Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2002
02/28/2002US20020023329 Semiconductor processing techniques
02/28/2002DE10136682A1 Selektives Epitaxieverfahren für Halbleiterbauelemente Selective epitaxy for semiconductor devices
02/28/2002DE10134181A1 P-type nitride semiconductor manufacturing method for light emitting and receiving elements, involves cooling substrate of nitride semiconductor layer in environment of hydrogen
02/28/2002DE10120184A1 Herstellung einer Halbleitervorrichtung mit Kupferverdrahtung Manufacturing a semiconductor device having copper wiring
02/28/2002DE10114226A1 Regler für einen Linearbeschleuniger Controller for a linear accelerator
02/28/2002DE10106406A1 Semiconductor device for integrated circuit protection circuit, has part insulation layer specifically formed in SOI-layer
02/28/2002DE10105505A1 Integrated circuit for testing DRAM, has judging circuit which detects normal condition of DRAM, when divided test data input for every predetermined number of bits correspond to excepted level
02/28/2002DE10051938A1 Arrangement comprises substrate attached to carrier element by means of adhesive layer which incorporates additional elements containing gas
02/28/2002DE10040898A1 Beleuchtungssystem für die Mikrolithographie An illumination system for microlithography
02/28/2002DE10039441A1 Speicherzelle, Speicherzellenanordnung und Herstellungsverfahren Memory cell, the memory cell array and production method
02/28/2002DE10039411A1 Strukturierung ferroelektrischer Schichten Patterning of ferroelectric layers
02/28/2002DE10039350A1 Integrierte Schaltung, Testaufbau und Verfahren zum Testen von integrierten Schaltungen An integrated circuit test set-up and method for testing integrated circuits
02/28/2002DE10038955A1 Verfahren zur Herstellung eines Bipolartransistors A process for producing a bipolar transistor
02/28/2002DE10038893A1 Semiconductor component used in a semiconductor laser comprises a second layer grown on a first layer doped with doping atoms
02/28/2002DE10038887A1 Production of a silicon nitride layer used in the production of a semiconductor device comprises reacting silicon wafers with ammonia gas in two separate chambers
02/28/2002DE10038877A1 Speicherzelle und Herstellungsverfahren Memory cell, and manufacturing method
02/28/2002DE10038611A1 Fördereinrichtung für den berührungslosen Transport von Bauteilen aus Kunststoff, Halbleitermaterial oder Metall Conveyor for the contactless transport of components made of plastic, metal or semiconductor material
02/28/2002DE10038378A1 Verfahren zur Herstellung von Kondensatorelektroden A process for producing capacitor plates
02/28/2002DE10037957C1 Verfahren zum anisotropen Trockenätzen organischer Antireflexionsschichten A method for anisotropic dry etching organic anti-reflective layers
02/28/2002DE10029035C1 Verfahren zur Bearbeitung eines Wafers A method for processing a wafer
02/28/2002CA2420262A1 Method for producing composite components by powder injection molding and composite powder appropriate for use in said method
02/28/2002CA2355591A1 Cooling body for semi-conductor components, process for its production and moulding tool for this
02/27/2002EP1182912A1 Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
02/27/2002EP1182779A2 Device and system for adjusting the electrical characteristics of microelectronic-circuits as well as the use of a microelectronical circuit element
02/27/2002EP1182713A2 Magneto-resistive element
02/27/2002EP1182708A2 High capacitance damascene capacitor
02/27/2002EP1182707A2 IGBT process and device
02/27/2002EP1182706A2 IGBT process and device
02/27/2002EP1182703A2 Semiconductor device having integrated capacitor and/or inductor
02/27/2002EP1182702A1 Device for the Protection of an Integrated Circuit
02/27/2002EP1182701A1 Method of manufacturing a buffer element for reducing mechanical strain
02/27/2002EP1182700A2 Process for the selective manufacturing of a T-shaped gate
02/27/2002EP1182699A2 Process for forming a thick dielectric region in a semiconductor substrate
02/27/2002EP1182698A2 Barrier layer for a storage capacitor
02/27/2002EP1182697A2 Sapphire substrate, semiconductor device, electronic component, and crystal growing method
02/27/2002EP1182696A2 Temperature compensating thinfilm capacitor
02/27/2002EP1182695A2 Semiconductor processing module and apparatus
02/27/2002EP1182694A2 Processing system for substrate
02/27/2002EP1182693A2 Vertical heat treatment system and method for transferring substrate
02/27/2002EP1182692A2 Heat-processing apparatus and method for semiconductor process
02/27/2002EP1182691A2 Method and apparatus for transfering a wafer
02/27/2002EP1182666A1 Integrated memory with magnetoresistive memory cells
02/27/2002EP1182665A2 MRAM with an effective noise countermeasure
02/27/2002EP1182526A2 Run-to-run control over semiconductor processing tool based upon mirror image
