| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/14/1987 | US4657780 Manufacture of diffraction gratings |
| 04/14/1987 | US4657779 Mixtures of epoxies and hydroxy-containing acrylates with a photosensitive difunctional catalyst |
| 04/14/1987 | US4657629 Bilevel resist process |
| 04/14/1987 | US4657379 Photomask and exposure apparatus using the same |
| 04/14/1987 | CA1220375A1 High resolution lithographic resist and method |
| 04/09/1987 | WO1987002178A1 Optical exposure apparatus |
| 04/09/1987 | WO1987001937A1 Structures for controlled chemical release |
| 04/08/1987 | EP0217539A1 Method for forming new preceramic polymers containing silicon |
| 04/08/1987 | EP0217463A1 Method of determining an exposure dose of a photosensitive lacquer layer |
| 04/08/1987 | EP0217324A2 Photopolymer films containing microencapsulated sensitometric adjuvants |
| 04/08/1987 | EP0217230A1 Developing station for a processing unit for printing plates |
| 04/08/1987 | EP0217205A2 Copolymerisable photoinitiators |
| 04/08/1987 | EP0217150A2 Film peeling apparatus |
| 04/08/1987 | EP0217137A2 Photopolymerizable composition of acrylic copolymer containing dicyclopentenyl acrylate or methacrylate |
| 04/08/1987 | EP0216884A1 Photo-initiator for the photo-polymerization of unsaturated systems. |
| 04/07/1987 | US4656504 Allocation of recording area onto photosensitive film |
| 04/07/1987 | US4656292 2,3-dimethylmaleimido-alkyl haloacetates |
| 04/07/1987 | US4656244 Method for the manufacture of polyimidazole and polyimidazopyrrolone precursors |
| 04/07/1987 | US4656119 Solvent-free, uncrosslinked film heat treated beford and after irradiation |
| 04/07/1987 | US4656116 Crosslinkable solutions of solvent, polyimide and polyazide chromogen; photoresists; photolithography |
| 04/07/1987 | US4656108 Photoresists; thin films; fineness |
| 04/07/1987 | US4656107 Photographic printing plate for use in a vacuum printing frame |
| 04/07/1987 | US4655876 Lasers, etching, sputtering |
| 04/07/1987 | US4655599 Mask aligner having a photo-mask setting device |
| 04/07/1987 | US4655594 Displacement device, particularly for the photolithographic treatment of a substrate |
| 04/07/1987 | US4655584 Substrate positioning apparatus |
| 04/07/1987 | US4655555 Objective with aspheric surfaces for imaging microzones |
| 04/07/1987 | US4655162 Semiconductor device manufacturing apparatus |
| 04/02/1987 | DE3534473A1 Illuminating device in a projection copier |
| 04/01/1987 | EP0216603A2 Microwave apparatus for generating plasma afterglows |
| 04/01/1987 | EP0216349A2 Process and device for manufacturing a black matrix |
| 04/01/1987 | EP0216083A1 Polyvinyl acetal and photosensitive composition containing it |
| 04/01/1987 | EP0215944A1 Process for fabricating glass tooling |
| 03/31/1987 | US4654571 Single plane orthogonally movable drive system |
| 03/31/1987 | US4654415 Method for the preparation of polyimide and polyisoindoloquinazoline dione precursors |
| 03/31/1987 | US4654296 Process for making lithographic film using photopolymer diffusion modulation layer for pigmented bottom layer |
| 03/31/1987 | US4654294 Printing plates |
| 03/31/1987 | US4654292 High resolution, for semiconductors |
| 03/31/1987 | US4654112 Silicon oxides, dielectrics, plasma/gases/, integrated circuits, oxygen, nitrogen trifluoride |
| 03/31/1987 | US4653903 For transferring mask patterns onto respective wafers |
| 03/31/1987 | US4653860 Programable mask or reticle with opaque portions on electrodes |
| 03/31/1987 | CA1219893A1 Electro-magnetic apparatus |
| 03/31/1987 | CA1219835A1 Metal/semiconductor deposition |
| 03/31/1987 | CA1219762A1 Photo-mechanically reproduced blasting mask and method of making and using same |
| 03/26/1987 | WO1987001827A2 Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method |
| 03/26/1987 | WO1987001825A1 Processless multicolor imaging |
| 03/25/1987 | EP0215453A2 Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer |
| 03/25/1987 | EP0215397A2 Film peeling apparatus |
| 03/25/1987 | EP0215358A2 Method and device employing input and output staging chamber devices for reduced pressure lamination |
| 03/25/1987 | EP0215222A2 Optical recording element having a smoothing layer |
| 03/25/1987 | EP0215069A1 Polysiloxane resist for ion beam and electron beam lithography. |
