Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2002
03/27/2002EP1190607A1 Integrated circuits with copper metallization for interconnections
03/27/2002EP1190604A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower
03/27/2002EP1190487A1 High voltage protection circuit on standard cmos process
03/27/2002EP1190455A2 Dual cmp pad conditioner
03/27/2002EP1190454A1 Method for making a semiconductor device comprising a stack alternately consisting of silicon layers and dielectric material layers
03/27/2002EP1190452A1 InGaAsN/GaAs QUANTUM WELL DEVICES
03/27/2002EP1190451A1 Multi-bit trench capacitor
03/27/2002EP1190450A2 Electrostatic discharge protection of integrated circuits
03/27/2002EP1190449A1 Interposer and method of making same
03/27/2002EP1190448A1 Chip package with molded underfill
03/27/2002EP1190446A1 Component and method for the production thereof
03/27/2002EP1190445A1 Method for manufacturing nanostructured thin film electrodes
03/27/2002EP1190444A2 Removal of silicon oxynitride material using a wet chemical process after gate etch processing
03/27/2002EP1190443A1 Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features
03/27/2002EP1190442A2 Semiconductor device manufacturing using low energy high tilt angle ion implantation
03/27/2002EP1190441A1 Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing
03/27/2002EP1190440A1 Fluid delivery stabilization for wafer preparation systems
03/27/2002EP1190437A1 Plasma processing system, apparatus, and method for delivering rf power to a plasma processing chamber
03/27/2002EP1190436A1 Plasma processor with coil responsive to variable amplitude rf envelope
03/27/2002EP1190435A1 A plasma reaction chamber component having improved temperature uniformity
03/27/2002EP1190434A1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography
03/27/2002EP1190422A1 Nanoporous material fabricated using a dissolvable reagent
03/27/2002EP1190390A1 Two-dimensional scatter plot technique for defect inspection
03/27/2002EP1190322A2 Semiconductor parallel tester
03/27/2002EP1190285A1 Method and device for conditioning atmosphere in a process chamber
03/27/2002EP1190277A1 Spin-on-glass anti-reflective coatings for photolithography
03/27/2002EP1190276A2 Coatings on reflective mask substrates
03/27/2002EP1190238A1 Method of and apparatus for inspection of articles by comparison with a master
03/27/2002EP1190209A1 Method and device for measuring the thickness of a layer
03/27/2002EP1190122A1 Method and apparatus for epitaxially growing a material on a substrate
03/27/2002EP1190121A1 Truncated susceptor for vapor-phase deposition
03/27/2002EP1190006A1 Slurry composition and method of chemical mechanical polishing using same
03/27/2002EP1190005A1 Magnetic polishing fluids
03/27/2002EP1189730A1 Abrasive processing apparatus and method employing encoded abrasive product
03/27/2002EP1189729A1 Method of modifying a surface of a structured wafer
03/27/2002EP1189722A1 Efficient energy transfer capillary
03/27/2002EP1189710A1 High rpm megasonic cleaning
03/27/2002EP1189706A1 Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
03/27/2002EP1189676A1 Organic acid scrubber & methods
03/27/2002EP1106040B1 Method for producing interconnections with electrically conductive cross connections between the top and the bottom part of a substrate and interconnections having such cross connections
03/27/2002EP1027355B1 Alcohol-based processors for producing nanoporous silica thin films
03/27/2002EP0986777B1 Lithography system
03/27/2002EP0857150B1 300 mm microenvironment pod with door on side and grounding electrical path
03/27/2002EP0778838B1 Formation of a metalorganic compound for growing epitaxial metal or semiconductor layers
03/27/2002EP0770265B1 Method of forming doped bst layers and integrated circuit capacitors comprising magnesium doped bst layers
03/27/2002EP0769206B1 Thin films of abo3 with excess a-site and b-site modifiers and method of fabricating integrated circuits with same
03/27/2002CN2483835Y Register parts of holding unit of sequencer used for IC measurement
03/27/2002CN1342332A Trench DMOS transistor structure having low resistance path to drain contact located on upper surface
03/27/2002CN1342331A Method for forming co-axial interconnect lines in CMOS process
03/27/2002CN1342330A Method for forming co-axial interconnect in CMOS process
