Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2002
10/24/2002WO2002084744A1 Semiconductor device and its manufacturing method
10/24/2002WO2002084743A1 Metal insulator power semiconductor component (mis) and a method for producing the same
10/24/2002WO2002084739A1 Thin film-device manufacturing method, and semiconductor device
10/24/2002WO2002084738A1 Soi wafer and its manufacturing method
10/24/2002WO2002084734A1 Electronic part with a lead frame
10/24/2002WO2002084732A2 Method of manufacturing an electronic device
10/24/2002WO2002084731A1 Cluster tool and method for controlling transport
10/24/2002WO2002084729A2 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring
10/24/2002WO2002084728A1 Control of thermal donor formation in high resistivity cz silicon
10/24/2002WO2002084727A2 Method of fabricating an oxide layer on a silicon carbide layer utilizing an anneal in a hydrogen environment
10/24/2002WO2002084726A1 Ultraviolet ray assisted processing device for semiconductor processing
10/24/2002WO2002084725A1 A method of using a germanium layer transfer to si for photovoltaic applications and heterostructure made thereby
10/24/2002WO2002084724A1 Method for surface treatment and system for fabricating semiconductor device
10/24/2002WO2002084723A1 Low cost fabrication of high resistivity resistors
10/24/2002WO2002084722A2 Detachable substrate with controlled mechanical hold and method for production thereof
10/24/2002WO2002084721A2 Detachable substrate or detachable structure and method for the production thereof
10/24/2002WO2002084720A2 Exposure device and substrate processing system and device producing method
10/24/2002WO2002084719A1 Electron beam exposing device and exposure method
10/24/2002WO2002084718A1 Method of reducing in-trench smearing during polishing
10/24/2002WO2002084717A1 Ceramic heater for semiconductor manufactring/inspecting apparatus
10/24/2002WO2002084715A1 Mushroom stem wafer pedestal for improved conductance and uniformity
10/24/2002WO2002084714A2 Method and apparatus for electrochemically depositing a material onto a workpiece surface
10/24/2002WO2002084712A2 Rapid thermal processing system for integrated circuits
10/24/2002WO2002084711A1 Heating system and method for heating an atmospheric reactor
10/24/2002WO2002084710A2 Systems and methods for epitaxially depositing films
10/24/2002WO2002084709A2 High pressure processing chamber for semiconductor substrate including flow enhancing features
10/24/2002WO2002084708A2 Method of forming semiconductor compound film for fabrication of electronic device and film produced by same
10/24/2002WO2002084707A2 Method of etching shaped cavities and associated on-chip devices and micro-machined structures
10/24/2002WO2002084706A2 Integrated magnetoresistive semiconductor memory arrangement
10/24/2002WO2002084705A2 Method for operating an mram semiconductor memory arrangement
10/24/2002WO2002084699A1 Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator
10/24/2002WO2002084698A1 Inductively coupled plasma source with controllable power distribution
10/24/2002WO2002084696A1 Electron beam generator and electron beam aligner
10/24/2002WO2002084671A1 Multi-layered film reflector manufacturing method
10/24/2002WO2002084631A1 Element transfer method, element arrangmenet method using the same, and image display apparatus production method
10/24/2002WO2002084586A1 Connection by deposition of a conductive material bead on a connecting zone delimited by an insulating mask
10/24/2002WO2002084422A2 System and method for dividing flow
10/24/2002WO2002084406A1 Euv-transparent interface structure
10/24/2002WO2002084403A1 Process for producing acid sensitive liquid composition containing a carbonate
10/24/2002WO2002084402A2 Process for producing film forming resins for photoresist compositions
10/24/2002WO2002084401A2 Photoresist compositions comprising solvents for short wavelength imaging
10/24/2002WO2002084399A1 Opc mask manufacturing method, opc mask, and chip
10/24/2002WO2002084312A2 Measuring back-side voltage of an integrated circuit
10/24/2002WO2002084213A1 Periodic patterns and technique to control misalignment
10/24/2002WO2002083997A1 Process for growing calcium fluoride monocrystals
10/24/2002WO2002083995A1 Method of and apparatus for controlling fluid flow
10/24/2002WO2002083994A1 Syntheses of mesophase materials with molecularly ordered frameworks
10/24/2002WO2002083981A1 Device and method for electroless plating
10/24/2002WO2002083978A1 Device or method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates
