Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2002
04/09/2002US6368762 Active mask exposure compensation of underlying nitride thickness variation to reduce critical dimension (CD) variation
04/09/2002US6368754 Overcoating wafer with photoresist; adjust mask
04/09/2002US6368753 Lithography
04/09/2002US6368733 ELO semiconductor substrate
04/09/2002US6368704 Conductive paste of high thermal conductivity and electronic part using the same
04/09/2002US6368683 Pellicle for photolithography
04/09/2002US6368673 Process control; selective heating
04/09/2002US6368567 Point-of-use exhaust by-product reactor
04/09/2002US6368518 Using halogen gas
04/09/2002US6368517 Method for preventing corrosion of a dielectric material
04/09/2002US6368516 Semiconductor manufacturing methods
04/09/2002US6368514 Method and apparatus for batch processed capacitors using masking techniques
04/09/2002US6368485 Forming electrolyte for forming metal oxide coating film
04/09/2002US6368484 Lining workpiece, then adding and selectively removing a seed layer before electroplating; reduces waste, cost, and time
04/09/2002US6368469 Inductive coils serves as additional target in sputtering; improves uniformity of deposited metal; independent bias of coils allows for additional control over sputtering
04/09/2002US6368452 Plasma treatment apparatus and method of semiconductor processing
04/09/2002US6368450 Processing apparatus
04/09/2002US6368435 Device and method for transporting separate substrates
04/09/2002US6368421 Composition for stripping photoresist and organic materials from substrate surfaces
04/09/2002US6368416 Method for validating pre-process adjustments to a wafer cleaning system
04/09/2002US6368415 Method for washing semiconductor substrate and washing apparatus therefor
04/09/2002US6368412 Apparatus with high temperature gas releasing means for vapor deposition of parylene polymer without peeling
04/09/2002US6368411 Permits purging a standard mechanical interface (smif) box or pod to isolate and control the environment in semiconductor manufacture, quickly to desired levels of relative humidity, oxygen and particulates; inlet port, check valve and filter
04/09/2002US6368407 Single crystal-manufacturing equipment and a method for manufacturing the same
04/09/2002US6368400 Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
04/09/2002US6368398 Method of depositing films by using carboxylate complexes
04/09/2002US6368372 Fluid media particle isolating system
04/09/2002US6368208 Cleanroom and cleanroom ventilation method
04/09/2002US6368194 Apparatus for controlling PH during planarization and cleaning of microelectronic substrates
04/09/2002US6368192 Wafer preparation apparatus including variable height wafer drive assembly
04/09/2002US6368191 Carrier head with local pressure control for a chemical mechanical polishing apparatus
04/09/2002US6368189 Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure
04/09/2002US6368183 Wafer cleaning apparatus and associated wafer processing methods
04/09/2002US6368182 Apparatus for optical inspection of wafers during polishing
04/09/2002US6368181 Apparatus for optical inspection of wafers during polishing
04/09/2002US6368051 Multi-position load lock chamber
04/09/2002US6368049 Semiconductor manufacturing method and semiconductor manufacturing apparatus
04/09/2002US6368044 Convertible wafer transfer machine
04/09/2002US6368040 Apparatus for and method of transporting substrates to be processed
04/09/2002US6367635 Ultra precision process carrier for semi-conductor manufacturing
04/09/2002US6367529 Method of adhering wafers and wafer adhering device
04/09/2002US6367493 Potted transducer array with matching network in a multiple pass configuration
04/09/2002US6367490 Processing apparatus and processing method
04/09/2002US6367486 Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal process
04/09/2002US6367415 View port of a chemical vapor deposition device for manufacturing semiconductor devices
04/09/2002US6367413 Apparatus for monitoring substrate biasing during plasma processing of a substrate
04/09/2002US6367410 Closed-loop dome thermal control apparatus for a semiconductor wafer processing system
04/09/2002US6367267 Integrated phase separator for ultra high vacuum system
04/09/2002US6367159 Method and apparatus for measuring surface shape of thin element
04/09/2002US6367152 Method for manufacturing a heat sink
04/09/2002US6367150 Solder flux compatible with flip-chip underfill material
