| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 04/04/2002 | WO2002027059A2 System and method for controlling movement of a workpiece in a thermal processing system |
| 04/04/2002 | WO2002026906A1 Method for chemical-mechanical polishing of layers made from metals from the platinum group |
| 04/04/2002 | WO2002026445A1 Polishing pad with built-in optical sensor |
| 04/04/2002 | WO2002026444A1 Wafer carrier for cmp system |
| 04/04/2002 | WO2002026443A1 Arrangement for polishing disk-like objects |
| 04/04/2002 | WO2002026441A1 Tool for applying resilient tape to chuck used for grinding or polishing wafers |
| 04/04/2002 | WO2002026435A1 Apparatus and method for controlling temperature uniformity of substrates |
| 04/04/2002 | WO2002012780B1 Automatic refill system for ultra pure or contamination sensitive chemicals |
| 04/04/2002 | WO2002006897A3 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation |
| 04/04/2002 | WO2002005470A3 Magnetoresistive trimming of gmr circuits |
| 04/04/2002 | WO2002005316A3 Wafer container washing apparatus |
| 04/04/2002 | WO2002003763A8 Vacuum plasma processor apparatus and method |
| 04/04/2002 | WO2002003160A8 Method and device for thermally treating objects |
| 04/04/2002 | WO2002001615A3 Crystal structure control of polycrystalline silicon in a single wafer chamber |
| 04/04/2002 | WO2001099167A3 Memory device including nanoclusters and method for manufacture |
| 04/04/2002 | WO2001095372A3 System and method for providing defect free rapid thermal processing |
| 04/04/2002 | WO2001086697A3 Inductive plasma loop enhancing magnetron sputtering |
| 04/04/2002 | WO2001084619A3 Method of depositing low stress films |
| 04/04/2002 | WO2001084602A3 Method of forming a shallow and deep trench isolation (sdti) suitable for silicon on insulator (soi) substrates |
| 04/04/2002 | WO2001080290A3 A method of operating a dual chamber reactor with neutral density decoupled from ion density |
| 04/04/2002 | WO2001078146A3 Bonding pad in semiconductor device |
| 04/04/2002 | WO2001078145A3 Boding pad in semiconductor device |
| 04/04/2002 | WO2001078108A3 Wafer chuck having piezoelectric elements and method |
| 04/04/2002 | WO2001073457A3 Controllable and testable oscillator apparatus for an integrated circuit |
| 04/04/2002 | WO2001073157A3 Method and apparatus for reducing contamination in a loadlock |
| 04/04/2002 | WO2001071799A3 Semiconductor element and method for producing the same |
| 04/04/2002 | WO2001071425A3 Method for two dimensional adaptive process control of critical dimensions during spin coating process |
| 04/04/2002 | WO2001067494A3 Precision electroplated solder bumps and method for manufacturing thereof |
| 04/04/2002 | WO2001065315A3 Method and apparatus for mixed-mode optical proximity correction |
| 04/04/2002 | WO2001059831A3 Method and apparatus for preparing semiconductor wafers for measurement |
| 04/04/2002 | WO2001056079A3 A method for transferring and stacking of semiconductor devices |
| 04/04/2002 | WO2000073090A9 Microstructures and method for wafer to wafer bonding |
| 04/04/2002 | WO2000062331A9 Semiconductor heterostructures with crystalline silicon carbide alloyed with germanium |
| 04/04/2002 | US20020040464 TAB autohandler |
| 04/04/2002 | US20020040459 Semiconductor integrated circuit having a self-testing function |
| 04/04/2002 | US20020040458 Hierarchical test circuit structure for chips with multiple circuit blocks |
| 04/04/2002 | US20020039880 Polishing apparatus |
| 04/04/2002 | US20020039878 Apparatus and method for feeding slurry |
| 04/04/2002 | US20020039877 Method and system for cleaning a chemical mechanical polishing pad |
| 04/04/2002 | US20020039875 Polishing agent for processing semiconductor, dispersant used therefor and process for preparing semiconductor device using above polishing agent for processing semiconductor |
| 04/04/2002 | US20020039845 Exposure apparatus, semiconductor device manufacturing method, exposure apparatus maintenance method and semiconductor manufacturing factory |
| 04/04/2002 | US20020039844 Semiconductor devices and fabricating methods thereof |
| 04/04/2002 | US20020039843 Method of manufacturing a semiconductor integrated circuit device |
| 04/04/2002 | US20020039842 Method of increasing oxide/oxynitride etching selectivity ratio in fabrication of self-aligned borderless contact |
| 04/04/2002 | US20020039841 Patterning method, thin film transistor matrix substrate manufacturing method, and exposure mask |
| 04/04/2002 | US20020039840 Semiconductor device having a multilayered interconnection structure |
| 04/04/2002 | US20020039839 Polishing compositions for noble metals |
| 04/04/2002 | US20020039838 Infrared sensor and manufacturing method thereof |
| 04/04/2002 | US20020039837 Method of manufacturing a semiconductor device |
| 04/04/2002 | US20020039836 Method for forming a dual inlaid copper interconnect structure |
| 04/04/2002 | US20020039835 Method of depositing a conformal hydrogen-rich silicon nitride layer onto a patterned structure |
| 04/04/2002 | US20020039834 Gate device with raised channel and method |
| 04/04/2002 | US20020039833 Forming of quantum dots |
