H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2002
10/29/2002	US6472285 Method for fabricating high-Q inductance device in monolithic technology
10/29/2002	US6472284 Method for fabricating a MOSFET having a thick and thin pad oxide at the gate sides
10/29/2002	US6472283 MOS transistor processing utilizing UV-nitride removable spacer and HF etch
10/29/2002	US6472282 Self-amorphized regions for transistors
10/29/2002	US6472281 Method for fabricating semiconductor device using a CVD insulator film
10/29/2002	US6472280 Method for forming a spacer for semiconductor manufacture
10/29/2002	US6472279 Method of manufacturing a channel stop implant in a semiconductor device
10/29/2002	US6472278 Method and apparatus for creating a voltage threshold in a FET
10/29/2002	US6472277 Method for fabricating a semiconductor device with an improved short channel effect
10/29/2002	US6472276 Using silicate layers for composite semiconductor
10/29/2002	US6472275 Read-only memory and method for fabricating the same
10/29/2002	US6472274 MOSFET with self-aligned channel edge implant and method
10/29/2002	US6472273 Method of manufacturing a flash memory device
10/29/2002	US6472271 Planarization method of memory unit of flash memory
10/29/2002	US6472270 Elimination of voids at the oxide/silicon interface in trench-based structures
10/29/2002	US6472269 Method for forming capacitor
10/29/2002	US6472268 Method for forming storage node contact
10/29/2002	US6472267 DRAM cell having storage capacitor contact self-aligned to bit lines and word lines
10/29/2002	US6472266 Method to reduce bit line capacitance in cub drams
10/29/2002	US6472265 Method for manufacturing embedded dynamic random access memory
10/29/2002	US6472264 Device and method for protecting against oxidation of a conductive layer in said device
10/29/2002	US6472262 Method for fabricating a bipolar transistor of the self-aligned double-polysilicon type with a heterojunction base and corresponding transistor
10/29/2002	US6472261 Method of forming an integrated circuit contact structure having gate electrode protection for self-aligned contacts with zero enclosure
10/29/2002	US6472260 Methods of forming field effect transistors and related field effect transistor constructions
10/29/2002	US6472259 Method of manufacturing semiconductor device
10/29/2002	US6472258 Double gate trench transistor
10/29/2002	US6472257 High quality factor, integrated inductor and production method thereof
10/29/2002	US6472256 Method of manufacturing a thin-film transistor with a short-circuiting pattern
10/29/2002	US6472255 Solid-state imaging device and method of its production
10/29/2002	US6472254 Integrated photovoltaic switch with integrated power device including etching backside of substrate
10/29/2002	US6472253 Programmable semiconductor device structures and methods for making the same
10/29/2002	US6472252 Methods for ball grid array (BGA) encapsulation mold
10/29/2002	US6472251 Method for integrated circuit packaging
10/29/2002	US6472249 Semiconductor device having sealing film formed on the surface having columnar electrode formed thereon and method of manufacturing the same
10/29/2002	US6472248 Microcrystalline series photovoltaic element and process for fabrication of same
10/29/2002	US6472247 Solid-state imaging device and method of production of the same
10/29/2002	US6472244 Manufacturing method and integrated microstructures of semiconductor material and integrated piezoresistive pressure sensor having a diaphragm of polycrystalline semiconductor material
10/29/2002	US6472243 Method of forming an integrated CMOS capacitive pressure sensor
10/29/2002	US6472241 Radical cell device and method for manufacturing groups II-VI compound semiconductor device
10/29/2002	US6472240 Methods of semiconductor processing
10/29/2002	US6472239 Method for fabricating semiconductor components
10/29/2002	US6472238 Evaluation of etching processes in semiconductors
10/29/2002	US6472237 Method and system for determining a thickness of a layer
10/29/2002	US6472236 Determination of effective oxide thickness of a plurality of dielectric materials in a MOS stack
10/29/2002	US6472234 Failure analysis method for chip of ball grid array type semiconductor device
10/29/2002	US6472231 Dielectric layer with treated top surface forming an etch stop layer and method of making the same
10/29/2002	US6472229 Method for manufacturing a ferroelectric capacitor having improved polarization characteristics and a method for manufacturing a ferroelectric memory device incorporating such capacitor
10/29/2002	US6472127 Method of forming a photoresist pattern
10/29/2002	US6472124 Self-aligned metal-insulator-metal capacitor for integrated circuits
10/29/2002	US6472122 Very thin layer of alumina, zerconia, or other ceramic, less than 25 microns thick,
10/29/2002	US6472120 Photosensitive polymer and chemically amplified photoresist composition containing the same
10/29/2002	US6472112 Method for measuring reticle leveling in stepper
10/29/2002	US6472109 Providing two different dopants within a periphery of the opening, the dopants each being provided to a concentration of at least about 1017 atoms/cm3
10/29/2002	US6472079 Product of hydrolysis and condensation of an organosilicon compound; 1a or 2a compound, especially carboxylic salt; solvent; excellent cracking resistance after a pct (pressure cooker test).
