Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1996
12/11/1996EP0747769A2 Process for producing photoimageable films prepared from aqueous photoimageable liquid emulsions
12/11/1996EP0747768A2 Chemically amplified positive resist composition
12/11/1996EP0747767A2 Method for forming pattern
12/11/1996EP0747754A1 Printing method
12/11/1996EP0747739A2 Method for using disc shaped material in the manufacture of optoelectronic components with variable grating period
12/11/1996EP0747203A2 Stereolithographic curl reduction
12/11/1996EP0746800A1 Process and device for the photomechanical production of structured surfaces, in particular for exposing offset plates
12/10/1996US5583696 Reflection and refraction optical system and projection exposure apparatus using the same
12/10/1996US5583063 Method of forming T-shaped, cross-sectional pattern using two layered masks
12/10/1996US5582956 Process for fixing an image, and medium for use therein
12/10/1996US5582954 Process for preparing photohardenable elastomeric element having increased exposure latitude
12/10/1996US5582952 Photosensitive lithographic printing plate containing a two-equivalent coupler residue-containing polymer
12/10/1996US5582921 Oxygen treated polyester film surface includes oxygen in the form of hydroxyl, ether, epoxy, carbonyl and carboxyl group; increased weltability, and hydrophilicity
12/10/1996US5582876 Stereographic apparatus and method
12/10/1996US5582746 Real time measurement of etch rate during a chemical etching process
12/10/1996US5582669 Method for providing a protective overcoat on an image carrying medium utilizing a heated roller and a cooled roller
12/05/1996WO1996038767A1 Positioning device with a vibration-free object table
12/05/1996WO1996038766A1 Positioning device with a force actuator system for compensating centre-of-gravity displacements
12/05/1996WO1996038765A1 A positioning device with a reference frame for a measuring system
12/05/1996WO1996038764A1 Lithographic device with a three-dimensionally positionable mask holder
12/05/1996WO1996038754A1 Non-wettable layer for color filters in flat panel display devices
12/05/1996WO1996038698A1 Method for reducing the level of diluent in diluent-containing resins using microwave energy
12/05/1996WO1996038254A1 Plasma assisted chemical etching for fabricating flat panel displays
12/05/1996WO1996029631A3 Magnification correction for small field scanning
12/05/1996WO1996029630A3 Scanning lithography system having double pass wynne-dyson optics
12/04/1996EP0745902A1 Improvement of the storage stability of an imaging element for making a printing plate according to the silver salt diffusion transfer process
12/04/1996EP0745901A1 A concentrated dampening solution with an improved shelf life for printing with a lithographic printing plate obtained according to the silver salt diffusion transfer process
12/04/1996EP0745900A1 Water-developing photosensitive resin composition
12/04/1996EP0745633A2 Si containing high molecular compound and photosensitive resin composition
12/04/1996EP0745575A1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound
12/04/1996EP0745489A2 Thermal transfer imaging elements
12/04/1996EP0745488A1 Recording sheet
12/04/1996EP0745474A2 CAD/CAM stereolithographic data conversion
12/04/1996EP0578660B1 Indolicin trimethine dye
12/04/1996CN1137339A Bonding inner layers in printed circuit board manufacture
12/04/1996CN1033464C Glue removing composition agent
12/03/1996US5581646 Method of coupling optical parts and refractive index imaging material
12/03/1996US5581605 Optical element, production method of optical element, optical system, and optical apparatus
12/03/1996US5581590 SOR exposure system and method of manufacturing semiconductor devices using same
12/03/1996US5581531 Method of making optical disk master and an optical disk
12/03/1996US5581324 Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors
12/03/1996US5581075 Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area
12/03/1996US5580949 Washing acidic ion exchange resin with deionized water, then with mineral acid, passing water/formaldehyde solution through resin to reduce sodium and iron content, condensing with phenolic compound in presence of acid catalyst
12/03/1996US5580936 Method for preparing partially tert-butoxylated poly(p-hydroxystyrene)
12/03/1996US5580912 Polysilane compositions
12/03/1996US5580847 Low-surface tension, storage stable solution also comprising a fluoroalkylsulfonamide having a carboxy or ether(s) group and hydrogen peroxide; cleaning semiconductor surfaces for high-density integrated circuits
12/03/1996US5580704 Dye solution for photosensitive lithographic printing plate requiring no fountain solution
