Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2002
11/05/2002US6475825 Process for preparing zinc oxide films containing p-type dopant
11/05/2002US6475822 Method of making microelectronic contact structures
11/05/2002US6475821 Circuit substrate, detector, and method of manufacturing the same
11/05/2002US6475820 Method for growing semiconductor layer and method for fabricating semiconductor light emitting elements
11/05/2002US6475819 Method for formation and production of matrices of high density light emitting diodes
11/05/2002US6475818 Method for fabricating multi-channel array optical device
11/05/2002US6475817 Method of fabricating integrated circuits, providing improved so-called saw bows
11/05/2002US6475816 Method for measuring source and drain junction depth in silicon on insulator technology
11/05/2002US6475815 Method of measuring temperature, method of taking samples for temperature measurement and method for fabricating semiconductor device
11/05/2002US6475814 Method for improved low pressure inductively coupled high density plasma reactor
11/05/2002US6475813 MOCVD and annealing processes for C-axis oriented ferroelectric thin films
11/05/2002US6475812 Method for fabricating cladding layer in top conductor
11/05/2002US6475811 System for and method of using bacteria to aid in contact hole printing
11/05/2002US6475810 Method of manufacturing embedded organic stop layer for dual damascene patterning
11/05/2002US6475707 Wet etching photoresist layer from silicon chip having insulation layer and bottom anti-reflection coating; photolithography; semiconductors
11/05/2002US6475706 Pattern formation method
11/05/2002US6475699 Terpolymer of 1-adamantyl-1-alkylalkyl (meth)acrylate, a norbornene, and maleic anhydride or itaconic anhydride; acid generating agent; sensitivity; resolution
11/05/2002US6475694 Mixture of alkali soluble resin, quinonediazide ester compound and compound which generates an acid upon exposur eto radiation
11/05/2002US6475684 Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the method
11/05/2002US6475682 Photolithography method, photolithography mask blanks, and method of making
11/05/2002US6475646 Electrocleaning, electropolishing, removing inclusions, rinsing, and forming multi-plated layers on the surface of a thin plate
11/05/2002US6475641 Connecting material and connection structure
11/05/2002US6475629 Adhesive film formed of a siloxane-modified polyamideimide resin composition, adhesive sheet and semiconductor device
11/05/2002US6475627 Semiconductor wafer and vapor growth apparatus
11/05/2002US6475606 Ceramic board for apparatuses for semiconductor manufacture and inspection
11/05/2002US6475567 Method of staining semiconductor wafer samples with a semiconductor treatment chemical
11/05/2002US6475564 Deposition of a siloxane containing polymer
11/05/2002US6475555 Process for screening features on an electronic substrate with a low viscosity paste
11/05/2002US6475429 Heat sink substrate consisting essentially of copper and molybdenum and method of manufacturing the same
11/05/2002US6475407 Composition for polishing metal on semiconductor wafer and method of using same
11/05/2002US6475403 Etching method and apparatus
11/05/2002US6475400 Method for controlling the sheet resistance of thin film resistors
11/05/2002US6475398 Semiconductor device incorporating hemispherical solid immersion lens, apparatus and method for manufacturing same
11/05/2002US6475369 Method for electrochemical fabrication
11/05/2002US6475356 Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma
11/05/2002US6475336 Electrostatically clamped edge ring for plasma processing
11/05/2002US6475335 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
11/05/2002US6475334 Dry etching device and dry etching method
11/05/2002US6475323 Method and apparatus for separating composite member using fluid
11/05/2002US6475298 Post-metal etch treatment to prevent corrosion
11/05/2002US6475293 Rotating belt wafer edge cleaning apparatus
11/05/2002US6475286 Seal means for separable closing elements, such as separable elements of chemical vapor deposition chamber and deposition reactor apparatus
11/05/2002US6475285 Deposition apparatus
11/05/2002US6475279 Substrate processing apparatus and substrate processing method
11/05/2002US6475278 Molecular beam source and molecular beam epitaxy apparatus
