| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/25/2002 | DE19854418C2 Halbleiterbauelement mit zumindest einem Kondensator sowie Verfahren zu dessen Herstellung A semiconductor device comprising at least a capacitor, and methods for its preparation |
| 04/25/2002 | DE10144201A1 Halbleiteranordnung Semiconductor device |
| 04/25/2002 | DE10141844A1 Hochfrequenz-Anpassungseinheit RF matching unit |
| 04/25/2002 | DE10139086A1 Verfahren zum Trennen eines plattenartigen Werkstückes, welches durch Adsorption an einem elastischen Adsorptionskissen gehalten wird A method of separating a plate-like workpiece which is held by adsorption on a sorbent elastic |
| 04/25/2002 | DE10137369A1 Halbleitersubstrat, Feldeffekt-Transistor, Verfahren zur Bildung einer SiGe-Schicht und Verfahren zur Bildung einer gespannten Si-Schicht unter Verwendung derselben, und Verfahren zur Herstellung eines Feldeffekt-Transistors Semiconductor substrate, the field effect transistor, method of forming a SiGe layer and method for forming a strained Si layer using the same, and method for producing a field effect transistor |
| 04/25/2002 | DE10136075A1 Belichtungsverfahren Exposure method |
| 04/25/2002 | DE10134162A1 Neuartiges Copolymeres, Photoresistzusammensetzung und Verfahren zur Herstellung eines Photoresistmusters mit hohem Seitenverhältnis Novel copolymer, the photoresist composition and process for producing a photoresist pattern with a high aspect ratio |
| 04/25/2002 | DE10126878A1 Halbleitervorrichtung Semiconductor device |
| 04/25/2002 | DE10119499A1 Dünnfilm-Magnetspeichervorrichtung zum leichten Steuern eines Datenschreibstroms A thin film magnetic memory device for easily controlling a data write current |
| 04/25/2002 | DE10054936C1 Production of an integrated circuit comprises forming metallizing regions in a substrate, applying an intermediate layer, removing the layer to form an oxide film, and partially converting the oxide film to produce a conducting connection |
| 04/25/2002 | DE10052293A1 Method for depositing a thin-walled, flat wafer substrate onto a mounting carrier with a level protective layer like wax brings the substrate into contact with the protective layer through making a gap and arching. |
| 04/25/2002 | DE10052289A1 8-Spiegel-Mikrolithographie-Projektionsobjektiv 8 Mirror microlithography projection lens |
| 04/25/2002 | DE10051052A1 Alkaline etching solution used in the production of silicon wafers and semiconductor diodes contains a carboxylic acid |
| 04/25/2002 | DE10050125A1 Vorrichtung zum Temperaturausgleich für thermisch belastete Körper mit niederer Wärmeleitfähigkeit, insbesondere für Träger reflektierender Schichten oder Substrate in der Optik Apparatus for temperature compensation for thermally stressed body with low thermal conductivity, in particular for vehicle reflective layers or substrates in optics |
| 04/25/2002 | DE10050052A1 Production of a capacitor used in DRAM cells comprises forming a silicon nitride layer on a substrate, depositing a borosilicate glass layer, forming a pattern, etching to form trenches |
| 04/25/2002 | DE10050050A1 Process for compensating for etching stress during etching of a semiconductor wafer comprises exposing a substrate bead from the edge of the wafer forming a pattern using photolacquer |
| 04/25/2002 | DE10050049A1 Production of a capacitor used in the semiconductor industry comprises mechanically treating the rear side of a semiconductor die to remove a section of substrate, fixing the die to a mounting device, and chemically treating the die |
| 04/25/2002 | DE10050047A1 Dry cleaning process used in the manufacture of semiconductors comprises preparing an etched metallized structure, arranging in a processing chamber, and cleaning using a mixture of a fluorine-containing gas and an oxygen-containing gas |
| 04/25/2002 | DE10050044A1 Process for forming a gate on a semiconductor substrate used in the production of a MOST, forming a gate oxide layer on the substrate followed by a polysilicon layer, a tungsten silicide layer and a nitride blocking layer |
