| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/23/2002 | US20020061716 Workpiece carrier with adjustable pressure zones and barriers |
| 05/23/2002 | US20020061715 Modified plating solution for plating and planarization and process utilizing same |
| 05/23/2002 | US20020061714 Semiconductor processing methods of removing conductive material |
| 05/23/2002 | US20020061668 Probe card and method of fabricating same |
| 05/23/2002 | US20020061665 Method and apparatus for vertically stacking and interconnecting ball grid array (BGA) electronic circuit devices |
| 05/23/2002 | US20020061661 Semiconductor device manufacturing method, heat treatment apparatus, and heat treatment method |
| 05/23/2002 | US20020061660 SOI annealing method and SOI manufacturing method |
| 05/23/2002 | US20020061659 Setting pressure of reactive gases containing ammonia and silane or silicon fluorides or trifluorosilane in a reaction chamber; forming a silicon nitride film on the surface of a pattern |
| 05/23/2002 | US20020061658 Method of forming a semiconductor structure |
| 05/23/2002 | US20020061657 Method of manufacturing semiconductor device |
| 05/23/2002 | US20020061656 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 05/23/2002 | US20020061655 Method for fabricating a III nitride film |
| 05/23/2002 | US20020061654 Etching method, semiconductor and fabricating method for the same |
| 05/23/2002 | US20020061653 Method for processing substrates |
| 05/23/2002 | US20020061652 Semiconductor integrated circuit device and method for fabricating the same |
| 05/23/2002 | US20020061651 Polishing agent, method of producing same, and method of polishing |
| 05/23/2002 | US20020061650 Metallization process for manufacturing semiconductor devices and system used in same |
| 05/23/2002 | US20020061649 Holding substrate having resist mask formed through an insulating film in chamber of ashing apparatus; applying radio frequency electric power to activate oxygen-containing gas introduced in chamber to perform ashing of resist mask |
| 05/23/2002 | US20020061648 Selecting materials for forming substrate and epitaxial material; epitaxial layer is kept under compressive stress if lattice constant is greater that substrate, if lattice constant is less, it is subjected to tensile stress |
| 05/23/2002 | US20020061647 Method for manufacturing a semiconductor device including treatment of substrate and apparatus for treatment of substrate |
| 05/23/2002 | US20020061646 Embedded metal nanocrystals |
| 05/23/2002 | US20020061645 Dual damascene interconnect |
| 05/23/2002 | US20020061644 Method of manufacturing an amorphized barrier layer for integrated circuit interconnects |
| 05/23/2002 | US20020061643 Forming a first dielectric layer in the opening, the opening having an aspect ratio greater than about two, and forming a second dielectric surface having a top surface that is not within the opening |
| 05/23/2002 | US20020061642 Forming resin layer having a sealing function on face with electrodes of semiconductor wafer which has plurality of semiconductor elements mounted thereon; grinding and thinning back face of semiconductor wafer |
| 05/23/2002 | US20020061641 Bump forming method, semiconductor device and method of manufacturing the same, circuit board, and electronic instrument |
| 05/23/2002 | US20020061640 Method of manufacturing passivation layer |
| 05/23/2002 | US20020061639 Semiconductor device and method for manufacturing the same |
| 05/23/2002 | US20020061637 Graded/stepped silicide process to improve mos transistor |
| 05/23/2002 | US20020061636 Method and structure for retarding high temperature agglomeration of silicides using alloys |
| 05/23/2002 | US20020061635 For use in polishing semiconductor device |
| 05/23/2002 | US20020061634 Method for manufacturing a semiconductor thin film |
| 05/23/2002 | US20020061633 Depositing a first component of film on a substrate at a first temperature; depositing a second component of film on substrate at a second temperature higher than first temperature; anealing to form strontium ruthenite |
| 05/23/2002 | US20020061631 SOI substrate annealing method and SOI substrate |
| 05/23/2002 | US20020061630 Methods for fabricating integrated circuit devices using antiparallel diodes to reduce damage during plasma processing |
| 05/23/2002 | US20020061629 Method of manufacturing multilayered ceramic substrate and green ceramic laminate |
| 05/23/2002 | US20020061628 Method for independent control of polycrystalline silicon-germanium in an HBT |
| 05/23/2002 | US20020061627 Method of producing a SI-GE base heterojunction bipolar device |
| 05/23/2002 | US20020061626 Forming a dielectric layer over semiconductor substrate, the dielectric dielectric layer comprising dopant; heating to to allow dopant atoms of first and second type to enter semiconductor region with a shape and local dopant |
| 05/23/2002 | US20020061625 Method of manufacturing a metal oxide semiconductor device |
| 05/23/2002 | US20020061624 Transistor and method of making the same |
| 05/23/2002 | US20020061623 Semiconductor trench device with enhanced gate oxide integrity structure |
| 05/23/2002 | US20020061622 Forming insulating film on the semiconductor substrate; forming a plug in the insulating film, forming lower electrode, forming tantalum oxide film and oxidizing; forming upper electrode and insulating film |
| 05/23/2002 | US20020061621 Trench etch with incremental oxygen flow |
| 05/23/2002 | US20020061620 Semiconductor device and method of manufacturing the same |
| 05/23/2002 | US20020061619 Semiconductor devices and methods for manufacturing semiconductor devices |
| 05/23/2002 | US20020061618 Method of producing a Si-Ge base heterojunction bipolar device |
| 05/23/2002 | US20020061617 Fabrication method of a dual-gate cmosfet |
| 05/23/2002 | US20020061616 Method for fabricating semiconductor device |