04/06/2002CA2358006A1 Method of fabricating compound semiconductor device
04/04/2002WO2002027872A1 High-peak-power laser device and application to the generation of light in the extreme ultraviolet
04/04/2002WO2002027869A1 Conductive contactor with movable guide plate
04/04/2002WO2002027805A2 A theory of the charge multiplication process in avalanche photodiodes
04/04/2002WO2002027802A1 Method for producing a body consisting of semiconductor material having a reduced mean free path length
04/04/2002WO2002027800A2 Trench dmos transistor having lightly doped source structure
04/04/2002WO2002027799A2 Process for the fabrication of mosfet devices depletion, silicided source and drain junctions
04/04/2002WO2002027797A2 Shallow trench transistor deep trench capacitor memory cell
04/04/2002WO2002027791A2 Polymer stud grid array and method for production thereof
04/04/2002WO2002027790A1 Barrier layers for solder joints
04/04/2002WO2002027786A1 Semiconductor element, method of manufacturing semiconductor element, multi-layer printed circuit board, and method of manufacturing multi-layer printed circuit board
04/04/2002WO2002027784A2 Making of fuses and antifuses with a vertical dram process
04/04/2002WO2002027783A1 PREPARATION OF A RELAXED SiGe LAYER ON AN INSULATOR
04/04/2002WO2002027782A2 Fault detection method and apparatus using multiple dimension measurements
04/04/2002WO2002027781A1 A ball forming process
04/04/2002WO2002027779A2 Singulation of semiconductor packages by tie bar cutting
04/04/2002WO2002027778A1 Method of heat-treating silicon wafer
04/04/2002WO2002027777A2 Silicon oxide patterning using cvd photoresist
04/04/2002WO2002027776A1 Substrate processing method, and apparatus therefor
04/04/2002WO2002027775A1 Method and apparatus for treating wafer
04/04/2002WO2002027774A1 Method of disordering quantum well heterostructures
04/04/2002WO2002027773A1 Improved high voltage device and method for making the same
04/04/2002WO2002027772A1 Heat-treating apparatus and heat-treating method
04/04/2002WO2002027770A2 Highly efficient capacitor structures with enhanced matching properties
04/04/2002WO2002027769A1 Manufacturing apparatus, method and system for controlling manufacturing apparatus, and computer-readable medium storing control program for manufacturing apparatus
04/04/2002WO2002027768A2 Fabrication of semiconductor devices
04/04/2002WO2002027767A2 Fluid delivery ring and methods for making and implementing the same
04/04/2002WO2002027766A1 Vehicle for transporting a semiconductor device carrier to a semiconductor processing tool
04/04/2002WO2002027764A1 Device and method for the planar connection of two wafers for a thin-grinding and separation process of a wafer product
04/04/2002WO2002027755A2 Chamber configuration for confining a plasma
04/04/2002WO2002027753A2 System and method for delivering cooling gas from atmospheric pressure to a high vacuum through a rotating seal in a batch ion implanter
04/04/2002WO2002027409A1 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors
04/04/2002WO2002027406A2 Illumination system particularly for microlithography
04/04/2002WO2002027405A2 Illumination system particularly for microlithography
04/04/2002WO2002027404A2 Mitigation of multilayer defects on a reticle
04/04/2002WO2002027402A2 Illumination system particularly for microlithography
04/04/2002WO2002027401A2 Illumination system particularly for microlithography
04/04/2002WO2002027400A2 Illumination system particularly for microlithography
04/04/2002WO2002027390A2 A method of forming electrodes or pixel electrodes and a liquid crystal display device
04/04/2002WO2002027362A2 Electro-optic structure and process for fabricating same
04/04/2002WO2002027310A1 Method and apparatus for measuring and controlling the water content of a water containing liquid mixture
04/04/2002WO2002027288A1 Improved system for scatterometric measurements and applications
04/04/2002WO2002027080A1 A technique for the desired crystalline phase formation for the manufacture of integrated circuits
04/04/2002WO2002027079A1 Crystal growth method
04/04/2002WO2002027078A1 Method for depositing, in particular, crystalline layers, a gas inlet element, and device for carrying out said method
04/04/2002WO2002027077A1 Method of manufacturing silicon monocrystal and device for manufacturing semiconductor monocrystal
04/04/2002WO2002027063A2 Vapor deposition of oxides, silicates and phosphates
04/04/2002WO2002027061A2 Process chamber lid
04/04/2002WO2002027060A2 Process chamber lid service system