| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/29/2002 | EP1208584A1 Handling device for preparing a wafer stack |
| 05/29/2002 | EP1208583A1 Plasma reactor for treating substrates having large surfaces |
| 05/29/2002 | EP1208521A1 Unitary package identification and dimensioning system employing ladar-based scanning methods |
| 05/29/2002 | EP1208408A1 Antireflective coating material for photoresists |
| 05/29/2002 | EP1208399A2 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices |
| 05/29/2002 | EP1208385A1 Sensor design and process |
| 05/29/2002 | EP1208349A1 Interferometers utilizing polarization preserving optical systems |
| 05/29/2002 | EP1208047A1 Inverted pressure vessel with horizontal through loading |
| 05/29/2002 | EP1127176B1 Device for producing and processing semiconductor substrates |
| 05/29/2002 | EP1109659A4 Method for making smart cards using isotropic thermoset adhesive materials |
| 05/29/2002 | EP1098859A4 Alkaline water-based solution for cleaning metallized microelectronic workpieces and methods of using same |
| 05/29/2002 | EP0996972B1 Method for targeted production on n-type conductive areas in diamond layers by ion implantation |
| 05/29/2002 | EP0956600B1 PREPARATION OF Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) PRECURSOR FILMS BY ELECTRODEPOSITION FOR FABRICATING HIGH EFFICIENCY SOLAR CELLS |
| 05/29/2002 | EP0954890A4 Excimer laser with greater spectral bandwidth and beam stability |
| 05/29/2002 | EP0946890B1 Layer with a porous layer area, an interference filter containing such a layer and a method for the production thereof |
| 05/29/2002 | EP0912995B1 Semiconductor component with low contact resistance to highly doped regions |
| 05/29/2002 | EP0756757B1 Process for fabrication a semiconductor apparatus with crystal defects |
| 05/29/2002 | EP0739228B1 Recycling of wafer cleaning substances |
| 05/29/2002 | EP0698295B1 Method of fabricating an electrically programmable read-only memory |
| 05/29/2002 | EP0683507B1 Manufacture of a display device |
| 05/29/2002 | EP0635890B1 Active matrix substrate and thin film transistor, and method of its manufacture |
| 05/29/2002 | DE19932829C2 Zweistufiges chemisch-mechanisches Polierverfahren Two-stage chemical mechanical polishing method |
| 05/29/2002 | DE10155452A1 Halbleitervorrichtung und Herstellungsverfahren der Halbleitervorrichtung A semiconductor device and manufacturing method of the semiconductor device |
| 05/29/2002 | DE10152913A1 Metallized structure used for an optoelectronic integrated circuit having photo diodes comprises a titanium layer on a preexisting layer, and an aluminum layer on the titanium layer |
| 05/29/2002 | DE10144893A1 Phasenverschiebungsmaskenvorform, Phasenverschiebungsmaske und Verfahren zu ihrer Herstellung Phase shift mask blank, the phase shift mask and process for their preparation |
| 05/29/2002 | DE10144646A1 Phasenverschiebungsmaskenrohling, Photomaskenrohling, und Vorrichtung und Verfahren zum Herstellen von Rohlingen Phase shift mask blank, photomask blank, and apparatus and methods for the manufacture of blanks |
| 05/29/2002 | DE10136280A1 Integrierte Halbleiterschaltung A semiconductor integrated circuit |
| 05/29/2002 | DE10134518A1 Verbessertes Diaphragma für eine chemische mechanische Poliervorrichtung Improved diaphragm for a chemical mechanical polishing apparatus |
| 05/29/2002 | DE10134501A1 Verfahren zum Bilden von Mikromustern eines Halbleiterbauelementes A method of forming micropatterns of a semiconductor device |
| 05/29/2002 | DE10122942A1 Elektrodenformungsverfahren und dafür benutzte Basis zur Formung von Bump-Elektroden Electrodes forming method and used for basis for forming bump electrodes |
| 05/29/2002 | DE10116510A1 Ultradünnfilm-Kapselung Ultra thin film encapsulation |
| 05/29/2002 | DE10065896A1 Electronic component used in flip-chip technology comprises a screen against electromagnetic scattering fields, and a semiconductor chip made from a semiconductor substrate having an active upper side and a passive rear side |
