| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/05/2002 | US6353259 Process for producing BGA type semiconductor device, TAB tape for BGA type semiconductor device, and BGA type semiconductor device |
| 03/05/2002 | US6353255 Semiconductor device and manufacturing method thereof |
| 03/05/2002 | US6353254 Device isolation structure and device isolation method for a semiconductor power integrated circuit |
| 03/05/2002 | US6353253 Semiconductor isolation region bounded by a trench and covered with an oxide to improve planarization |
| 03/05/2002 | US6353252 High breakdown voltage semiconductor device having trenched film connected to electrodes |
| 03/05/2002 | US6353251 MOS gate Schottky tunnel transistor and an integrated circuit using the same |
| 03/05/2002 | US6353249 MOSFET with high dielectric constant gate insulator and minimum overlap capacitance |
| 03/05/2002 | US6353248 Optimized decoupling capacitor using lithographic dummy filler |
| 03/05/2002 | US6353246 Semiconductor device including dislocation in merged SOI/DRAM chips |
| 03/05/2002 | US6353245 Body-tied-to-source partially depleted SOI MOSFET |
| 03/05/2002 | US6353243 Process for manufacturing an integrated circuit comprising an array of memory cells |
| 03/05/2002 | US6353242 Nonvolatile semiconductor memory |
| 03/05/2002 | US6353241 Memory circuitry with spaced conductive lines of different elevational thickness |
| 03/05/2002 | US6353239 Semiconductor integrated circuit device |
| 03/05/2002 | US6353235 Plasma damage detector and plasma damage evaluation method |
| 03/05/2002 | US6353231 Pinhole detector for electron intensity distribution |
| 03/05/2002 | US6353218 Laser illumination apparatus with beam dividing and combining performances |
| 03/05/2002 | US6353210 Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probe |
| 03/05/2002 | US6353209 Temperature processing module |
| 03/05/2002 | US6353206 Plasma system with a balanced source |
| 03/05/2002 | US6353202 Apparatus and method for producing a chip-substrate connection |
| 03/05/2002 | US6353201 Discharge electrode, RF plasma generation apparatus using the same, and power supply method |
| 03/05/2002 | US6353189 Wiring board, wiring board fabrication method, and semiconductor package |
| 03/05/2002 | US6353182 Proper choice of the encapsulant volumetric CTE for different PGBA substrates |
| 03/05/2002 | US6352946 High-pressure anneal process for integrated circuits |
| 03/05/2002 | US6352945 Introducing silicon compound having two alkoxy groups or less with no additive gas into reaction chamber for plasma chemical vapor deposition containing semiconductor substrate, activating plasma polymerization to form silicone film |
| 03/05/2002 | US6352944 Positioning semiconductor substrate within chemical vapor deposition reactor, feeding ammonia and trialkylaluminum compound to reactor at specified temperature and pressure to deposit layer comprising amorphous aluminum nitride |
| 03/05/2002 | US6352943 Method of film formation and method for manufacturing semiconductor device |
| 03/05/2002 | US6352942 Exposing silicon layer on germanium layer to dry oxygen gas at exposure temperature sufficient to induce oxidation of silicon layer substantially only by thermal energy, for time selected to oxidize only portion of silicon layer |
| 03/05/2002 | US6352941 Controllable oxidation technique for high quality ultrathin gate oxide formation |
| 03/05/2002 | US6352940 Semiconductor passivation deposition process for interfacial adhesion |
| 03/05/2002 | US6352939 Method for improving the electrical properties of a gate oxide |
| 03/05/2002 | US6352938 Method of removing photoresist and reducing native oxide in dual damascene copper process |
| 03/05/2002 | US6352937 Generating radicals in gas mainly composed of fluorine-based gas, stripping organic film formed on layered unit having organic low dielectric constant insulating film with radicals |
| 03/05/2002 | US6352936 Method for stripping ion implanted photoresist layer |
| 03/05/2002 | US6352935 Method of forming a cover cap for semiconductor wafer devices |
| 03/05/2002 | US6352934 Sidewall oxide process for improved shallow junction formation in support region |
| 03/05/2002 | US6352933 Methods of forming insulating materials between conductive components and methods of forming insulating materials around a conductive component |
| 03/05/2002 | US6352932 Methods of forming integrated circuitry and integrated circuitry structures |
| 03/05/2002 | US6352931 Manufacturing method of semiconductor devices by using dry etching technology |
| 03/05/2002 | US6352930 Bilayer anti-reflective coating and etch hard mask |
| 03/05/2002 | US6352928 Method of forming trench isolation |
| 03/05/2002 | US6352927 Semiconductor wafer and method for fabrication thereof |
| 03/05/2002 | US6352926 Structure for improving low temperature copper reflow in semiconductor features |
| 03/05/2002 | US6352924 Removing first tungsten plug from contact opening, removing top surface layer of titanium nitride glue layer by sputter etching, depositing new thin layer of titanium nitride over glue layer, re-depositing second tungsten plug in opening |
| 03/05/2002 | US6352923 Method of fabricating direct contact through hole type |
| 03/05/2002 | US6352922 Method of fabrication of a semiconductor device having a double layer type anti-reflective layer |
