Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2002
10/31/2002US20020160585 Thin film deposition method
10/31/2002US20020160584 Semiconductor wafer and method for fabicating the same
10/31/2002US20020160582 Hydrolysis and condensation of alkoxysilane; evaporating solvent; coating integrated circuits and semiconductors
10/31/2002US20020160581 Semiconductor device
10/31/2002US20020160580 Method of manufacturing a semiconductor device including forming well comprising epi in trench
10/31/2002US20020160579 Method of manufacturing semiconductor device having shallow trench isolation (STI)
10/31/2002US20020160578 Method for fabricating element isolating film of semiconductor device, and structure of the same
10/31/2002US20020160577 Capacitor for analog circuit, and manufacturing method thereof
10/31/2002US20020160576 Monolithic integrated circuit incorporating an inductive component and process for fabricating such an integrated circuit
10/31/2002US20020160575 High coupling ratio stacked-gate flash memory and the method of making the same
10/31/2002US20020160574 Method of forming a dual-gated semiconductor-on-insulator device
10/31/2002US20020160573 Trench-gate semiconductor devices and their manufacture
10/31/2002US20020160572 High voltage device and method for fabricating the same
10/31/2002US20020160571 High coupling ratio stacked-gate flash memory and the method of making the same
10/31/2002US20020160570 Stacked-gate flash memory and the method of making the same
10/31/2002US20020160569 Method for fabricating capacitor of semiconductor device
10/31/2002US20020160568 Novel dram access transistor
10/31/2002US20020160567 Method for forming storage node contact plug of DRAM (dynamic random access memory)
10/31/2002US20020160566 Semiconductor integrated circuit device and process for manufacturing the same
10/31/2002US20020160565 Capacitor for semiconductor devices and a method of fabricating such capacitors
10/31/2002US20020160564 Semiconductor device having conductive layer within field oxide layer and method for forming the same
10/31/2002US20020160563 Practical air dielectric interconnections by post-processing standard CMOS wafers
10/31/2002US20020160562 Integrated process for high voltage and high performance silicon-on-insulator bipolar devices
10/31/2002US20020160560 Substrate processing apparatus and semiconductor device producing method
10/31/2002US20020160559 Capacitor for semiconductor devices and a method of fabrication
10/31/2002US20020160557 Trench-gate semiconductor devices and their manufacture
10/31/2002US20020160556 Semiconductor device and method for forming the same
10/31/2002US20020160555 Method for manufacturing thin film transistor array panel for liquid crystal display
10/31/2002US20020160554 Method of manufacturing a semiconductor device
10/31/2002US20020160553 Method and apparatus for forming a thin semiconductor film, method and apparatus for producing a semiconductor device, and electro-opitcal apparatus
10/31/2002US20020160552 Terminal land frame and method for manufacturing the same
10/31/2002US20020160550 Semiconductor device including storage nodes of capacitor and method for manufacturing the same
10/31/2002US20020160547 Transistor and associated driving device
10/31/2002US20020160545 Method of fabricating reflection-mode EUV diffusers
10/31/2002US20020160542 FeRAM having BLT ferroelectric layer and method for forming the same
10/31/2002US20020160541 Method for forming minimally spaced MRAM structures
10/31/2002US20020160539 Method of producing Cu (In, Ga) (Se, S) 2 semiconductor film
10/31/2002US20020160320 Process for forming sub-lithographic photoresist features by modification of the photoresist surface
10/31/2002US20020160319 Surface treatment of a semiconductor wafer with hexamethyldisilazane; applying and spreading a photoresist liquid; keeping the temperature of the resist lower than that of the edges to delay solvent evaporation; uniform thickness
10/31/2002US20020160311 Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus
10/31/2002US20020160303 Unsaturated ether containing polymer
10/31/2002US20020160302 Forming relief images
10/31/2002US20020160279 Pattern formation method, mask for exposure used for pattern formation, and method of manufacturing the same
10/31/2002US20020160277 Dividing pattern into zones; drawing
10/31/2002US20020160208 SOI substrate, annealing method therefor, semiconductor device having the SOI substrate, and method of manufacturing the same
10/31/2002US20020160207 Having uniform mesopores, that is applicable to catalyst carrier, adsorbent, light functional material, electron functional material
10/31/2002US20020160185 Circuit tape having adhesive film, semiconductor device, and a method for manufacturing the same