| 05/29/2002 | DE10062494A1 Production of spacer oxide layers on the side walls of field effect transistors comprises forming control electrodes made from polysilicon on a substrate, implanting ions into the side walls of the electrodes |
| 05/29/2002 | DE10058608A1 Leiterstreifenanordnung für ein gemouldetes elektronisches Bauelement und Verfahren zum Moulden Conductor strip assembly for a gemouldetes electronic device and method for Moulden |
| 05/29/2002 | DE10057463A1 Production of a metal line comprises completely covering a substrate with an insulating layer, forming a sacrificial layer, selectively etching to expose the conducting region, forming a metal layer and finely grinding a metal structure |
| 05/29/2002 | DE10057444A1 Production of a capacitor arrangement used for an FeRAM storage device comprises filling exposed intermediate regions of the substrate with an electrically insulating intermediate layer up to the level of an capacitor device |
| 05/29/2002 | DE10056885A1 Halbleiterbauelement mit einer leitfähigen Struktur und Verfahren zu seiner Herstellung A semiconductor device having a conductive structure and process for its preparation |
| 05/29/2002 | DE10056873A1 Field effect transistor for integrated circuit, has gate electrode with middle portion whose cross-sectional area exceeds predefined value obtained by multiplying gate length by gate height |
| 05/29/2002 | DE10056871A1 Feldeffekttransistor mit verbessertem Gatekontakt und Verfahren zur Herstellung desselben Of the same field effect transistor with an improved gate contact and methods for preparing |
| 05/29/2002 | DE10056869A1 Halbleiterbauteil mit einer strahlungsabsorbierenden leitenden Schutzschicht und Verfahren zur Herstellung derselben A semiconductor device comprising a radiation-conducting protective layer and method of manufacturing the same |
| 05/29/2002 | DE10056868A1 Halbleiterbauteil mit verringerter Leitungskapazität und verringertem Übersprechrauschen Semiconductor device with reduced line capacitance and reduced crosstalk noise |
| 05/29/2002 | DE10056830A1 Integrierte magnetoresistive Halbleiterspeicheranordnung Integrated magnetoresistive semiconductor memory device |
| 05/29/2002 | DE10056261A1 Verfahren zur Herstellung eines integrierten Halbleiter-Bauelements A method for manufacturing an integrated semiconductor device |
| 05/29/2002 | DE10056257A1 Sputtering process used for cleaning a substrate e.g. a wafer comprises using a platform made from a conducting metal placed into an outer shell of a vacuum chamber |
| 05/29/2002 | DE10055482A1 Film material made from insulating plastic used as a connecting material between electronic components has metal spikes, opposite lying surfaces |
| 05/29/2002 | DE10055182A1 CVD-Reaktor mit von einem Gasstrom drehgelagerten und -angetriebenen Substrathalter CVD reactor with a rotationally supported by a gas stream and substrate holder -angetriebenen |
| 05/29/2002 | DE10053742A1 Vorrichtung zum Sintern, Abtragen und/oder Beschriften mittels elektromagnetischer gebündelter Strahlung sowie Verfahren zum Betrieb der Vorrichtung Device for sintering, ablating and / or inscribing by means of electromagnetic focused radiation, and methods for operating the apparatus |
| 05/29/2002 | CN2494034Y Means for testing semiconductor package element |
| 05/29/2002 | CN1351762A Improved trench isolation process to deposit a trench fill oxide prior to sidewall liner oxidation growth |
| 05/29/2002 | CN1351761A Fabrication of integrated circuit by selective deposition of procursor liquid |
| 05/29/2002 | CN1351760A Manufacture of dielectric film |
| 05/29/2002 | CN1351759A Differential trench open process |
| 05/29/2002 | CN1351758A Installation for processing wafers |
| 05/29/2002 | CN1351756A Electrostatically focused addressable field emission arraychips (AFEA' s) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy |
| 05/29/2002 | CN1351721A Method for error reduction in lithography |
| 05/29/2002 | CN1351680A Semi-insulating silicon carbide without vandium dumination |
