| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/18/2002 | WO2002031858A2 Gas distribution apparatus for semiconductor processing |
| 04/18/2002 | WO2002031595A2 Dissolution inhibitors in photoresist compositions for microlithography |
| 04/18/2002 | WO2002031232A1 Method and device for producing optical fluoride crystals |
| 04/18/2002 | WO2002031231A1 Semiconductor production device and production method for semiconductor device |
| 04/18/2002 | WO2002031227A2 Deposition uniformity control for electroplating apparatus, and associated method |
| 04/18/2002 | WO2002031219A1 Electrostatically clamped edge ring for plasma processing |
| 04/18/2002 | WO2002031217A2 Sputter targets |
| 04/18/2002 | WO2002031072A1 Cmp slurry composition and a method for planarizing semiconductor device using the same |
| 04/18/2002 | WO2002031018A1 Die-attaching paste and semiconductor device |
| 04/18/2002 | WO2002031011A2 Fractionation of resins using a static mixer and a liquid-liquid centrifuge |
| 04/18/2002 | WO2002030840A2 Glass member resistant to plasma corrosion |
| 04/18/2002 | WO2002030618A1 Activated slurry cmp system and methods for implementing the same |
| 04/18/2002 | WO2002030617A1 Polishing pad comprising a filled translucent region |
| 04/18/2002 | WO2002030173A2 Method and apparatus for communicating images, data, or other information in a defect source identifier |
| 04/18/2002 | WO2002012585A3 Processing apparatus and cleaning method |
| 04/18/2002 | WO2002011147A3 Integrated circuit with a temperature sensor |
| 04/18/2002 | WO2002007201A3 Method for etching trenches for the fabrication of semiconductor devices |
| 04/18/2002 | WO2002007194A3 Cleaning gas for semiconductor production equipment |
| 04/18/2002 | WO2002007191A3 Silica zeolite low-k dielectric thin films |
| 04/18/2002 | WO2002005314A3 Apparatus for processing a microelectronic workpiece including a workpiece cassette inventory assembly |
| 04/18/2002 | WO2002003472A3 Aerosol silicon nanoparticles for use in semiconductor device fabrication |
| 04/18/2002 | WO2002001643A3 Soft recovery power diode and related method |
| 04/18/2002 | WO2002001608A3 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((Al,In,Ga)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES |
| 04/18/2002 | WO2002001234A3 System for calibrating timing of an integrated circuit wafer tester |
| 04/18/2002 | WO2001099182A3 Insitu diffusion barrier and copper metallization for improving reliability of semiconductor devices |
| 04/18/2002 | WO2001098836A3 Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure |
| 04/18/2002 | WO2001097584A3 Encapsulation using microcellular foamed materials |
| 04/18/2002 | WO2001096961A3 Multipass multiphoton absorption method and apparatus |
| 04/18/2002 | WO2001095396A3 Double-implant high performance varactor and method for manufacturing same |
| 04/18/2002 | WO2001095389A3 Shielding of analog circuits on semiconductor substrates |
| 04/18/2002 | WO2001093333A3 Bandgap reference circuit and related method |
| 04/18/2002 | WO2001091176A3 Trilayer/bilayer solder bumps and fabrication methods therefor |
| 04/18/2002 | WO2001071804A3 Lateral asymmetric lightly doped drain mosfet |
| 04/18/2002 | WO2001071426A3 Apparatus for generating a laser pattern on a photomask and associated methods |
| 04/18/2002 | WO2001070628A3 Plasma processing for porous silica thin film |
| 04/18/2002 | WO2001068954A3 Axial gradient transport apparatus and process |
| 04/18/2002 | WO2001067505A3 Substrate thermal management system |
| 04/18/2002 | WO2001067071B1 Evaluating a property of a multilayered structure |
| 04/18/2002 | WO2001065596A3 Method for controlling uniformity of treatment of a surface of material for microelectronics with an electrically charged particle beam and equipment therefor |
| 04/18/2002 | WO2001064391A3 Planarization system with a wafer transfer corridor and multiple polishing modules |
| 04/18/2002 | WO2001063266A3 System for imaging a cross-section of a substrate |
| 04/18/2002 | WO2001059814A3 Semiconductor structure |
| 04/18/2002 | WO2001046996A3 Substrate holder |
| 04/18/2002 | WO2001039266A9 Power semiconductor die attach process using conductive adhesive film |
| 04/18/2002 | WO2001004643A3 Wafer-level burn-in and test cartridge and methods |
| 04/18/2002 | WO2000072368A9 Process for etching a silicon wafer |
| 04/18/2002 | WO2000066969A9 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 04/18/2002 | US20020046391 Method for generating behavior model description of circuit and apparatus for logic verification |
| 04/18/2002 | US20020046389 Automatic cell placement and routing apparatus and automatic cell placement and routing method used for the apparatus |
| 04/18/2002 | US20020046318 Flash eeprom system |
| 04/18/2002 | US20020046140 Information providing method and system |
| 04/18/2002 | US20020046001 Method, computer readable medium and apparatus for accessing a defect knowledge library of a defect source identification system |
