Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2001
08/28/2001US6280652 Polishing edge surface of silicon wafers or oxide film-coated semiconductor wafers with formulation comprising water, silicon dioxide selected form colloidal silica, fumed silica, and precipitated silica
08/28/2001US6280651 Can etch different types of silicon oxide at different relative etch rates
08/28/2001US6280645 Wafer flattening process and system
08/28/2001US6280644 Method of planarizing a surface on an integrated circuit
08/28/2001US6280640 Providing layers of copper conductors on base; electrically connecting layers of copper conductors by aluminum studs; providing barrier metal mask; anodizing unprotected aluminum; removing aluminum oxide; etching copper conductor; polishing
08/28/2001US6280595 Providing substrate having electrode at its surfacethat is proximate to molecule bearing protected functional group; applying potential to electrode to generate electrochemical reagents to deprotect; bonding with monomer
08/28/2001US6280585 Sputtering apparatus for filling pores of a circular substrate
08/28/2001US6280527 Aqueous quaternary ammonium hydroxide as a screening mask cleaner
08/28/2001US6280507 Air manager apparatus and method for exhausted equipment and systems, and exhaust and airflow management in a semiconductor manufacturing facility
08/28/2001US6280308 Wafer suction pad
08/28/2001US6280299 Combined slurry dispenser and rinse arm
08/28/2001US6280297 Apparatus and method for distribution of slurry in a chemical mechanical polishing system
08/28/2001US6280295 Apparatus and method to polish a wafer using abrasive flow machining
08/28/2001US6280292 Polishing apparatus
08/28/2001US6280291 Wafer sensor utilizing hydrodynamic pressure differential
08/28/2001US6280290 Method of forming a transparent window in a polishing pad
08/28/2001US6280289 Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers
08/28/2001US6280183 Substrate support for a thermal processing chamber
08/28/2001US6280134 Apparatus and method for automated cassette handling
08/28/2001US6280081 Methods and apparatus for calibrating temperature measurements and measuring currents
08/28/2001US6280062 Light source device and illumination system
08/28/2001US6280060 Cooling arrangement of a heating device of the light irradiation type
08/28/2001US6279976 Wafer handling device having conforming perimeter seal
08/28/2001US6279889 Loose die fixture
08/28/2001US6279881 Method and apparatus which exposes a second object with a pattern formed on a first object and which performs statistical calculation based on position information of marks on the first object
08/28/2001US6279816 Apparatus and process for mounting conductor balls on terminal pads of semiconductor devices
08/28/2001US6279815 Stacked chip process carrier
08/28/2001US6279814 Soldering apparatus for providing a fixed quantity of solder piece onto target plate
08/28/2001US6279810 Piezoelectric sensor for measuring bonding parameters
08/28/2001US6279724 Automated semiconductor processing system
08/28/2001US6279648 Method of manufacturing cooling devices made up of several metal shaped-section elements for mounting on semiconductor components, shaped-section elements for use in the manufacture of such cooling devices, and cooling devices manufactured by the method
08/28/2001US6279585 A residue of the barrier metal is produced, oxidized, and then removed; patterning of the thin film resistor is stable, and short-circuit does not occur to a wiring pattern disposed above the barrier metal
08/28/2001US6279564 Rocking apparatus and method for slicing a workpiece utilizing a diamond impregnated wire
08/28/2001US6279563 Method for sawing wafers employing multiple indexing techniques for multiple die dimensions
08/28/2001US6279504 Plasma CVD system
08/28/2001US6279503 Chemical vapor deposition apparatus for manufacturing semiconductor devices
08/28/2001US6279502 Resist developing method by magnetic field controlling, resist developing apparatus and method of fabricating semiconductor device
08/28/2001US6279490 Epicyclic stage
08/28/2001US6279412 Corrosion resistant exoskeleton arm linkage assembly
08/28/2001US6279402 Device for measuring pressure in a chamber
08/28/2001US6279249 Reduced particle contamination manufacturing and packaging for reticles
08/28/2001US6279227 Method of forming a resilient contact structure
08/28/2001US6279226 Lead bonding machine for bonding leads of a chip disposed over a carrier tape to an electrode pad formed on the chip
08/28/2001CA2054706C Very large scale immobilized polymer synthesis
08/24/2001CA2336569A1 Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method
08/23/2001WO2001062062A2 Component mounting apparatus and component mounting method, and recognition apparatus for component mount panel, component mounting apparatus for liquid crystal panel, and component mounting method for liquid crystal panel