11/05/2002US6475277 Group III-V nitride semiconductor growth method and vapor phase growth apparatus
11/05/2002US6475276 Production of elemental thin films using a boron-containing reducing agent
11/05/2002US6475072 Method of wafer smoothing for bonding using chemo-mechanical polishing (CMP)
11/05/2002US6475070 Chemical mechanical polishing with a moving polishing sheet
11/05/2002US6475068 Wafer holding plate for wafer grinding apparatus and method for manufacturing the same
11/05/2002US6474987 Wafer holder
11/05/2002US6474986 Hot plate cooling method and heat processing apparatus
11/05/2002US6474712 Gripper for supporting substrate in a vertical orientation
11/05/2002US6474700 Gas panel
11/05/2002US6474562 Gas injector and gas injection direction adjusting method
11/05/2002US6474538 Bonding apparatus and bonding method
11/05/2002US6474532 Apparatus for forming wire bonds from circuitry on a substrate to a semiconductor chip, and methods of forming semiconductor chip assemblies
11/05/2002US6474529 Wire bonding apparatus
11/05/2002US6474477 Carrier assembly for semiconductor IC (integrated circuit) packages
11/05/2002US6474476 Universal carrier tray
11/05/2002US6474474 Sheet support container
11/05/2002US6474350 Cleaning device for probe needle of probe card and washing liquid used therefor
11/05/2002US6474258 Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
11/05/2002US6473996 Load port system for substrate processing system, and method of processing substrate
11/05/2002US6473993 Thermal treatment method and apparatus
11/05/2002US6473989 Conveying system for a vacuum processing apparatus
11/05/2002CA2190077C Suspended microstructures
11/05/2002CA2180807C Integrated circuit chip package and encapsulation process
11/04/2002EP1125003A4 Excess cvd reactant control
10/2002
10/31/2002WO2002087297A1 Electronic apparatus
10/31/2002WO2002087293A2 Support for electrical circuit elements
10/31/2002WO2002087085A1 Power standby circuit of low-threshold mos transistor
10/31/2002WO2002086975A1 Production method for bonded substrates
10/31/2002WO2002086974A1 Semiconductor device
10/31/2002WO2002086973A2 Nanoelectronic devices and circuits
10/31/2002WO2002086970A2 Semiconductor device and method of manufacturing the same
10/31/2002WO2002086967A2 Method for producing metallic bit line contacts
10/31/2002WO2002086966A1 Two-transistor flash cell having vertical access transistor
10/31/2002WO2002086965A1 Contact structure for an integrated semiconductor device
10/31/2002WO2002086964A1 Wiring method and element arranging method using the same, and method of producing image display devices
10/31/2002WO2002086963A1 Method of producing semiconductor integrated circuit device
10/31/2002WO2002086961A1 Electropolishing metal layers on wafers having trenches or vias with dummy structures
10/31/2002WO2002086960A1 Method for the preparation of a silicon wafer having stabilized oxygen precipitates
10/31/2002WO2002086959A2 Post-planarization clean-up
10/31/2002WO2002086958A1 Method and device for the production of process gases
10/31/2002WO2002086957A1 Dry etching method
10/31/2002WO2002086956A1 Method for making a microstructure by surface micromachining
10/31/2002WO2002086955A1 Semiconductor device and method of manufacturing same
10/31/2002WO2002086954A1 Method and system for providing a single-scan, continuous motion sequential lateral solidification
10/31/2002WO2002086953A1 Methods for forming ultrashallow junctions with low sheet resistance
10/31/2002WO2002086952A1 Mixed-signal semiconductor structure
10/31/2002WO2002086951A1 Method and system to achieve thermal transfer between a workpiece and a heated body disposed in a chamber
10/31/2002WO2002086950A1 Method and apparatus for wafer exchange employing stacked robot blades
10/31/2002WO2002086949A2 Transport box for optical masks
10/31/2002WO2002086948A2 Transport cassette for semiconductor substrate masks
10/31/2002WO2002086947A2 A method for making a metal-insulator-metal capacitor using plate-through mask techniques
10/31/2002WO2002086943A1 Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
10/31/2002WO2002086937A1 Dipole ion source
10/31/2002WO2002086932A1 Magnetic mirror plasma source
10/31/2002WO2002086924A1 Method of producing electronic parts, and member for production thereof
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