Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2003
05/22/2003US20030094625 Semiconductor device and method for fabricating the same
05/22/2003US20030094624 Trench MOSFET device with improved on-resistance
05/22/2003US20030094621 Semiconductor package, manufacturing method of semiconductor package
05/22/2003US20030094620 Gallium nitride-based III-V group compound semiconductor
05/22/2003US20030094619 Active matrix substrate and method of manufacturing the same
05/22/2003US20030094618 Method for manufacturing gallium nitride compound semiconductor and light emitting element
05/22/2003US20030094615 Light emitting device
05/22/2003US20030094614 Consumes small power even when a screen is made to be larger; signal wiring line from a low resistant material and p-channel TFTs are used for a pixel TFT of a pixel portion.
05/22/2003US20030094613 Crystalline silicon thin film transistor panel for OELD and method of fabricating the same
05/22/2003US20030094611 Semiconductor device and method of fabricating the same
05/22/2003US20030094610 Wash water or immersion water used during semiconductor manufacturing
05/22/2003US20030094609 Structure for detecting charging effects in device processing
05/22/2003US20030094607 Patterning of electrodes in oled devices with shaped pillars
05/22/2003US20030094593 Silica and a silica-based slurry
05/22/2003US20030094586 Wafer defect inspection machine
05/22/2003US20030094585 Pixel region and peripheral circuit region, both including thin film transistors, on amorphous substrate; semiconductor films of transistors in peripheral circuit region formed into crystalline state having streamlined flow pattern
05/22/2003US20030094584 Charged-particle beam exposure apparatus and device manufacturing method using the same
05/22/2003US20030094583 Wafer holding apparatus for ion implanting system
05/22/2003US20030094572 Inspection system and inspection process for wafer with circuit using charged-particle beam
05/22/2003US20030094548 Single-handed cord/cable management device
05/22/2003US20030094481 Bump bonding method and apparatue
05/22/2003US20030094451 Heating apparatus
05/22/2003US20030094447 Ceramic heaters, a method for producing the same and heating apparatuses used for a system for producing semiconductors
05/22/2003US20030094446 Rapid thermal processing system for integrated circuits
05/22/2003US20030094435 Epitaxial cleaning process using HCL and N-type dopant gas to reduce defect density and auto doping effects
05/22/2003US20030094434 Passivation for cleaning a material
05/22/2003US20030094426 Colloidal waste water solutions containing microparticles filtrated using a second filter, having a gel film that is formed by suction on the surface of a first filter.
05/22/2003US20030094374 Comprises etching dielectric layer around the periphery of a semiconductor wafer substrate; increased strength, eliminates delamination
05/22/2003US20030094366 Plasma processing apparatus with real-time particle filter
05/22/2003US20030094364 Method and apparatus for electro-chemical mechanical deposition
05/22/2003US20030094305 Pressure-welded structure of flexible circuit boards
05/22/2003US20030094275 Heat sink and fin module
05/22/2003US20030094241 Die bonder
05/22/2003US20030094238 Plasma processing apparatus for spatial control of dissociation and ionization
05/22/2003US20030094212 Stationary and pivotable trays for semiconductor wafer transfer
05/22/2003US20030094196 Advanced process control for immersion processing
05/22/2003US20030094137 Coating a resist on the substrate, and placing in a vapor atmosphere
05/22/2003US20030094136 Atmospheric pressure wafer processing reactor having an internal pressure control system and method
05/22/2003US20030094135 Discharges exhaust gas generated as a result of chemical processing
05/22/2003US20030094134 By-product deposited on an interior wall in the main exhaust pipe is exhausted by a dust collection exhaust pipe having exhaust power higher than that of the main exhaust pipe
05/22/2003US20030094129 Below 160NM optical lithography crystal materials and methods of making
05/22/2003US20030094128 Dispersion management optical lithography crystals for below 160nm optical lithography method thereof
05/22/2003US20030094059 Slide apparatus and its stage mechanism for use in vacuum
05/22/2003US20030093917 Apparatus and methods for processing electronic component precursors
05/22/2003US20030093897 Method and apparatus for shock and vibration isolation of a circuit component
05/22/2003US20030093894 Double layer patterning and technique for making a magnetic recording head
