Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2002
08/13/2002US6432802 Method for fabricating semiconductor device
08/13/2002US6432801 Gate electrode in a semiconductor device and method for forming thereof
08/13/2002US6432800 Inspection of defects on the circumference of semiconductor wafers
08/13/2002US6432799 Method of manufacturing semiconductor integrated circuit device
08/13/2002US6432798 Extension of shallow trench isolation by ion implantation
08/13/2002US6432797 Simplified method to reduce or eliminate STI oxide divots
08/13/2002US6432795 Method of fabricating a cylindrical capacitor storage node having HSG silicon on inner wall thereof in a semiconductor device
08/13/2002US6432794 Process for fabricating capacitor
08/13/2002US6432793 Reducing current leakage; using sulfur trioxide
08/13/2002US6432792 Substrate and method for manufacturing the same
08/13/2002US6432790 Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device
08/13/2002US6432789 Method of forming a well isolation bipolar transistor
08/13/2002US6432788 Method for fabricating an emitter-base junction for a gallium nitride bipolar transistor
08/13/2002US6432787 Method and apparatus for providing low-GIDL dual workfunction gate doping with borderless diffusion contact
08/13/2002US6432786 Forming a nitrogen-containing gate oxide layer on a silicon substrate, depositing polysilicon layer on gate oxide layer and doping and flourine ion implantation of the polysilicon layer, heat treating so fluorine enters gate oxide layer
08/13/2002US6432785 Method for fabricating ultra short channel PMOSFET with buried source/drain junctions and self-aligned silicide
08/13/2002US6432784 Method of forming L-shaped nitride spacers
08/13/2002US6432783 Method for doping a semiconductor device through a mask
08/13/2002US6432782 8 bit per cell non-volatile semiconductor memory structure utilizing trench technology and dielectric floating gate
08/13/2002US6432781 Inverted MOSFET process
08/13/2002US6432780 Method for suppressing boron penetrating gate dielectric layer by pulsed nitrogen plasma doping
08/13/2002US6432779 Reduction to metal, or hydride thereof
08/13/2002US6432778 Method of forming a system on chip (SOC) with nitride read only memory (NROM)
08/13/2002US6432777 Method for increasing the effective well doping in a MOSFET as the gate length decreases
08/13/2002US6432776 Method of manufacturing semiconductor device
08/13/2002US6432775 Trench DMOS transistor structure having a low resistance path to a drain contact located on an upper surface
08/13/2002US6432774 Method of fabricating memory cell with trench capacitor and vertical transistor
08/13/2002US6432773 Multilayer dielectric; anisotropic etching
08/13/2002US6432772 Method of forming a lower storage node of a capacitor
08/13/2002US6432771 DRAM and MOS transistor manufacturing
08/13/2002US6432770 Semiconductor arrangement having capacitive structure and manufacture thereof
08/13/2002US6432769 Semiconductor integrated circuit device and process for manufacture the same
08/13/2002US6432768 Method of fabricating memory device and logic device on the same chip
08/13/2002US6432767 Method of fabricating semiconductor device
08/13/2002US6432766 Method of fabricating a SRAM device
08/13/2002US6432765 Multilayer; forming oxide, etching
08/13/2002US6432764 Methods of forming resistors
08/13/2002US6432763 Field effect transistor having doped gate with prevention of contamination from the gate during implantation
08/13/2002US6432762 Memory cell for EEPROM devices, and corresponding fabricating process
08/13/2002US6432761 Apparatus and method for independent threshold voltage control of memory cell and select gate in a split-EEPROM
08/13/2002US6432759 Method of forming source and drain regions for CMOS devices
08/13/2002US6432758 Recrystallization method of polysilicon film in thin film transistor
08/13/2002US6432757 Method of manufacturing liquid crystal display panel by poly-crystallizing amorphous silicon film using both a laser and lamp lights
08/13/2002US6432756 Semiconductor device and fabricating method thereof
08/13/2002US6432755 Thin film transistor and manufacturing method therefor
08/13/2002US6432754 Double SOI device with recess etch and epitaxy
08/13/2002US6432752 Stereolithographic methods for fabricating hermetic semiconductor device packages and semiconductor devices including stereolithographically fabricated hermetic packages