| 04/04/2002 | US20020039832 Forming an amorphous silicon film where the silicon product and the flow rate of a gas mixture of hydrogen and silicon compound(s) are set to meet a given relation; large area, high conversion efficiency, increased film forming rate |
| 04/04/2002 | US20020039831 Forming a semiconductor layer having an acute projection of polycrystalline silicon on a substrate, and forming an insulating layer layer by oxidation so the radius of curvature of the projection is a given value |
| 04/04/2002 | US20020039830 Self-aligned silicidation (salicidation); thickness of the selective epitaxial growth (SEG) silicon layer is sufficient to prevent dislocation and fracture of a subsequently formed metal silicide layer |
| 04/04/2002 | US20020039829 Semiconductor device manufacturing system and electron beam exposure apparatus |
| 04/04/2002 | US20020039828 Method for exposing a layout comprising multiple layers on a wafer |
| 04/04/2002 | US20020039827 Method for forming inner capacitor of semiconductor devices using oxide layers formed by the SACVD method |
| 04/04/2002 | US20020039826 Methods of forming capacitors and resultant capacitor structures |
| 04/04/2002 | US20020039825 Electrostatic discharge protection device for semiconductor integrated circuit, method for producing the same, and electrostatic discharge protection circuit using the same |
| 04/04/2002 | US20020039824 Semiconductor device and a production method for the same |
| 04/04/2002 | US20020039823 Semiconductor memory device and method for fabricating the same |
| 04/04/2002 | US20020039822 Nonvolatile semiconductor memory device and method for fabricating the same |
| 04/04/2002 | US20020039821 FLASH memory and method of forming FLASH memory |
| 04/04/2002 | US20020039820 Fabricating an integrated circuit includes placing at least two antireflective coating layers chosen so radiation reflected mutally cancels when combined, between a reflective surface and another material |
| 04/04/2002 | US20020039819 Method for manufacturing a field effect transistor |
| 04/04/2002 | US20020039818 Wavy-shaped deep trench and method of forming |
| 04/04/2002 | US20020039817 Ion implanting a dopant through a mask opening, and enhancement dopant of a second conductivity type; first dopant forms a halo region proximate the source/drain regions and lightly doped drain (LDD) regions |
| 04/04/2002 | US20020039816 Method of manufacturing a semiconductor device |
| 04/04/2002 | US20020039815 Method for manufacturing a bipolar junction transistor |
| 04/04/2002 | US20020039814 Flat panel display device and method for manufacturing the same |
| 04/04/2002 | US20020039813 Semiconductor device and its manufacturing method |
| 04/04/2002 | US20020039812 Method and apparatus for a dense metal programmable ROM |
| 04/04/2002 | US20020039811 A method of manufacturing a semiconductor device |
| 04/04/2002 | US20020039809 Converting exposed portions of a photo-definable layer to an insulative material; especially photooxidation of a plasma polymerized methylsilane to a siloxane |
| 04/04/2002 | US20020039808 Capable of meeting miniaturization and high integration |
| 04/04/2002 | US20020039807 Manufacturing method of a semiconductor device |
| 04/04/2002 | US20020039806 Method for growing p-n homojunction-based structures utilizing HVPE techniques |
| 04/04/2002 | US20020039803 Method for CVD process control for enhancing device performance |
| 04/04/2002 | US20020039802 Fabrication method of semiconductor integrated circuit device and its testing apparatus |
| 04/04/2002 | US20020039801 Semiconductor device and test method for manufacturing same |
| 04/04/2002 | US20020039800 Burn-in method and burn-in device |
| 04/04/2002 | US20020039704 Lithographic and etching process using a hardened photoresist layer |
| 04/04/2002 | US20020039701 Resist composition and patterning process |
| 04/04/2002 | US20020039700 Pattern formation material and pattern formation method |
| 04/04/2002 | US20020039694 On-the-Fly leveling is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor |
| 04/04/2002 | US20020039692 Photomask |
| 04/04/2002 | US20020039650 Thickness of a monitor wafer is made smaller than a prescribed standard thickness with respect to the wafer diameter. |
| 04/04/2002 | US20020039644 Particularly, it relates to a printed wiring board for a very thin ball grid array type plastic package. |
| 04/04/2002 | US20020039626 Formation of said plasma is performed by applying an RF power and a DC power, and said DC power is applied to an electrode carrying the deposition target object. |
| 04/04/2002 | US20020039516 Three degree of freedom joint |
| 04/04/2002 | US20020039464 Optical reflective structures and method for making |
| 04/04/2002 | US20020039437 Bonding apparatus and bonding method |
| 04/04/2002 | US20020039319 Semiconductor device and method for supplying power supply voltage to semiconductor device |
| 04/04/2002 | US20020039316 Semiconductor memory device operating at high speed with low current consumption |
| 04/04/2002 | US20020039308 MRAM configuration |
| 04/04/2002 | US20020039305 Method and apparatus for a dense metal programmable ROM |
| 04/04/2002 | US20020039291 Illumination optical system and exposure apparatus having the same |
| 04/04/2002 | US20020039184 Differential numerical aperture methods and device |