Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2002
08/15/2002US20020109133 Semiconductor chip and semiconductor device using the same, and method of fabricating semiconductor chip
08/15/2002US20020109122 Clean aqueous planarizing solution consists of an etchant selected from oxalic acid, ascorbic acid and phosphoric acid and a buffer
08/15/2002US20020109110 Laser scanning wafer inspection using nonlinear optical phenomena
08/15/2002US20020109108 Illumination apparatus and projection exposure apparatus using the same
08/15/2002US20020109106 Hybrid scanning system and methods for ion implantation
08/15/2002US20020109105 Method of ion implantation
08/15/2002US20020109103 Lithographic apparatus, method of manufacturing a device, and device manufactured thereby
08/15/2002US20020109099 Apparatus for magnetically scanning and/or switching a charged-particle beam
08/15/2002US20020109074 Semiconductor device, optoelectronic board, and production methods therefor
08/15/2002US20020109000 Methods and systems for positioning substrates using spring force of phase-changeable bumps therebetween
08/15/2002US20020108940 Circuit and method for heating an adhesive to package or rework a semiconductor die
08/15/2002US20020108933 Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
08/15/2002US20020108930 Apparatus for removing native oxide layers from silicon wafers
08/15/2002US20020108929 Use of ammonia for etching organic low-k dielectrics
08/15/2002US20020108927 Method of fabricating ferroelectric memory transistors
08/15/2002US20020108899 Ion processing element with composite media
08/15/2002US20020108893 Apparatus and method for determining various processes of wafer fabrication
08/15/2002US20020108862 Electroplating apparatus with vertical electrical contact
08/15/2002US20020108861 Platen of conductive material is disposed proximate to the polishing pad and is configured to have a negative charge during planarization process; demetallization of a workpiece surface such as semiconductor
08/15/2002US20020108851 Methods and apparatus for processing the surface of a microelectronic workpiece
08/15/2002US20020108850 Cup-type plating apparatus
08/15/2002US20020108847 Non-thermionic sputter material transport device, methods of use, and materials produced thereby
08/15/2002US20020108842 Integrated transport carrier and conveyor system
08/15/2002US20020108781 Printed wiring board and production thereof
08/15/2002US20020108769 Plastic integrated circuit package and method and lead frame for making the package
08/15/2002US20020108714 Processing chamber for atomic layer deposition processes
08/15/2002US20020108712 Apparatus for plasma processing
08/15/2002US20020108711 Gas distribution apparatus of semiconductor equipment
08/15/2002US20020108710 Processing method for substrate
08/15/2002US20020108707 Bonding method and apparatus
08/15/2002US20020108643 Sulfuric acid recycle apparatus
08/15/2002US20020108642 Substrate processing unit
08/15/2002US20020108641 Single type of semiconductor wafer cleaning apparatus and method of using the same
08/15/2002US20020108632 Method of reducing defects in anti-reflective coatings and semiconductor structures fabricated thereby
08/15/2002US20020108574 Method of holding substrate and substrate holding system
08/15/2002US20020108571 Heated and cooled vacuum chamber shield
08/15/2002US20020108570 Method and apparatus of growing a thin film onto a substrate
08/15/2002US20020108565 Apparatus and method for selectively restricting process fluid flow in semiconductor processing
08/15/2002US20020108559 Liquid phase growth methods and liquid phase growth apparatus
08/15/2002US20020108267 Method and apparatus for transporting substrates in oled process
08/15/2002US20020108238 Semiconductor device mounting jig
08/15/2002US20020108232 Fixture, carrier ring, and method for processing delicate workpieces
08/15/2002CA2437322A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
08/15/2002CA2433076A1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography
08/14/2002EP1231820A1 Ceramic heater
08/14/2002EP1231685A2 Semiconductor laser and method of manufacturing the same
08/14/2002EP1231649A2 Solar cell and method of manufacturing same
08/14/2002EP1231646A2 Semiconductor memory capable of being driven at low voltage and its manufacture method
08/14/2002EP1231645A2 Thin film SOI semiconductor device
