| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/11/2002 | WO2002029886A2 Method and apparatus for substrate surface inspection using spectral profiling techniques |
| 04/11/2002 | WO2002029885A2 Optical signal routing method and apparatus providing multiple inspection collection points on semiconductor manufacturing systems |
| 04/11/2002 | WO2002029884A2 Detection of process endpoint through monitoring fluctuation of output data |
| 04/11/2002 | WO2002029883A1 Method to detect surface metal contamination |
| 04/11/2002 | WO2002029882A1 Silicon oxide liner for reduced nickel silicide bridging |
| 04/11/2002 | WO2002029881A1 Miniaturised ldd-type mos transistors |
| 04/11/2002 | WO2002029880A1 Process for forming conductor lines on a semiconductor product |
| 04/11/2002 | WO2002029879A1 Method for etching organic anti-reflecting coatings |
| 04/11/2002 | WO2002029878A2 Chemical mechanical polishing of dielectric materials |
| 04/11/2002 | WO2002029877A1 Vacuum processing device |
| 04/11/2002 | WO2002029876A1 Method for revealing crystalline defects and/or stress field defects at the molecular adhesion interface of two solid materials |
| 04/11/2002 | WO2002029875A2 Plating system with remote secondary anode for semiconductor manufacturing |
| 04/11/2002 | WO2002029874A2 Method of fabricating an oxide layer on a silicon carbide layer utilizing n2o |
| 04/11/2002 | WO2002029873A1 Method of epitaxial growth of high quality nitride layers on silicon substrates |
| 04/11/2002 | WO2002029872A1 Semiconductor structure including a partially annealed layer |
| 04/11/2002 | WO2002029871A1 Method for making juxtaposed islands by automatically controlled deposition on a substrate and resulting structure |
| 04/11/2002 | WO2002029868A1 Electron beam exposure system |
| 04/11/2002 | WO2002029867A1 Method for correcting electron beam and electron beam exposure system |
| 04/11/2002 | WO2002029866A1 Electron beam exposure system and method for calibrating irradiating position of electron beam |
| 04/11/2002 | WO2002029865A2 Method of manufacturing a semiconductor component and semiconductor component thereof |
| 04/11/2002 | WO2002029864A1 Device and method for manufacturing semiconductor |
| 04/11/2002 | WO2002029863A1 Method for producing a microelectronic circuit and a microelectronic circuit |
| 04/11/2002 | WO2002029862A2 Integrated semiconductor substrate bevel cleaning apparatus and method |
| 04/11/2002 | WO2002029861A2 System architecture of semiconductor manufacturing equipment |
| 04/11/2002 | WO2002029860A2 Wafer cleaning module and method for cleaning the surface of a substrate |
| 04/11/2002 | WO2002029859A2 Method and apparatus for electrochemical planarization of a workpiece |
| 04/11/2002 | WO2002029858A2 Deep trench etching method to reduce/eliminate formation of black silicon |
| 04/11/2002 | WO2002029857A1 Method of cleaning electronic device |
| 04/11/2002 | WO2002029856A2 A testing device for semiconductor components and a method of using the same |
| 04/11/2002 | WO2002029853A2 Method for cutting a composite structure comprising one or more electronic compnents using a laser |
| 04/11/2002 | WO2002029852A2 Charge-coupled image sensor comprising gate electrodes interconnected by shunt electrodes |
| 04/11/2002 | WO2002029849A2 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 04/11/2002 | WO2002029848A2 Wafer area pressure control for plasma confinement |
| 04/11/2002 | WO2002029819A2 An analog functional module using magnetoresistive memory technology |
| 04/11/2002 | WO2002029495A1 Mountable and removable sensor |
| 04/11/2002 | WO2002029493A1 Photoresist composition for forming insulation film, insulation film for organic electroluminescence element and method for its formation |
| 04/11/2002 | WO2002029492A1 Photolithography methods and systems |
| 04/11/2002 | WO2002029491A1 Method for high yield reticle formation |
| 04/11/2002 | WO2002029423A1 Multicontact electric connector |
| 04/11/2002 | WO2002029393A2 Method and apparatus for enhanced embedded substrate inspection through process data collection and substrate imaging techniques |
| 04/11/2002 | WO2002029392A2 Defect source identifier |
| 04/11/2002 | WO2002029391A2 Defect knowledge library |
| 04/11/2002 | WO2002029390A2 Method and apparatus to provide for automated process verification and hierarchical substrate examination |
| 04/11/2002 | WO2002029385A2 Method and apparatus to provide embedded substrate process monitoring through consolidation of multiple process inspection techniques |
| 04/11/2002 | WO2002029384A2 Method and apparatus for embedded substrate and system status monitoring |
| 04/11/2002 | WO2002029382A1 Condensation particle counter |
| 04/11/2002 | WO2002029374A1 Differential numerical aperture methods and device |
| 04/11/2002 | WO2002029137A2 Method and associated apparatus for tilting a substrate upon entry for metal deposition |
| 04/11/2002 | WO2002029125A1 High purity zirconium or hafnium, sputtering target comprising the high purity zirconium or hafnium and thin film formed using the target, and method for producing high purity zirconium or hafnium and method for producing powder of high purity zirconium or hafnium |
