Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2001
12/13/2001WO2001094640A2 Bio-mediated assembly of micrometer-scale and nanometer-scale structures
12/13/2001WO2001094273A1 Method for manufacturing aluminum nitride sintered body in which via hole is made
12/13/2001WO2001094245A1 Material transport system
12/13/2001WO2001094076A1 Chemical-hydrodynamic etch planarization
12/13/2001WO2001094075A1 Orbital polishing apparatus
12/13/2001WO2001094074A1 Polishing pad window for a chemical-mechanical polishing tool
12/13/2001WO2001094038A1 Surface tension effect dryer with porous vessel walls
12/13/2001WO2001094037A1 Edge bead removal for spin-on materials using carbon-dioxide cleaning
12/13/2001WO2001077243B1 Die-attaching paste and semiconductor device
12/13/2001WO2001063233A3 Device for detecting wave fronts
12/13/2001WO2001051243A3 Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulsewidths
12/13/2001WO2001043184A3 Electrostatic chucks with flat film electrode
12/13/2001WO2001043169A3 Methods for separating microcircuit dies from wafers
12/13/2001WO2001041212A3 Integrated circuit package
12/13/2001WO2001039257A3 Silicon layer highly sensitive to oxygen and method for obtaining same
12/13/2001WO2001039250A3 Conductive interconnection
12/13/2001WO2001035051A3 X-ray tomography bga (ball grid array) inspections
12/13/2001WO2001033621A3 Methods for forming openings in a substrate and methods for creating assemblies
12/13/2001WO2000019524A9 Ic interconnect structures and methods for making same
12/13/2001WO2000014797A3 Isolation region forming methods
12/13/2001WO2000004587A9 Nitride based transistors on semi-insulating silicon carbide substrates
12/13/2001WO2000000560A3 Chemical mechanical polishing slurry and method for using same
12/13/2001WO1999062671A9 Apparatus for polishing silicon wafers
12/13/2001US20010052116 Method for the analysis of a test software tool
12/13/2001US20010052096 Low power scan flipflop
12/13/2001US20010051839 Differential process control method
12/13/2001US20010051837 Substrate processing system and substrate processing method
12/13/2001US20010051836 Fab yield enhancement system
12/13/2001US20010051742 Norbornene ester such as 1-ethylcyclopentyl 3-acetoxy-3-(5-norbornen-2-yl)propionate for use as monomer in photoresist resin having good reactivity and radiation transparency using excimer laser as light source
12/13/2001US20010051741 Novel ester compounds having alicyclic structure and method for preparing same
12/13/2001US20010051597 Aqueous solution of citric acid and chelate compound
12/13/2001US20010051500 Polishing apparatus
12/13/2001US20010051499 Substrate rotating apparatus
12/13/2001US20010051496 Methods and apparatuses for planarizing microelectronic substrate assemblies
12/13/2001US20010051494 Method of cleaning glass
12/13/2001US20010051447 Semiconductor device, semiconductor wafer, and methods of producing the same device and wafer
12/13/2001US20010051446 Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film
12/13/2001US20010051445 Semiconductor device and method of manufacturing the same
12/13/2001US20010051444 Method for manufacturing aluminum oxide film for use in semiconductor device
12/13/2001US20010051443 Defect analysis method in image sensor device
12/13/2001US20010051442 Method for producing high surface area foil electrodes
12/13/2001US20010051440 Acid blend for removing etch residue
12/13/2001US20010051439 Self cleaning method of forming deep trenches in silicon substrates
12/13/2001US20010051438 Process and apparatus for dry-etching a semiconductor layer
12/13/2001US20010051437 Process Monitoring Apparatus and Method
12/13/2001US20010051436 Fabrication method and structure for ferroelectric nonvolatile memory field effect transistor
12/13/2001US20010051435 Chemical-organic planarization process for atomically smooth interfaces
12/13/2001US20010051434 Methods Incorporating Detectable Atoms Into Etching Processes
12/13/2001US20010051433 Chemical mechanical polishing using cesium hydroxide
12/13/2001US20010051432 Manufacturing method of semiconductor device
12/13/2001US20010051431 Fabrication process for dishing-free cu damascene structures
12/13/2001US20010051430 Planarization process for semiconductor substrates
12/13/2001US20010051429 High vacuum apparatus for fabricating semiconductor device and method for forming epitaxial layer using the same
12/13/2001US20010051428 Low-resistive tungsten silicide layer strongly adhered to lower layer and semiconductor device using the same
12/13/2001US20010051427 Methods of forming refractory metal silicide components and methods of restricting silicon surface migration of a silicon structure
12/13/2001US20010051426 Method for forming a semiconductor device having a mechanically robust pad interface.
