| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/02/2002 | US6365422 Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same |
| 04/02/2002 | US6365420 Method of forming dielectric film with good crystallinity and low leak |
| 04/02/2002 | US6365419 High density MRAM cell array |
| 04/02/2002 | US6365333 Low temperature anti-reflective coating for IC lithography |
| 04/02/2002 | US6365328 Semiconductor structure and manufacturing method |
| 04/02/2002 | US6365327 Forming a stack including insulating layers, a stop layer and two masks; tantalum or silicon element or compound dielectrics; copper, aluminum, tungsten, nickel, polysilicon,or gold conductor |
| 04/02/2002 | US6365323 High performance curable polymers and processes for the preparation thereof |
| 04/02/2002 | US6365322 Photoresist composition for deep UV radiation |
| 04/02/2002 | US6365320 Process for forming anti-reflective film for semiconductor fabrication using extremely short wavelength deep ultraviolet photolithography |
| 04/02/2002 | US6365306 Photosensitive polymer composition, method for forming relief patterns, and electronic parts |
| 04/02/2002 | US6365302 Automatic overlap process using a plurality of linear patterns; faster with greater reproducibility and reliability semiconductor substrate with a photoresist film |
| 04/02/2002 | US6365266 Spinning solution of a ceramic precursor, acid catalyst, a surfactant and solvent applied to silicon wafer, removing solvent, calcining to form a ceramic film having reduced halide content and reduced metal content |
| 04/02/2002 | US6365235 Streams of active particles are created, these being directed onto the surface which is to be treated, and caused to interact with the surface |
| 04/02/2002 | US6365228 Process for spin-on coating with an organic material having a low dielectric constant |
| 04/02/2002 | US6365085 Comprises a cavity to which a plurality of bus bars are juxtaposedly inserted provided with gap portions to which a resin material to be injected therethrough and a plurality of holder pins provided |
| 04/02/2002 | US6365064 Method for evenly immersing a wafer in a solution |
| 04/02/2002 | US6365063 Plasma reactor having a dual mode RF power application |
| 04/02/2002 | US6365062 Treatment on silicon oxynitride |
| 04/02/2002 | US6365060 Method for controlling plasma processor |
| 04/02/2002 | US6365057 Circuit manufacturing using etched tri-metal media |
| 04/02/2002 | US6365042 Sequestering metals |
| 04/02/2002 | US6365027 Preirradiation with pulsed laser |
| 04/02/2002 | US6365025 Multilstage, multizonal |
| 04/02/2002 | US6365020 Wafer plating jig |
| 04/02/2002 | US6365015 Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gaps |
| 04/02/2002 | US6364958 Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges |
| 04/02/2002 | US6364957 Support assembly with thermal expansion compensation |
| 04/02/2002 | US6364955 Particulary of all types of storage disks for reactive and nonreactive processes; a carrousel-type conveyor for rotating about an axis and a transport element to be moved out and back radially and controlled at given positions; apertures |
| 04/02/2002 | US6364953 Method and apparatus for making aerogel film |
| 04/02/2002 | US6364947 Method and apparatus for manufacturing a silicon single crystal having few crystal defects, and a silicon single crystal and silicon wafers manufactured by the same |
| 04/02/2002 | US6364922 Substrate transport container |
| 04/02/2002 | US6364919 Constant pressure in dispersion chambers prevents macro particles would lead to scratching |
| 04/02/2002 | US6364762 Wafer atmospheric transport module having a controlled mini-environment |
| 04/02/2002 | US6364751 Method for singling semiconductor components and semiconductor component singling device |
| 04/02/2002 | US6364745 Mapping system for semiconductor wafer cassettes |
| 04/02/2002 | US6364744 CMP system and slurry for polishing semiconductor wafers and related method |
| 04/02/2002 | US6364743 Composite lapping monitor resistor |
| 04/02/2002 | US6364742 Chemical-mechanical polishing apparatus |
| 04/02/2002 | US6364731 Circuit device manufacturing equipment |
| 04/02/2002 | US6364595 Reticle transfer system |
| 04/02/2002 | US6364593 Material transport system |
| 04/02/2002 | US6364592 Small footprint carrier front end loader |
| 04/02/2002 | US6364331 Method and apparatus for transferring wafer cassettes in microelectronic manufacturing environment |
| 04/02/2002 | US6364196 Method and apparatus for aligning and attaching balls to a substrate |
| 04/02/2002 | US6364089 Multi-station rotary die handling device |
| 04/02/2002 | US6363976 Semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
| 04/02/2002 | US6363968 System for conserving a resource by flow interruption |
| 04/02/2002 | US6363958 Flow control of process gas in semiconductor manufacturing |
| 04/02/2002 | US6363950 Apparatus for processing substrate using process solutions having desired mixing ratios |