| 05/29/2002 | CN1351677A PECVD of TaN films from tantalum halide precursors |
| 05/29/2002 | CN1351675A Protective gas shield apparatus |
| 05/29/2002 | CN1351531A Method and apparatus for plating and polishing a semiconductor substrate |
| 05/29/2002 | CN1351530A Method and apparatus for deposition on and polishing of a semiconductor surface |
| 05/29/2002 | CN1351529A Beam shaping and projection imaging with solid state UV gaussien beam to form vias |
| 05/29/2002 | CN1351523A Temperature controlled gassication of deionized water for megasonic cleaning of semiconductor wafers |
| 05/29/2002 | CN1351421A Level shift circuit and semiconductor integrated circuits |
| 05/29/2002 | CN1351384A Semiconductor light emitting element and manufacture thereof |
| 05/29/2002 | CN1351382A Self alignment of semiconductor memory array having floating gate memory units with control gate isolating sheets |
| 05/29/2002 | CN1351378A Semiconductor IC system |
| 05/29/2002 | CN1351377A Voltage reverting circuits |
| 05/29/2002 | CN1351376A Semiconductor modules and manufacture thereof |
| 05/29/2002 | CN1351374A Method for forming metal wires in semiconductor device |
| 05/29/2002 | CN1351373A Improved method for structurally binding multiple internal connecting lines with low-K metallic dielectric |
| 05/29/2002 | CN1351372A Pre-burning controller of integrated circuit |
| 05/29/2002 | CN1351371A Film transistor having polycrystal active layer and manufacture thereof |
| 05/29/2002 | CN1351370A Technology for preparing MOS FET with embedded grid |
| 05/29/2002 | CN1351369A Semiconductor device and making method |
| 05/29/2002 | CN1351368A Liquid treating apparatus for disc-like object |
| 05/29/2002 | CN1351325A Liquid crystal display device |
| 05/29/2002 | CN1351263A Nondestructive inspecting method |
| 05/29/2002 | CN1351194A Corrodent for surface texture of silicon material in solar battery |
| 05/29/2002 | CN1350997A Tool for heat treating silicon carbide material |
| 05/29/2002 | CN1085894C Semiconductor device and fabrication method thereof |
| 05/29/2002 | CN1085893C Semiconductor integrated circuit apparatus and making method thereof |
| 05/29/2002 | CN1085892C Microwave integrated circuit passive element structure and method for reducing signal propagation losses |
| 05/29/2002 | CN1085890C Chip-size semiconductor package and fabrication method thereof |
| 05/29/2002 | CN1085889C Compositions for diffusion patterning |
| 05/29/2002 | CN1085887C Process for fabricating semi conductor device |
| 05/29/2002 | CN1085850C Half-tone type phase shift mask and method for fabrication thereof |
| 05/29/2002 | CN1085849C Method for producing optical mask |
| 05/29/2002 | CN1085681C Isolation of novolak resin by low temp. subsurface forced steam distillation |
| 05/28/2002 | US6397119 Semiconductor manufacturing system for simultaneous processing of prescribed number of lots |
| 05/28/2002 | US6396943 Defect inspection method and defect inspection apparatus |
| 05/28/2002 | US6396900 Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application |
| 05/28/2002 | US6396763 DRAM having a reduced chip size |
| 05/28/2002 | US6396756 Integrated circuit memory devices including transmission parts that are adjacent input/output selection parts |
| 05/28/2002 | US6396741 Programming of nonvolatile memory cells |
| 05/28/2002 | US6396737 High density flash memory architecture with columnar substrate coding |
| 05/28/2002 | US6396735 Magnetic memory element, magnetic memory and manufacturing method of magnetic memory |
| 05/28/2002 | US6396732 Semiconductor memory apparatus, semiconductor apparatus, data processing apparatus and computer system |
| 05/28/2002 | US6396727 Integrated circuit having conductive paths of different heights formed from the same layer structure and method for forming the same |
| 05/28/2002 | US6396708 Circuit board frame and method of use thereof for manufacturing semiconductor device |
| 05/28/2002 | US6396679 Single-layer dielectric structure with rounded corners, and circuits including such structures |