10/29/2002	US6472076 Semiconductor dielectric thin films
10/29/2002	US6472065 For supporting a silicon wafer; adhesive becomes progressively detackified during exposure to ultraviolet radiation; multi-functional urethane acrylate oligomer combined with (meth)acrylate copolymer
10/29/2002	US6472040 Semi-pure and pure monocrystalline silicon ingots and wafers
10/29/2002	US6472023 Seed layer of copper interconnection via displacement
10/29/2002	US6471913 Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperature
10/29/2002	US6471847 Plating a surface of a semiconductor workpiece (wafer, flat panel, magnetic films) using a liquid conductor such as mercury
10/29/2002	US6471836 Sputtering apparatus
10/29/2002	US6471833 High etch rate method for plasma etching silicon nitride
10/29/2002	US6471821 Plasma reactor and method
10/29/2002	US6471806 Method of adhering a wafer to wafer tape
10/29/2002	US6471783 Using carbonated water to reduce generation of static electricity and oxidation caused by water contacting metal thin film conductors during such as washing, cutting, polishing, surface treatment
10/29/2002	US6471782 Precursor deposition using ultrasonic nebulizer
10/29/2002	US6471781 Method of depositing titanium nitride thin film and CVD deposition apparatus
10/29/2002	US6471780 Process for fabricating films of uniform properties on semiconductor devices
10/29/2002	US6471779 Gas feed ceramic structure for semiconductor-producing apparatus
10/29/2002	US6471772 Laser processing apparatus and laser processing method
10/29/2002	US6471771 In-situ post epitaxial treatment process
10/29/2002	US6471770 Method of manufacturing semiconductor substrate
10/29/2002	US6471769 Using a group iii element and ammonia for nitriding in presence of hydrogen as carrier gas, improved crystallinity by controlling a flow rate ratio between starting material gas and carrier gas
10/29/2002	US6471735 Slurry of abrasive particles, suspension medium, peroxygen compound, etching agent and an alkyl ammonium hydroxide; increased silicon oxide to silicon nitride polish rate selectivity
10/29/2002	US6471538 Contact structure and production method thereof and probe contact assembly using same
10/29/2002	US6471501 Mold for fabricating semiconductor devices
10/29/2002	US6471464 Wafer positioning device
10/29/2002	US6471462 Carrier handling apparatus of an IC module handler
10/29/2002	US6471460 Apparatus for processing a microelectronic workpiece including a workpiece cassette inventory assembly
10/29/2002	US6471459 Substrate transfer shuttle having a magnetic drive
10/29/2002	US6471435 Flexural joint
10/29/2002	US6471422 Substrate processing apparatus and substrate processing method
10/29/2002	US6471421 Supply ports become gradually smaller toward a center portion of the substrate to prevent heaping of solution at the center and promote evenness of the developing solution within the substrate surface; photolithographic semiconductor production
10/29/2002	US6471327 Apparatus and method of delivering a focused beam of a thermodynamically stable/metastable mixture of a functional material in a dense fluid onto a receiver
10/29/2002	US6471115 Process for manufacturing electronic circuit devices
10/29/2002	US6471110 Method and apparatus for mounting semiconductor chips
10/29/2002	US6471037 Semiconductor manufacturing apparatus and method
10/29/2002	US6471010 Material delivery system for clean room-like environments
10/29/2002	US6470946 Wafer demount gas distribution tool
10/29/2002	US6470927 Foup opener
10/29/2002	US6470824 Semiconductor manufacturing apparatus
10/29/2002	US6470823 Apparatus and method for forming a deposited film by a means of plasma CVD
10/29/2002	US6470596 Vacuum processing apparatus and operating method therefor
10/29/2002	CA2238827C Forming contacts on semiconductor substrates for radiation detectors and imaging devices
10/28/2002	EP1137675A4 Preparation of partially cross-linked polymers and their use in pattern formation
10/28/2002	EP1131849A4 Pseudomorphic high electron mobility transistors
10/24/2002	WO2002085080A1 Method and device for generating extreme ultraviolet radiation in particular for lithography
10/24/2002	WO2002084755A2 Keepers for mram electrodes
10/24/2002	WO2002084748A2 Method for producing optically transparent regions in a silicon substrate
10/24/2002	WO2002084745A2 Power semiconductor devices and methods of forming same

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