Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2002
01/03/2002US20020001942 Expanded implantation of contact holes
01/03/2002US20020001941 Semiconductor device manufacturing method
01/03/2002US20020001940 Method for forming contact holes for metal inteconnection in semiconductor devices
01/03/2002US20020001939 Method of manufacturing semiconductor devices
01/03/2002US20020001938 Process for fabricating semiconductor integrated circuit device having polycide line and impurity region respectively exposed to contact holes different in depth
01/03/2002US20020001937 Semiconductor package board using a metal base
01/03/2002US20020001936 Semiconductor device and production method for the same
01/03/2002US20020001935 Method of forming gate electrode in semiconductor device
01/03/2002US20020001934 Method for manufacturing gate in semiconductor device
01/03/2002US20020001933 MOSFET and fabrication method thereof
01/03/2002US20020001932 Method for forming a gate for semiconductor devices
01/03/2002US20020001931 Forming a conductive pattern on the substrate including a plurality of conductive lines, forming shielding dielectric layer convering sides and top of the pattern, forming dummy dielectric layer, patterning; shielding, etching
01/03/2002US20020001930 Method for fabricating a semiconductor device using a damascene process
01/03/2002US20020001929 Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
01/03/2002US20020001928 Method for performing metallo-organic chemical vapor deposition of titanium nitride at reduced temperature
01/03/2002US20020001927 Semiconductor device manufacturing method
01/03/2002US20020001926 Semiconductor device and method for fabricating the same
01/03/2002US20020001925 Method for manufacturing semiconductor device
01/03/2002US20020001924 Production process of semiconductor layer, fabrication process of photovoltaic cell and production apparatus of semiconductor layer
01/03/2002US20020001923 Method of fabricating electronic devices integrated in semiconductor substrates provided with gettering sites, and a device fabricated by the method
01/03/2002US20020001922 Wafer level fabrication and assembly of chip scale packages
01/03/2002US20020001921 Process for production of SOI substrate and process for production of semiconductor device
01/03/2002US20020001920 Wafer bonding method, appartus and vacuum chuck
01/03/2002US20020001919 Method of forming partial reverse active mask
01/03/2002US20020001918 Method for forming a field oxide film on a semiconductor device
01/03/2002US20020001917 Method for forming isolation layer in semiconductor device
01/03/2002US20020001916 Forming a pad insulating a mask layer on a semiconductor substrate,patterning both layers and etching the substrate using both layers as etch mask to form trench, using hydrogen fluoride and oxidizer to round the trench edge
01/03/2002US20020001915 Step & scan projection exposure apparatus, maintenance method therefor, and semiconductor device manufacturing method and semiconductor manufacturing factory using the apparatus
01/03/2002US20020001914 Forming a gate with a uniform elevation irrespective of a wafer region, a chemical-mechanical polishing using a typical slurry for oxide film containing abrasives of silica, cerium oxide, alumina or zirconia, and hydrogen peroxide
01/03/2002US20020001913 Semiconductor memory device having silicon-on-insulator (SOI) structure and method for fabricating thereof
01/03/2002US20020001912 Capacitor for semiconductor device and method for manufacturing the same
01/03/2002US20020001910 Method of forming a mos transistor of a semiconductor
01/03/2002US20020001909 Process for fabricating MOS semiconductor transistor
01/03/2002US20020001908 To reduce the diffusion of fluorine atoms during the anneal, forming a diffusion barrier layer of titanium nitride doped with boron
01/03/2002US20020001907 Method of forming an EPI - channel in a semiconductor device
01/03/2002US20020001906 Forming a gate insulating film on a semiconductor substrate, covering the insulating film with titanium alumium nitride film, forming a metal layer, patterning the insulating layer to expose a part of metal layer, etching exposed metal layer
01/03/2002US20020001905 Vertical nano-size transistor using carbon nanotubes and manufacturing method thereof
01/03/2002US20020001903 Electrically programmable memory cell
01/03/2002US20020001902 Simple stack cell capacitor formation
01/03/2002US20020001901 Random access memory
01/03/2002US20020001900 Memory cell for dynamic random access memory (dram)
01/03/2002US20020001899 Semiconductor integrated circuit device and a method of manufacturing the same
01/03/2002US20020001898 Method of manufacturing a flash memory cell
01/03/2002US20020001897 Methods of forming gated semiconductor assemblies
01/03/2002US20020001893 Method of manufacturing a capacitor in a semiconductor device
01/03/2002US20020001892 Method for fabricating semiconductor device
01/03/2002US20020001891 Method for fabricating MOSFET device
01/03/2002US20020001890 Method for forming semiconductor device having epitaxial channel layer using laser treatment