10/24/2002WO2002083804A1 Polishing composition having a surfactant
10/24/2002WO2002083597A1 Ceramic bonded body and its producing method, and ceramic structure for semiconductor wafer
10/24/2002WO2002083522A1 Ic wafer cushioned separators
10/24/2002WO2002083415A1 Anti-reflective coating composition with improved spin bowl compatibility
10/24/2002WO2002083387A1 Substrate- layer cutting device and method associated therewith
10/24/2002WO2002083372A1 Wafer carrying robot teaching method and teaching plate
10/24/2002WO2002083364A1 Implement for cleaning tip and lateral surface of contactor
10/24/2002WO2002083359A1 Ultra-precision positioning system
10/24/2002WO2002083332A1 Label sheet for cleaning and conveying member having cleaning function
10/24/2002WO2002083331A1 Method and equipment for cleaning substrate
10/24/2002WO2002083327A1 Layered stacks and methods of production thereof
10/24/2002WO2002068713A8 Vaporizer
10/24/2002WO2002063658A3 Self aligned, magnetoresitive random-access memory (mram) structure utilizing a spacer containment scheme
10/24/2002WO2002061752A3 Mram architecture and system
10/24/2002WO2002049078A3 Method for cleaning post-etch residues from a substrate
10/24/2002WO2002025730A3 Self aligned trench and method of forming the same
10/24/2002WO2002003419A3 Device for forming nanostructures on the surface of a semiconductor wafer by means of ion beams
10/24/2002WO2001061409A9 Apparatus and method of cleaning reticles for use in a lithography tool
10/24/2002WO2001055703A9 Method of preparing a sensor array
10/24/2002WO2001055702A9 Portable sensor array system
10/24/2002WO2001049362A8 Method of forming vertical, hollow needles within a semiconductor substrate
10/24/2002WO1999060608A3 Dram cell with vertical transistor and method for the production thereof
10/24/2002US20020157083 Exposure mask pattern correction method, pattern formation method, and a program product for operating a computer
10/24/2002US20020157081 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
10/24/2002US20020157080 Design method of a logic circuit
10/24/2002US20020157079 CMOS tapered gate and synthesis method
10/24/2002US20020157076 Fabrication method for a semiconductor device with dummy patterns
10/24/2002US20020157075 Method and apparatus for computing placement costs
10/24/2002US20020157074 Method for layout design and timing adjustment of logically designed integrated circuit
10/24/2002US20020157068 Data management method for reticle/mask writing
10/24/2002US20020157066 Reconfigurable processor devices
10/24/2002US20020156614 Emulator with switching network connections
10/24/2002US20020156610 Gate delay calculation apparatus and method thereof using parameter expressing RC model source resistance value
10/24/2002US20020156609 Circuit simulation method, circuit simulation device, and circuit simulation program and computer readable storage medium onto which the program is stored
10/24/2002US20020156549 Controlling method for manufacturing process
10/24/2002US20020156548 Computer integrated manufacturing techniques
10/24/2002US20020156216 Acid generating agent, additive, solvent and a copolymer of an acrylic acid, ester, anhydride and a cyclic non-aromatic monomers
10/24/2002US20020156180 Low dielectric constant materials and their production and use
10/24/2002US20020155964 Cleaning agent composition, method for cleaning and use thereof
10/24/2002US20020155792 Method and apparatus for creating an open cell micro-environment for treating a substrate with an impingement spray
10/24/2002US20020155736 Probe pin assembly
10/24/2002US20020155732 Exposed to radiation at a first wavelength to cure the planarization material and is exposed to radiation at a second wavelength to cause changes to the planarization material that facilitate separation
10/24/2002US20020155731 Has a proper strength and an anti-vibration effect.
10/24/2002US20020155730 Deposition of silicon oxide films
10/24/2002US20020155729 Semiconductor device encapsulation
10/24/2002US20020155728 Incorporating flexible, sheet-like elements having terminals thereon overlying the front or rear face of the chip, which are movable to compensate for thermal expansion, to provide a compact unit.
10/24/2002US20020155727 Method of making semiconductor device
10/24/2002US20020155726 Method of removing silicon nitride film
10/24/2002US20020155725 Method and apparatus for etching photomasks
10/24/2002US20020155724 Dry etching method and apparatus
10/24/2002US20020155723 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof
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