| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/16/2002 | US6372570 Method of formation of a capacitor on an integrated circuit |
| 04/16/2002 | US6372569 Selective formation of hydrogen rich PECVD silicon nitride for improved NMOS transistor performance |
| 04/16/2002 | US6372567 Control of oxide thickness in vertical transistor structures |
| 04/16/2002 | US6372566 Method of forming a silicide layer using metallic impurities and pre-amorphization |
| 04/16/2002 | US6372565 Method of manufacturing SRAM cell |
| 04/16/2002 | US6372564 Method of manufacturing V-shaped flash memory |
| 04/16/2002 | US6372563 Self-aligned SOI device with body contact and NiSi2 gate |
| 04/16/2002 | US6372562 Method of producing a semiconductor device |
| 04/16/2002 | US6372561 Fabrication of fully depleted field effect transistor formed in SOI technology with a single implantation step |
| 04/16/2002 | US6372560 Simplified process for forming thin film transistor matrix for liquid crystal display |
| 04/16/2002 | US6372559 Method for self-aligned vertical double-gate MOSFET |
| 04/16/2002 | US6372558 Electrooptic device, driving substrate for electrooptic device, and method of manufacturing the device and substrate |
| 04/16/2002 | US6372557 Method of manufacturing a lateral fet having source contact to substrate with low resistance |
| 04/16/2002 | US6372554 Semiconductor integrated circuit device and method for production of the same |
| 04/16/2002 | US6372553 Disposable mold runner gate for substrate based electronic packages |
| 04/16/2002 | US6372550 Semiconductor device and method for manufacturing same |
| 04/16/2002 | US6372549 Semiconductor package and semiconductor package fabrication method |
| 04/16/2002 | US6372548 Method for fabricating a semiconductor package with a semiconductor device attached to a multilayered substrate |
| 04/16/2002 | US6372547 Method for manufacturing electronic device with resin layer between chip carrier and circuit wiring board |
| 04/16/2002 | US6372546 Method of producing semiconductor device and configuration thereof, and lead frame used in said method |
| 04/16/2002 | US6372545 Method for under bump metal patterning of bumping process |
| 04/16/2002 | US6372544 Method to reduce occurrences of fillet cracking in flip-chip underfill |
| 04/16/2002 | US6372543 Wrap-around interconnect for fine pitch ball grid array |
| 04/16/2002 | US6372542 Method of component manufacture |
| 04/16/2002 | US6372541 Method of fabricating a microcircuit card |
| 04/16/2002 | US6372539 Leadless packaging process using a conductive substrate |
| 04/16/2002 | US6372537 Pinned photodiode structure in a 3T active pixel sensor |
| 04/16/2002 | US6372536 Contact structures with which it is possible to produce low-loss p-type contact with p-conducting zinc-selenium semiconductor layer |
| 04/16/2002 | US6372535 Manufacturing method of a thin film transistor |
| 04/16/2002 | US6372534 Method of making a TFT array with photo-imageable insulating layer over address lines |
| 04/16/2002 | US6372531 Semiconductor device and fabrication process therefor |
| 04/16/2002 | US6372528 Burn-in method and burn-in device |
| 04/16/2002 | US6372527 Methods of making semiconductor chip assemblies |
| 04/16/2002 | US6372526 Method of manufacturing semiconductor components |
| 04/16/2002 | US6372524 Method for CMP endpoint detection |
| 04/16/2002 | US6372523 Etching method and etching device |
| 04/16/2002 | US6372522 Use of optimized film stacks for increasing absorption for laser repair of fuse links |
| 04/16/2002 | US6372521 Post epitaxial thermal oxidation |
| 04/16/2002 | US6372520 Sonic assisted strengthening of gate oxides |
| 04/16/2002 | US6372519 Providing an oxide containing substrate having layer comprised of metals capable of forming a ferroelectric oxide; heating layer such that metals reacts with oxide containing substrate to reduce oxide to form metal silicide |
| 04/16/2002 | US6372518 Method using unreactive gas anneal and low temperature pretreatment for fabricating layered superlattice materials and making electronic devices including same |
| 04/16/2002 | US6372414 Coating substrate with layer of liquid positive photoresist; soft baki to remove solvent from photoresist layer; contacting with aqueous alkaline developer; placing mask containing a pattern over photoresist; exposure to actinic radiation |
| 04/16/2002 | US6372413 Method for cleaning the surface of substrate to which residues of resist stick |
| 04/16/2002 | US6372412 Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby |
| 04/16/2002 | US6372410 Resist stripping composition |
| 04/16/2002 | US6372406 Deactivated aromatic amines as additives in acid-catalyzed resists |
| 04/16/2002 | US6372403 Photosensitive resin composition |
| 04/16/2002 | US6372391 Template mask lithography utilizing structured beam |
| 04/16/2002 | US6372390 Photo mask with an ESD protective function |
| 04/16/2002 | US6372356 Compliant substrates for growing lattice mismatched films |
