| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/28/2002 | US6393716 Method and apparatus for transporting substrates in OLED process |
| 05/28/2002 | US6393696 Method for manufacturing printed circuit board |
| 05/28/2002 | CA2039424C Integrated circuit for analog system |
| 05/23/2002 | WO2002041677A2 Cooling device, method for the production thereof, and device for carrying out this method |
| 05/23/2002 | WO2002041405A1 Semiconductor device with reduced line-to-line capacitance and cross talk noise |
| 05/23/2002 | WO2002041404A2 Trench-gate field-effect transistors and their manufacture |
| 05/23/2002 | WO2002041403A2 Mos low-voltage vertical transistor |
| 05/23/2002 | WO2002041402A2 Discrete and packaged power devices for radio frequency (rf) applications and methods of forming same |
| 05/23/2002 | WO2002041401A1 Semiconductor device and portable electronic apparatus |
| 05/23/2002 | WO2002041399A2 Method for producing an integrated semiconductor component |
| 05/23/2002 | WO2002041397A2 Low profile integrated module interconnects |
| 05/23/2002 | WO2002041393A2 Method of forming shallow trench isolation in silicon |
| 05/23/2002 | WO2002041392A2 Conductor chemical-mechanical polishing in integrated circuit interconnects |
| 05/23/2002 | WO2002041391A2 Amorphized barrier layer for integrated circuit interconnects |
| 05/23/2002 | WO2002041390A1 Device and method for electronic device test |
| 05/23/2002 | WO2002041389A2 A method for monitoring line width of electronic circuit patterns |
| 05/23/2002 | WO2002041388A2 Method of inspecting an anisotropic etch in a microstructure |
| 05/23/2002 | WO2002041387A1 A method for attaching an integrated circuit on a silicon chip to a smart label |
| 05/23/2002 | WO2002041386A1 Method for coating electronic parts |
| 05/23/2002 | WO2002041385A1 Tool for thermo-compression-bonding chips, and chip packaging device having the same |
| 05/23/2002 | WO2002041384A1 Chip mounting device and method of calibrating the device |
| 05/23/2002 | WO2002041383A1 Fet with notched gate and method of manufacturing the same |
| 05/23/2002 | WO2002041382A1 Method for controlling critical dimension in a polycrystalline silicon emitter and related structure |
| 05/23/2002 | WO2002041381A1 Method for producing semiconductor device |
| 05/23/2002 | WO2002041380A1 Wafer shape evaluating method and device and device producing method, wafer and wafer selecting method |
| 05/23/2002 | WO2002041379A1 Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring |
| 05/23/2002 | WO2002041378A2 Semiconductor structure and process for fabricating same |
| 05/23/2002 | WO2002041377A1 Cvd thin film manufacturing apparatus |
| 05/23/2002 | WO2002041376A1 Method for cleaning of processing chamber in semiconductor processing apparatus |
| 05/23/2002 | WO2002041375A1 Method and device for transfer, method and device for exposure, and method of manufacturing device |
| 05/23/2002 | WO2002041374A1 Electron beam exposure system, electron beam correction method, electron beam exposure method, and method of producing semiconductor element |
| 05/23/2002 | WO2002041373A1 Electron beam correction method and electron beam exposure system |
| 05/23/2002 | WO2002041372A1 Electron beam exposure system, electron beam exposure method, and production method for semiconductor element |
| 05/23/2002 | WO2002041371A1 Semiconductor structure having high dielectric constant material |
| 05/23/2002 | WO2002041370A2 Apparatuses and methods for resistively heating a thermal processing system |
| 05/23/2002 | WO2002041369A2 Electropolishing and chemical mechanical planarization |
| 05/23/2002 | WO2002041368A2 Method of forming conductive interconnections wherein a barrier layer is removed by an etching process |
| 05/23/2002 | WO2002041367A2 Self-aligned magnetic clad write line and method thereof |
| 05/23/2002 | WO2002041366A2 Nitrogen implantation using a shadow effect to control gate oxide thickness in sti dram semiconductors |
| 05/23/2002 | WO2002041365A2 Single crystalline oxide on a semiconductor substrate |
| 05/23/2002 | WO2002041362A2 Laser separated die with tapered sidewalls for improved light extraction |
| 05/23/2002 | WO2002041361A2 Method for fabricating interfacial oxide in a transistor and related structure |
| 05/23/2002 | WO2002041355A2 Plasma processing comprising three rotational motions of an article being processed |
| 05/23/2002 | WO2002041339A2 Method for producing ferroelectric capacitors and integrated ferroelectric semiconductor memory arrangement |
| 05/23/2002 | WO2002041321A1 Integrated magnetoresistive semiconductor memory system |
| 05/23/2002 | WO2002041196A1 Digital photolithography system for making smooth diagonal components |
| 05/23/2002 | WO2002041081A1 Method for forming pattern and treating agent for use therein |
| 05/23/2002 | WO2002041080A2 Process for reducing edge roughness in patterned photoresist |
