| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/26/2002 | US6350113 Resin molding machine |
| 02/26/2002 | US6350097 Method and apparatus for processing wafers |
| 02/26/2002 | US6349887 Liquid delivery system |
| 02/26/2002 | US6349872 Packaging method |
| 02/26/2002 | US6349870 Method of manufacturing electronic component |
| 02/26/2002 | US6349832 Stud and ride for use on matrix trays |
| 02/26/2002 | US6349669 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction |
| 02/26/2002 | US6349594 Method of measuring film thickness distribution |
| 02/26/2002 | US6349456 Method of manufacturing photodefined integral capacitor with self-aligned dielectric and electrodes |
| 02/26/2002 | CA2239277C Passive element circuit |
| 02/26/2002 | CA2211562C De-warping apparatus for straightening a plate |
| 02/21/2002 | WO2002015659A1 Method and device for the fixing of electronic circuits |
| 02/21/2002 | WO2002015654A1 Mounting method and mounting device |
| 02/21/2002 | WO2002015650A2 Externally excited torroidal plasma source |
| 02/21/2002 | WO2002015649A2 Close coupled match structure for rf drive electrode |
| 02/21/2002 | WO2002015293A2 Organic field-effect transistor (ofet), a production method therefor, an integrated circuit constructed from the same and their uses |
| 02/21/2002 | WO2002015285A1 Metal sulfide semiconductor transistor devices |
| 02/21/2002 | WO2002015283A2 Metal sulfide-oxide semiconductor transistor devices |
| 02/21/2002 | WO2002015280A1 Thick oxide layer on bottom of trench structure in silicon |
| 02/21/2002 | WO2002015278A2 Multigate semiconductor device and method of fabrication |
| 02/21/2002 | WO2002015277A2 Dense arrays and charge storage devices, and methods for making same |
| 02/21/2002 | WO2002015276A2 Memory cell, memory cell device and method for the production thereof |
| 02/21/2002 | WO2002015275A1 Method for manufacturing semiconductor device |
| 02/21/2002 | WO2002015274A1 Semiconductor device for communication |
| 02/21/2002 | WO2002015273A2 Methods for producing passive components on a semiconductor substrate |
| 02/21/2002 | WO2002015267A2 Integrated circuit package including opening exposing portion of an ic |
| 02/21/2002 | WO2002015266A2 Direct build-up layer on an encapsulated die package |
| 02/21/2002 | WO2002015263A1 Semiconductor device and method for manufacturing the same |
| 02/21/2002 | WO2002015262A1 Method of isolating semiconductor device |
| 02/21/2002 | WO2002015259A1 High reliability non-conductive adhesives for non-solder flip chip bondings and flip chip bonding method using the same |
| 02/21/2002 | WO2002015258A1 Mounting method |
| 02/21/2002 | WO2002015257A1 Sensor micro-machined with electrolytic welding and method for making same |
| 02/21/2002 | WO2002015256A1 Micromachined sensor with insulating protection of connections |
| 02/21/2002 | WO2002015255A1 System and method for cleaning semiconductor fabrication equipment parts |
| 02/21/2002 | WO2002015254A2 Method of manufacturing a trench-gate semiconductor device and corresponding device |
| 02/21/2002 | WO2002015253A1 Method of producing silicon wafer |
| 02/21/2002 | WO2002015252A2 A method for producing a metal film, a thin film device having such metal film and a liquid crystal display device having such thin film device |
| 02/21/2002 | WO2002015251A1 Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| 02/21/2002 | WO2002015250A1 Structuring of ferroelectric layers |
| 02/21/2002 | WO2002015249A2 Integrated shallow trench isolation process |
| 02/21/2002 | WO2002015248A1 Quartz glass jig for plasma-using process device |
| 02/21/2002 | WO2002015247A2 Method and apparatus for processing a semiconductor wafer using novel final polishing method |
| 02/21/2002 | WO2002015246A1 Method of polishing semiconductor wafer |
| 02/21/2002 | WO2002015245A2 Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence |
| 02/21/2002 | WO2002015244A2 Process for producing semiconductor article using graded expitaxial growth |
| 02/21/2002 | WO2002015243A1 Device and method for processing substrate |
| 02/21/2002 | WO2002015242A1 Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 02/21/2002 | WO2002015241A1 Systems and methods for forming processing streams |
| 02/21/2002 | WO2002015240A1 Directed assembly of nanometer-scale molecular devices |
| 02/21/2002 | WO2002015238A2 Device and method for optical inspection of semiconductor wafer |
| 02/21/2002 | WO2002015237A2 Changing local compressibility of a wafer support member |
| 02/21/2002 | WO2002015236A2 Wafer area pressure control |