08/14/2002EP1231643A2 MOS field-effect transistor comprising Si and SiGe layers or Si and SiGeC layers as channel regions
08/14/2002EP1231640A1 Semiconductor device
08/14/2002EP1231636A2 Semiconductor device, production method therefor, and electrophotographic apparatus
08/14/2002EP1231633A1 Material of heat-dissipating plate on which semiconductor is mounted, method for fabricating the same, and ceramic package produced by using the same
08/14/2002EP1231631A2 MFMOS/MFMS non-volatile memory transistors and method of making same
08/14/2002EP1231630A2 Method of fabricating ferroelectric memory transistors
08/14/2002EP1231629A1 A method of forming metal connection elements in integrated circuits
08/14/2002EP1231628A1 Method for roughening a surface of a semioconductor substrate
08/14/2002EP1231627A2 Marking apparatus and process therefor
08/14/2002EP1231626A1 Measurement arrangement
08/14/2002EP1231617A1 Out-of-plane micro-device structures
08/14/2002EP1231616A1 Out-of-plane micro-device structures
08/14/2002EP1231615A1 Integrated inductor structure
08/14/2002EP1231607A2 Nonvolatile magnetic storage device
08/14/2002EP1231551A2 Process of simulating defects, which may appear during the semiconductor manufacturing process, as well as associated components
08/14/2002EP1231528A2 Circuit configuration for the generation of a reference voltage
08/14/2002EP1231524A2 Adaptive plasma characterization system
08/14/2002EP1231516A2 Method of forming and adjusting optical system and exposure apparatus, and for determining specification thereof and related computer system
08/14/2002EP1231514A1 Measurement of wavefront aberrations in a lithographic projection apparatus
08/14/2002EP1231513A1 Lithographic projection apparatus with adjustable focal surface
08/14/2002EP1231512A1 Composition for anti-reflective coating and method for manufacturing semiconductor device
08/14/2002EP1231301A1 Epitaxial silicon wafer
08/14/2002EP1231300A1 Plating method and device, and plating system
08/14/2002EP1231248A1 Conductive and resistive materials with electrical stability for use in electronics devices
08/14/2002EP1231242A1 Curable organosiloxane compositions and semiconductor devices
08/14/2002EP1230828A1 Method for obtaining an extreme ultraviolet radiation source and its use in lithography
08/14/2002EP1230752A1 Virtual laser operator
08/14/2002EP1230711A1 Arrangement for electrically connecting chips in a circuit that is embodied in a three-dimensional manner
08/14/2002EP1230684A1 Semiconductor component and method for the production thereof
08/14/2002EP1230682A2 Bandgap reference circuit and related method
08/14/2002EP1230680A2 Method for integrating a chip in a printed board and integrated circuit
08/14/2002EP1230679A2 Method for producing a support element for an integrated circuit (ic) component
08/14/2002EP1230678A1 Self-aligned metal caps for interlevel metal connections
08/14/2002EP1230677A1 Process for forming shallow isolating regions in an integrated circuit and an integrated circuit thus formed
08/14/2002EP1230676A1 Advanced flip-chip join package
08/14/2002EP1230675A1 Dmos transistor having a trench gate electrode and method of making the same
08/14/2002EP1230674A1 Crosslinked resin and method for making oxides using same
08/14/2002EP1230673A1 Integrated circuit plating using highly-complexed copper plating baths
08/14/2002EP1230672A1 Method for treating a surface of an sic semiconductor layer and schottky contact
08/14/2002EP1230671A2 System and method for providing defect free rapid thermal processing
08/14/2002EP1230670A1 Device and method for cleaning substrates
08/14/2002EP1230668A2 Method and apparatus for producing uniform process rates
08/14/2002EP1230667A2 Method and apparatus for controlling the volume of a plasma
08/14/2002EP1230666A1 Plasma processing systems and method therefor
08/14/2002EP1230665A1 Plasma processing system with dynamic gas distribution control
08/14/2002EP1230664A1 Materials and gas chemistries for processing systems
08/14/2002EP1230663A1 Temperature control system for plasma processing apparatus
08/14/2002EP1230421A1 Method of modifying source chemicals in an ald process
08/14/2002EP1230340A1 Methods and apparatus for the electronic, homogeneous assembly and fabrication of devices
08/14/2002EP1230334A1 Non-corrosive cleaning composition for removing plasma etching residues
08/14/2002EP1230311A1 Deposition of fluorosilsesquioxane films