| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 02/28/2002 | WO2001066834A3 Chemical vapor deposition process for fabricating layered superlattice materials |
| 02/28/2002 | WO2001065599A3 Nitride layer forming methods |
| 02/28/2002 | WO2001063668A3 Method of forming lead-free solder alloys by electrochemical deposition process |
| 02/28/2002 | WO2001059828A3 Building component with constant distorsion-free bonding, and method for bonding |
| 02/28/2002 | WO2001055478A3 Method and device for depositing a precursor on a substrate, said precursor being present in liquid form |
| 02/28/2002 | WO2001054183A3 Method to prevent oxygen out-diffusion from basrtio3 containing micro-electronic device |
| 02/28/2002 | WO2001041963A3 Systems and methods for application of atmospheric plasma surface treatment to various electronic component packaging and assembly methods |
| 02/28/2002 | WO2001039248A3 Contact for a trench capacitor of a dram cell arrangement |
| 02/28/2002 | WO2001037342A3 Dram cell structure with tunnel barrier |
| 02/28/2002 | WO2001031698A3 Method for thermally treating semiconductor substrates |
| 02/28/2002 | WO2000077830A8 A method for the preparation of an epitaxial silicon wafer with intrinsic gettering |
| 02/28/2002 | US20020026628 Pattern defect checking method and device |
| 02/28/2002 | US20020026627 Streamlined IC mask layout optical and process correction through correction reuse |
| 02/28/2002 | US20020026625 Method for dividing a terminal in automatic interconnect routing processing, a computer program for implementing same, and an automatic interconnect routing processor using the method |
| 02/28/2002 | US20020026624 Correction of layout pattern data during semiconductor patterning process |
| 02/28/2002 | US20020026623 Semiconductor Integrated circuit provided with determination circuit |
| 02/28/2002 | US20020026621 Method of layout compaction |
| 02/28/2002 | US20020026612 Apparatus for testing semiconductor integrated circuits |
| 02/28/2002 | US20020026263 Method of monitoring manufacturing apparatus |
| 02/28/2002 | US20020026260 Exposure apparatus |
| 02/28/2002 | US20020026259 Method of transporting substrates and apparatus for transporting substrates |
| 02/28/2002 | US20020026258 Method and apparatus for testing IC device |
| 02/28/2002 | US20020026251 System and method for monitoring and controlling gas plasma processes |
| 02/28/2002 | US20020026022 Resist compositions containing polymers having dialkyl malonate groups for use in chemically amplified resists |
| 02/28/2002 | US20020025763 Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate |
| 02/28/2002 | US20020025761 Chemical mechanical polishing machine and chemical mechanical polishing method |
| 02/28/2002 | US20020025760 Methods and apparatus for electrically and/or chemically-mechanically removing conductive material from a microelectronic substrate |
| 02/28/2002 | US20020025759 Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material |
| 02/28/2002 | US20020025694 Device and method for protecting against oxidation of a conductive layer in said device |
| 02/28/2002 | US20020025693 Method of manufacturing low dielectric film by a vacuum ultraviolet chemical vapor deposition |
| 02/28/2002 | US20020025692 Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off |
| 02/28/2002 | US20020025691 Flash memory device and a fabrication process thereof, method of forming a dielectric film |
| 02/28/2002 | US20020025690 Semiconductor device and method for manufacturing same |
| 02/28/2002 | US20020025689 Method of improving surface planarity of chemical-mechanical polishing operation by forming shallow dummy |
| 02/28/2002 | US20020025688 Heat-processing apparatus and method of semiconductor process |
| 02/28/2002 | US20020025687 Method and apparatus for selective removal of material from wafer alignment marks |
| 02/28/2002 | US20020025686 Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield |
| 02/28/2002 | US20020025685 Endpoint control for small open area by RF source parameter Vdc |
| 02/28/2002 | US20020025684 Etching silicon oxide surface using anhydrous fluorine gas |
| 02/28/2002 | US20020025683 Etching gas used for plasma-enhanced etching of vanadium oxide film and method of plasma-enhanced etching of vanadium oxide film |
| 02/28/2002 | US20020025681 Semiconductor etching apparatus and method of etching semiconductor devices using same |
| 02/28/2002 | US20020025680 Methods of etching insulative materials, of forming electrical devices, and of forming capacitors |
| 02/28/2002 | US20020025679 Process for fabricating semiconductor device |
| 02/28/2002 | US20020025678 Method for reducing thermal budget in node contact application |
| 02/28/2002 | US20020025677 Dry etching method and apparatus |
| 02/28/2002 | US20020025676 Salicide formation process |
| 02/28/2002 | US20020025675 Electronic devices with diffusion barrier and process for making same |
| 02/28/2002 | US20020025674 Manufacturing method of semiconductor device |