| 02/21/2002 | WO2002015235A1 Method for wafer position data retrieval in semiconductor wafer manufacturing |
| 02/21/2002 | WO2002015234A2 Carrier monitoring and fab-wide carrier management systems |
| 02/21/2002 | WO2002015233A2 Integrated transistor devices |
| 02/21/2002 | WO2002015231A2 A method for patterning layers of semiconductor devices |
| 02/21/2002 | WO2002015222A2 Use of pulsed voltage in a plasma reactor |
| 02/21/2002 | WO2002015209A2 Methods and apparatus for making integrated circuit package including opening exposing portion of the ic |
| 02/21/2002 | WO2002015190A2 Non-volatile memory, method of manufacture and programming |
| 02/21/2002 | WO2002015171A1 Circuit selection of magnetic memory cells and related cell structures |
| 02/21/2002 | WO2002014954A2 Antireflective coating compositions |
| 02/21/2002 | WO2002014953A1 Resin composition sensitive to actinic energy ray and method of forming polymer pattern from the resin composition |
| 02/21/2002 | WO2002014924A1 Relay image optical system, and illuminating optical device and exposure system provided with the optical system |
| 02/21/2002 | WO2002014846A2 Multiple beam inspection apparatus and method |
| 02/21/2002 | WO2002014840A2 Database interpolation method for optical measurement of diffractive microstructures |
| 02/21/2002 | WO2002014576A1 Sputtering target |
| 02/21/2002 | WO2002014018A2 Abrasive pad for cmp |
| 02/21/2002 | WO2002014015A1 Retaining ring for chemical-mechanical polishing head, polishing apparatus, slurry cycle system, and method |
| 02/21/2002 | WO2002014014A2 Chemical mechanical planarization of metal substrates |
| 02/21/2002 | WO2002014008A1 Soldering method for mounting electric components |
| 02/21/2002 | WO2002013943A2 Ensemble manifold, system and method for monitoring particles in clean environments |
| 02/21/2002 | WO2001086034A3 Modified susceptor for use in chemical vapor deposition process |
| 02/21/2002 | WO2001084616A3 Semiconductor device using a barrier layer |
| 02/21/2002 | WO2001084552A3 Programming of nonvolatile memory cells |
| 02/21/2002 | WO2001080303A3 Method and apparatus for manufacturing an interconnect structure |
| 02/21/2002 | WO2001080291B1 Methods and apparatus for thermally processing wafers |
| 02/21/2002 | WO2001078135A3 Methods for repairing defects on a semiconductor substrate |
| 02/21/2002 | WO2001078116A3 System for the preferential removal of silicon oxide |
| 02/21/2002 | WO2001076771A3 Low temperature oxidizing method of making a layered superlattice material |
| 02/21/2002 | WO2001069685A3 Trench-gate semiconductor devices |
| 02/21/2002 | WO2001069659A3 Fabrication of semiconductor materials and devices with controlled electrical conductivity |
| 02/21/2002 | WO2001068271A8 Controlling surface chemistry on solid substrates |
| 02/21/2002 | WO2001067502A3 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 02/21/2002 | WO2001063024A8 Production of ceramic layers |
| 02/21/2002 | WO2001061762A3 Punch-through diode and method of manufacturing the same |
| 02/21/2002 | WO2001061746A3 Test structure for metal cmp process control |
| 02/21/2002 | WO2001061409A3 Apparatus and method of cleaning reticles for use in a lithography tool |
| 02/21/2002 | WO2001059832A3 Evaluation of etching processes in semiconductors |
| 02/21/2002 | WO2001059815A3 Method and apparatus for processing a microelectronic workpiece at an elevated temperature |
| 02/21/2002 | WO2001051679A3 Anti-reflective coating process and apparatus |
| 02/21/2002 | WO2001048870A3 Interconnect for microelectronic structures with enhanced spring characteristics |
| 02/21/2002 | WO2001046992A3 Optical method for the determination of grain orientation in films |
| 02/21/2002 | WO2001029899A3 Semiconductor pn-junction diode, method of making the same and electronic circuit comprising the same |
| 02/21/2002 | WO2001029881A3 Method of making an optoelectronic device using multiple etch stop layers |
| 02/21/2002 | WO2001020646A3 Fill strategies in the optical kerf |
| 02/21/2002 | WO2000074139A9 A single polysilicon flash eeprom and method for making same |
| 02/21/2002 | US20020023254 System and method for processing a transistor channel layout |
| 02/21/2002 | US20020023250 Parameterized designing method of data driven information processor employing self-timed pipeline control |
| 02/21/2002 | US20020022937 Abnormality-cause identifying apparatus and method |
| 02/21/2002 | US20020022708 Incorporating thermosetting monomer containing triple bond into a polymer thereby forming the low dielectric constant polymer |