01/03/2002US20020001889 A wet or dry etching, in which high etching selectivity between dummy dielectric pattern and interdielectric layer pattern is used
01/03/2002US20020001888 Method of manufacturing a semiconductor device
01/03/2002US20020001887 Thin film transistor and manufacturing method therefor
01/03/2002US20020001886 Method of manufacturing thin film transistor
01/03/2002US20020001885 Semiconductor processing methods of forming integrated circuitry, forming conductive lines, forming a conductive grid, forming a conductive network, forming an electrical interconnection to a node location, Forming an electrical interconnection with a transistor source/drain region, and integrated circuitry
01/03/2002US20020001884 Methods of forming thin film transistors
01/03/2002US20020001883 Method and apparatus for reduced flash encapsulation of microelectronic devices
01/03/2002US20020001882 Method for adhering and sealing a silicon chip in an integrated circuit package
01/03/2002US20020001880 High-frequency module, method of manufacturing thereof and method of molding resin
01/03/2002US20020001879 Gravitationally-assisted control of spread of viscous material applied to semiconductor assembly components
01/03/2002US20020001878 A method for encapsulating with a fixing member to secure an electronic device
01/03/2002US20020001877 Interconnect formation in a semiconductor device
01/03/2002US20020001876 Forming a conductive layer, having conductive lines with gaps, over a semiconductor substrate, depositing afluorosilcated glass layer, by high density plasma chemical vapor depositon over patterned conductive layer, filling gap
01/03/2002US20020001875 Low resistance semiconductor process and structures
01/03/2002US20020001873 Chip scale surface-mountable packaging method for electronic and MEMS devices
01/03/2002US20020001872 Semiconductor package having semiconductor element mounting structure of semiconductor package mounted on circuit board and method of assembling semiconductor package
01/03/2002US20020001871 Triple layer isolation for silicon microstructure and structures formed using the same
01/03/2002US20020001869 Semiconductor package having light sensitive chips
01/03/2002US20020001866 Processing method of a plurality of films
01/03/2002US20020001864 Heating group III element nitride layers on a recessed surface in a hydrogen atmosphere and using an aluminum layer as an etching stopper; controlled in current confinement and transverse move
01/03/2002US20020001862 Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same
01/03/2002US20020001861 Electrostatic protection circuit
01/03/2002US20020001860 Seed layer removal not required
01/03/2002US20020001859 Method for forming a ferroelectric memory device
01/03/2002US20020001858 Method of manufacturing a capacitor in a semiconductor device
01/03/2002US20020001850 Method for automatically adjusting concentration of solution used in semiconductor manufacturing process
01/03/2002US20020001788 Method of determining set temperature trajectory for heat treatment system
01/03/2002US20020001781 Method for cleaning the surface of substrate to which residues of resist stick
01/03/2002US20020001780 Method of reducing defects
01/03/2002US20020001778 Photolithography scheme using a silicon containing resist
01/03/2002US20020001777 Multilaye rlaminate; dielectric substrate, patterned photoresist mask
01/03/2002US20020001769 Positive photoresist composition
01/03/2002US20020001768 Exposure of photoresist to radiation to generate an acid
01/03/2002US20020001760 Preferential positioning of coating on reticle; adjusting emission; heat exchanging
01/03/2002US20020001758 Optical proximity correction
01/03/2002US20020001747 Solid state electronics
01/03/2002US20020001746 Low-temperature fabrication of thin-film energy-storage devices
01/03/2002US20020001720 Adhesives; coatings; encapsulation
01/03/2002US20020001688 Sheet resin composition and process for manufacturing semiconductor device therewith
01/03/2002US20020001679 Heat treatment
01/03/2002US20020001670 Low cost electroless plating process for single chips and wafer parts and products obtained thereof
01/03/2002US20020001460 Heater sealed with carbon wire heating element
01/03/2002US20020001404 Investigation device and investigation method
01/03/2002US20020001403 Focusing control mechanism, and inspection apparatus using same
01/03/2002US20020001361 Semiconductor integrated circuit and optical transfer unit
01/03/2002US20020001327 Nitride based semiconductor laser device and method of fabricating the same
01/03/2002US20020001251 Low-power consumption semiconductor memory device
01/03/2002US20020001243 Mram configuration
01/03/2002US20020001239 Semiconductor integrated circuit and method for controlling activation thereof
01/03/2002US20020001230 Non-volatile semiconductor memory including memory cells having different charge exhange capability
01/03/2002US20020001225 Method for preventing electromigration in an MRAM
01/03/2002US20020001224 Integrated memory having memory cells with a magnetoresistive storage property and method of operating such a memory