| 03/05/2002 | US6352921 Use of boron carbide as an etch-stop and barrier layer for copper dual damascene metallization |
| 03/05/2002 | US6352920 Process of manufacturing semiconductor device |
| 03/05/2002 | US6352919 Method of fabricating a borderless via |
| 03/05/2002 | US6352918 Method of forming inter-metal interconnection |
| 03/05/2002 | US6352917 Reversed damascene process for multiple level metal interconnects |
| 03/05/2002 | US6352916 Method of forming plugs in multi-level interconnect structures by partially removing conductive material from a trench |
| 03/05/2002 | US6352915 Method for manufacturing semiconductor package containing cylindrical type bump grid array |
| 03/05/2002 | US6352913 Damascene process for MOSFET fabrication |
| 03/05/2002 | US6352912 Prior to formation of gate, blanket implanting neutral dopant into semiconductor substrate at energy dose sufficient to implant dopant at depth greater than that of diffusion regions, forming peak concentration at specified depth |
| 03/05/2002 | US6352910 Method of depositing amorphous silicon based films having controlled conductivity |
| 03/05/2002 | US6352909 Process for lift-off of a layer from a substrate |
| 03/05/2002 | US6352908 Method for reducing nitride residue in a LOCOS isolation area |
| 03/05/2002 | US6352907 Method for manufacturing bipolar devices with a self-aligned base-emitter junction |
| 03/05/2002 | US6352906 Nitridization of STI sidewalls |
| 03/05/2002 | US6352905 Method and structure of high and low K buried oxide for SOI technology |
| 03/05/2002 | US6352903 Junction isolation |
| 03/05/2002 | US6352902 Process of forming a capacitor on a substrate |
| 03/05/2002 | US6352901 Method of fabricating a bipolar junction transistor using multiple selectively implanted collector regions |
| 03/05/2002 | US6352900 Controlled oxide growth over polysilicon gates for improved transistor characteristics |
| 03/05/2002 | US6352899 Raised silicide source/drain MOS transistors having enlarged source/drain contact regions and method |
| 03/05/2002 | US6352898 Method of manufacturing a semiconductor memory device incorporating a capacitor therein |
| 03/05/2002 | US6352897 Method of improving edge recess problem of shallow trench isolation |
| 03/05/2002 | US6352896 Method of manufacturing DRAM capacitor |
| 03/05/2002 | US6352895 Method of forming merged self-aligned source and ONO capacitor for split gate non-volatile memory |
| 03/05/2002 | US6352894 Method of forming DRAM cell arrangement |
| 03/05/2002 | US6352893 Low temperature self-aligned collar formation |
| 03/05/2002 | US6352892 Method of making DRAM trench capacitor |
| 03/05/2002 | US6352891 Method of manufacturing semiconductor device in which hot carrier resistance can be improved and silicide layer can be formed with high reliability |
| 03/05/2002 | US6352890 Method of forming a memory cell with self-aligned contacts |
| 03/05/2002 | US6352889 Method for fabricating capacitor and method for fabricating semiconductor device |
| 03/05/2002 | US6352888 Method of fabricating SRAM cell having a field region |
| 03/05/2002 | US6352887 Merged bipolar and CMOS circuit and method |
| 03/05/2002 | US6352885 Transistor having a peripherally increased gate insulation thickness and a method of fabricating the same |
| 03/05/2002 | US6352884 Method for growing crystals having impurities and crystals prepared thereby |
| 03/05/2002 | US6352883 Semiconductor device and method for forming the same |
| 03/05/2002 | US6352882 Silicon-on-insulator structure for electrostatic discharge protection and improved heat dissipation |
| 03/05/2002 | US6352881 Method and apparatus for forming an underfill adhesive layer |
| 03/05/2002 | US6352879 Semiconductor device and method of manufacturing the same |
| 03/05/2002 | US6352878 Method for molding a bumped wafer |
| 03/05/2002 | US6352877 Metal layer in semiconductor device and method for fabricating the same |
| 03/05/2002 | US6352872 SOI device with double gate and method for fabricating the same |
| 03/05/2002 | US6352870 Method of endpointing plasma strip process by measuring wafer temperature |
| 03/05/2002 | US6352867 Method of controlling feature dimensions based upon etch chemistry concentrations |
| 03/05/2002 | US6352866 Method for improving the sidewall stoichiometry of thin film capacitors |
| 03/05/2002 | US6352865 Method for fabricating a capacitor for a semiconductor device |
| 03/05/2002 | US6352864 Single transistor cell, method for manufacturing the same, memory circuit composed of single transistors cells, and method for driving the same |
| 03/05/2002 | US6352817 Methodology for mitigating formation of t-tops in photoresist |
| 03/05/2002 | US6352813 Acrylic polymer |
| 03/05/2002 | US6352803 Mask substrate including single layer substrate composed of low thermal expansion material, at least one layer of material on front side of substrate, at least one layer of material on back side of substrate |
| 03/05/2002 | US6352802 Mask for electron beam exposure and method of manufacturing semiconductor device using the same |
| 03/05/2002 | US6352801 Mask comprising phase shifter constructed of gadolinium gallium garnet serving as second light transmissive region formed on substrate which is transmissive to exposure light |
| 03/05/2002 | US6352800 Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device |
| 03/05/2002 | US6352743 Semiconductor copper band pad surface protection |