| 05/23/2002 | WO2002041076A2 Photolithographic mask |
| 05/23/2002 | WO2002040987A1 Automated acoustic micro imaging system and method |
| 05/23/2002 | WO2002040741A1 Gas injection device and treatment furnace equipped with same |
| 05/23/2002 | WO2002040740A1 Device for multiple-zone injection of gas in a reactor |
| 05/23/2002 | WO2002040739A1 Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase |
| 05/23/2002 | WO2002040185A1 Method and device for ultrasonic vibration |
| 05/23/2002 | WO2002040145A2 Spheres and method of forming a plurality of spheres |
| 05/23/2002 | WO2002027060A8 Process chamber lid service system |
| 05/23/2002 | WO2002020236A3 A mold |
| 05/23/2002 | WO2002014018A3 Abrasive pad for cmp |
| 05/23/2002 | WO2002013284A3 Memory element and method for production of a memory element |
| 05/23/2002 | WO2002009203A3 Microelectronic piezoelectric structure |
| 05/23/2002 | WO2002009191A3 Non-volatile memory element |
| 05/23/2002 | WO2002009184A3 Capacitively coupled dtmos on soi for multiple devices |
| 05/23/2002 | WO2002009173A3 Method of forming copper interconnect capping layers with improved interface and adhesion |
| 05/23/2002 | WO2002009131A3 Semiconductor element comprising a sequence of layers for converting acoustic or thermal signals and electrical voltage changes into each other and method for producing the same |
| 05/23/2002 | WO2002005326A3 Robotic end effector provided with wafer supporting pads elastically mounted |
| 05/23/2002 | WO2002004961A3 Self-retained spring probe |
| 05/23/2002 | WO2002003454A3 Method for etching dual damascene structures in organosilicate glass |
| 05/23/2002 | WO2002003415A3 Switched uniformity control |
| 05/23/2002 | WO2002001930A3 Electrostatic methods and apparatus for mounting and demounting particles from a surface having an array of tacky and non-tacky areas |
| 05/23/2002 | WO2002001620A3 Two step chemical mechanical polishing process |
| 05/23/2002 | WO2002001611A3 Electrostatic chuck and method of fabricating the same |
| 05/23/2002 | WO2002001607A3 Method of producing trench capacitor buried strap |
| 05/23/2002 | WO2001099173A3 Method of treating a substrate |
| 05/23/2002 | WO2001098556A3 Temperature controlled gas feedthrough |
| 05/23/2002 | WO2001098554A3 Improved lamphead for a rapid thermal processing chamber |
| 05/23/2002 | WO2001097257A3 Dual metal gate transistors for cmos process |
| 05/23/2002 | WO2001096888A3 Difference frequency imaging and spectroscopy to measure dopants using an alternating current scanning tunneling microscope |
| 05/23/2002 | WO2001095381A3 Post chemical-mechanical planarization (cmp) cleaning composition |
| 05/23/2002 | WO2001091969A3 Polishing methods and apparatus for semiconductor and integrated circuit manufacture |
| 05/23/2002 | WO2001091186A3 Semiconductor multilayer system and a method for producing a semiconductor multilayer system with increased resistance to thermal processing |
| 05/23/2002 | WO2001088991A3 Polysilicon sidewall with silicide formation to produce high performance mosfets |
| 05/23/2002 | WO2001088985A3 Uniform bitline strapping of a non-volatile memory cell |
| 05/23/2002 | WO2001085391A3 Method and apparatus for agitation of workpiece in high pressure environment |
| 05/23/2002 | WO2001084624A3 Semiconductor lift pin for dechucking substrates |
| 05/23/2002 | WO2001084601A3 Implantation process using sub-stoichiometric, oxygen doses at different energies |
| 05/23/2002 | WO2001084561A3 Tunable devices incorporating bicu3ti3feo¿12? |
| 05/23/2002 | WO2001080287A3 Process for fabricating thin film transistors |
| 05/23/2002 | WO2001075188A3 Method of and apparatus for gas injection |
| 05/23/2002 | WO2001073525A3 Method and apparatus for purchasing product over an interactive television network |
| 05/23/2002 | WO2001055767A3 Microlithographic reduction projection catadioptric objective |
| 05/23/2002 | WO2001046498A3 Chemical vapor deposition reactor and process chamber for said reactor |
| 05/23/2002 | WO2001041183A8 Dose monitor for plasma doping system |
| 05/23/2002 | US20020062465 LSI device failure analysis apparatus and analysis method thereof |
| 05/23/2002 | US20020062430 Memory configuration with a central connection area |
| 05/23/2002 | US20020062206 Method and apparatus for fast aerial image simulation |
| 05/23/2002 | US20020062166 Vacuum processing apparatus and semiconductor manufacturing line using the same |
| 05/23/2002 | US20020062165 Vacuum processing apparatus and semiconductor manufacturing line using the same |
| 05/23/2002 | US20020062162 User configurable multivariate time series reduction tool control method |
| 05/23/2002 | US20020062037 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor |
| 05/23/2002 | US20020061718 Method and system for reducing photo-assisted corrosion in wafers during cleaning processes |