| 03/24/1987 | US4652762 Electron lithography mask manufacture |
| 03/24/1987 | US4652604 Radiation-polymerizable composition and element containing a photopolymer composition |
| 03/24/1987 | US4652513 Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method |
| 03/24/1987 | US4651440 Spin drying apparatus |
| 03/24/1987 | CA1219686A1 Process for making semiconductor devices using photosensitive bodies |
| 03/24/1987 | CA1219488A1 Flexographic printing plates, methods of their production and laminates for use in their production |
| 03/18/1987 | EP0214665A2 Derivatives of benzoine, process for their preparation and photocurable compositions containing these derivatives |
| 03/18/1987 | EP0214664A2 Process for the preparation of organopolysilanes and use of the organopolysilanes thus obtained |
| 03/18/1987 | EP0214514A2 Mask removal tool |
| 03/18/1987 | EP0214461A2 Apparatus to strip the protection layer from a printed circuit coated with an exposed photoresist |
| 03/18/1987 | CN86106083A Epoxy fluorocarbon coating compositions and the process to make the same |
| 03/17/1987 | US4651009 Contact exposure apparatus |
| 03/17/1987 | US4650983 Focusing apparatus for projection optical system |
| 03/17/1987 | US4650849 Photosensitive curable resin composition |
| 03/17/1987 | US4650745 Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development |
| 03/17/1987 | US4650741 Positive photosensitive composition of cocondensed β-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide |
| 03/17/1987 | US4650738 Negative working diazo color proofing method |
| 03/17/1987 | US4650536 Photoengraving field |
| 03/17/1987 | US4650315 Optical lithographic system |
| 03/17/1987 | US4650288 Electrically conductive materials for devices |
| 03/12/1987 | DE3530680A1 Roll-pressure and -lifting device |
| 03/11/1987 | EP0214103A2 Adhesively bonded photostructurable polyimide foil |
| 03/11/1987 | EP0213701A1 Thioether containing mercaptocarboxylic acids and process therefor |
| 03/11/1987 | EP0213555A2 Apparatus for cutting photoresistive webs into photoresistive sheets with defined sizes, and laminating the sheets accurately and without plies upon flexible or rigid supporting materials |
| 03/10/1987 | US4649103 Heat-developable light-sensitive material |
| 03/10/1987 | US4649101 Developer containing ethoxylated alkylphenol surfactant |
| 03/10/1987 | US4649100 Degradation of polydiacetylenes by actinic radiation |
| 03/10/1987 | US4649099 Acetalized polyvinyl alcohol |
| 03/10/1987 | US4649098 Image recording process using both silver halide and vinyl monomers |
| 03/10/1987 | US4648725 Guide mechanism |
| 03/10/1987 | US4648708 Pattern transfer apparatus |
| 03/10/1987 | US4648699 Point contact development of imaging sheets employing photosensitive microcapsules |
| 03/10/1987 | CA1218898A1 Precurled flexographic printing plate |
| 03/05/1987 | DE3629701A1 Radiation-curing of cationically polymerisable compounds |
| 03/04/1987 | EP0212924A2 Plasma processing apparatus |
| 03/04/1987 | EP0212597A2 Film peeling method and apparatus |
| 03/04/1987 | EP0212556A2 Stripping process for lightly hardened photoresist layers |
| 03/04/1987 | EP0212482A2 Process for obtaining negative images from positive photoresists |
| 03/04/1987 | EP0212440A2 Radiation-sensitive composition, registration material containing such a composition and process for the production of relief images |
| 03/04/1987 | EP0212439A2 Polymers and radiosensitive compositions containing them |
| 03/04/1987 | EP0212387A2 Method of treating photosensitive printing plate |
| 03/04/1987 | EP0212373A2 Photoreactive compounds |
| 03/04/1987 | EP0212372A2 Photoreactive polymers for the preparation of relief structures |
| 03/04/1987 | EP0212334A2 Improved polyimide formulation for forming a patterned film on a substrate |
| 03/04/1987 | EP0212271A2 Micro replication process |
| 03/04/1987 | EP0212263A2 Composition for the development of lithographic printing plates |
| 03/04/1987 | EP0212203A2 Reel for winding and unwinding photoresist material |
| 03/04/1987 | EP0111273B1 Light-sensitive composition, photoprinting material prepared using that composition and processes for producing a printing plate with this material |
| 03/04/1987 | CN85106160A Photosensitive composition and the photosensitive metarial prepared from it |