05/22/2003DE19934605C2 Anordnung zur rotatorischen Positionierung Arrangement for the rotational positioning
05/22/2003CA2464423A1 Electropolishing assembly and methods for electropolishing conductive layers
05/21/2003EP1313149A1 Process for fabricating a dual charge storage location memory cell
05/21/2003EP1313148A2 A scalable flash eeprom memory cell, method of manufacturing and operation thereof
05/21/2003EP1313147A2 Power MOSFET device
05/21/2003EP1313146A2 Monolithically integrated pin diode and schottky diode circuit and method of fabricating same
05/21/2003EP1313144A2 Passive devices and modules for transceiver
05/21/2003EP1313142A2 Method of manufacturing a rerouting layer on a semiconductor device and corresponding semiconductor device
05/21/2003EP1313141A2 Semiconductor device and method of manufacturing the same
05/21/2003EP1313140A1 Method of forming a liner for tungsten plugs
05/21/2003EP1313139A1 Device and method for forming bump
05/21/2003EP1313138A2 Protective layer in memory device and method therefore
05/21/2003EP1313137A1 Method for manufacturing single-crystal silicon wafers
05/21/2003EP1313136A1 Semiconductor device and method for manufacturing the same
05/21/2003EP1313135A1 Method for processing semiconductor wafer and semiconductor wafer
05/21/2003EP1313134A1 Semiconductor polysilicon component and method of manufacture thereof
05/21/2003EP1313132A1 Toroidal low-field reactive gas source
05/21/2003EP1313131A1 Toroidal low-field reactive gas source
05/21/2003EP1313130A1 Toroidal low-field reactive gas source
05/21/2003EP1313129A1 Toroidal low-field reactive gas source
05/21/2003EP1313128A1 Toroidal low-field reactive gas source
05/21/2003EP1313127A1 Metal film production apparatus
05/21/2003EP1312985A2 Semiconductor manufacturing apparatus
05/21/2003EP1312984A2 Lithographic projection apparatus and device manufacturing method
05/21/2003EP1312983A2 Photocleaning
05/21/2003EP1312981A2 Transparent substrate having character/symbol section and processing method of character/symbol section
05/21/2003EP1312698A1 Heating element CVD System and heating element CVD method using the same
05/21/2003EP1312697A1 CVD of dielectric films
05/21/2003EP1312696A2 Metal barrier film production apparatus, metal barrier film production method, metal film production method, and metal film production apparatus
05/21/2003EP1312586A1 Optical coating for UV applications
05/21/2003EP1312123A1 Metal sulfide semiconductor transistor devices
05/21/2003EP1312122A2 Integrated transistor devices
05/21/2003EP1312121A2 Power mosfet and methods of forming and operating the same
05/21/2003EP1312120A1 Dense arrays and charge storage devices, and methods for making same
05/21/2003EP1312119A2 Non-volatile memory, method of manufacture and programming
05/21/2003EP1312118A2 Methods for producing passive components on a semiconductor substrate
05/21/2003EP1312115A2 Semiconductor arrangement and method for production thereof
05/21/2003EP1312114A1 Method of forming spacers in cmos devices
05/21/2003EP1312113A1 Trench formation and oxide etching process
05/21/2003EP1312112A2 Method for preventing damage to wafers in a sequential multiple steps polishing process
05/21/2003EP1312110A2 Method and device to reduce gate-induced drain leakage (gidl) current in thin gate oxide mosfets
05/21/2003EP1312109A1 Super critical drying of low k materials
05/21/2003EP1312108A2 Integrated shallow trench isolation process
05/21/2003EP1312107A1 Low temperature processing of ferroelectric strontium bismuth tantalate layers and the production of ferroelectric components thereof
05/21/2003EP1312106A1 Temperature-controlled thermal platform for automated testing
05/21/2003EP1312105A1 Directed assembly of nanometer-scale molecular devices
05/21/2003EP1311917A2 Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control
05/21/2003EP1311908A2 Photoresist composition for deep uv and process thereof
05/21/2003EP1311907A1 Photosensitive composition for making photoresist
05/21/2003EP1311827A2 Ring chuck to hold 200 and 300 mm wafer
05/21/2003EP1311826A1 Device for positioning disk-shaped objects
05/21/2003EP1311825A1 Method for fast and accurate determination of the minority carrier diffusion length from simultaneously measured surface photovoltages
05/21/2003EP1311368A2 Polishing apparatus and methods controlling the polishing pressure as a function of the overlapping area between the polishing head and the semiconductor substrate
05/21/2003EP1311366A2 Cmp apparatus with an oscillating polishing pad rotating in the opposite direction of the wafer
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