| 04/18/2002 | US20020045967 Substrate processing system |
| 04/18/2002 | US20020045966 Chemical vapor deposition process and apparatus for performing the same |
| 04/18/2002 | US20020045709 Liquid epoxy resin composition and semiconductor device |
| 04/18/2002 | US20020045693 Composition for film formation, method of film formation and silica-based film |
| 04/18/2002 | US20020045556 Method for treating surface of substrate and surface treatment composition used for the same |
| 04/18/2002 | US20020045414 Cutting machine |
| 04/18/2002 | US20020045413 Substrate cleaning apparatus and substrate polishing apparatus with substrate cleaning apparatus |
| 04/18/2002 | US20020045412 Method for supplying slurry to polishing apparatus |
| 04/18/2002 | US20020045410 Polishing apparatus |
| 04/18/2002 | US20020045362 Method of forming a silicon nitride layer on a semiconductor wafer |
| 04/18/2002 | US20020045361 Plasma processes for depositing low dielectric constant films |
| 04/18/2002 | US20020045360 Semiconductor device and method of manufacturing thereof |
| 04/18/2002 | US20020045359 Fluorine-containing materials and processes |
| 04/18/2002 | US20020045358 Fabrication of DRAM and other semiconductor devices with an insulating film using a wet rapid thermal oxidation process |
| 04/18/2002 | US20020045357 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small production runs |
| 04/18/2002 | US20020045356 To eliminate delamination in the interface between a layer of passivation and an overlying layer of epoxy |
| 04/18/2002 | US20020045355 Method of manufacturing a semiconductor device having a silicide layer |
| 04/18/2002 | US20020045354 Acid resistance glass; smooth surface |
| 04/18/2002 | US20020045353 Placing a semiconductor substrate with a silicon oxide containing layer thereon into a plasma reaction chamber, supplying a linear octafluoro1-butene or octafluoro-2-butene etchant gas into the chamber, etching silicon oxide layer |
| 04/18/2002 | US20020045352 Method for controlling flatness of wafer and manufacturing method of thin-film magnetic head |
| 04/18/2002 | US20020045351 Method of manufacturing a substrate for an electronic device by using etchant and electronic device having the substrate |
| 04/18/2002 | US20020045350 Cerium oxide; water soluble carboxylic or sulfonic acid or salt; forming shallow trench isolations using this abrasive composition. |
| 04/18/2002 | US20020045348 Semiconductor wafer treating method and device for removing deposit on a semiconductor wafer |
| 04/18/2002 | US20020045346 Formation of diamond particle interconnects |
| 04/18/2002 | US20020045345 Enhance performance of copper damascene process by embedding conformal tin layer |
| 04/18/2002 | US20020045344 Method of forming polycrystalline cosi2 salicide and products obtained thereof |
| 04/18/2002 | US20020045343 Employed to form diffusion barrier layers on microelectronic devices via vapor deposition. |
| 04/18/2002 | US20020045342 Semiconductor structure having a doped conductive layer |
| 04/18/2002 | US20020045341 Reducing reflectivity on a semiconductor wafer by annealing titanium and aluminum |
| 04/18/2002 | US20020045340 Method of manufacturing group iii-v compound semiconductor |
| 04/18/2002 | US20020045339 Manufacture method for semiconductor with small variation in MOS threshold voltage |
| 04/18/2002 | US20020045338 Semiconductor device and method for manufacturing the same |
| 04/18/2002 | US20020045337 Methods of planarizing insulating layers on regions having different etching rates |
| 04/18/2002 | US20020045336 Methods for forming improved passivation layers for integrated circuits |
| 04/18/2002 | US20020045335 Passivation integrity improvements |
| 04/18/2002 | US20020045334 Interconnection system and method for producing the same |
| 04/18/2002 | US20020045333 Semiconductor device manufacturing method and semiconductor device |
| 04/18/2002 | US20020045332 Method of fabricating a semiconductor device using a damascene metal gate |
| 04/18/2002 | US20020045331 Method of producing a semiconductor device using feature trimming |
| 04/18/2002 | US20020045329 Dielectrically separated wafer and method of manufacturing the same |
| 04/18/2002 | US20020045328 Method of manufacturing a semiconductor integrated circuit device |
| 04/18/2002 | US20020045327 Method and apparatus for separating sample |
| 04/18/2002 | US20020045326 Methods for making semiconductor devices |
| 04/18/2002 | US20020045325 Thin tensile layers in shallow trench isolation and method of making same |
| 04/18/2002 | US20020045324 Method for forming shallow trench isolation |
| 04/18/2002 | US20020045322 Method of depositing tungsten nitride using a source gas comprising silicon |
| 04/18/2002 | US20020045321 Process for fabricating a semiconductor component |
| 04/18/2002 | US20020045320 Nonvolatile memory device and method for manufacturing the same |