H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2002
08/22/2002	US20020113271 Semiconductor integrated circuit device and manufacturing method of semiconductor integrated circuit device
08/22/2002	US20020113269 Field transistors for electrostatic discharge protection and methods for fabricating the same
08/22/2002	US20020113268 Nonvolatile memory, semiconductor device and method of manufacturing the same
08/22/2002	US20020113267 Conductive coupling of electrical structures to a semiconductor device located under a buried oxide layer
08/22/2002	US20020113266 Semiconductor devices and methods for manufacturing the same
08/22/2002	US20020113265 Silicon on insulator structure having a low defect density device layer and a process for the preparation thereof
08/22/2002	US20020113264 Thin-film transistor and method of manufacturing the same
08/22/2002	US20020113262 P-channel dynamic flash memory cells with ultrathin tunnel oxides
08/22/2002	US20020113261 Semiconductor device
08/22/2002	US20020113260 Rhodium-rich oxygen barriers
08/22/2002	US20020113257 Semiconductor device
08/22/2002	US20020113256 Semiconductor device and method for manufacturing the same
08/22/2002	US20020113255 MOS transistor and method for producing the transistor
08/22/2002	US20020113254 Semiconductor memory device
08/22/2002	US20020113249 Semiconductor element
08/22/2002	US20020113240 Semiconductor device and method for producing the same
08/22/2002	US20020113239 Semiconductor device with a tapered hole formed using multiple layers with different etching rates
08/22/2002	US20020113237 Semiconductor memory device for increasing access speed thereof
08/22/2002	US20020113236 Thin film transistor and fabrication method thereof
08/22/2002	US20020113234 Method and system for inspecting electronic circuit pattern
08/22/2002	US20020113216 Substrate treatment device using a dielectric barrier discharge lamp
08/22/2002	US20020113208 Process for precise arrangement of micro-bodies
08/22/2002	US20020113205 Atomic beam control apparatus and method
08/22/2002	US20020113131 Smart card module, smart card with the smart card module, and method for producing the smart card module
08/22/2002	US20020113060 Method and apparatus to control temperature in an rtp system
08/22/2002	US20020113056 Substrate temperature control system and method for controlling temperature of substrate
08/22/2002	US20020113039 Integrated semiconductor substrate bevel cleaning apparatus and method
08/22/2002	US20020113038 Replacing a polysilicon, amorphous silicon or tantalum silicide layer in metallization
08/22/2002	US20020113037 Method for removing etching residues
08/22/2002	US20020113035 Method for forming hole pattern
08/22/2002	US20020113034 Methods of fabricating microelectromechanical and microfluidic devices
08/22/2002	US20020113027 Retainer for use in heat treatment of substrate, substrate heat treatment equipment, and method of manufacturing the retainer
08/22/2002	US20020112955 Rejuvenation of refractory metal products
08/22/2002	US20020112952 Object plating method and system
08/22/2002	US20020112881 Substrate of semiconductor package
08/22/2002	US20020112879 Electronic parts mounting board and production method thereof
08/22/2002	US20020112820 Susceptors for semiconductor-producing apparatuses
08/22/2002	US20020112819 Remote plasma generator with sliding short tuner
08/22/2002	US20020112784 Maintains flatness of photomask improving overlay accuracy; blowing gas flow; semiconductors; photolithography
08/22/2002	US20020112758 Pressure vessel systems and methods for dispensing liquid chemical compositions
08/22/2002	US20020112747 Methods for cleaning microelectronic structures with cyclical phase modulation
08/22/2002	US20020112746 Methods for removing particles from microelectronic structures
08/22/2002	US20020112740 For photoresist-coated semiconductor/integrated circuits or an electrooptic device
08/22/2002	US20020112739 Minimal distance between ultraviolet radiator and substrate while irradiating in translational or rotational movement achieves intense and uniform illumination
08/22/2002	US20020112667 Vacuum apparatus of ion implantation system and evacuation method
08/22/2002	US20020112662 System for separating and recovering waste fluid and spin coater
08/22/2002	US20020112632 Method for supporting sensitive workpieces during processing
08/22/2002	US20020112605 Providing sensors constituted of same material as chemical filter and taking measurement of impedance of material constituting sensors, sensors comprising adsorption state detection sensor and reference sensor
08/22/2002	US20020112544 Methods and apparatus for measuring stress of membrane regions of segmented microlithographic mask blanks
08/22/2002	US20020112457 Fluid media particle isolating system
08/22/2002	US20020112371 Method for controlling airflow on a backside of a semiconductor wafer during spin processing
08/22/2002	US20020112370 Method for two dimensional adaptive process control of critical dimensions during spin coating process
08/22/2002	US20020112369 Method of drying substrates
08/22/2002	US20020112368 Substrate cooling system
08/22/2002	US20020112363 Method of transferring a material from first apparatus to second apparatus in the clean room and an assembly line
08/22/2002	US20020112331 Apparatus for fabricating a semiconductor device
08/22/2002	DE10204644A1 Halbleitervorrichtung und Verfahren zu deren Herstellung Semiconductor device and process for their preparation