08/23/2001WO2001061847A1 Electronic device
08/23/2001WO2001061798A1 Injection seeded f2 lithography laser
08/23/2001WO2001061765A1 Semiconductor component which emits radiation, and method for producing the same
08/23/2001WO2001061762A2 Punch-through diode and method of manufacturing the same
08/23/2001WO2001061761A1 Polycrystalline thin film and semiconductor device
08/23/2001WO2001061760A1 Method of manufacturing thin-film transistor, and liquid-crystal display
08/23/2001WO2001061758A1 Lateral dmos improved breakdown structure and method
08/23/2001WO2001061755A1 Semiconductor devices
08/23/2001WO2001061754A1 Semiconductor device fabrication method and semiconductor device fabrication device
08/23/2001WO2001061753A1 Electronic component comprising an electrically conductive connection consisting of carbon nanotubes and a method for producing the same
08/23/2001WO2001061750A2 Method of etching a shaped cavity
08/23/2001WO2001061749A1 SEMICONDUCTOR DEVICE WITH AN INTEGRATED CMOS CIRCUIT WITH MOS TRANSISTORS HAVING SILICON-GERMANIUM (Si1-xGex) GATE ELECTRODES, AND METHOD OF MANUFACTURING SAME
08/23/2001WO2001061747A2 Method for eliminating stress induced dislocation in cmos devices
08/23/2001WO2001061746A2 Test structure for metal cmp process control
08/23/2001WO2001061745A2 Surface passivation method and arrangement for measuring the lifetime of minority carriers in semiconductors
08/23/2001WO2001061744A1 Method for manufacturing semiconductor device
08/23/2001WO2001061743A1 Method for low temperature bonding and bonded structure
08/23/2001WO2001061742A1 Method for annealing an integrated device using a radiant energy absorber layer
08/23/2001WO2001061741A1 A method of manufacturing a semiconductor device
08/23/2001WO2001061740A1 Self-cleaning process for etching silicon-containing material
08/23/2001WO2001061739A1 Process for planarization and recess etching of polysilicon in an overfilled trench
08/23/2001WO2001061738A1 Dram capacitor with ultra-thin nitride layer
08/23/2001WO2001061737A1 Electron beam modification of cvd deposited films, forming low dielectric constant materials
08/23/2001WO2001061736A1 Method of processing wafer
08/23/2001WO2001061735A2 Implantation mask for high energy ion implantation
08/23/2001WO2001061734A1 Non-single crystal film, substrate with non-single crystal film, method and apparatus for producing the same, method and apparatus for inspecting the same, thin film transistor, thin film transistor array and image display using it
08/23/2001WO2001061733A2 Double recessed transistor
08/23/2001WO2001061728A1 Method and apparatus for plasma deposition
08/23/2001WO2001061727A1 Method and device for attenuating harmonics in semiconductor plasma processing systems
08/23/2001WO2001061515A1 Laser lithography quality alarm system
08/23/2001WO2001061514A1 Process monitoring system for lithography lasers
08/23/2001WO2001061412A1 A method of improving photomask geometry
08/23/2001WO2001061411A1 Zoom illumination system for use in photolithography
08/23/2001WO2001061409A2 Apparatus and method of cleaning reticles for use in a lithography tool
08/23/2001WO2001061407A1 Laser thermal processing apparatus and method
08/23/2001WO2001061369A1 Lssd interface
08/23/2001WO2001061368A1 Tester and holder for tester
08/23/2001WO2001061065A1 Method of depositing an io or ito thin film on polymer substrate
08/23/2001WO2001060764A1 METHOD FOR MANUFACTURING Si-SiC MEMBER FOR SEMICONDUCTOR HEAT TREATMENT
08/23/2001WO2001060567A1 Process for reducing surface variations for polished wafer
08/23/2001WO2001060242A2 Test structure for metal cmp process control
08/23/2001WO2000075975A3 Low dielectric constant polyorganosilicon coatings generated from polycarbosilanes
08/23/2001WO1999059191A3 Method and device for drying photoresist coatings
08/23/2001US20010016938 Inspection method and inspection system using charged particle beam
08/23/2001US20010016937 System and method for compressing LSI mask writing data
08/23/2001US20010016934 Designing method of semiconductor integrated circuit using library storing mask pattern of macro circuit and designing apparatus executing the same
08/23/2001US20010016933 Block based design methodology
08/23/2001US20010016923 Program execution system for semiconductor testing apparatus
08/23/2001US20010016893 Layout for a semiconductor memory device having redundant elements
08/23/2001US20010016826 Assistance method and apparatus
08/23/2001US20010016786 Tool position measurement method, offset measurement method, reference member and bonding apparatus
08/23/2001US20010016674 Method and apparatus for cleaning a vacuum line in a CVD system
08/23/2001US20010016551 Shock resistance; high strength; heat resistance
08/23/2001US20010016470 Polishing apparatus and polishing method