| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/21/2002 | US6391116 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
| 05/21/2002 | US6391114 Vacuum processing apparatus |
| 05/21/2002 | US6391113 Semiconductor wafer processing apparatus and method of controlling the same |
| 05/21/2002 | US6391112 Heat-exchanging workholder for a vacuum unit |
| 05/21/2002 | US6391111 Coating apparatus |
| 05/21/2002 | US6391067 Baths for processing wafers, holding, driving and contacting with rotation |
| 05/21/2002 | US6390908 Determining when to replace a retaining ring used in substrate polishing operations |
| 05/21/2002 | US6390905 Workpiece carrier with adjustable pressure zones and barriers |
| 05/21/2002 | US6390904 Retainers and non-abrasive liners used in chemical mechanical polishing |
| 05/21/2002 | US6390903 Precise polishing apparatus and method |
| 05/21/2002 | US6390897 Cleaning station integral with polishing machine for semiconductor wafers |
| 05/21/2002 | US6390896 Method and device for cutting a multiplicity of disks from a hard brittle workpiece |
| 05/21/2002 | US6390895 Wetting abrasive; prepolishing |
| 05/21/2002 | US6390853 Laser wire bonding for wire embedded dielectrics to integrated circuits |
| 05/21/2002 | US6390811 High-temperature and high-pressure treatment device |
| 05/21/2002 | US6390767 Positioning assembly |
| 05/21/2002 | US6390755 Exhaust device for use in a clean room, cleanroom, and method |
| 05/21/2002 | US6390754 Wafer processing apparatus, method of operating the same and wafer detecting system |
| 05/21/2002 | US6390753 System for loading, processing and unloading substrates arranged on a carrier |
| 05/21/2002 | US6390677 Fluid bearings and vacuum chucks and methods for producing same |
| 05/21/2002 | US6390448 Single shaft dual cradle vacuum slot valve |
| 05/21/2002 | US6390394 Nozzle and adjust module |
| 05/21/2002 | US6390356 Method of forming cylindrical bumps on a substrate for integrated circuits |
| 05/21/2002 | US6390351 Apparatus and method of transferring conductive balls and apparatus and method of supplying conductive balls |
| 05/21/2002 | US6390271 Leadframe transport and method therefor |
| 05/21/2002 | US6390182 Heat sink assembly |
| 05/21/2002 | US6390145 Container and method for sealing the container |
| 05/21/2002 | US6390111 Collapsible structures |
| 05/21/2002 | US6390020 Dual face shower head magnetron, plasma generating apparatus and method of coating substrate |
| 05/21/2002 | US6390019 Chamber having improved process monitoring window |
| 05/21/2002 | US6390018 Microwave plasma treatment apparatus |
| 05/21/2002 | US6389829 Temperature control system |
| 05/21/2002 | US6389708 Tab and slot design optimized for blind alignment of components |
| 05/21/2002 | US6389707 Wafer container having electrically conductive kinematic coupling groove to detect the presence of the wafer container on a support surface, the support surface, and method |
| 05/21/2002 | US6389706 Wafer container having electrically conductive kinematic coupling groove, support surface with electrically conductive kinematic coupling pin, transportation system, and method |
| 05/21/2002 | US6389702 Method and apparatus for motion control |
| 05/21/2002 | US6389691 Methods for forming integrated redistribution routing conductors and solder bumps |
| 05/21/2002 | US6389689 Method of fabricating semiconductor package |
| 05/21/2002 | US6389688 Method and apparatus for chip placement |
| 05/21/2002 | US6389687 Method of fabricating image sensor packages in an array |
| 05/21/2002 | US6389680 Method of manufacturing electronic component |
| 05/21/2002 | US6389677 Perimeter wafer lifting |
| 05/21/2002 | CA2363437A1 Equipment for communication system and semiconductor integrated circuit device |
| 05/21/2002 | CA2037490C Wet-etch process and composition |
| 05/16/2002 | WO2002039797A1 A dielectric spacing layer |
| 05/16/2002 | WO2002039796A1 Definable integrated passives for circuitry |
| 05/16/2002 | WO2002039583A1 Electronic device, semiconductor device comprising such a device and method of manufacturing such a device |
| 05/16/2002 | WO2002039507A1 Semiconductor device and method for fabricating the same |
| 05/16/2002 | WO2002039502A1 Nonvolatile semiconductor storage device and production method therefor |
| 05/16/2002 | WO2002039501A2 Method for producing trench capacitors |
| 05/16/2002 | WO2002039500A2 Use of a barrier sputter reactor to remove an underlying barrier layer |
| 05/16/2002 | WO2002039499A1 Method of transferring processed body and processing system for processed body |