08/22/2002	DE10203762A1 Non-volatile semiconductor memory device, includes charge storage region on substrate, control gate on charge storage region, and spacer-shaped gate mask on control gate
08/22/2002	DE10200703A1 Verfahren zum Bilden einer Resiststruktur, zum Bilden einer Elektrodenstruktur und zum Herstellen eines akustischen Oberflächenwellenbauelements A method of forming a resist pattern, forming an electrode structure and for producing a surface acoustic wave device
08/22/2002	DE10152911A1 Integrierte Schaltungsvorrichtungen, die aktive Bereiche mit erweiterten effektiven Breiten aufweisen, und Verfahren zur Herstellung derselben Integrated circuit devices having active regions with enhanced effective widths, and processes for making them
08/22/2002	DE10136283A1 Halbleiteranordnung Semiconductor device
08/22/2002	DE10126116A1 Integrierte, abstimmbare Kapazität Integrated tunable capacitance
08/22/2002	DE10106605A1 System zur Beseitigung oder wenigstens Dämpfung von Schwingungen System to eliminate or at least dampen vibrations
08/22/2002	DE10105244A1 Kondensatoranordnung für eine Halbleiterspeichereinrichtung sowie Halbleiterspeichereinrichtung Capacitor arrangement for a semiconductor memory device and semiconductor memory device
08/22/2002	DE10104776A1 Bipolartransistor und Verfahren zu dessen Herstellung Bipolar transistor and method of producing the
08/22/2002	DE10104742A1 Grabenstruktur für eine Halbleiterschaltungsanordnung Grave structure for a semiconductor circuit arrangement
08/22/2002	DE10104613A1 Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung Plasma system and method for generating a functional coating
08/22/2002	DE10104265A1 Verfahren zum Herstellen einer Halbleiterschaltungsanordnung A method for fabricating a semiconductor circuit arrangement
08/22/2002	DE10104052A1 Auflage für Halbleitersubstrate bei Einseiten-Plasma-Prozessen Pad for semiconductor substrates at one-side plasma processes
08/22/2002	DE10104037A1 Substrat für integrierte Halbleiterkomponenten Substrate for integrated semiconductor components,
08/22/2002	DE10103779A1 Verwendung einer Einebnungs-Dielektrikumsschicht zur Verringerung des Einbeulungseffekts, der bei einer chemisch-mechanischen Bearbeitung auftritt, die bei der Herstellung von Isolationsbereichen in Form wenig tiefer Gräben eingesetzt wird Using a planarization dielectric layer for reducing the Einbeulungseffekts which occurs at a chemical-mechanical treatment, which is used little deep trenches in the fabrication of isolation regions in the form of
08/22/2002	DE10103528A1 Ferroelektrischer Kondensator, Verfahren zur Herstellung und Verwendung des Kondensators A ferroelectric capacitor, methods of making and using the capacitor
08/22/2002	DE10103524A1 Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske A method and apparatus for etching of a semiconductor layer of a semiconductor substrate by means of a silicon-containing etching mask
08/22/2002	DE10103340A1 Verfahren zum Wachsen von Kohlenstoff-Nanoröhren oberhalb einer elektrisch zu kontaktierenden Unterlage sowie Bauelement A method for growing carbon nanotubes above a electrically contacting pad and component
08/22/2002	DE10103313A1 MRAM-Anordnung MRAM array
08/22/2002	DE10051380A1 Verfahren zur Herstellung eines Halbleiterbauteils unter Anwendung eines Schrumpfprozesses eines Strukturmerkmals A process for producing a semiconductor device using a shrinking process of a structural feature
08/22/2002	CA2437713A1 Rejuvenation of refractory metal products
08/21/2002	EP1233651A1 Ceramic heater
08/21/2002	EP1233501A2 Linear motor, stage apparatus, exposure apparatus and device manufacturing method
08/21/2002	EP1233492A2 Compound semiconductor device manufacturing method
08/21/2002	EP1233489A2 Dfb semiconductor laser device
08/21/2002	EP1233457A2 Insulated gate semiconductor device and method of manufacturing the same
08/21/2002	EP1233456A2 High voltage/high beta semiconductor devices and methods of fabrication thereof
08/21/2002	EP1233455A2 Non-volatile semiconductor memory cell, method of fabrication and programming
08/21/2002	EP1233454A2 Semiconductor memory device and method of manufacturing the same
08/21/2002	EP1233453A2 Semiconductor integrated circuit having anti-fuse, method of fabricating, and method of writing data in the same
08/21/2002	EP1233452A2 Semiconductor device, method of manufacturing the same and liquid jet apparatus
08/21/2002	EP1233451A2 Integrated radio frequency circuit devices
08/21/2002	EP1233450A1 Semiconductor device and its manufacturing method
08/21/2002	EP1233449A2 A method of fabricating a semiconductor device
08/21/2002	EP1233448A2 Reliable interconnects with low via/contact resistance
08/21/2002	EP1233447A2 Semiconductor device
08/21/2002	EP1233446A2 Thermosetting resin composition and semiconductor device using the same
08/21/2002	EP1233445A2 Process of manufacturing a semiconductor device
08/21/2002	EP1233444A2 Membrane dielectric isolation ic fabrication
08/21/2002	EP1233442A2 Non-contacting conveyance equipment
08/21/2002	EP1233441A1 Arrangement and a method for reducing contamination with particles on a substrate in a process tool
08/21/2002	EP1233305A2 Photolithographic device with multiple reticles
08/21/2002	EP1233304A1 Lithographic apparatus
08/21/2002	EP1233299A1 Monolithically integrated optical component comprising a modulator and a heterojunction bipolar transistor

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