Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2001
12/27/2001US20010055102 Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method
12/27/2001US20010055101 Exposure apparatus, exposure method, and device manufacturing method
12/27/2001US20010055100 Exposure apparatus
12/27/2001US20010054991 Display apparatus
12/27/2001US20010054975 Current source cell arrangement, method of selecting current source cell and current addition type digital-to-analog converter
12/27/2001US20010054921 Semiconductor integrated circuit and method for initializing the same
12/27/2001US20010054920 Semiconductor device capable of internally adjusting delayed amount of a clock signal
12/27/2001US20010054906 Probe card and a method of manufacturing the same
12/27/2001US20010054905 Probe card assembly and kit
12/27/2001US20010054904 Monitoring resistor element and measuring method of relative preciseness of resistor elements
12/27/2001US20010054892 Inspection stage
12/27/2001US20010054771 Method for making projected contact structures for engaging bumped semiconductor devices
12/27/2001US20010054769 Protective layers prior to alternating layer deposition
12/27/2001US20010054768 Bonding pad structure of a semiconductor device and method of fabricating the same
12/27/2001US20010054767 Low resistivity titanium silicide structures
12/27/2001US20010054765 Semiconductor device and method and apparatus for manufacturing the same
12/27/2001US20010054764 Semiconductor device having a wiring layer of damascene structure and method for manufacturing the same
12/27/2001US20010054763 Contact electrode for n-type gallium nitride-based compound semiconductor and method for forming the same
12/27/2001US20010054762 Semiconductor device and method of fabricating the same
12/27/2001US20010054760 Semiconductor integrated circuit
12/27/2001US20010054759 Semiconductor device
12/27/2001US20010054751 Semiconductor device and liquid crystal module
12/27/2001US20010054749 Method for filling depressions in a surface of a semiconductor structure, and a semiconductor structure filled in this way
12/27/2001US20010054747 Semiconductor switch devices having a region with three distinct zones and their manufacture
12/27/2001US20010054746 Lateral bipolar transistor formed on an insulating layer
12/27/2001US20010054741 Semiconductor device and method of manufacturing the same
12/27/2001US20010054739 Vertical component peripheral structure
12/27/2001US20010054736 Semiconductor memorty device and method of fabricating the same
12/27/2001US20010054735 Non-volatile semiconductor storage apparatus and manufacturing method thereof
12/27/2001US20010054734 Methods of forming integrated circuits using masks to provide ion implantation shielding to portions of a substrate adjacent to an isolation region therein and integrated circuits formed using same
12/27/2001US20010054733 Capacitors having a capacitor dielectric layer comprising a metal oxide having multiple different metals bonded with oxygen
12/27/2001US20010054732 Semiconductor memory and method for driving the same
12/27/2001US20010054731 Semiconductor device having a lower electrode aperture that is larger than the photolithography resolution of the capacitor pattern
12/27/2001US20010054730 Metal-insulator-metal capacitor and manufacturing method thereof
12/27/2001US20010054729 Gate prespacers for high density, high performance drams
12/27/2001US20010054728 Metal oxide integrated circuit on silicon germanium substrate
12/27/2001US20010054727 Integrated circuit configuration and method for manufacturing it
12/27/2001US20010054725 Semiconductor integrated circuit device and the process of manufacturing the same
12/27/2001US20010054724 Solid picture element manufacturing method
12/27/2001US20010054721 Semiconductor integrated circuit and semiconductor integrated circuit wiring layout method
12/27/2001US20010054720 Power/ground metallization routing in a semiconductor device
12/27/2001US20010054719 Semiconductor memory device having self-aligned contacts and method of fabricating the same
12/27/2001US20010054718 Heterojunction bipolar transistor and method of manufacturing the same
12/27/2001US20010054716 Opto-electronic device with self-aligned ohmic contact layer
12/27/2001US20010054715 Schottky diode on a silicon carbide substrate
12/27/2001US20010054714 Gate insulated field effect transistor and method of manufacturing the same
12/27/2001US20010054709 Chemically synthesized and assembled electronic devices
12/27/2001US20010054706 Compositions and processes for spin etch planarization
12/27/2001US20010054700 Laser imaging apparatus
12/27/2001US20010054697 Test method of mask for electron-beam exposure and method of electron-beam exposure
12/27/2001US20010054690 Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method
12/27/2001US20010054677 Solid-state imaging device and method for producing the same
12/27/2001US20010054640 Wire bonding apparatus for connecting semiconductor devices
12/27/2001US20010054606 Laser scribing of wafers
12/27/2001US20010054601 Etchant and polymer precursor species contain fluorine (especially CHF3 AND CH2F2), and the chamber ceiling semiconductor material includes a fluorine scavenger precursor material
12/27/2001US20010054599 Etching method
12/27/2001US20010054558 Formation of voids in the via plug is suppressed; particularly high reliability.