| 04/25/2002 | DE10049557A1 Vorrichtung zum Umwandeln der Intensitätsverteilung eines Laserstrahls und Vorrichtung und Verfahren zum Erzeugen eines Laserstrahls mit einer Intensität, dielängs einer Achse von einer Seite des Strahls zur anderen beständig abfällt Means for converting the intensity distribution of a laser beam, and apparatus and method for generating a laser beam with an intensity dielängs an axis from one side of the beam to the other resistant drops |
| 04/25/2002 | DE10048477A1 Verfahren zum chemisch-mechanischen Polieren von Schichten aus Metallen der Platingruppe A method for chemical mechanical polishing of layers of metals of the platinum group |
| 04/25/2002 | DE10047664A1 Production of porous silicon used in the production of an optoelectronic component comprises chemically etching a silicon sample in an anodic oxidation process with localized etching |
| 04/25/2002 | DE10047152A1 Hochvolt-Diode und Verfahren zu deren Herstellung High-voltage diode and methods for their preparation |
| 04/25/2002 | DE10047135A1 Production of an integrated component comprises preparing an integrated circuit with contact pads connected to electrically conducting humps, applying the circuit onto a substrate |
| 04/25/2002 | DE10046942A1 Verfahren zum Transport von Wafern A method for transport of wafers |
| 04/25/2002 | DE10046218A1 Projektionsbelichtungsanlage Projection exposure apparatus |
| 04/25/2002 | DE10025562C1 Production of a nitride layer on a substrate used in the production of laser diodes comprises vaporizing gallium atoms and aluminum and/or indium atoms and irradiating substrate during vaporization with nitrogen atoms |
| 04/25/2002 | CA2425613A1 Stabilized alkaline compositions for cleaning microelectronic substrates |
| 04/24/2002 | EP1199909A1 Method and apparatus for manufacturing organic el display |
| 04/24/2002 | EP1199908A1 Ceramic heater |
| 04/24/2002 | EP1199755A1 ZnO COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT AND PRODUCTION METHOD THEREOF |
| 04/24/2002 | EP1199754A2 Photovoltaic cell and process for producing the same |
| 04/24/2002 | EP1199750A2 Post passivation interconnection schemes on top of the IC chips |
| 04/24/2002 | EP1199746A2 Resin-moulded semiconductor device with heat radiating electrode |
| 04/24/2002 | EP1199745A2 Vertical transistor trench capacitor DRAM with SOI logic devices |
| 04/24/2002 | EP1199744A1 Microcap wafer-level package |
| 04/24/2002 | EP1199743A2 Method of fabricating a stack consisting of a layer of Si3N4 topped by a layer of SiO2 on a semiconductor substrate |
| 04/24/2002 | EP1199742A2 Multi-layered polysilicon gate process |
| 04/24/2002 | EP1199741A2 Ceramic heater to heat wafers |
| 04/24/2002 | EP1199740A2 Procedure for drying silicon |
| 04/24/2002 | EP1199739A2 A device and method for suppressing space charge induced abberations in charged-particle projection lithography systems |
| 04/24/2002 | EP1199601A2 Photomask fabrication method, photomask, and exposure method thereof |
| 04/24/2002 | EP1199590A1 8 mirror microlithography projection lens |
| 04/24/2002 | EP1199388A1 Group III nitride film containing aluminum with hexagonal system crystal structure |
| 04/24/2002 | EP1199386A2 Plating methods and systems |
| 04/24/2002 | EP1199384A2 Plating Bath |
| 04/24/2002 | EP1199383A2 Seed layer repair bath |
| 04/24/2002 | EP1199380A1 Film forming device |
| 04/24/2002 | EP1199378A1 Method for forming metallic film and apparatus for forming the same |
| 04/24/2002 | EP1199135A1 Work holding panel for polishing, and device and method for polishing |
| 04/24/2002 | EP1199123A1 Ultra fine composite metal particles |
| 04/24/2002 | EP1198852A1 Preferred methods for producing electrical circuit elements used to control an electronic display |
| 04/24/2002 | EP1198851A1 Reactive formation of dielectric layers and protection of organic layers in organic semiconductor device |