| 02/28/2002 | US20020025673 Method for forming gate by using Co-silicide |
| 02/28/2002 | US20020025672 Method for forming an integrated circuit interconnect using a dual poly process |
| 02/28/2002 | US20020025671 Method of manufacturing a metal line in a semiconductor device |
| 02/28/2002 | US20020025670 Method of manufacturing a semiconductor device |
| 02/28/2002 | US20020025669 Methods of forming a contact structure in a semiconductor device |
| 02/28/2002 | US20020025668 Wiring pattern formation method and original substrate used for the method |
| 02/28/2002 | US20020025667 Method of forming overmolded chip scale package and resulting product |
| 02/28/2002 | US20020025666 Use of selective ozone teos oxide to create variable thickness layers and spacers |
| 02/28/2002 | US20020025665 Method of forming a metal to polysilicon contact in oxygen environment |
| 02/28/2002 | US20020025664 Process for production of gate electrode and gate electrode structure |
| 02/28/2002 | US20020025663 Method of manufacturing semiconductor device of dual-gate construction, and semiconductor device manufactured thereby |
| 02/28/2002 | US20020025662 Semiconductor device and method for fabricating the same |
| 02/28/2002 | US20020025661 Multilayers of various electroconductivity; vapor deposition |
| 02/28/2002 | US20020025660 Growth of epitaxial semiconductor material with improved crystallographic properties |
| 02/28/2002 | US20020025659 Method for crystallizing semiconductor material without exposing it to air |
| 02/28/2002 | US20020025658 Method for forming a barrier layer |
| 02/28/2002 | US20020025657 Wafer processing in a chamber with novel gas inlets |
| 02/28/2002 | US20020025656 Semiconductor chip pick-up method |
| 02/28/2002 | US20020025655 Semiconductor device and manufacturing method thereof |
| 02/28/2002 | US20020025654 Method for manufacturing a semiconductor device |
| 02/28/2002 | US20020025653 Method of forming multilevel interconnection structure having an air gap between interconnects |
| 02/28/2002 | US20020025652 Method and apparatus for processing composite member |
| 02/28/2002 | US20020025651 Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
| 02/28/2002 | US20020025650 Methods for enhancing capacitors having roughened features to increase charge-storage capacity |
| 02/28/2002 | US20020025649 Method of manufacturing a capacitor in a semiconductor device |
| 02/28/2002 | US20020025648 Method for manufacturing a capacitor for use in a semiconductor device |
| 02/28/2002 | US20020025647 Device formation method for preventing pattern shift caused by glass layer reflow |
| 02/28/2002 | US20020025646 Method for forming capacitor of semiconductor device |
| 02/28/2002 | US20020025645 Method for manufacturing buried layer with low sheet resistence and structure formed thereby |
| 02/28/2002 | US20020025644 Structures comprising transistor gates |
| 02/28/2002 | US20020025643 Method for using thin spacers and oxidation in gate oxides |
| 02/28/2002 | US20020025642 Method for using thin spacers and oxidation in gate oxides |
| 02/28/2002 | US20020025641 Method for fabricating a MOSFET and a MOSFET |
| 02/28/2002 | US20020025639 Method for fabricating abrupt source/drain extensions with controllable gate electrode overlap |
| 02/28/2002 | US20020025638 Reducing lithography limitation by reverse-offset spacer process |
| 02/28/2002 | US20020025637 Method for manufacturing self-matching transistor |
| 02/28/2002 | US20020025636 Field effect transitor with non-floating body and method for forming same on a bulk silicon wafer |
| 02/28/2002 | US20020025635 Method for fabricating connection structure between segment transistor and memory cell region of flash memory device |
| 02/28/2002 | US20020025634 Method for fabricating MOS transistor using selective silicide process |
| 02/28/2002 | US20020025633 MOSFET gate insulating film and method of manufacturing the same |
| 02/28/2002 | US20020025632 Process for fabricating semiconductor device and photolithography mask |
| 02/28/2002 | US20020025631 Process for manufacturing a non-volatile memory cell with a floating gate region autoaligned to the isolation and with a high coupling coefficient |
| 02/28/2002 | US20020025630 Semiconductor device and method for manufacturing the device |
| 02/28/2002 | US20020025629 Method of fabricating a capacitor structure |
| 02/28/2002 | US20020025628 Capacitor fabrication methods and capacitor constructions |
| 02/28/2002 | US20020025627 Integrated circuits |
| 02/28/2002 | US20020025626 Forming barriers |
| 02/28/2002 | US20020025625 Mixed oxides, nitrides |
| 02/28/2002 | US20020025624 Method for manufacturing capacitor for use in semiconductor device |
| 02/28/2002 | US20020025623 Semiconductor device, manufacturing method therefor, and thin film capacitor |
| 02/28/2002 | US20020025622 Low leakage capacitance isolation material |
| 02/28/2002 | US20020025621 Radical cell device and method for manufacturing groups II-VI compound semiconductor device |