| 04/02/2002 | US6363882 Lower electrode design for higher uniformity |
| 04/02/2002 | US6363881 Plasma chemical vapor deposition apparatus |
| 04/02/2002 | US6363808 Conveying device |
| 04/02/2002 | US6363626 Method and device for treating items stored in containers and storage apparatus equipped with such a device |
| 04/02/2002 | US6363624 Apparatus for cleaning a semiconductor process chamber |
| 04/02/2002 | US6363623 Apparatus and method for spinning a work piece |
| 04/02/2002 | CA2241676C Platinum-free ferroelectric memory cell with intermetallic barrier layer and method of making same |
| 04/02/2002 | CA2233132C Semiconductor substrate and process for producing same |
| 04/02/2002 | CA2231625C Semiconductor substrate having compound semiconductor layer, process for its production, and electronic device fabricated on semiconductor substrate |
| 04/02/2002 | CA2163739C Memory material and method for its manufacture |
| 04/02/2002 | CA2070836C Electronic articles containing a fluorinated poly(arlene ether) dielectric |
| 03/28/2002 | WO2002025825A2 Method for assembling components and antennae in radio frequency identification devices |
| 03/28/2002 | WO2002025750A1 Electrode and/or conductor track for organic components and production method therefor |
| 03/28/2002 | WO2002025749A2 Magnetic layer system and a component comprising such a layer system |
| 03/28/2002 | WO2002025742A2 Method for producing a semiconductor-metal contact through a dielectric layer |
| 03/28/2002 | WO2002025740A1 High-voltage diode and method for the production thereof |
| 03/28/2002 | WO2002025739A1 Thin-film transistor, and liquid crystal display and electroluminescence display which comprise it |
| 03/28/2002 | WO2002025733A2 Non-volatile memory cell array and methods of forming |
| 03/28/2002 | WO2002025730A2 Self aligned trench and method of forming the same |
| 03/28/2002 | WO2002025729A2 Control of separation between gate and storage node in vertical dram |
| 03/28/2002 | WO2002025728A2 Dual thickness gate oxide fabrication method using plasma surface treatment |
| 03/28/2002 | WO2002025727A2 Method of forming conductive interconnections on an integrated circuit device |
| 03/28/2002 | WO2002025726A1 Method to recess interconnects in damascene patterning |
| 03/28/2002 | WO2002025725A2 Semiconductor device and process for forming the same |
| 03/28/2002 | WO2002025724A2 Correction of overlay offset between inspection layers in integrated circuits |
| 03/28/2002 | WO2002025723A2 Lateral shift measurement using an optical technique |
| 03/28/2002 | WO2002025722A2 Method and system for determining pressure compensation factors in an ion implanter |
| 03/28/2002 | WO2002025721A1 Method for installing a chip on a substrate |
| 03/28/2002 | WO2002025720A1 Chip mounting device and calibration method therein |
| 03/28/2002 | WO2002025719A2 Reduced capacitance scaled hbt using a separate base post layer |
| 03/28/2002 | WO2002025718A1 Method of producing anneal wafer and anneal wafer |
| 03/28/2002 | WO2002025717A1 Silicon wafer and silicon epitaxial wafer and production methods therefor |
| 03/28/2002 | WO2002025716A1 Method of producing silicon wafer and silicon wafer |
| 03/28/2002 | WO2002025715A2 Method of fabricating conductor structures with metal comb bridging avoidance |
| 03/28/2002 | WO2002025714A1 A process for dry-etching a semiconductor wafer surface |
| 03/28/2002 | WO2002025713A1 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon-containing compounds |
| 03/28/2002 | WO2002025709A2 Integrated thin film capacitor/inductor/interconnect system and method |
| 03/28/2002 | WO2002025708A2 Methods and systems for semiconductor fabrication processes |
| 03/28/2002 | WO2002025707A2 Method and apparatus for alignment of carriers and semiconductor processing equipment |
| 03/28/2002 | WO2002025706A2 Apparatus and method for batch processing semiconductor substrates in making semiconductor lasers |
| 03/28/2002 | WO2002025701A2 Body-tied silicon on insulator semiconductor device structure and method therefor |
| 03/28/2002 | WO2002025700A2 Semiconductor device and method of forming a semiconductor device |
| 03/28/2002 | WO2002025698A2 Cooling body, especially for cooling electronic components |
| 03/28/2002 | WO2002025697A2 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
| 03/28/2002 | WO2002025696A2 Reducing deposition of process residues on a surface in a chamber |
| 03/28/2002 | WO2002025695A2 Tunable focus ring for plasma processing |
| 03/28/2002 | WO2002025665A2 Non-volatile passive matrix and method for readout of the same |
| 03/28/2002 | WO2002025379A1 Developing solution for photoresist |
| 03/28/2002 | WO2002025376A2 Oxime derivatives and the use thereof as latent acids |
| 03/28/2002 | WO2002025375A2 Pinhole defect repair by resist flow |
| 03/28/2002 | WO2002025374A2 Antireflective composition |