| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 07/31/2001 | US6269047 Semiconductor memory device |
| 07/31/2001 | US6269027 Non-volatile storage latch |
| 07/31/2001 | US6268994 Electrostatic chuck and method of manufacture |
| 07/31/2001 | US6268990 Semiconductor protection device and power converting system |
| 07/31/2001 | US6268916 System for non-destructive measurement of samples |
| 07/31/2001 | US6268907 Elimination of standing waves in photoresist |
| 07/31/2001 | US6268906 Exposure apparatus and exposure method |
| 07/31/2001 | US6268903 Method of adjusting projection optical apparatus |
| 07/31/2001 | US6268902 Exposure apparatus, and manufacturing method for devices using same |
| 07/31/2001 | US6268900 Accommodating apparatus and substrate processing system |
| 07/31/2001 | US6268842 Thin film transistor circuit and semiconductor display device using the same |
| 07/31/2001 | US6268779 Integrated oscillators and tuning circuits |
| 07/31/2001 | US6268764 Bandgap voltage comparator used as a low voltage detection circuit |
| 07/31/2001 | US6268761 Booster circuit |
| 07/31/2001 | US6268760 Hysteretic fuse control circuit with serial interface fusing |
| 07/31/2001 | US6268757 Semiconductor device having capacitor that reduce fluctuation of power supply |
| 07/31/2001 | US6268740 System for testing semiconductor device formed on semiconductor wafer |
| 07/31/2001 | US6268718 Burn-in test device |
| 07/31/2001 | US6268700 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 07/31/2001 | US6268662 Wire bonded flip-chip assembly of semiconductor devices |
| 07/31/2001 | US6268661 Semiconductor device and method of its fabrication |
| 07/31/2001 | US6268659 Semiconductor body with layer of solder material comprising chromium |
| 07/31/2001 | US6268658 Semiconductor integrated circuit device for connecting semiconductor region and electrical wiring metal via titanium silicide layer and method of fabrication thereof |
| 07/31/2001 | US6268657 Semiconductor devices and an insulating layer with an impurity |
| 07/31/2001 | US6268656 Method and structure for uniform height solder bumps on a semiconductor wafer |
| 07/31/2001 | US6268655 Semiconductor device including edge bond pads and methods |
| 07/31/2001 | US6268652 CSP type semiconductor device with reduced package size |
| 07/31/2001 | US6268648 Board for mounting semiconductor element, method for manufacturing the same, and semiconductor device |
| 07/31/2001 | US6268647 Electronic component with an insulating coating |
| 07/31/2001 | US6268645 Semiconductor device |
| 07/31/2001 | US6268644 Semiconductor device |
| 07/31/2001 | US6268643 Lead frame device for delivering electrical power to a semiconductor die |
| 07/31/2001 | US6268641 Semiconductor wafer having identification indication and method of manufacturing the same |
| 07/31/2001 | US6268640 Forming steep lateral doping distribution at source/drain junctions |
| 07/31/2001 | US6268638 Metal wire fuse structure with cavity |
| 07/31/2001 | US6268637 Method of making air gap isolation by making a lateral EPI bridge for low K isolation advanced CMOS fabrication |
| 07/31/2001 | US6268636 Operation and biasing for single device equivalent to CMOS |
| 07/31/2001 | US6268634 Transistor with an ultra short channel length defined by a laterally diffused nitrogen implant |
| 07/31/2001 | US6268633 Electronic structure comprising high and low voltage transistors, and a corresponding fabrication method |
| 07/31/2001 | US6268632 Field effect transistor and power amplifier including the same |
| 07/31/2001 | US6268631 Glass substrate assembly, semiconductor device and method of heat-treating glass substrate |
| 07/31/2001 | US6268630 Silicon-on-insulator field effect transistor with improved body ties for rad-hard applications |
| 07/31/2001 | US6268629 Field effect transistor with reduced narrow channel effect |
| 07/31/2001 | US6268628 Depletion type MOS semiconductor device and MOS power IC |
| 07/31/2001 | US6268627 Semiconductor device having impurity regions with varying impurity concentrations |
| 07/31/2001 | US6268626 DMOS field effect transistor with improved electrical characteristics and method for manufacturing the same |
| 07/31/2001 | US6268625 Trench-type thin film transistor |
| 07/31/2001 | US6268624 Method for inhibiting tunnel oxide growth at the edges of a floating gate during semiconductor device processing |
| 07/31/2001 | US6268623 Apparatus and method for margin testing single polysilicon EEPROM cells |
| 07/31/2001 | US6268622 Non-volatile memory device and fabrication method thereof |
