09/2001 | WO2001057926A1 Mos field effect transistor arrangement |
| 08/09/2001 | WO2001057925A1 Protection device for schottky diodes |
| 08/09/2001 | WO2001057924A1 Semiconductor component with contacts provided on the lower side thereof, and method for producing the same |
| 08/09/2001 | WO2001057923A1 Method for producing electrical connections in particular for an electronic device |
| 08/09/2001 | WO2001057922A1 Method and apparatus for singulation of electronic devices |
| 08/09/2001 | WO2001057921A1 Etching solution and method |
| 08/09/2001 | WO2001057920A1 Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor |
| 08/09/2001 | WO2001057919A1 Polishing composite for use in lsi manufacture and method of manufacturing lsi |
| 08/09/2001 | WO2001057918A1 Method for forming thin layers of silicon and germanium compounds |
| 08/09/2001 | WO2001057916A2 Bipolar transistor |
| 08/09/2001 | WO2001057914A2 Process of manufacturing a semiconductor device including a buried channel field effect transistor |
| 08/09/2001 | WO2001057911A1 Method for carrying out a plasma etching process |