Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/1997
04/23/1997EP0769721A1 Photocurable composition
04/23/1997EP0769485A1 Positive resist composition and photosensitizers
04/23/1997EP0769372A1 Method of lithographic printing
04/23/1997EP0768954A2 Exposure process and device
04/23/1997CN1148188A Method and compositions for diffusion patterning
04/23/1997CN1148187A Photosensitive resin compound
04/23/1997CN1148186A Plate-making method by electrostatic printing plate
04/22/1997US5623529 SOR exposure system and mask manufactured thereby
04/22/1997US5623343 For exposing a pattern of a photo-mask on a photosensitive substrate
04/22/1997US5623080 Fluorone and pyronin Y derivatives
04/22/1997US5622899 Method of fabricating semiconductor chips separated by scribe lines used for endpoint detection
04/22/1997US5622813 Water development; storage stability
04/22/1997US5622809 Activation with a(hydrogen sulfite or sulphur dioxide)amine complex
04/22/1997US5622796 Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems
04/22/1997US5622795 Laser ablation transfer; prints or proofs thus produced have durable protective overcoatings
04/22/1997US5622794 Light-shielding photosensitive resin composition, light-shielding photosensitive transfer material and method for forming light-shielding film
04/22/1997US5622747 Method for dispensing a layer of photoresist on a wafer without spinning the wafer
04/20/1997CA2188196A1 Reticle container with corner holding
04/17/1997WO1997014156A1 Collimator for x-ray spectroscopy
04/17/1997WO1997014079A1 Water-processable, chemically amplified resist compositions and processes
04/17/1997WO1997014077A1 Magnification control and thermal substrate chuck for photolithography
04/17/1997WO1996029629A3 Microcontact printing on surfaces and derivative articles
04/17/1997DE19642053A1 High resolution excimer laser exposed photoresists
04/17/1997CA2234512A1 Water-processable, chemically amplified resist compositions and processes
04/16/1997EP0768705A2 Stage apparatus and linear motor, and exposure apparatus and device production method using the stage apparatus
04/16/1997EP0768575A2 Method of optimising the arrangement of semiconductor elements on a semiconductor wafer
04/16/1997EP0768573A1 Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel
04/16/1997EP0768572A1 Photoresist composition
04/16/1997EP0768172A1 On press development of a diazo based printing plate
04/16/1997EP0767933A1 Method and apparatus for peeling a laminate
04/16/1997EP0767932A1 Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
04/16/1997EP0767931A1 Increasing the useful range of cationic photoinitiators in stereolithography
04/16/1997EP0767803A1 Method of generating a reactive species and applications therefor
04/16/1997EP0767733A1 Process and device for producing objects by stereolithography
04/16/1997EP0710161A4 Post treatment of a coated substrate with a gas containing excited halogen to remove residues
04/16/1997EP0466770B1 Process for coating a photoresist composition onto a substrate
04/16/1997CN1147868A Photosensitive resin composition, and coating film, resist ink, resist protective film solder protective resist film and substrate of printed circuit
04/16/1997CN1147844A Perforated disc, especially for injection valves, and process for producing it
04/16/1997CN1147694A Method for forming capacitor in memory cell in dynamic random access memory device
04/16/1997CN1147688A Liquid coating method and producing method for electronic device by using said method
04/15/1997US5621822 Method of detecting focus position of object from variable gray level image of object
04/15/1997US5621813 Pattern recognition alignment system
04/15/1997US5621529 Apparatus and method for projecting laser pattern with reduced speckle noise
04/15/1997US5621500 Method and apparatus for projection exposure
04/15/1997US5621499 Scanning exposure apparatus
04/15/1997US5621498 For optically projecting a mask pattern onto a wafer
04/15/1997US5621497 Pattern forming method and projection exposure tool therefor
04/15/1997US5621019 Monomer having vinyl group, polymer thereof and photosensitive resin including those
04/15/1997US5621018 Material comprising substrate having photoinitiator bonded to surface; contact lenses
04/15/1997US5620831 Cyanoguanidine derivatives, and thermosetting or photocurable, thermosetting resin composition using the same
04/15/1997US5620830 Element with gelatin anti-stress layer for making printing plate according to the silver salt diffusion transfer process
04/15/1997US5620829 Developing exposed imaging element comprising photosensitive silver halide emulsion low in silver bromide using alkaline processing liquid in presence of developer, meso-ionic compound, alkanolamine
04/15/1997US5620828 Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator
04/15/1997US5620827 On-press developable lithographic printing plate precursor
04/15/1997US5620818 Mask; grid pattern
04/15/1997US5620816 Layout methodology, mask set, and patterning method for phase-shifting lithography
04/15/1997US5620814 Process and arrangement for producing dose profiles for the fabrication of structured surfaces
04/10/1997WO1997013183A1 Holographic medium and process
04/10/1997WO1997012759A1 On-press developable printing plates with hydrogen bond forming developability stabilizer
04/10/1997DE19640811A1 Process defect of semiconductor module examination method
04/10/1997DE19613650C1 Stable hydrolysable per:fluoro-silane cpds.