| 04/24/2002 | EP1198844A1 Diode comprising a metal semiconductor contact and a method for the production thereof |
| 04/24/2002 | EP1198843A1 Power semiconductor devices having an insulating layer formed in a trench |
| 04/24/2002 | EP1198842A2 Trench-gate semiconductor devices |
| 04/24/2002 | EP1198841A1 Electric semiconductor element with a contact hole |
| 04/24/2002 | EP1198840A1 Method for making a device comprising layers of planes of quantum dots |
| 04/24/2002 | EP1198839A1 Semiconductor element |
| 04/24/2002 | EP1198837A1 Monolithic low dielectric constant platform for passive components and method |
| 04/24/2002 | EP1198836A1 Fuse for semiconductor device |
| 04/24/2002 | EP1198835A1 Dual wafer attachment process |
| 04/24/2002 | EP1198834A1 New method of forming select gate to improve reliability and performance for nand type flash memory devices |
| 04/24/2002 | EP1198833A1 Method for producing a semiconductor memory element |
| 04/24/2002 | EP1198832A1 Method of making a buried strap for a trench capacitor |
| 04/24/2002 | EP1198830A2 Process of manufacturing a semiconductor device including a buried channel field effect transistor |
| 04/24/2002 | EP1198829A1 Multiple stage cleaning process for plasma etching chambers |
| 04/24/2002 | EP1198828A1 Method for producing a semiconductor memory component |
| 04/24/2002 | EP1198827A1 Compositions and processes for spin etch planarization |
| 04/24/2002 | EP1198826A1 Semiconductor trenches and formation thereof |
| 04/24/2002 | EP1198825A2 Thermal processing chamber for heating and cooling wafer-like objects |
| 04/24/2002 | EP1198822A2 New methodologies to reduce process sensitivity to the chamber condition |
| 04/24/2002 | EP1198821A1 Techniques for improving etch rate uniformity |
| 04/24/2002 | EP1198748A2 A system, method and apparatus pertaining to flexible selection scan test |
| 04/24/2002 | EP1198725A1 Moru/be multilayers |
| 04/24/2002 | EP1198692A1 Heat exchanger |
| 04/24/2002 | EP1198620A1 Methods for wet processing electronic components having copper containing surfaces |
| 04/24/2002 | EP1198534A1 Polishing liquid composition |
| 04/24/2002 | EP1198295A1 Analysing device with biochip |
| 04/24/2002 | EP1113988B1 Method and device for producing aerogels |
| 04/24/2002 | EP1017770A4 Aqueous rinsing composition |
| 04/24/2002 | EP0968523B1 Method for forming a structured metallization on a semiconductor wafer |
| 04/24/2002 | CN2488173Y Ring contact type inductor |
| 04/24/2002 | CN1346516A Intelligent gate-level fill methods for reducing global pattern density effects |
| 04/24/2002 | CN1346515A Methods for packaging integrated circuit devices including cavities adjacent active regions and related structures |
| 04/24/2002 | CN1346514A Electrostatic discharge protection of integrated circuits |
| 04/24/2002 | CN1346512A Dual process semiconductor heterostructure and methods |
| 04/24/2002 | CN1346511A Method of processing monocrystalline semiconductor disk and partially processed semiconductor disk |
| 04/24/2002 | CN1346510A Mehtod and apparatus for holding and positioing semiconductor workpieces during electropolishing and/or electroplating of the workpieces |
| 04/24/2002 | CN1346509A Installation for working wafers |
| 04/24/2002 | CN1346331A Method for producing high-purity solutions using gaseous hydrogen fluoride |
| 04/24/2002 | CN1346177A Method for making RF module element iwth sound wave surface wave unit |
| 04/24/2002 | CN1346156A Magnetic resistance element and magnetic device using same |
| 04/24/2002 | CN1346153A 半导体器件 Semiconductor devices |
| 04/24/2002 | CN1346152A Thin-film transistor and semiconductor |
| 04/24/2002 | CN1346148A Method for making double-metal inlaid structure |
| 04/24/2002 | CN1346138A Formation of precision high-frequency capacitor in semiconductor substrate |
| 04/24/2002 | CN1346132A Non-volatile semiconductor memory and system |
| 04/24/2002 | CN1346090A Automatic insert method for semiconductor circuit and easifying circuit test |
| 04/24/2002 | CN1346031A Vacuum gas discharge valve |