02/27/2002EP1182508A2 Method of exposing a layout comprising several levels on a wafer
02/27/2002EP1182507A2 Projection exposure system
02/27/2002EP1182505A2 Device and process for exposing a radiation-sensitive coating using charged particles and mask therefor
02/27/2002EP1182460A2 Fritting inspection method and apparatus
02/27/2002EP1182276A2 Process for the production of a ferroelectric solid layer using an additive
02/27/2002EP1182275A2 Method of forming an interlayer insulating film
02/27/2002EP1182273A2 Gas chemistry cycling to achieve high aspect ratio gapfill with hdp-cvd
02/27/2002EP1182242A1 Polishing composition and polishing method employing it
02/27/2002EP1182230A1 Filler for crosslinkable elastomer and crosslinkable elastomer composition containing the same
02/27/2002EP1182133A1 Stern tube sealing apparatus
02/27/2002EP1181724A1 Wavelength-insensitive radiation coupling for multi-quantum well sensor based on intersubband absorption
02/27/2002EP1181723A1 Double gate mosfet transistor and method for the production thereof
02/27/2002EP1181720A1 Methods and apparatus for fabricating a multiple modular assembly
02/27/2002EP1181719A1 Method and laminate for fabricating an integrated circuit
02/27/2002EP1181718A1 Improved trench isolation process to deposit a trench fill oxide prior to sidewall liner oxidation growth
02/27/2002EP1181717A1 Fabrication of integrated circuit by selective deposition of precursor liquid
02/27/2002EP1181715A1 Method and system for providing a continuous motion sequential lateral solidification
02/27/2002EP1181714A1 Method to produce high density memory cells and small spaces by using nitride spacer
02/27/2002EP1181713A2 Method for the preparation of pure citalopram
02/27/2002EP1181712A2 Low-resistance vdmos semiconductor component
02/27/2002EP1181711A2 Method for fabrication of a low resistivity mosfet gate with thick metal silicide on polysilicon
02/27/2002EP1181699A1 Amorphous barrier layer in a ferroelectric memory cell
02/27/2002EP1181693A1 Magnetic device with a coupling layer and method of manufacturing and operation of such device
02/27/2002EP1181692A1 Device with embedded flash and eeprom memories
02/27/2002EP1181651A2 Semiconductor processing techniques
02/27/2002EP1181401A2 Semi-insulating silicon carbide without vanadium domination
02/27/2002EP1181400A1 Electrochemical etching installation and method for etching a body to be etched
02/27/2002EP1181134A1 Method and system for cleaning a chemical mechanical polishing pad
02/27/2002EP1181112A1 Temperature controlled gassification of deionized water for megasonic cleaning of semiconductor wafers
02/27/2002EP1040486B1 Biasing method and structure for reducing band-to-band and/or avalanche currents during the erase of flash memory devices
02/27/2002EP0931350B1 Method of fabricating a short channel self-aligned VMOS field effect transistor
02/27/2002EP0925607B1 Method for producing a dram cellular arrangement
02/27/2002EP0904159A4 Process to modify work functions using ion implantation
02/27/2002EP0861503B1 Electrostatic discharge protection circuit comprising staggered contacts
02/27/2002EP0839389B1 Integrated circuit
02/27/2002EP0835518B1 Low inductance large area coil for an inductively coupled plasma source
02/27/2002EP0712535B1 Trenched dmos transistor with channel block at cell trench corners
02/27/2002CN1338118A Die pad crack absorption integrated circuit chip and fabrication process
02/27/2002CN1338115A Semiconductor integrated circuit device and its production method
02/27/2002CN1338114A Semiconductor integrated circuit device and its production method
02/27/2002CN1338113A Ferroelectric device with capping layer and method of make same
02/27/2002CN1338066A Four-phase charge pump with lower peak current
02/27/2002CN1338007A Indium source reagent compositions
02/27/2002CN1337983A Working liquids and methods for modifying structured wafers for semiconductor fabrication
02/27/2002CN1337975A Electronic circuit device comprising an epoxy-modified aromatic vinyl-conjugated diene block copolymer
02/27/2002CN1337905A Thermal transfer element for forming multi-layer devices
02/27/2002CN1337898A Fluid dispensing fixed abrasive polishing pad
02/27/2002CN1337749A Magnetic-resistance-effect type element and magnetic storage element and magnetic head made thereby
02/27/2002CN1337745A Semiconductor device and method for producing same
02/27/2002CN1337744A Semiconductor device
02/27/2002CN1337743A Package uith for semiconductor device and its manufacture
02/27/2002CN1337741A Semiconductor with injectable conductive area and mfg. method thereof
02/27/2002CN1337740A Manufacture of capacitor with insulating pins
02/27/2002CN1337739A Method for producing semi-conductor device
02/27/2002CN1337738A Band with injectable conductive area for semiconductor package treatment and mfg. method thereof
02/27/2002CN1337737A Method for producing semi-conductor device