12/03/1996US5580702 Method for forming resist patterns
12/03/1996US5580701 Antireflecting material is deposited between photoresist and underlying layer
12/03/1996US5580700 Pre-purifying, demetallizing the ion exchange resin by washing with water, mineral acid second
12/03/1996US5580699 Method for manufacturing implantable cardiac defibrillation electrodes using a laser beam material removal process
12/03/1996US5580698 Scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame
12/03/1996US5580697 Reacting a solid substrate with a photosensitive nitrenogenic compound, e.g. a tetrafluorophenyl azide; photolithography
12/03/1996US5580695 Chemically amplified resist
12/03/1996US5580694 Acrylic acid, acrylic ester copolymer, radiation sensitive acid generator
12/03/1996US5580687 Contact stepper printed lithography method
12/03/1996US5580650 Process of preparing a composite membrane
12/03/1996US5580511 Method of forming thick film pattern and material for forming thick film pattern
12/03/1996CA2029665C Shaped articles and method of making same
11/1996
11/28/1996WO1996037573A1 Process for the production of photochromic product of curing
11/28/1996DE3891340C2 Heat and chemical resistant photosensitive resin for printed circuits
11/28/1996DE19526011C1 Prodn. of sub-lithographic etching mask
11/28/1996DE19518185A1 Micro-structuring of workpiece surface with agglomerate beam
11/27/1996EP0744764A2 Method and apparatus for manufacture of semiconductor devices
11/27/1996EP0744665A1 Lithography system and method with mask image enlargement
11/27/1996EP0744664A2 Hybrid illumination system for use in photolithography
11/27/1996EP0744663A1 Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
11/27/1996EP0744662A2 Reflection-preventing film-forming composition
11/27/1996EP0744661A1 Positive photoresist composition
11/27/1996EP0744660A2 Color proofing system
11/27/1996EP0744652A1 Image recording apparatus comprising an imagesetter and a vertical processor
11/27/1996EP0744641A2 An illumination system and method employing a deformable mirror and defractive optical elements
11/27/1996EP0744044A1 Masks for lithographic patterning using off-axis illumination
11/27/1996EP0500620B1 Process for the production of metal microstructure bodies
11/27/1996EP0485626B1 Color filter coating material for liquid crystal display, color filter material, formation of coating, and formation of color filter
11/27/1996CN1136792A Ablative imaging by proximity lithography
11/27/1996CN1136708A Light exposing device for manufactureing semiconductor device
11/26/1996US5579240 Method and an apparatus for illuminating points on a medium
11/26/1996US5579147 Scanning light exposure apparatus
11/26/1996US5579084 Apparatus and method for manufacturing semiconductors
11/26/1996US5578697 Polyimide precursor, bismaleimide-based cured resin precursor and electronic parts having insulating members made from these precursors
11/26/1996US5578676 Forming an antireflective layer for deep ultraviolet microlithographic processes
11/26/1996US5578424 Process for generation of unbuffered super-acid and for imaging
11/26/1996US5578423 Method for the preparation of a pattern overlay accuracy-measuring mark
11/26/1996US5578422 Reduced projection exposure method using phase shift mask
11/26/1996US5578421 Photomask and pattern forming method employing the same
11/26/1996US5578420 Coating substrates with photosensitive resins, development with solution for relief images, the solution containing aromatic hydrocarbons, alcohols and isobutyl isobutyrate
11/26/1996US5578419 Dyes for color filters, and photosensitive resist resin composition containing the same
11/26/1996US5578418 Liquid jet recording head and recording apparatus having same
11/26/1996US5578413 Temporary substrates
11/26/1996US5578412 Preparing a colored image on a receptor surface
11/26/1996US5578403 Electrodeposition using circuits on substrate as one electrode
11/26/1996US5578402 Photomask used by photolithography and a process of producing same
11/26/1996US5578401 Photomask for the measurement of resolution of exposure equipment
11/26/1996US5578360 Thin film reinforcing structure and method for manufacturing the same
11/26/1996US5578186 Method for forming an acrylic resist on a substrate and a fabrication process of an electronic apparatus
11/26/1996US5578127 System for applying process liquid
11/26/1996US5577610 Casing for frame-supported pellicles
11/26/1996US5577552 Temperature controlling device for mask and wafer holders
11/25/1996CA2177200A1 Illumination system and method employing a deformable mirror and diffractive optical elements
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