10/31/2002US20020160125 Pulsed plasma processing method and apparatus
10/31/2002US20020160124 Vacuum processing method
10/31/2002US20020160113 Deposition chamber and method for depositing low dielectric constant films
10/31/2002US20020160112 Chemical vapor deposition apparatus and chemical vapor deposition method
10/31/2002US20020160103 Method and apparatus for forming thin film of metal
10/31/2002US20020159924 Fluorine abatement using steam injection in oxidation treatment of semiconductor manufacturing effluent gases
10/31/2002US20020159911 Nickel-titanium sputter target alloy
10/31/2002US20020159879 Plant for processing wafers
10/31/2002US20020159878 Methods and apparatus for retaining a tray stack having a plurality of trays for carrying microelectronic devices
10/31/2002US20020159864 Triple chamber load lock
10/31/2002US20020159626 Detection of an end point of polishing a substrate
10/31/2002US20020159326 Semiconductor integrated circuit device
10/31/2002US20020159316 Semiconductor memory cell and method of fabricating a semiconductor memory cell
10/31/2002US20020159315 Semiconductor memory
10/31/2002US20020159312 Method of reading stored data and semiconductor memory device
10/31/2002US20020159307 Ferroelectric memory device and method of operating memory cell including ferroelectric capacitor
10/31/2002US20020159306 Ferroelectric memory device
10/31/2002US20020159300 Bus driving circuit and memory device having same
10/31/2002US20020159298 Nonvolatile semiconductor memory device capable of preventing occurrence of latchup
10/31/2002US20020159297 Eeprom erasing method
10/31/2002US20020159295 Nonvolatile semiconductor memory device
10/31/2002US20020159293 Higher program vt and faster programming rates based on improved erase methods
10/31/2002US20020159291 Nonvolatile semiconductor memory, data deletion method of nonvolatile semiconductor memory, information processing apparatus and nonvolatile semiconductor memory system
10/31/2002US20020159290 Booster circuit capable of achieving a stable pump operation for nonvolatile semiconductor memory device
10/31/2002US20020159242 Module with built-in electronic elements and method of manufacture thereof
10/31/2002US20020159217 Electrostatic chuck and substrate processing apparatus
10/31/2002US20020159216 Vacuum plasma processor and method of operating same
10/31/2002US20020159203 Magnetoresistance effect element
10/31/2002US20020159142 Illuminating apparatus
10/31/2002US20020159054 Wafer chuck with integrated reference sample
10/31/2002US20020159049 Measuring method of illuminance unevenness of exposure apparatus, correcting method of illuminance unevennes, manufacturing method of semiconductor device, and exposure apparatus
10/31/2002US20020159048 Wavefront aberration measuring method and unit, exposure apparatus, device manufacturing method, and device
10/31/2002US20020159043 Aligner having shared rotation shaft
10/31/2002US20020159042 Chamber assembly for an exposure apparatus
10/31/2002US20020159041 Scanning exposure apparatus, scanning exposure method and mask
10/31/2002US20020159040 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
10/31/2002US20020159016 In-plane switching mode active matrix type liquid crystal display device and method of fabricating the same
10/31/2002US20020159010 Liquid crystal display device and manufacturing method of same
10/31/2002US20020158995 Polycrystalline silicon thin film transistor of liquid crystal display and manufacturing method thereof
10/31/2002US20020158994 Manufacturing method of liquid crystal display device
10/31/2002US20020158964 Laser exposure device
10/31/2002US20020158829 Display system
10/31/2002US20020158679 Voltage control circuit
10/31/2002US20020158666 Semiconductor device
10/31/2002US20020158659 Semiconductor integrated circuit and manufacturing method thereof
10/31/2002US20020158651 Semiconductor device with a self-testing function and a method for testing the semiconductor device
10/31/2002US20020158647 Apparatus for manufacturing semiconductor device, method for manufacturing semiconductor device, inspection apparatus for semiconductor device, and inspection method for semiconductor device
10/31/2002US20020158644 Test needle for pattern adapter of circuit board tester
10/31/2002US20020158643 Method and apparatus for generating values for selected pixels used in evaluating semiconductor wafer bumps
10/31/2002US20020158642 Surface passivation method and arrangement for measuring the lifetime of minority carriers in semiconductors
10/31/2002US20020158618 Data processing system
10/31/2002US20020158616 Power supply with flux-controlled transformer
10/31/2002US20020158573 Electro-optical device and electronic apparatus
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