04/10/1997DE19536474A1 Cleaning of coated workpieces
04/09/1997EP0767410A2 Automatic developing apparatus for photosensitive lithographic printing plates
04/09/1997EP0767409A2 Process for exposing the peripheral area of a semiconductor wafer for removing unnecessary resist and a device for executing the process
04/09/1997EP0767408A1 Process for the production of photopolymer intaglio printing plates
04/09/1997EP0767407A1 Multilayer recording element suitable for the production of flexographic printing plates by digital information transmission
04/09/1997EP0767406A1 Process for the production of photopolymer relief printing plates
04/09/1997EP0766908A1 Method and device for coating printed-circuit boards, in particular for the manufacture of multi-chip-modules
04/09/1997EP0766880A1 Holographic technique for extreme microcircuitry size reduction
04/09/1997EP0766820A1 The production of electrodes for electrochemical sensing
04/09/1997CN1147147A Method for forming fine patterns of semiconductor device
04/09/1997CN1034532C Undamaged regenerating method for precoated positive sensitive plate
04/08/1997US5619603 Method of creating bragg gratings in waveguides
04/08/1997US5619376 Illuminating optical apparatus for uniformly illuminating a reticle
04/08/1997US5619304 Reduction exposure apparatus with improved resolution characteristic and raised light intensity
04/08/1997US5618932 Reacting a phenol with a hetrocyclic carbonyl compound in presence of acid catalyst forming chemical intermediate, reacting intermediate with napthoquinone diazide sulfonyl chloride; used to form photoresists
04/08/1997US5618892 2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the same
04/08/1997US5618856 Visible light sensitizer for photopolymerizing initiator and/or photocrosslinking agent, photosensitive composition, and hologram recording medium
04/08/1997US5618843 Inhibit platelet aggregation
04/08/1997US5618760 Method of etching a pattern on a substrate using a scanning probe microscope
04/08/1997US5618655 Solvent extraction using cyclohexane and isopropyl acetate, separating aqueous and organic phases
04/08/1997US5618653 Containing all necessary active materials and hydrophobizing agent on surface of solid particles
04/08/1997US5618651 Imaging element with a flexible support and method for making a lithographic printing plate
04/08/1997US5618650 Imaging element and method for making a printing plate according to the silver salt diffusion transfer
04/08/1997US5618649 Storage stability of a diazo-based imaging element for making a printing plate
04/08/1997US5618461 Reflectance method for accurate process calibration in semiconductor wafer heat treatment
04/08/1997US5618380 Wafer edge sealing
04/08/1997US5618348 Air elimination system
04/08/1997US5617790 Apparatus for producing flexographic printing plates
04/08/1997CA2094407C Propylene carbonate recovery process
04/03/1997WO1997012281A1 Process for producing surfactant having a low metal ion level and developer produced therefrom
04/03/1997WO1997012280A1 Metal ion reduction in top anti-reflective coatings for photoresists
04/03/1997WO1997011991A1 Improved colored articles and compositions and methods for their fabrication
04/03/1997WO1997011929A1 Low metal ion containing 4,4'-(1-(4-(1-(4-hydroxyphenyl)-1-methylethyl)phenyl)ethylidene)bisphenol and photoresist compositions therefrom
04/03/1997WO1997011810A1 Laser apparatus
04/03/1997WO1997011623A1 Modular system
04/03/1997WO1997009643A3 System for producing 3-dimensional photon crystals
04/03/1997WO1997003453A3 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
04/03/1997DE19612956A1 Verfahren zur Bildung einer schwarzen Matrix einer Flüssigkristalldisplayvorrichtung A method of forming a black matrix of a liquid crystal display device
04/02/1997EP0766296A2 Method of manufacturing a thin film transistor