Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/19/1987 | US4666817 Presensitized diazo color-proofing sheet with particular sized pigments |
05/19/1987 | US4666294 Apparatus for exposure of both sides of printed circuit plates |
05/19/1987 | US4666292 Projection optical apparatus and a photographic mask therefor |
05/19/1987 | US4666291 Light-exposure apparatus |
05/19/1987 | US4666273 Automatic magnification correcting system in a projection optical apparatus |
05/19/1987 | CA1222091A1 Photopolymerizable compositions |
05/19/1987 | CA1221864A1 High contrast, high resolution deep ultraviolet lithographic resists |
05/14/1987 | DE3540107A1 Contact copier for UV-sensitive material |
05/14/1987 | DE3531661C1 Device for applying photoresist onto small-area products |
05/13/1987 | EP0221773A2 Opacifying phtographically produced images |
05/13/1987 | EP0221559A2 Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
05/13/1987 | EP0221514A2 Method of producing a grid pattern incorporating a phase jump on the surface of a substrate |
05/13/1987 | EP0221457A2 Method of defect detection in step-and-repeat projection systems |
05/13/1987 | EP0221428A2 Liquid for the treatment of a photoresist composition, and process therefor |
05/13/1987 | EP0221334A1 Subbed lithographic printing plate |
05/12/1987 | US4665541 X-ray lithography |
05/12/1987 | US4665124 Resin |
05/12/1987 | US4665009 Method of developing radiation sensitive negative resists |
05/12/1987 | US4665006 Positive resist system having high resistance to oxygen reactive ion etching |
05/12/1987 | US4664996 Opaque master pattern on transparent plate |
05/12/1987 | US4664510 Repeating copying machine |
05/07/1987 | WO1987002791A1 Photoimaging processes and compositions |
05/07/1987 | WO1987002790A1 Device for aligning a photomask onto a printed wiring board |
05/07/1987 | WO1987002789A1 Electron beam sensitive positive resist |
05/07/1987 | WO1987002626A1 Method for forming vertical interconnects in polyimide insulating layers |
05/07/1987 | DE3625183A1 Method for forming an image |
05/07/1987 | DE3620514A1 Light-sensitive diamine, and process for its preparation |
05/06/1987 | EP0221010A1 Photo-initiator systems for free-radical polymerisations |
05/06/1987 | EP0220943A2 Method for making printing plates and assembly useful therein |
05/06/1987 | EP0220934A2 Aluminium carboxylates |
05/06/1987 | EP0220661A1 Apparatus for conveying a base as of a printed circuit board |
05/06/1987 | EP0220652A2 Method for manufacturing phase gratings of a combination pattern-refraction modification type |
05/06/1987 | EP0220645A2 Photosensitive positive composition and photoresist material prepared therewith |
05/06/1987 | EP0220589A2 Photopolymerisable compound and registration material containing it |
05/06/1987 | EP0220578A2 A photoresist composition and a process using that photoresist composition |
05/06/1987 | EP0220554A1 X-Y-theta Stage assembly |
05/06/1987 | EP0220544A2 Non-precipitating photoresist composition |
05/06/1987 | EP0220507A2 Process for the manufacture of carboxylic esters of polymers containing hydraulic groups |
05/05/1987 | US4663412 Fluorene containing compounds and negative photoresist compositions therefrom |
05/05/1987 | US4663275 Photoresists, multilayer, stripping |
05/05/1987 | US4663269 Method of forming highly sensitive photoresist film in the absence of water |
05/05/1987 | US4663268 High-temperature resistant photoresists featuring maleimide binders |
05/05/1987 | US4663266 Thermal development of photosensitive materials employing microencapsulated radiation sensitive compositions |
05/05/1987 | US4663197 Method and apparatus for coating a substrate |
05/05/1987 | US4662986 Planarization method and technique for isolating semiconductor islands |
05/05/1987 | US4662985 Method of smoothing out an irregular surface of an electronic device |
05/05/1987 | US4662976 For producing printed circuit boards |
05/05/1987 | US4662747 Method and apparatus for production and use of nanometer scale light beams |
05/05/1987 | US4662746 Spatial light modulator and method |