| 05/23/2002 | US20020061615 Process for manufacturing a semiconductor wafer, a semiconductor wafer, process for manufacturing a semiconductor integrated circuit device, and semiconductor integrated circuit device |
| 05/23/2002 | US20020061614 Method for producing circuit structures on a semiconductor substrate and semiconductor configuration with functional circuit structures and dummy circuit structures |
| 05/23/2002 | US20020061612 Exposing substrate to adherent material to form initiation layer; reacting with reactive materials |
| 05/23/2002 | US20020061611 Method of manufacturing a flat panel display |
| 05/23/2002 | US20020061610 Forming gate and a source/drain region on a semiconductor substrate, forming etch stop layer and a dielectric layers; etching; forming a salicide layer on exposed gates and exposed source/drain region in logic circuit region |
| 05/23/2002 | US20020061608 Semiconductor device and a method of manufacturing the same and designing the same |
| 05/23/2002 | US20020061606 Semiconductor wafer, semiconductor chip, semiconductor device and method for manufacturing semiconductor device |
| 05/23/2002 | US20020061605 Apparatus that is able to shorten the time required for purging treatment after performing maintenance |
| 05/23/2002 | US20020061604 Implanting oxygen into one of a ferroelectric, metal oxide-containing layer and an auxiliary layer adjoining the ferroelectric, metal oxide-containing layer; heat-treatment |
| 05/23/2002 | US20020061539 Detecting modulators of binding protein activity; obtain test particle, incubate with binding protein, monitor test particles, determine spacial fit in binding protein, monitor activity of binding protein |
| 05/23/2002 | US20020061471 Exposing predetermined pattern through a phase-shift mask while moving at least one of said phase-shift mask and substrate by a constant distance along an optical axis |
| 05/23/2002 | US20020061470 Depositing layered photoresist above a substrate, patterning the first lower layer using the patterned first upper layer as a hard mask; depositing a second layered photoresist above the first layer photoresist, patterning |
| 05/23/2002 | US20020061469 Projection apparatus, method of manufacturing the apparatus,method of exposure using the apparatus, and method of manufacturing circuit devices by using the apparatus |
| 05/23/2002 | US20020061466 Adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide solution, suitable for photolithography |
| 05/23/2002 | US20020061465 Polymer, resist composition and patterning process |
| 05/23/2002 | US20020061464 Positive resist composition |
| 05/23/2002 | US20020061462 Negative resist composition |
| 05/23/2002 | US20020061461 Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same |
| 05/23/2002 | US20020061458 Can form a resist pattern mixture including both a dense pattern and an isolation pattern with good shapes and can especially minimize the formation of a back taper shape of an isolation pattern induced by shift of focus |
| 05/23/2002 | US20020061453 Method for forming pattern |
| 05/23/2002 | US20020061452 Phase shift mask blank, phase shift mask, and method for manufacturing the same |
| 05/23/2002 | US20020061421 Spin valve device with spin-dependent, specular electronic reflection |
| 05/23/2002 | US20020061410 Electrical resistance, electrodes |
| 05/23/2002 | US20020061401 Conductive metal particles, conductive composite metal particles and applied products using the same |
| 05/23/2002 | US20020061392 Web process interconnect in electronic assemblies |
| 05/23/2002 | US20020061248 High productivity semiconductor wafer processing system |
| 05/23/2002 | US20020061245 Processing system and device manufacturing method using the same |
| 05/23/2002 | US20020061244 Vacuum processing apparatus and semiconductor manufacturing line using the same |
| 05/23/2002 | US20020061243 Wafer stage chamber |
| 05/23/2002 | US20020061173 Platform and optical module, method of manufacture thereof, and optical transmission device |
| 05/23/2002 | US20020061129 Method and apparatus for correcting inclination of IC on semiconductor wafer |
| 05/23/2002 | US20020060931 Semiconductor memory circuit |
| 05/23/2002 | US20020060930 Semiconductor integrated circuit device |
| 05/23/2002 | US20020060927 Non-volatile read only memory and its manufacturing method |
| 05/23/2002 | US20020060904 Electronic component, circuit device, method for manufacturing the circuit device, and semiconductor device |
| 05/23/2002 | US20020060793 Optical positional displacement measuring apparatus and adjustment method thereof |
| 05/23/2002 | US20020060789 Surface inspection apparatus |
| 05/23/2002 | US20020060750 Single-button remote access to a synthetic channel page of specialized content |
| 05/23/2002 | US20020060600 Reference voltage generation circuit having reduced temperature sensitivity, an output adjusting method, and an electrical power source |
| 05/23/2002 | US20020060595 Semiconductor integrated circuit and clock distribution method thereof |
| 05/23/2002 | US20020060581 Mechanism for connecting test head to handler |
| 05/23/2002 | US20020060580 Probe card |
| 05/23/2002 | US20020060579 Semiconductor device testing method, using a spring-biased transformable conductive member electrode connection |
| 05/23/2002 | US20020060572 Circuit modification method |
| 05/23/2002 | US20020060372 IC chip |
| 05/23/2002 | US20020060370 Die attach curing method for semiconductor device |
| 05/23/2002 | US20020060369 Board-on-chip packages with conductive foil on the chip surface |
| 05/23/2002 | US20020060368 Underfile process |
| 05/23/2002 | US20020060367 Semiconductor apparatus and method for fabricating the same |
| 05/23/2002 | US20020060365 Non-volatile semiconductor memory device and fabrication process thereof |
| 05/23/2002 | US20020060364 Silica zeolite low-k dielectric thin films |