| 04/16/2002 | US6372301 Method of improving adhesion of diffusion layers on fluorinated silicon dioxide |
| 04/16/2002 | US6372292 Insulating paste composition for rib formation and method of rib pattern formulation |
| 04/16/2002 | US6372291 In situ deposition and integration of silicon nitride in a high density plasma reactor |
| 04/16/2002 | US6372286 Forming metal electrode, depositing liquid precursor comprising barium, strontium, and titanium in common solution to form film, annealing film to form peroyskite layer of barium strontium titanate on electrode |
| 04/16/2002 | US6372151 Controlled etchant gas flow of sulfur hexafluoride, oxygen, and nitrogen |
| 04/16/2002 | US6372150 High vapor plasma strip methods and devices to enhance the reduction of organic residues over metal surfaces |
| 04/16/2002 | US6372116 Adhesion, uniformity; supersonic waves. |
| 04/16/2002 | US6372114 Method of forming a semiconductor device |
| 04/16/2002 | US6372084 Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate |
| 04/16/2002 | US6372083 Masking and doping are carried out continuously without exposing the substrate to the atmosphere; thin film transistor |
| 04/16/2002 | US6372082 Method and apparatus for semiconductor device fabrication |
| 04/16/2002 | US6372081 Process to prevent copper contamination of semiconductor fabs |
| 04/16/2002 | US6372051 Rinsing and cleaning semiconductor wafers with deionized water |
| 04/16/2002 | US6372050 Non-corrosive stripping and cleaning composition |
| 04/16/2002 | US6372048 Gas processing apparatus for object to be processed |
| 04/16/2002 | US6372044 Method for dispensing a liquid |
| 04/16/2002 | US6372042 System for processing semiconductor wafers producing a downward laminar flow of clean air in front of baking units |
| 04/16/2002 | US6372041 Method and apparatus for single crystal gallium nitride (GaN) bulk synthesis |
| 04/16/2002 | US6372039 Method and apparatus for irradiation of a pulse laser beam |
| 04/16/2002 | US6372034 Adding pb acetate to 2-methoxyethanol solvent at ambient temperature and pressure in nitrogen-filled gloved box, refluxing, fractionally distilling, adding germanium tetraalkoxy compound; ferroelectricity, transistors |
| 04/16/2002 | US6372003 Polishing abrasive of crystalline ceric oxide particles having surfaces modified with hydroxyl groups |
| 04/16/2002 | US6371840 Method and apparatus for processing a planar structure |
| 04/16/2002 | US6371838 Polishing pad conditioning device with cutting elements |
| 04/16/2002 | US6371836 Groove cleaning device for chemical-mechanical polishing |
| 04/16/2002 | US6371716 Apparatus and method for unloading substrates |
| 04/16/2002 | US6371713 Substrate processing apparatus |
| 04/16/2002 | US6371712 Support frame for substrates |
| 04/16/2002 | US6371310 Boat for land grid array packages |
| 04/16/2002 | US6371135 Using a charged particle beam directed at the particle to be removed. |
| 04/16/2002 | US6371134 Stripping the patterned resist from the semiconductor structure; contacting carbon containing resist debris remaining on the semiconductor structure with ozone to reduc the amount of carbon debris thereon. |
| 04/16/2002 | US6370965 Capacitive sensing array devices |
| 04/16/2002 | US6370897 Semiconductor manufacturing facility |
| 04/16/2002 | US6370796 Heater block cooling system for wafer processing apparatus |
| 04/16/2002 | US6370793 Apparatus for controlling the temperature of a wafer located at a pre-alignment stage |
| 04/16/2002 | US6370791 Processing machine with lockdown rotor |
| 04/16/2002 | US6370785 Strip counting gauge |
| 04/16/2002 | US6370774 Radiator with thin fins and method for producing the same |
| 04/16/2002 | US6370750 Component affixing method and apparatus |
| 04/11/2002 | WO2002029949A2 Semiconductor device with protective functions |
| 04/11/2002 | WO2002029912A1 Solid state embossing of polymer devices |
| 04/11/2002 | WO2002029911A2 Tunelling magnetoresistance (tmr) material having ultra-thin magnetic layer |
| 04/11/2002 | WO2002029903A2 Silicon-on-insulator (soi) trench photodiode and method of forming same |
| 04/11/2002 | WO2002029902A1 Nonvolatile semiconductor storage device and production method therefor |
| 04/11/2002 | WO2002029901A1 Thin film transistor, liquid crystal display device comprising it, and electroluminescence display device |
| 04/11/2002 | WO2002029900A2 Silicon carbide power mosfets having a shorting channel and methods of fabrication them |
| 04/11/2002 | WO2002029891A1 Method and apparatus for a dense metal programmable rom |
| 04/11/2002 | WO2002029890A2 Semiconductor stacked die devices and methods of forming semiconductor stacked die devices |
| 04/11/2002 | WO2002029889A2 Vertical transistor dram cell and method of making the same |
| 04/11/2002 | WO2002029888A2 Vertical transistor trench capacitor dram cell and method of making the same |
| 04/11/2002 | WO2002029887A2 One-step etch processes for dual damascene metallization |