| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/05/2002 | US6352741 Planar high temperature superconductive integrated circuits for using ion implantation |
| 03/05/2002 | US6352629 Coaxial electromagnet in a magnetron sputtering reactor |
| 03/05/2002 | US6352623 Vertically configured chamber used for multiple processes |
| 03/05/2002 | US6352620 Staged aluminum deposition process for filling vias |
| 03/05/2002 | US6352611 Ceramic composition for an apparatus and method for processing a substrate |
| 03/05/2002 | US6352596 Post CMP cleaning method using a brush cleaner with torque monitor |
| 03/05/2002 | US6352595 Method and system for cleaning a chemical mechanical polishing pad |
| 03/05/2002 | US6352594 Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
| 03/05/2002 | US6352593 Mini-batch process chamber |
| 03/05/2002 | US6352592 Free floating shield and semiconductor processing system |
| 03/05/2002 | US6352591 Methods and apparatus for shallow trench isolation |
| 03/05/2002 | US6352589 Apparatus for spin-coating semiconductor substrate and method of doing the same |
| 03/05/2002 | US6352580 Complexes having tris(pyrazolyl)borate ligands for forming films |
| 03/05/2002 | US6352469 Polishing apparatus with slurry screening |
| 03/05/2002 | US6352468 Lapping method and method for manufacturing lapping particles for use in the lapping method |
| 03/05/2002 | US6352467 Integrated electrodeposition and chemical mechanical polishing tool |
| 03/05/2002 | US6352466 Method and apparatus for wireless transfer of chemical-mechanical planarization measurements |
| 03/05/2002 | US6352454 Wear-resistant spring contacts |
| 03/05/2002 | US6352436 Self retained pressure connection |
| 03/05/2002 | US6352423 Apparatus for underfilling semiconductor devices |
| 03/05/2002 | US6352422 Method and apparatus for epoxy loc die attachment |
| 03/05/2002 | US6352403 Controlled environment enclosure and mechanical interface |
| 03/05/2002 | US6352399 Twin tower wafer boat loading system and method |
| 03/05/2002 | US6352265 Seal ring using gas curtain |
| 03/05/2002 | US6352197 Method and apparatus for wire-bonding for electric components |
| 03/05/2002 | US6352191 Non-conductive and self-leveling leadframe clamp insert for wirebonding integrated circuits |
| 03/05/2002 | US6352084 Substrate treatment device |
| 03/05/2002 | US6352083 Substrate treating apparatus and substrate treating method |
| 03/05/2002 | US6352082 The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance to accelerate fluid flow of the attached liquid |
| 03/05/2002 | US6352081 Method of cleaning a semiconductor device processing chamber after a copper etch process |
| 03/05/2002 | US6352073 Semiconductor manufacturing equipment |
| 03/05/2002 | US6352050 Remote plasma mixer |
| 03/05/2002 | US6352049 Plasma assisted processing chamber with separate control of species density |
| 03/05/2002 | US6351925 Method of packing a semiconductor manufacturing apparatus to be carried into a clean room |
| 03/05/2002 | US6351885 Method of making conductive bump on wiring board |
| 03/05/2002 | US6351871 Aqueous quaternary ammonium hydroxide as a screening mask cleaner |
| 03/05/2002 | CA2233543C Adjustable slit and method for varying line width |
| 03/05/2002 | CA2086287C Method of manufacturing fusible links in semiconductor devices |
| 02/28/2002 | WO2002017694A1 Installation device |
| 02/28/2002 | WO2002017438A1 Interposer for use in electronic packages |
| 02/28/2002 | WO2002017411A1 Polishing apparatus comprising pad and polishing method using the same |
| 02/28/2002 | WO2002017409A2 Method of fabricating thermally stable mtj cell and apparatus |
| 02/28/2002 | WO2002017403A1 Memory cell array with ferroelectric capacitor, method for manufacturing the same, and ferroelectric memory device |
| 02/28/2002 | WO2002017399A1 Semiconductor arrangement and method for production thereof |
| 02/28/2002 | WO2002017398A1 Device for protecting an integrated circuit formed in a substrate |
| 02/28/2002 | WO2002017397A1 Electronic element, method for producing an element of this type and a semiconductor element |
| 02/28/2002 | WO2002017391A2 Method of manufacturing a semiconductor device and a support plate, and a semiconductor device obtained by means of said method |
| 02/28/2002 | WO2002017389A2 Disposable spacer technology for device tailoring |
| 02/28/2002 | WO2002017388A2 Method of improving the adhesion of copper |
| 02/28/2002 | WO2002017387A2 Conductive material patterning methods |
| 02/28/2002 | WO2002017386A1 Process for forming shallow isolating regions in an integrated circuit and an integrated circuit thus formed |
| 02/28/2002 | WO2002017385A1 Semiconductor cofiguration and corresponding production process |
| 02/28/2002 | WO2002017384A1 Electrostatic chuck temperature control method and system |
| 02/28/2002 | WO2002017383A2 Flexure based translation stage |
| 02/28/2002 | WO2002017382A1 Alignment device |