| 05/16/2002 | WO2002039498A2 Methods and systems for positioning substrates |
| 05/16/2002 | WO2002039496A1 Method for manufacturing annealed wafer and annealed wafer |
| 05/16/2002 | WO2002039495A1 Plasma processing device and method of assembling the plasma processing device |
| 05/16/2002 | WO2002039494A1 Dry etching gas and method for dry etching |
| 05/16/2002 | WO2002039493A1 Plasma processing device and exhaust ring |
| 05/16/2002 | WO2002039492A1 Method for producing trench capacitors for large-scale integrated semiconductor memories |
| 05/16/2002 | WO2002039490A2 A power distribution printed circuit board for a semiconductor processing system |
| 05/16/2002 | WO2002039489A2 Method for removing etch residue resulting from a process for forming a via |
| 05/16/2002 | WO2002039488A2 Method for producing an integrated circuit |
| 05/16/2002 | WO2002039485A2 Platen for retaining polishing material |
| 05/16/2002 | WO2002039483A2 Single metal programmability in a customizable integrated circuit device |
| 05/16/2002 | WO2002039481A2 Device for detecting three-dimensional electromagnetic radiation and method for making same |
| 05/16/2002 | WO2002039480A2 Ion beam deposition targets having a replaceable insert |
| 05/16/2002 | WO2002039463A2 Methods and system for attaching substrates using solder structures |
| 05/16/2002 | WO2002039455A2 Mram arrangement with selection transistors of large channel width |
| 05/16/2002 | WO2002039454A2 Magnetoresistive memory (mram) |
| 05/16/2002 | WO2002039188A1 Method for exposing a semiconductor wafer |
| 05/16/2002 | WO2002039186A2 Photoacid generators in photoresist compositions for microlithography |
| 05/16/2002 | WO2002039185A1 Optical recording materials |
| 05/16/2002 | WO2002039184A1 Optical recording materials |
| 05/16/2002 | WO2002039183A1 Optical recording materials |
| 05/16/2002 | WO2002039182A1 Systems and methods for exposing substrate periphery |
| 05/16/2002 | WO2002039131A2 Method for locating defects and measuring resistance in a test structure |
| 05/16/2002 | WO2002039099A2 Measurement of surface defects |
| 05/16/2002 | WO2002039066A1 Position measuring device and method for determining a position |
| 05/16/2002 | WO2002038841A2 Atomic layer doping apparatus and method |
| 05/16/2002 | WO2002038840A1 Method and device for controlling the surface temperatures of substrates in a chemical vapour deposition reactor |
| 05/16/2002 | WO2002038839A1 Cvd reactor comprising a substrate holder rotatably mounted and driven by a gas flow |
| 05/16/2002 | WO2002038838A1 Cvd reactor with graphite-foam insulated, tubular susceptor |
| 05/16/2002 | WO2002038386A1 A process and an apparatus for the formation of patterns in films using temperature gradients |
| 05/16/2002 | WO2002038335A1 Methods, apparatus and slurries for chemical mechanical planarization |
| 05/16/2002 | WO2002025665A3 Non-volatile passive matrix and method for readout of the same |
| 05/16/2002 | WO2002018100A3 Method and apparatus for measuring a polishing condition |
| 05/16/2002 | WO2002017383A3 Flexure based translation stage |
| 05/16/2002 | WO2002009149A3 Post deposition sputtering |
| 05/16/2002 | WO2002005298A3 Semiconductor inductor and methods for making the same |
| 05/16/2002 | WO2001099183A3 Method and apparatus for a direct buried strap for same level interconnections for semiconductor devices |
| 05/16/2002 | WO2001099163A3 Multiplayer pillar arry capacitor structure for deep -sub-micron cmos |
| 05/16/2002 | WO2001098755A3 Optical inspection method and apparatus with adaptive spatial filter |
| 05/16/2002 | WO2001095369A3 Halo-free non-rectifying contact on chip with halo source/drain diffusion |
| 05/16/2002 | WO2001088997A3 Trench-gate semiconductor device and method of making the same |
| 05/16/2002 | WO2001084591A3 Pulsed rf power delivery for plasma processing |
| 05/16/2002 | WO2001082368A3 Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
| 05/16/2002 | WO2001082361A3 Method of forming an integrated circuit package at a wafer level |
| 05/16/2002 | WO2001082359A3 Method of making a semiconductor device having a recessed insulating layer of varying thickness |
| 05/16/2002 | WO2001079863A3 Method and apparatus for testing signal paths between an integrated circuit wafer and a wafer tester |
| 05/16/2002 | WO2001078119A3 Multilayered capacitor structure with alternately connected concentric lines for deep submicron cmos |
| 05/16/2002 | WO2001078110B1 Low dielectric constant organic dielectrics based on cage-like structures |