| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/23/2002 | US6376270 Method of making an array of TFTs having an insulation layer with a low dielectric constant |
| 04/23/2002 | US6376266 Semiconductor package and method for forming same |
| 04/23/2002 | US6376265 Non-contact automatic height sensing using air pressure for die bonding |
| 04/23/2002 | US6376262 Method of forming a semiconductor device using double endpoint detection |
| 04/23/2002 | US6376260 Magnetic element with improved field response and fabricating method thereof |
| 04/23/2002 | US6376259 Method for manufacturing a ferroelectric memory cell including co-annealing |
| 04/23/2002 | US6376158 Methods for selectively filling apertures |
| 04/23/2002 | US6376157 Method of manufacturing a semiconductor device, chemical solution to form fine pattern, and semiconductor device |
| 04/23/2002 | US6376156 Photoresist masking; patterning; removal; photolithography |
| 04/23/2002 | US6376155 Before wet etching, surface treating by novolak coating, base treatment, or irradiating the patterned chemical amplification resist layer to form an insoluble layer on the resist layer, improving wet etching resistance |
| 04/23/2002 | US6376152 Mixture of a compound which generates an acid upon radiation, resin and nitrogen-containing compound |
| 04/23/2002 | US6376139 Exposure amount and a focus value are set in transferring a circuit pattern on a mask onto a resist formed on a wafer by the exposure apparatus |
| 04/23/2002 | US6376137 Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector |
| 04/23/2002 | US6376136 Scanning a mask formed on sample with charged beams; pattern exposure; applying calibration voltage |
| 04/23/2002 | US6376132 Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device |
| 04/23/2002 | US6376130 Substrate with triangular light transmission zones |
| 04/23/2002 | US6376100 Blend of epoxy resin and filler |
| 04/23/2002 | US6376090 Forming electrode on substrate; prebaking |
| 04/23/2002 | US6376050 Electric connecting method and apparatus |
| 04/23/2002 | US6376048 Organosilicon compound adhesive |
| 04/23/2002 | US6376013 Multiple nozzles for dispensing resist |
| 04/23/2002 | US6375899 Reconfigurable; nucleic acid hybridization and analysis; medical diagnosis |
| 04/23/2002 | US6375859 Partial chlorine removal by exposure to plasma; minimization of erosion; removing remainder residue with solvent |
| 04/23/2002 | US6375857 Method to form fuse using polymeric films |
| 04/23/2002 | US6375823 Plating method and plating apparatus |
| 04/23/2002 | US6375810 Plasma vapor deposition with coil sputtering |
| 04/23/2002 | US6375792 Methods and apparatuses for removing material from discrete areas on a semiconductor wafer |
| 04/23/2002 | US6375790 Adaptive GCIB for smoothing surfaces |
| 04/23/2002 | US6375758 For semiconductors |
| 04/23/2002 | US6375756 Supplying cleaning gas into heated chamber so that gas is decomposed and activated by hot element to generate activated species that converts deposited film into gaseous substance |
| 04/23/2002 | US6375754 Processing compositions and methods of using same |
| 04/23/2002 | US6375753 Pumping a bulk amount of processing liquid from the processing liquid delivery line; and applying non-thermal energy to the processing liquid delivery line and thereby desorbing processing liquid from processing liquid delivery line |
| 04/23/2002 | US6375750 Plasma enhanced chemical processing reactor and method |
| 04/23/2002 | US6375749 Susceptorless semiconductor wafer support and reactor system for epitaxial layer growth |
| 04/23/2002 | US6375748 Method and apparatus for preventing edge deposition |
| 04/23/2002 | US6375746 Wafer processing architecture including load locks |
| 04/23/2002 | US6375744 Sequential in-situ heating and deposition of halogen-doped silicon oxide |
| 04/23/2002 | US6375743 Method for improved chamber bake-out and cool-down |
| 04/23/2002 | US6375741 Semiconductor processing spray coating apparatus |
| 04/23/2002 | US6375738 Process of producing semiconductor article |
| 04/23/2002 | US6375737 Method of self-assembly silicon quantum dots |
| 04/23/2002 | US6375694 Oxides, particularly ceria, alumina, or silica 10 nanometers to 100 nanometers in size |
| 04/23/2002 | US6375693 Chemical-mechanical planarization of barriers or liners for copper metallurgy |
| 04/23/2002 | US6375687 Filling connection hole with wiring material by using centrifugal force |
| 04/23/2002 | US6375559 Polishing system having a multi-phase polishing substrate and methods relating thereto |
| 04/23/2002 | US6375552 Slurries for chemical mechanical polishing |
| 04/23/2002 | US6375549 Polishing head for wafer, and method for polishing |
| 04/23/2002 | US6375548 Chemical-mechanical polishing methods |
| 04/23/2002 | US6375545 Chemical mechanical method of polishing wafer surfaces |
| 04/23/2002 | US6375408 Die-level burn-in and test flipping tray |
| 04/23/2002 | US6375403 Loading and unloading station for semiconductor processing installations |