| 02/28/2002 | WO2002017381A2 Method for preventing damage to wafers in a sequential multiple steps polishing process |
| 02/28/2002 | WO2002017380A2 Selective flux deposition |
| 02/28/2002 | WO2002017379A1 Semiconductor joining substrate-use tape with adhesive and copper-clad laminate sheet using it |
| 02/28/2002 | WO2002017378A1 Mounting method and device |
| 02/28/2002 | WO2002017376A1 Active-matrix liquid crystal display |
| 02/28/2002 | WO2002017375A1 Vertical field-effect transistor and method for the production thereof |
| 02/28/2002 | WO2002017374A1 Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof |
| 02/28/2002 | WO2002017373A1 Super critical drying of low k materials |
| 02/28/2002 | WO2002017372A1 Boron diffusion barrier layer and its use in semiconductor device fabrication |
| 02/28/2002 | WO2002017371A1 Method for reducing semiconductor resistance, device for reducing semiconductor resistance and semiconductor element |
| 02/28/2002 | WO2002017370A1 Method for producing a doped semiconductor material |
| 02/28/2002 | WO2002017369A1 Method of fabricating group-iii nitride semiconductor crystal, metho of fabricating gallium nitride-based compound semiconductor, gallium nitride-based compound semiconductor, gallium nitride-based compound semiconductor light-emitting device, and light source using the semiconductor light-emitting device |
| 02/28/2002 | WO2002017367A2 Semiconductor device having passive elements and method of making same |
| 02/28/2002 | WO2002017366A1 Method and device for installation |
| 02/28/2002 | WO2002017365A1 Low temperature processing of ferroelectric strontium bismuth tantalate layers and the production of ferroelectric components thereof |
| 02/28/2002 | WO2002017364A2 Micromechanical multichip module and method of making same |
| 02/28/2002 | WO2002017362A2 Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors and fabricating such devices |
| 02/28/2002 | WO2002017359A2 High carrier concentration p-type transparent conducting oxide films |
| 02/28/2002 | WO2002017357A2 Three dimensional inspection of leaded ics |
| 02/28/2002 | WO2002017356A2 Method and structure for adhering msq material to liner oxide |
| 02/28/2002 | WO2002017355A2 Semiconductor wafer container cleaning apparatus |
| 02/28/2002 | WO2002017354A2 Ring chuck to hold 200 and 300 mm wafer |
| 02/28/2002 | WO2002017337A2 LOWER THERMAL BUDGET SiON BARRIER FOR MIS TANOX STACK CAPACITOR |
| 02/28/2002 | WO2002017030A2 Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control |
| 02/28/2002 | WO2002017029A1 Arrangement for data transmission between an equipment for manufacturing of a semiconductor device and a communicating device and method for operating the arrangement |
| 02/28/2002 | WO2002017019A2 Oxime sulfonate and n-oxyimidosulfonate photoacid generators and photoresists comprising same |
| 02/28/2002 | WO2002016973A2 Electronic and optical devices and methods of forming these devices |
| 02/28/2002 | WO2002016477A2 Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 02/28/2002 | WO2002016463A2 Polymers with high internal free volume |
| 02/28/2002 | WO2002016079A1 Cmp device and production method for semiconductor device |
| 02/28/2002 | WO2002016078A2 Polishing apparatus and methods controlling the polishing pressure as a function of the overlapping area between the polishing head and the semiconductor substrate |
| 02/28/2002 | WO2002016075A2 Cmp apparatus with an oscillating polishing pad rotating in the opposite direction of the wafer |
| 02/28/2002 | WO2002016063A2 Method for producing composite components by powder injection molding and composite powder appropriate for use in said method |
| 02/28/2002 | WO2001088993A3 A METHOD FOR LOCALLY MODIFYING THE EFFECTIVE BANDGAP ENERGY IN INDIUM GALLIUM ARSENIDE PHOSPHIDE (InGaAsP) QUANTUM WELL STRUCTURES |
| 02/28/2002 | WO2001086708A3 Amorphous metal oxide gate dielectric structure |
| 02/28/2002 | WO2001084604A3 Method for producing an integrated capacitor |
| 02/28/2002 | WO2001082344A3 Method of patterning lead zirconium titanate and barium strontium titanate |
| 02/28/2002 | WO2001082343A3 Heat management in wafer processing equipment using thermoelectric device |
| 02/28/2002 | WO2001075939A3 Method and apparatus for increased workpiece throughput |
| 02/28/2002 | WO2001074958A3 Polishing agent and method for producing planar layers |
| 02/28/2002 | WO2001074074A8 Techniques for controlling access to web content information and television content information using user modes |
| 02/28/2002 | WO2001073854A3 Variable capacitor with programmability |
| 02/28/2002 | WO2001071795A3 Method for forming high quality multiple thickness oxide layers by reducing descum induced defects |
| 02/28/2002 | WO2001071781A3 Combination differential and absolute pressure transducer for load lock control |
| 02/28/2002 | WO2001067465A3 Lead zirconate titanate dielectric thin film composites on metallic foils |