05/05/1987 | CA1221496A1 Photocurable resin composition |
05/05/1987 | CA1221333A1 Producing printing plate by electrophoretic deposition or photosensitive coating on hydrophilized metal |
04/29/1987 | EP0220121A2 A method for the preparation of a screen mesh for screen printing |
04/29/1987 | EP0219928A2 Epoxy fluorocarbon coating composition and process to make same |
04/29/1987 | EP0219795A2 Photopolymerisable compositions |
04/29/1987 | EP0219789A2 Stripping solvent for photoresists |
04/29/1987 | EP0219626A2 Film-forming compositions comprising polyglutarimide |
04/29/1987 | CN86103644A Method of adding the protective layer |
04/28/1987 | US4661697 Optically reflecting code plate |
04/28/1987 | US4661595 Treating ketone compound with s or sulfide |
04/28/1987 | US4661439 Nonelectroscopic; milling, filtering, vacuum drying, pulverizing |
04/28/1987 | US4661436 Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant |
04/28/1987 | US4661435 Reacting with an unsaturated isourea |
04/28/1987 | US4661434 Photopolymerizable composition containing a novel combination of photopolymerizable initiators |
04/28/1987 | US4661433 Photolithography contrast enhancement |
04/28/1987 | US4661432 Light-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material containing this polycondensation product |
04/28/1987 | US4661204 Method for forming vertical interconnects in polyimide insulating layers |
04/28/1987 | US4661203 Low defect etching of patterns using plasma-stencil mask |
04/28/1987 | US4660934 Method for manufacturing diffraction grating |
04/28/1987 | CA1221194A1 Electron beam sensitive resist |
04/28/1987 | CA1221102A1 Process for the photopolymerisation of unsaturated compounds |
04/22/1987 | EP0219369A1 Method for marking a metallic object with a bar code |
04/22/1987 | EP0219087A2 Light-sensitive material |
04/22/1987 | EP0218873A2 Film peeling apparatus |
04/22/1987 | EP0218613A1 Device for the alignment, testing and/or measurement of two-dimensional objects. |
04/22/1987 | CN86104557A Imaging materials employing photosensitive microcapsules containing tertiary amines as coinitiators |
04/21/1987 | US4660094 Method for focus adjustment of a picture scanning and recording system |
04/21/1987 | US4659650 Temperature resistance |
04/21/1987 | US4659649 Photosensitive systems showing visible indication of exposure |
04/21/1987 | US4659648 Oxygen-insensitive, photopolymerizable |
04/21/1987 | US4659645 Photosensitive mixture and photosensitive recording material with diazonium salt polycondensation product and free radical radiation polymerizable composition |
04/21/1987 | US4659642 Positive working naphthoquinone diazide color proofing transfer process |
04/21/1987 | US4659429 High resolution optical microscopy and lithography |
04/21/1987 | US4659227 Alignment apparatus |
04/21/1987 | US4659225 Pattern exposure apparatus with distance measuring system |
04/21/1987 | CA1220894A1 Photosensitive composition and process for forming pattern with the same |
04/21/1987 | CA1220893A1 Photocrosslinkable polymers having thioetherimidyl side groups |
04/21/1987 | CA1220708A1 Vacuum sheet |
04/21/1987 | CA1220668A1 Compressible printing plate |
04/21/1987 | CA1220662A1 Lithographic printing plate and process for production thereof |
04/15/1987 | EP0218546A1 Micropositioning device |
04/15/1987 | EP0218159A1 Anodized aluminum support, method for the preparation thereof and lithographic printing plate containing same |
04/15/1987 | EP0217792A1 Exposure latitude improvements in printing proofs. |
04/15/1987 | EP0188432A4 Conveyorized microwave heating system. |
04/14/1987 | US4657942 Photopolymerizable composition |
04/14/1987 | US4657845 Positive tone oxygen plasma developable photoresist |
04/14/1987 | US4657844 Polyvinyl formal, vinyl carbazole and ionium salt initiator |
04/14/1987 | US4657843 Photo resists having improved radiation sensitivity |
04/14/1987 | US4657841 High sensitive, resolution |
04/14/1987 | US4657839 Photoprinting process and apparatus for exposing paste-consistency photopolymers |
04/14/1987 | US4657832 Photosensitive polymers as coating materials |