12/13/2001US20010051425 Method of forming a contact hole in a seminconductor device
12/13/2001US20010051424 Method of forming an opening in a dielectric layer in integrated circuit
12/13/2001US20010051423 Multilayer passivation process for forming air gaps within a dielectric between interconnections
12/13/2001US20010051422 Semiconductor devices and methods for manufacturing the same
12/13/2001US20010051421 Method of manufacturing a semiconductor device
12/13/2001US20010051420 Dielectric formation to seal porosity of low dielectic constant (low k) materials after etch
12/13/2001US20010051419 Method for fabricating a mosfet having polycide gate electrode
12/13/2001US20010051418 Method of manufacturing semiconductor device having memory cell transistors
12/13/2001US20010051417 Spot-implant method for MOS transistor applications
12/13/2001US20010051415 Thin microelectronic substrates and methods of manufacture
12/13/2001US20010051414 Semiconductor integrated circuit and method for manufacturing the same
12/13/2001US20010051413 Process for fabricating a self-aligned double-polysilicon bipolar transistor
12/13/2001US20010051412 Method of fabricating semiconductor device
12/13/2001US20010051411 Manufacturing method of semiconductor device
12/13/2001US20010051410 Semiconductor device having reduced field oxide recess and method of fabrication
12/13/2001US20010051409 Processing methods of forming integrated circuitry memory devices, methods of forming DRAM arrays, and related semiconductor masks
12/13/2001US20010051408 Method for providing improved step coverage of deep trenches and use thereof
12/13/2001US20010051407 Semiconductor processing methods of forming integrated circuitry
12/13/2001US20010051406 Fabrication of dram and other semiconductor devices with an insulating film using a wet rapid thermal oxidation process
12/13/2001US20010051405 Microlens, solid state imaging device, and production process thereof
12/13/2001US20010051404 Semiconductor device with test circuit
12/13/2001US20010051403 Method and apparatus for deposition of porous silica dielectrics
12/13/2001US20010051401 Production of a semiconductor device
12/13/2001US20010051400 Method of manufacturing a laterally diffused metal oxide semiconductor device
12/13/2001US20010051399 Control system for use when growing thin-films on semiconductor-based materials
12/13/2001US20010051398 Electro-optical device
12/13/2001US20010051397 Plastic lead frames for semiconductor devices, packages including same, and methods of fabrication
12/13/2001US20010051396 Method for fabricating electronic circuit device, semiconductor device and electronic circuit device
12/13/2001US20010051394 Die bonding equipment
12/13/2001US20010051392 Semiconductor devices having protective layers thereon through which contact pads are exposed and stereolithographic methods of fabricating such semiconductor devices
12/13/2001US20010051391 Stereolithographically fabricated conductive elements, semiconductor device components and assemblies including such conductive elements, and methods
12/13/2001US20010051389 Method for manufacturing high efficiency photovoltaic devices at enhanced depositions rates
12/13/2001US20010051388 Microcrystalline series photovoltaic element, process for the production of said photovoltaic element, building material in which said photovoltaic element is used, and power generation apparatus in which said photovoltaic element is used
12/13/2001US20010051387 Method of growing silicon crystal in liquid phase and method of producing solar cell
12/13/2001US20010051386 Method of manufacturing a semiconductor device
12/13/2001US20010051382 Method for fabricating epitaxial substrate
12/13/2001US20010051381 Method for manufacturing a ferroelectric memory
12/13/2001US20010051317 Slit in tube; dividing eddy current zone
12/13/2001US20010051313 Positive resist composition
12/13/2001US20010051302 Preferential etching
12/13/2001US20010051289 Anti-corrosion ceramic member
12/13/2001US20010051232 Plasma processing method
12/13/2001US20010051228 Method of forming interlayer insulating film
12/13/2001US20010051215 Silicon titanium nitrides formed by reacting titanium halide such as titanium tetraiodide, a vapor phase silicon compound and a reactive nitrogen gas such as ammonia in presence of the substrate at given temperature range until nitride forms