03/27/2002CN1342329A Method of forming dual gate oxide layers of varying thickness on single substrate
03/27/2002CN1342328A Dielectric films from organohydridosiloxane resins
03/27/2002CN1342327A Pressure equalization system for chemical vapor deposition reactors
03/27/2002CN1342318A IC test software system for mapping logical functional data of logic integrated circuits to physical representation
03/27/2002CN1342220A Electrodeposition of metals in small recesses using modulated electric fields
03/27/2002CN1342217A Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas
03/27/2002CN1342214A Distributed control system architecture and method for material transport system
03/27/2002CN1342213A Processing chamber for atomic layer deposition processes
03/27/2002CN1342212A Wafer processing reactor having gas flow control system and method
03/27/2002CN1342041A Electronic device of sealed electronic element and manufacturing method and printed wiring board
03/27/2002CN1342037A Protecting circuit device using metal oxide semiconductor field effect transistor and its manufacturing method
03/27/2002CN1342035A Circuit device and its manufacturing method
03/27/2002CN1341968A 半导体集成电路装置及其制造方法 The semiconductor integrated circuit device and manufacturing method thereof
03/27/2002CN1341967A 集成电路装置 The integrated circuit device
03/27/2002CN1341964A Integrated electromagnetic shield device
03/27/2002CN1341963A 半导体装置及其制造方法 Semiconductor device and manufacturing method thereof
03/27/2002CN1341962A Semiconductor device and manufactoring method thereof
03/27/2002CN1341961A Method for manufacturing semiconductor integrated circuit device
03/27/2002CN1341960A Method for manufacturing conductive connecting wire
03/27/2002CN1341959A Semiconductor baseplate carrier and its production method
03/27/2002CN1341958A Chip pickup device and method for manufacturing semiconductor
03/27/2002CN1341957A Method for growing silicon oxide thick film by adopting TEOS source PECVD
03/27/2002CN1341956A Method for manufacturing field effect transistor
03/27/2002CN1341955A Production process of polycrystalline silicon metal gate by using nitriding process
03/27/2002CN1341954A Method for manufacturing crystal semiconductor material and method for making semiconductor device
03/27/2002CN1341869A Control signal part and liquid crystal display containing said control signal part
03/27/2002CN1341772A Production method of composite vapor phase deposit membrane, its used material and its production method
03/27/2002CN1341547A Self-assembly method of potential-controlled DNA on electrode surface
03/27/2002CN1341543A 芯片元件进给器 Chip component feeder
03/27/2002CN1081832C Method for fabricating metal oxide semiconductor field effect transistor
03/27/2002CN1081826C Non-volatile semiconductor store and data programing method
03/27/2002CN1081825C 半导体集成电路器件 The semiconductor integrated circuit device
03/27/2002CN1081804C Phase shift mask and method for fabricating the same
03/27/2002CN1081683C Epitaxial reactor
03/27/2002CN1081510C 改进的磨削和抛光机床 Improved grinding and polishing machine
03/26/2002US6363500 Device and method for outputting positional information for LSI cells and recording medium for positional information output program for LSI cells
03/26/2002US6363382 Data classification method and data management method, database and data storage medium based on that data classification method
03/26/2002US6363329 Method in an integrated circuit (IC) manufacturing process for identifying and redirecting IC's mis-processed during their manufacture
03/26/2002US6363296 System and method for automated defect inspection of photomasks
03/26/2002US6363294 Method and system for semiconductor wafer fabrication process real-time in-situ interactive supervision
03/26/2002US6363293 Video wire bonded system and method of operation
03/26/2002US6363168 Measurement position determination on a semiconductor wafer
03/26/2002US6363167 Method for measuring size of fine pattern
03/26/2002US6363166 Automated photomask inspection apparatus
03/26/2002US6363006 Asymmetric RAM cell
03/26/2002US6363004 Nonvolatile ferroelectric memory having shunt lines
03/26/2002US6363003 Ferroelectric memory device
03/26/2002US6363000 Write circuit for large MRAM arrays
03/26/2002US6362999 Semiconductor device including a repetitive pattern
03/26/2002US6362946 Electrostatic wafer clamp having electrostatic seal for retaining gas