| 04/23/2002 | US6375348 System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing |
| 04/23/2002 | US6375194 Method for semiconductor wafer processing system |
| 04/23/2002 | US6375176 Workpiece chuck with guard layer having vacuum distribution pattern |
| 04/23/2002 | US6375159 High laser absorption copper fuse and method for making the same |
| 04/23/2002 | US6375064 Method of forming projecting electrodes and method of manufacturing semiconductor device provided with projecting electrodes |
| 04/23/2002 | US6375062 Surface bumping method and structure formed thereby |
| 04/23/2002 | US6375061 Non-conductive and self-leveling leadframe clamp insert for wirebonding integrated circuits |
| 04/23/2002 | US6374907 Hydrofluoroether as a heat-transfer fluid |
| 04/23/2002 | US6374871 Liner for use in processing chamber |
| 04/23/2002 | US6374859 Manifold system for enabling a distribution of fluids |
| 04/23/2002 | US6374837 Single semiconductor wafer processor |
| 04/23/2002 | US6374836 Apparatus for treating plate type part with fluid |
| 04/23/2002 | US6374834 Substrate processing method and processing apparatus |
| 04/23/2002 | US6374833 Removing a residue remaining in a metal etching chamber and on a wafer after completing a metal etching process; bcl3 reactive gas; applying an electromagnetic power to said metal etching chamber for producing a plasma |
| 04/23/2002 | US6374832 Performing a dry cleaning process in the etching chamber with oxygen/hydrogen bromide plasma to restore an etching environment in the etching chamber, wherein the etching chamber is free of wafers |
| 04/23/2002 | US6374831 Reactive plasma cleaning process using a plasma formed in an astron fluorine source generator from a flow of pure inert-source gas. after formation of the plasma, a flow of a fluorine source gas is introduced to form radicals |
| 04/23/2002 | US6374770 Apparatus for improving film stability of halogen-doped silicon oxide films |
| 04/23/2002 | US6374748 Tracking cart system |
| 04/23/2002 | US6374733 Method of manufacturing ceramic substrate |
| 04/23/2002 | US6374635 Bring cooling traps to a cryogenic temperature with a low-capacity refrigerator; recover a high-purity pfc gas by applying deep freeze separation without the need for a multistage fractionator. |
| 04/23/2002 | US6374512 Method for reducing contamination of a substrate in a substrate processing system |
| 04/23/2002 | US6374508 Apparatus and method for aligning a substrate on a support member |
| 04/23/2002 | US6374491 Method and apparatus for producing high efficiency heat sinks |
| 04/18/2002 | WO2002031979A1 Digitally controlled impedance for i/o of an integrated circuit device |
| 04/18/2002 | WO2002031893A1 Epitaxial oxide films via nitride conversion |
| 04/18/2002 | WO2002031886A1 Monolithically integrated e/d mode hemt and method for fabricating the same |
| 04/18/2002 | WO2002031883A2 Protection diode for improved ruggedness of a radio frequency power transistor and self-defining method to manufacture such protection diode |
| 04/18/2002 | WO2002031882A1 An optoelectronic device |
| 04/18/2002 | WO2002031881A1 Electronic unit and process for the production thereof |
| 04/18/2002 | WO2002031880A2 Trench dmos transistor with embedded trench schottky rectifier |
| 04/18/2002 | WO2002031879A2 Select transistor architecture for a virtual ground non-volatile memory cell array |
| 04/18/2002 | WO2002031878A2 Trench capacitor dram process with protected top oxide during sti etch |
| 04/18/2002 | WO2002031877A1 Specimen analyzing method |
| 04/18/2002 | WO2002031876A1 Semiconductor device and production method therefor |
| 04/18/2002 | WO2002031875A2 Dielectric interface films and methods therefor |
| 04/18/2002 | WO2002031874A1 Abrasive cloth, polishing device and method for manufacturing semiconductor device |
| 04/18/2002 | WO2002031873A1 Integration of cvd tantalum oxide with titanium nitride and tantalum nitride to form mim capacitors |
| 04/18/2002 | WO2002031872A1 Semiconductor amorphous layer formed with energy beam |
| 04/18/2002 | WO2002031871A1 Method and apparatus for producing polysilicon film, semiconductor device, and method of manufacture thereof |
| 04/18/2002 | WO2002031870A1 Projection optical system, aligner comprising the projection optical system, and method for manufacturing apparartus comprising the aligner |
| 04/18/2002 | WO2002031869A2 Method and apparatus for processing thin metal layers |
| 04/18/2002 | WO2002031868A1 Stacked wafer alignment method |
| 04/18/2002 | WO2002031867A2 Electronic structure having in-situ resistors |
| 04/18/2002 | WO2002031866A2 Infrared end-point system for cmp |
| 04/18/2002 | WO2002031865A1 Method of making an electrode |
| 04/18/2002 | WO2002031864A1 Monolithic lead-salt infrared detectors |
| 04/18/2002 | WO2002031862A2 Device for fast and uniform heating of a substrate with infrared radiation |
| 04/18/2002 | WO2002031861A2 Substrate processing in an immersion, scrub and dry system |
| 04/18/2002 | WO2002031859A2 Stepped upper electrode for plasma processing uniformity |