Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2001
12/27/2001US20010055905 TAB, probe card, TAB handler and method for measuring IC chip
12/27/2001US20010055900 Contact pin
12/27/2001US20010055894 Wafer having smooth surface
12/27/2001US20010055893 Transistor device and fabrication method thereof
12/27/2001US20010055892 Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film
12/27/2001US20010055891 High density semiconductors
12/27/2001US20010055890 Method of fabricating a patterned metal-oxide-containing layer
12/27/2001US20010055889 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers
12/27/2001US20010055887 Method of fabricating compound semiconductor device and apparatus for fabricating compound semiconductor device
12/27/2001US20010055886 Dry etching method
12/27/2001US20010055885 Plasma processing method for working the surface of semiconductor devices
12/27/2001US20010055884 Method for fabricating semiconductor device
12/27/2001US20010055883 Method of producing a semiconductor device having tapered through holes
12/27/2001US20010055881 Method for manufacturing breakaway layers for detaching deposited laye
12/27/2001US20010055880 Barrier layer buffing after cu cmp
12/27/2001US20010055879 Method of forming patterned thin film and method of manufacturing thin-film magnetic head
12/27/2001US20010055878 Non-conductive barrier formations for copper damascene type interconnects
12/27/2001US20010055877 Methods, complexes, and systems for forming metal-containing films on semiconductor structures
12/27/2001US20010055876 Semiconductor sensor device and method of manufacturing the same
12/27/2001US20010055875 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
12/27/2001US20010055873 Semiconductor device and fabrication method thereof
12/27/2001US20010055872 Semiconductor device having multilayer wiring structure and method for manufacturing the same
12/27/2001US20010055871 Method of producing p-type nitride based III-V compound semiconductor and method of fabricating semiconductor device using the same
12/27/2001US20010055870 Method of forming trench isolation
12/27/2001US20010055869 Oxidation using organometallic compound as catalyst
12/27/2001US20010055868 Apparatus and method for metal layer streched conducting plugs
12/27/2001US20010055867 Method of forming self-aligned contacts in a semiconductor device
12/27/2001US20010055866 Lead structure and method of manufacture
12/27/2001US20010055865 Method and apparatus for diffusion of an impurity into a semiconductor wafer with high in-plane diffusion uniformity
12/27/2001US20010055863 Methods for manufacturing soi wafer and soi wafer
12/27/2001US20010055862 Process for device fabrication
12/27/2001US20010055861 Process for manufacturing deep well junction structures
12/27/2001US20010055860 Semiconductor processing methods of forming contact openings, methods of forming memory circuitry, methods of forming electrical connections, and methods of forming dynamic random access memory (DRAM) circuitry
12/27/2001US20010055859 Semiconductor device and method of fabricating the same
12/27/2001US20010055858 Method for making electrical contact with a rear side of a semiconductor substrate during its processing
12/27/2001US20010055857 Semiconductor processing method for processing discrete pieces of substrate to form electronic devices
12/27/2001US20010055856 Method of dicing a wafer from the back side surface thereof
12/27/2001US20010055855 Method for sectioning a substrate wafer into a plurality of substrate chips
12/27/2001US20010055854 Process for producing semiconductor member, and process for producing solar cell
12/27/2001US20010055853 Forming etching barrier overcoating semiconductor substrate; patterning
12/27/2001US20010055852 Dielectric etching using halogen
12/27/2001US20010055851 Method for forming capacitor of semiconductor memory device using electrolplating method
12/27/2001US20010055850 Method of forming a capacitor and an electrical connection thereto, and method of forming DRAM circuitry
12/27/2001US20010055849 Method of manufacturing photodiode CMOS image sensor
12/27/2001US20010055848 Fuse area structure having guard ring surrounding fuse opening in semiconductor device and method of forming the same
12/27/2001US20010055847 Nonvolatile semiconductor storage apparatus and production method of the same
12/27/2001US20010055846 Method for manufacturing a trench capacitor
12/27/2001US20010055845 Method of production of semiconductor device
12/27/2001US20010055844 Method of producing an electroluminescence display device
12/27/2001US20010055843 Method for fabricating semiconductor device
12/27/2001US20010055842 Methods of forming self-aligned contact pads using a damascene gate process
12/27/2001US20010055841 Light emitting device and manufacturing method thereof
12/27/2001US20010055840 Method for fabricating narrow metal interconnects in an integrated circuit using heat and pressure to extrude a metal layer into a lead trench and via/contact
12/27/2001US20010055838 Nonvolatile memory on SOI and compound semiconductor substrates and method of fabrication
12/27/2001US20010055837 Method of attaching a leadframe to singulated semiconductor dice
12/27/2001US20010055835 Flip chip interconnection structure
12/27/2001US20010055834 Method of making semiconductor packages at wafer level
12/27/2001US20010055830 Semiconductor device and method of manufacturing the same
12/27/2001US20010055826 Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device
12/27/2001US20010055825 Laser marking techniques
12/27/2001US20010055824 Oxidation rate of the thermal oxidation is reduced and the growth of the oxide layer on the silicon surface is inhibited. The thickness of the oxide layer is thus used as a measure for the nitrogen content.
