| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 09/04/2001 | US6284561 Method of forming a metal plate of a fingerprint sensor chip on a semiconductor wafer |
| 09/04/2001 | US6284560 Method for producing co-planar surface structures |
| 09/04/2001 | US6284557 Optical sensor by using tunneling diode |
| 09/04/2001 | US6284554 Process for manufacturing a flip-chip integrated circuit |
| 09/04/2001 | US6284553 Location dependent automatic defect classification |
| 09/04/2001 | US6284552 Method and apparatus for evaluating surface roughness of an epitaxial growth layer, method and apparatus for measuring reflectance of an epitaxial growth layer, and manufacturing method of semiconductor device |
| 09/04/2001 | US6284551 Capacitor and method for fabricating the same |
| 09/04/2001 | US6284440 As developing solution |
| 09/04/2001 | US6284439 Selecting an enhanced positive photoresist and depositing onto substrate; exposing selected portions of positive photoresist layer to light, wherein the exposed portions are soluble in aqueous base; developing exposed portions |
| 09/04/2001 | US6284438 Providing semiconductor substrate; forming material film to be patterned on semiconductor substrate; forming a photoresist film on the material film by coating photoresist; patterning photoresist film reducing size of opening by thermal flow |
| 09/04/2001 | US6284430 Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same |
| 09/04/2001 | US6284419 Methods of reducing proximity effects in lithographic processes |
| 09/04/2001 | US6284415 Charged-particle-beam transfer masks and methods of making |
| 09/04/2001 | US6284414 Preparing mask substrate having light-shielding film pattern over including integrated circuit pattern and alignment mark; forming resist film; aligning position of phase-shifting pattern; electron beam exposure to form phase-shifting pattern |
| 09/04/2001 | US6284413 Selecting reticle primitives containing patterns corresponding to portions of a layer to be created by semicustom reticle; exposing to create image; employing semicustom reticle to create an image of patterns on integrated circuit |
| 09/04/2001 | US6284384 For electronics |
| 09/04/2001 | US6284317 Providing surface comprising units having silion-hydrogen bonds; exposing to organometallic reagent; forming a silicon-carbon bond at a temperature of less than about 25.degree. c. and free of an external energy source |
| 09/04/2001 | US6284316 Chemical vapor deposition of titanium |
| 09/04/2001 | US6284173 Method for vacuum encapsulation of semiconductor chip packages |
| 09/04/2001 | US6284151 Ferric nitrate-alumina based slurry containing ferric nonahydrate, water and nitric acid; corrosion resistance |
| 09/04/2001 | US6284149 High-density plasma etching of carbon-based low-k materials in a integrated circuit |
| 09/04/2001 | US6284148 Method for anisotropic etching of silicon |
| 09/04/2001 | US6284146 Etching gas mixture for transition metal thin film and method for etching transition metal thin film using the same |
| 09/04/2001 | US6284114 Immersing electrodes in particulate bath;controlling electrical conditions; generating bubbles to make polishing pad |
| 09/04/2001 | US6284110 Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines |
| 09/04/2001 | US6284106 Method of producing flat panels |
| 09/04/2001 | US6284093 Shield or ring surrounding semiconductor workpiece in plasma chamber |
| 09/04/2001 | US6284091 Unique chemical mechanical planarization approach which utilizes magnetic slurry for polish and magnetic fields for process control |
| 09/04/2001 | US6284086 Apparatus and method for attaching a microelectronic device to a carrier using a photo initiated anisotropic conductive adhesive |
| 09/04/2001 | US6284080 Barrier metallization in ceramic substrate for implantable medical devices |
| 09/04/2001 | US6284079 Method and structure to reduce low force pin pull failures in ceramic substrates |
| 09/04/2001 | US6284055 Using an aqueous rinse solution which is de-oxygenated by passing it with a carrier gas through an osmotic membrane degasifier |
| 09/04/2001 | US6284052 In-situ method of cleaning a metal-organic chemical vapor deposition chamber |
| 09/04/2001 | US6284051 Cooled window |
| 09/04/2001 | US6284050 UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition |
| 09/04/2001 | US6284049 Processing apparatus for fabricating LSI devices |
| 09/04/2001 | US6284048 Method of processing wafers with low mass support |
| 09/04/2001 | US6284044 Film forming method and film forming apparatus |
| 09/04/2001 | US6284043 Solution treatment apparatus |
| 09/04/2001 | US6284042 Such as gallium, aluminum, indium, and boron which is one of iii-v compound semiconductor materials and applicable to light-emitting, cladding, or conductive layers of semiconductor light-emitting elements or devices |
| 09/04/2001 | US6284041 Process for growing a silicon single crystal |
| 09/04/2001 | US6284039 Epitaxial silicon wafers substantially free of grown-in defects |
| 09/04/2001 | US6284020 Removing circulated atmosphere-borne chemicals using gaseous impurity-trapping filter in hermetically sealed box; storage and transfer use in semiconductor wafers processing, devices in a clean room |