12/27/2001US20010054551 Increasing electroosmotic flow; reducing electrophoretic mobility; effective concentration of 3-(n-ethyl-n,n-dimethyl-ammonium)propanesulfonate; microfluidics
12/27/2001US20010054510 Integrated microcontact pin and method for manufacturing the same
12/27/2001US20010054484 Plasma processor, cluster tool, and method of controlling plasma
12/27/2001US20010054483 Thermal control apparatus for inductively coupled rf plasma reactor having an overhead solenoidal antenna
12/27/2001US20010054481 Method for making multilayer board having a cavity
12/27/2001US20010054480 Method for producing a stable bond between two wafers
12/27/2001US20010054431 Use of an acid liquid agent in a cleaning cup; remaining acid washed out by use of pure water; alkaline liquid agent emitted to substrate surface to neutralize the acid left on surface
12/27/2001US20010054391 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
12/27/2001US20010054390 Wafer support system
12/27/2001US20010054389 Electro-static chucking mechanism and surface processing apparatus
12/27/2001US20010054388 Single-substrate-film-forming method and single-substrate-heat-processing apparatus
12/27/2001US20010054386 Oxidation processing unit
12/27/2001US20010054385 Single-substrate-processing apparatus for semiconductor process
12/27/2001US20010054384 Vaporiser for generating feed gas for an arc chamber
12/27/2001US20010054383 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
12/27/2001US20010054382 Chemical vapor deposition system
12/27/2001US20010054377 Method of growing a thin film onto a substrate
12/27/2001US20010054375 Method of suppressing convection in a fluid in a cylindrical vessel
12/27/2001US20010054229 Apparatus for mounting a flipchip on a work piece
12/27/2001CA2416625A1 Graphite-based heat sink
12/27/2001CA2409411A1 Diagnosting reliability of vias by e-beam probing
12/27/2001CA2391331A1 Reference cell for high speed sensing in non-volatile memories
12/26/2001CN2467251Y Improvement of welding machine transducer
12/26/2001CN1328700A Memory cell arrangement
12/26/2001CN1328699A Methods and compositions for improving interconnect metallization performance in integrated circuits
12/26/2001CN1328698A Composition for removing sidewall and method of removing sidewall
12/26/2001CN1328697A Etching solution, etched article and method for etched article
12/26/2001CN1328696A Etching solution, etched article and mehtod for etched article
12/26/2001CN1328695A Workpiece vibration damper
12/26/2001CN1328646A Laser scanning system mirror
12/26/2001CN1328644A Probe card for probing wafers with raised contact elements
12/26/2001CN1328589A Composition containing cross-linkable matrix precursor and poragen, and porous matrix prepared therefrom
12/26/2001CN1328588A Impact-resistant epoxide resin compositions
12/26/2001CN1328521A Wafer carrier having low tolerance build-up
12/26/2001CN1328344A Substrate of silicon structure on insulating layer using alumina as buried layer and its preparing process
12/26/2001CN1328343A Process for preparing flash memory with laminated grid
12/26/2001CN1328342A Process for preparing diode with ceramic substrate and crystal grain structure
12/26/2001CN1328341A Method for making semiconductor chip suitable to be made of electrically conductive liquid material
12/26/2001CN1328340A Semiconductor circuit and its manufacturing method
12/26/2001CN1327888A Treater for substrate surface
12/26/2001CN1076946C Cooling apparatus and assembling method thereof
12/26/2001CN1076877C Process of fabricating semiconductor device having non-single crystal thin film transistor free from residual hydrogen left therein
12/26/2001CN1076875C Semiconductor device and making of same