| 04/11/2002 | WO2002028597A1 Method and apparatus for electrochemical planarization of a workpiece |
| 04/11/2002 | WO2002028596A1 Web-style pad conditioning system and methods for implementing the same |
| 04/11/2002 | WO2002028589A1 Method and device for applying pieces of material to a workpiece |
| 04/11/2002 | WO2002028585A2 Method for ablating points of contact (debumping) |
| 04/11/2002 | WO2002015237A3 Changing local compressibility of a wafer support member |
| 04/11/2002 | WO2002013259A3 Method and apparatus for measuring parameters of an electronic device |
| 04/11/2002 | WO2002007222A3 Receiver comprising a variable capacitance diode |
| 04/11/2002 | WO2002005317A3 Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures |
| 04/11/2002 | WO2002005300A3 Feedback control of strip time to reduce post strip critical dimension variation in a transistor gate electrode |
| 04/11/2002 | WO2002003428A3 Silicon fixtures for supporting wafers during thermal processing and method of fabrication |
| 04/11/2002 | WO2002003423A8 Capacitor and capacitor contact process for stack capacitor drams |
| 04/11/2002 | WO2002002274A3 Base-pad for a polishing pad |
| 04/11/2002 | WO2002001628A3 Formation of boride barrier layers using chemisorption techniques |
| 04/11/2002 | WO2002001622A3 Novel non-crystalline oxides for use in microelectronic, optical, and other applications |
| 04/11/2002 | WO2001099181A3 Clean method for recessed conductive barriers |
| 04/11/2002 | WO2001099180A3 Novel frontside contact to substrate of soi device |
| 04/11/2002 | WO2001099151A3 Structure and method for abrupt pn junction diode formed using chemical vapor deposition processing |
| 04/11/2002 | WO2001097281A3 Method for processing a wafer |
| 04/11/2002 | WO2001097274A3 Heterostructure field effect transistor and method of manufacturing it |
| 04/11/2002 | WO2001097265A3 Method of plasma doping deep trenches covered with hemispherical gained silicon |
| 04/11/2002 | WO2001096972A3 Methods and apparatus for maintaining a pressure within an environmentally controlled chamber |
| 04/11/2002 | WO2001096956A3 Method for producing a planar mask on surfaces having reliefs |
| 04/11/2002 | WO2001095386A3 Apparatus and method for correcting warp of semiconductor carrier tape |
| 04/11/2002 | WO2001093330A3 Electronic device and method using crystalline, conductive regions and amorphous, insulating regions of a layer |
| 04/11/2002 | WO2001093311A3 Method of controlling well leakage for trench isolations of differing depths |
| 04/11/2002 | WO2001091179A3 Semiconductor device with shallow trench isolation (sti) sidewall implant |
| 04/11/2002 | WO2001091163A3 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
| 04/11/2002 | WO2001088987A3 Staggered bitline strapping of a non-volatile memory cell |
| 04/11/2002 | WO2001084627A3 Electronic devices with diffusion barrier and process for making same |
| 04/11/2002 | WO2001071773A3 Method and device for connecting at least one chip to a rewiring arrangement |
| 04/11/2002 | WO2001069604A3 Automated reference cell trimming verify |
| 04/11/2002 | WO2001067491A3 Digital feature separation |
| 04/11/2002 | WO2001064975A8 Method and device for growing large-volume oriented monocrystals |
| 04/11/2002 | WO2001037310A3 Method and apparatus for ionized physical vapor deposition |
| 04/11/2002 | US20020042906 Apparatus for and method of preparing pattern data of electronic part |
| 04/11/2002 | US20020042905 LSI layout design apparatus, layout design method, recording medium recording layout design program, and semiconductor integrated circuit |
| 04/11/2002 | US20020042682 Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methods |
| 04/11/2002 | US20020042666 Method of using a specimen sensing end effector to determine the thickness of a specimen |
| 04/11/2002 | US20020042246 Substrate holding apparatus |
| 04/11/2002 | US20020042211 Decomposition of of organosilicon compound; heat treatment |
| 04/11/2002 | US20020042210 Ionic additives for extreme low dielectric constant chemical formulations |
| 04/11/2002 | US20020042209 Method of manufacturing semiconductor device prevented from peeling of wirings from insulating film |
| 04/11/2002 | US20020042208 Aqueous mixture containing phase transfer agents |
| 04/11/2002 | US20020042207 Methods and compositions for removal of anti-reflective layers using fluorine containing compounds, oxidants, and water |
| 04/11/2002 | US20020042206 Plasma etching apparatus and plasma etching method |
| 04/11/2002 | US20020042205 Gas distribution apparatus for semiconductor processing |
| 04/11/2002 | US20020042204 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 04/11/2002 | US20020042203 Method of forming a fine pattern |
| 04/11/2002 | US20020042202 Semiconductor device and method for forming contact holes in a semiconductor device |
| 04/11/2002 | US20020042201 Chemical mechanical planarization of conductive material |
| 04/11/2002 | US20020042197 Forming multilayer silicide using germanium silicide interface |