12/27/2001US20010055823 Wafer processing apparatus and method
12/27/2001US20010055822 Semiconductor memory and method for driving the same
12/27/2001US20010055821 Vapor deposition
12/27/2001US20010055820 Multilayer; silicon substrate, titanium nitride layer, ferroelectric alloy
12/27/2001US20010055819 Method of manufacturing a semiconductor device comprising a semiconductor body having a surface provided with a coil having magnetic core
12/27/2001US20010055733 Slits for light; synchronous conveying to transfer images of pattern; filter
12/27/2001US20010055731 Pattern forming method and apparatus for fabricating semiconductor device
12/27/2001US20010055730 Using polymers; uniform embedding
12/27/2001US20010055727 Resist material and method for pattern formation
12/27/2001US20010055726 Positive radiation-sensitive composition
12/27/2001US20010055725 Forming intergrated circuits; electroconductive layer on substrate
12/27/2001US20010055696 Method for forming composite vapor-deposited film having varied film composition at initial and final stages of vapor deposition, composite vapor-deposition material for producing the same, and method for producing the composite vapor-deposition material
12/27/2001US20010055689 Extruded thermoplastic barrier coating carpet backing materials used to provide a durable, highly flexible carpet backing capable of being thermoformed
12/27/2001US20010055686 Wafer planarization using a uniform layer of material and method and apparatus for forming uniform layer of material used in semiconductor processing
12/27/2001US20010055678 Heat-peelable pressure-sensitive adhesive sheet
12/27/2001US20010055672 Low dielectric constant materials and processes
12/27/2001US20010055668 Surface acoustic wave device and method for making the same
12/27/2001US20010055664 Electronic component and method for etching an insulating layer of a component
12/27/2001US20010055660 Bulk single crystal gallium nitride and method of making same
12/27/2001US20010055649 Coating, modification and etching of substrate surface with particle beam irradiation of the same
12/27/2001US20010055647 Method and apparatus for forming deposition film, and method for treating substrate
12/27/2001US20010055552 Plasma generator, impedance matching unit, radio frequency generator; for gases used in semiconductor manufacturing process
12/27/2001US20010055522 Substrate processing apparatus
12/27/2001US20010055416 Defect inspection method and defect inspection apparatus
12/27/2001US20010055415 Pattern inspection method and pattern inspection device
12/27/2001US20010055364 High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other uses
12/27/2001US20010055357 Clock signal selection system, method of generating a clock signal and programmable clock manager including same
12/27/2001US20010055326 Exposure apparatus and device manufacturing method
12/27/2001US20010055230 Semiconductor memory and memory board therewith
12/27/2001US20010055223 Nonvolatile semiconductor memory
12/27/2001US20010055221 Method for forming gate segments for an integrated circuit
12/27/2001US20010055218 256 meg dynamic random access memory
12/27/2001US20010055201 Circuit configuration having at least one nanoelectronic component and method for fabricating the component
12/27/2001US20010055190 Electrostatic chuck
12/27/2001US20010055189 Electrostatic chucking system, and apparatus and method of manufacturing a semiconductor device using the electrostatic chucking system
12/27/2001US20010055146 Method of manufacturing spatial light modulator and electronic device employing it
12/27/2001US20010055117 Alignment method, exposure method, exposure apparatus and device manufacturing method
12/27/2001US20010055107 Illumination optical system in exposure apparatus
12/27/2001US20010055104 Exposure method and apparatus
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