08/13/2002US6432751 Overcoatings; plasma sputtering, curing
08/13/2002US6432749 Method of fabricating flip chip IC packages with heat spreaders in strip format
08/13/2002US6432748 Substrate structure for semiconductor package and manufacturing method thereof
08/13/2002US6432747 Repair method for broken or missing microcircuit package terminal lead
08/13/2002US6432744 Wafer-scale assembly of chip-size packages
08/13/2002US6432743 Method of manufacturing semiconductor device
08/13/2002US6432739 Method for generating electrical conducting or semiconducting structures in two or three dimensions, a method for erasing the same structures and an electric field generator/modulator for use with the method for generating
08/13/2002US6432738 Single-layer-electrode type two-phase charge coupled device having smooth charge transfer
08/13/2002US6432737 Method for forming a flip chip pressure sensor die package
08/13/2002US6432734 Method of manufacturing a display unit of a flat display panel having a wide viewing angle
08/13/2002US6432730 Plasma processing method and apparatus
08/13/2002US6432729 Method for characterization of microelectronic feature quality
08/13/2002US6432728 Method for integration optimization by chemical mechanical planarization end-pointing technique
08/13/2002US6432727 Method for eliminating a static electricity on a semiconductor wafer
08/13/2002US6432725 Methods for crystallizing metallic oxide dielectric films at low temperature
08/13/2002US6432724 Buried ground plane for high performance system modules
08/13/2002US6432622 Mixture of acetone, butyrolactone and ester
08/13/2002US6432621 Developer is reaction product of base and phenolic carboxylic compound
08/13/2002US6432620 Exposure, development, discharging development solution
08/13/2002US6432619 Forming photosensitive mask; simplification
08/13/2002US6432618 Forming, etching, stripping cycles
08/13/2002US6432594 Charged particle beam microlithography
08/13/2002US6432546 Microelectronic piezoelectric structure and method of forming the same
08/13/2002US6432540 Flame retardant molding compositions
08/13/2002US6432521 Forming at low temperature
08/13/2002US6432511 Thermoplastic adhesive preform for heat sink attachment
08/13/2002US6432494 Protective coating by high rate arc plasma deposition
08/13/2002US6432493 Method of carrying out plasma-enhanced chemical vapor deposition
08/13/2002US6432479 Method for in-situ, post deposition surface passivation of a chemical vapor deposited film
08/13/2002US6432473 High dielectric; controlling particle size
08/13/2002US6432353 Method for producing oxide type ceramic sintered body
08/13/2002US6432318 Dielectric etch process reducing striations and maintaining critical dimensions
08/13/2002US6432317 Method to produce masking
08/13/2002US6432291 Simultaneous electroplating of both sides of a dual-sided substrate
08/13/2002US6432282 Method and apparatus for supplying electricity uniformly to a workpiece
08/13/2002US6432261 Plasma etching system
08/13/2002US6432260 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof
08/13/2002US6432259 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
08/13/2002US6432257 Dresser for polishing cloth and method for manufacturing such dresser and polishing apparatus
08/13/2002US6432255 Method and apparatus for enhancing chamber cleaning
08/13/2002US6432253 Cover with adhesive preform and method for applying same
08/13/2002US6432239 Method of producing ceramic multilayer substrate
08/13/2002US6432218 Multistage flowing of cleaning solutions for valves
08/13/2002US6432214 Cleaning apparatus
08/13/2002US6432212 Scrubbing films and substrates with water for cleaning for semiconductors
08/13/2002US6432209 Mixture of hydroxylamine partially neutralized with a weak carboxylic acid and an organic solvent such as an alkyl sulfoxide, pyrrolidinone or a sulfone removes photoresist with reduced metal corrosion
08/13/2002US6432208 Plasma processing apparatus
08/13/2002US6432207 Method and structure for baking a wafer
08/13/2002US6432205 Gas feeding system for chemical vapor deposition reactor and method of controlling the same
08/13/2002US6432204 Temperature and humidity controlled processing system
08/13/2002US6432203 Heated and cooled vacuum chamber shield
08/13/2002US6432199 Apparatus and method for processing a substrate
08/13/2002US6432198 Method for growing a semiconductor crystal from a semiconductor melt