| 09/04/2001 | US6284013 Semiconductor thin film applications; ozone-containing gas conversion into ruthenium tetraoxide, blowing chlorine gas into sodium hydroxide solution; absorbing in acid, evaporating, salting out and sintering in hydrogen atmosphere |
| 09/04/2001 | US6284006 Incorporates transport mechanism allowing range of motion inside open or sealed chamber; integrated circuits, flat panel displays, thin film heads, transistors, diodes, semiconductors; avoids damaging, and/or contaminating |
| 09/04/2001 | US6283840 Cleaning and slurry distribution system assembly for use in chemical mechanical polishing apparatus |
| 09/04/2001 | US6283835 Method and apparatus for manufacturing a semiconductor integrated circuit |
| 09/04/2001 | US6283828 Wafer polishing apparatus |
| 09/04/2001 | US6283827 Non-contacting support for a wafer |
| 09/04/2001 | US6283822 Polishing apparatus |
| 09/04/2001 | US6283746 Method for purging furnace to decrease particle pollution in baking process |
| 09/04/2001 | US6283703 Automatic conveying apparatus for JEDEC carrier members |
| 09/04/2001 | US6283701 Pneumatically actuated flexure gripper for wafer handling robots |
| 09/04/2001 | US6283695 Tray conveying apparatus and method |
| 09/04/2001 | US6283693 Method and apparatus for semiconductor chip handling |
| 09/04/2001 | US6283692 Apparatus for storing and moving a cassette |
| 09/04/2001 | US6283359 Method for enhancing fatigue life of ball grid arrays |
| 09/04/2001 | US6283357 Fabrication of clad hollow cathode magnetron sputter targets |
| 09/04/2001 | US6283355 End effector for substrate handling |
| 09/04/2001 | US6283273 Substrate processing apparatus |
| 09/04/2001 | US6283175 Enveloping device and vertical heat-treating apparatus for semiconductor process system |
| 09/04/2001 | US6283155 System of modular substrates for enabling the distribution of process fluids through removable components |
| 09/04/2001 | US6283143 System and method for providing an integrated gas stick |
| 09/04/2001 | US6283134 Apparatus for removing photo-resist |
| 09/04/2001 | US6283131 In-situ strip process for polysilicon etching in deep sub-micron technology |
| 09/04/2001 | US6283130 Plasma cleaning method and placement area protector used in the method |
| 09/04/2001 | US6283113 Strip separation tool |
| 09/04/2001 | US6283111 Wire saw cutting method and apparatus therefor |
| 09/04/2001 | US6283066 Continuous gas saturation system and method |
| 09/04/2001 | US6283060 Plasma CVD apparatus |
| 09/04/2001 | US6283041 Table support apparatus and exposure apparatus |
| 09/04/2001 | US6282781 Resin package fabrication process |
| 09/04/2001 | US6282780 Bump forming method and its forming apparatus. |
| 09/04/2001 | CA2237018C Method for making a circuit structure having a flip-mounted matrix of devices |
| 09/03/2001 | CA2299991A1 A memory cell for embedded memories |
| 08/30/2001 | WO2001063991A1 Multilayer printed wiring board and method for producing multilayer printed wiring board |
| 08/30/2001 | WO2001063983A2 Thermal management system |
| 08/30/2001 | WO2001063981A1 High frequency plasma source |
| 08/30/2001 | WO2001063972A1 Ceramic substrate and its production method |
| 08/30/2001 | WO2001063971A1 Ceramic substrate |
| 08/30/2001 | WO2001063905A2 Frame shutter pixel with an isolated storage node |
| 08/30/2001 | WO2001063864A2 Chromeless alternating phase-shift reticle for producing semiconductor device features |
| 08/30/2001 | WO2001063669A1 Microwave electric elements using porous silicon dioxide layer and forming method of same |
| 08/30/2001 | WO2001063668A2 Method of forming lead-free solder alloys by electrochemical deposition process |
| 08/30/2001 | WO2001063663A1 Enhanced planarity isolation structure and method |
| 08/30/2001 | WO2001063661A1 Method of manufacturing semiconductor integrated circuit having multilayer wiring structure |
| 08/30/2001 | WO2001063659A1 Method for fabrication and structure for high aspect ratio vias |
| 08/30/2001 | WO2001063658A1 Method for producing a ferroelectric layer |
| 08/30/2001 | WO2001063657A1 Two etchant etch method |
| 08/30/2001 | WO2001063656A1 Method for wafer processing |
| 08/30/2001 | WO2001063655A1 Chemical-mechanical polishing device, damascene wiring forming device, and damascene wiring forming method |
| 08/30/2001 | WO2001063654A2 Methods of forming a plurality of semiconductor layers using trench arrays |
| 08/30/2001 | WO2001063652A1 Semiconductor component and method for the production thereof |
| 08/30/2001 | WO2001063651A2 Wafer processing system |
| 08/30/2001 | WO2001063650A1 Method for crystalline growth in epitaxial heterostructures based on gallium nitride |
| 08/30/2001 | WO2001063649A1 Apparatus and method for processing electronic components |
| 08/30/2001 | WO2001063644A2 Method for producing bipolar transistors in a bicmos process |
| 08/30/2001 | WO2001063642A1 Multi-zone rf electrode for capacitive plasma sources |
| 08/30/2001 | WO2001063365A1 Method of reducing defects |
| 08/30/2001 | WO2001063363A2 Photoacid generators and photoresists comprising same |