| 07/31/2001 | US6268621 Vertical channel field effect transistor |
| 07/31/2001 | US6268620 Method of forming capacitors on integrated circuit |
| 07/31/2001 | US6268619 Integrated circuits |
| 07/31/2001 | US6268608 Method and apparatus for selective in-situ etching of inter dielectric layers |
| 07/31/2001 | US6268606 Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up |
| 07/31/2001 | US6268457 Spin-on glass anti-reflective coatings for photolithography |
| 07/31/2001 | US6268323 Mixture of solvent, alkanolamine and corrosion resistance |
| 07/31/2001 | US6268299 Variable stoichiometry silicon nitride barrier films for tunable etch selectivity and enhanced hyrogen permeability |
| 07/31/2001 | US6268298 Method of manufacturing semiconductor device |
| 07/31/2001 | US6268297 Self-planarizing low-temperature doped-silicate-glass process capable of gap-filling narrow spaces |
| 07/31/2001 | US6268296 Low temperature process for multiple voltage devices |
| 07/31/2001 | US6268295 Method of manufacturing semiconductor device |
| 07/31/2001 | US6268294 Attenuated degradation of a polyarylene ether dielectric |
| 07/31/2001 | US6268293 Method of forming wires on an integrated circuit chip |
| 07/31/2001 | US6268292 Methods for use in formation of titanium nitride interconnects |
| 07/31/2001 | US6268291 Method for forming electromigration-resistant structures by doping |
| 07/31/2001 | US6268290 Method of forming wirings |
| 07/31/2001 | US6268289 Method for protecting the edge exclusion of a semiconductor wafer from copper plating through use of an edge exclusion masking layer |
| 07/31/2001 | US6268288 Plasma treated thermal CVD of TaN films from tantalum halide precursors |
| 07/31/2001 | US6268287 Polymerless metal hard mask etching |
| 07/31/2001 | US6268286 Method of fabricating MOSFET with lateral resistor with ballasting |
| 07/31/2001 | US6268285 Method of removing plasma etch damage to pre-silicidized surfaces by wet silicon etch |
| 07/31/2001 | US6268284 In situ titanium aluminide deposit in high aspect ratio features |
| 07/31/2001 | US6268283 Method for forming dual damascene structure |
| 07/31/2001 | US6268282 Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
| 07/31/2001 | US6268281 Method to form self-aligned contacts with polysilicon plugs |
| 07/31/2001 | US6268280 Semiconductor device using dual damascene technology and method for manufacturing the same |
| 07/31/2001 | US6268279 Trench and via formation in insulating films utilizing a patterned etching stopper film |
| 07/31/2001 | US6268278 Semiconductor device and manufacturing process thereof |
| 07/31/2001 | US6268277 Method of producing air gap for reducing intralayer capacitance in metal layers in damascene metalization process and product resulting therefrom |
| 07/31/2001 | US6268276 Area array air gap structure for intermetal dielectric application |
| 07/31/2001 | US6268275 Method of locating conductive spheres utilizing screen and hopper of solder balls |
| 07/31/2001 | US6268274 Low temperature process for forming inter-metal gap-filling insulating layers in silicon wafer integrated circuitry |
| 07/31/2001 | US6268273 Fabrication method of single electron tunneling device |
| 07/31/2001 | US6268272 Method of forming gate electrode with titanium polycide |
| 07/31/2001 | US6268271 Method for forming buried layer inside a semiconductor device |
| 07/31/2001 | US6268269 Method for fabricating an oxide layer on silicon with carbon ions introduced at the silicon/oxide interface in order to reduce hot carrier effects |
| 07/31/2001 | US6268268 Method of manufacturing semiconductor device |
| 07/31/2001 | US6268267 Vapor deposition |
| 07/31/2001 | US6268266 Method for forming enhanced FOX region of low voltage device in high voltage process |
| 07/31/2001 | US6268265 Trench isolation method for semiconductor integrated circuit |
| 07/31/2001 | US6268264 Method of forming shallow trench isolation |
| 07/31/2001 | US6268263 Method of forming a trench type element isolation in semiconductor substrate |
| 07/31/2001 | US6268262 Method for forming air bridges |
| 07/31/2001 | US6268261 Microprocessor having air as a dielectric and encapsulated lines and process for manufacture |
| 07/31/2001 | US6268260 Methods of forming memory cell capacitor plates in memory cell capacitor structures |
| 07/31/2001 | US6268259 Overhanging separator for self-defining stacked capacitor |
| 07/31/2001 | US6268258 Method for fabricating capacitor in semiconductor device |
| 07/31/2001 | US6268257 Method of forming a transistor having a low-resistance gate electrode |
| 07/31/2001 | US6268256 Method for reducing short channel effect |