| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/25/1997 | US5605782 Optical information carriers |
| 02/25/1997 | US5605781 Containing cationic photoinitiator |
| 02/25/1997 | US5605775 Photomask used by photolithography and a process of producing same |
| 02/25/1997 | US5605726 Organosilicon polymers, and dyes, exhibiting nonlinear optical response |
| 02/25/1997 | US5605723 Method for forming a pattern of non-volatile ferroelectric thin film memory |
| 02/25/1997 | US5604990 Printing plate drying apparatus |
| 02/25/1997 | CA1338947C Polymeric compounds |
| 02/20/1997 | WO1997006468A2 Pattern formation, replication, fabrication and devices thereby |
| 02/20/1997 | WO1997006013A1 Lithographic surface or thin layer modification |
| 02/20/1997 | WO1997006012A1 Stamp for a lithographic process |
| 02/19/1997 | EP0749352A4 Microfabricated particle filter |
| 02/19/1997 | CN1143418A Stable ionomeric photoresist emulsion and process of preparation and use thereof |
| 02/19/1997 | CN1143201A Multifunctional light receiver |
| 02/18/1997 | US5604779 Optical exposure method and device formed by the method |
| 02/18/1997 | US5604354 Masks for a double-side exposure machine |
| 02/18/1997 | US5604081 Method for producing a surface structure with reliefs |
| 02/18/1997 | US5604080 Also containing photocurable resin, photoinitiator, diluent, epoxy compound; storage stability |
| 02/18/1997 | US5604077 Mixture of alkali-soluble novolak and a quinone diazide photosensitizer; heat resistance, resolution, antifouling agents |
| 02/18/1997 | US5604073 Ortho-hydroxy substituted 4-phenylazo compounds; exhibits no loss of adhesion at prebake temperature |
| 02/18/1997 | US5604059 Transparent support plate |
| 02/13/1997 | WO1997005527A1 Method and apparatus for curing photoresist |
| 02/13/1997 | WO1997005526A1 Lithography systems employing programmable reticles |
| 02/12/1997 | EP0758103A1 New type of photo-sensitive element and a process of forming a metal image with it |
| 02/12/1997 | EP0758102A1 Terpolymers containing organosilicon side chains and their use for the production of relief structures |
| 02/12/1997 | EP0758097A1 Polymerizable composition for color filter |
| 02/12/1997 | EP0757629A1 Imaging medium and process |
| 02/12/1997 | EP0757628A1 Process for fixing an image |
| 02/12/1997 | CN1142682A Method for forming fine patterns of semiconductor device |
| 02/11/1997 | US5602683 Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system |
| 02/11/1997 | US5602620 Scanning exposure apparatus and exposure method |
| 02/11/1997 | US5602619 Scanner for step and scan lithography system |
| 02/11/1997 | US5602492 Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate |
| 02/11/1997 | US5602400 Surface position detecting method and apparatus including detection and correction of errors, such as surface position errors or tilt, in exposure regions |
| 02/11/1997 | US5602260 Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions |
| 02/11/1997 | US5601965 Contains hydroxy-modified vinyl chloride/vinyl acetate polymer; useful as photoresists |
| 02/11/1997 | US5601961 High-sensitivity positive-working photoresist composition |
| 02/11/1997 | US5601905 Laminate for insulation protection of circuit boards |
| 02/11/1997 | US5601733 Full field mask illumination enhancement methods and apparatus |
| 02/11/1997 | US5601731 Process for the production of an optoelectronic component having a defined axial variation of the coupling coefficient and a defined axial distribution of the phase shift |
| 02/06/1997 | WO1997004449A1 Nanometer scale data storage device and associated positioning system |
| 02/06/1997 | WO1997004362A1 Screen for flat or rotary screen printing and method for its manufacturing |
| 02/06/1997 | WO1997004361A1 Heterogeneous photo-initiators, photopolymerisable compositions and their use |
| 02/06/1997 | CA2227192A1 Heterogeneous photo-initiators, photopolymerisable compositions and their use |
| 02/05/1997 | EP0757291A2 Processing method and processing apparatus using fast atom beam |
| 02/05/1997 | EP0757290A2 Pattern formation method and surface treating agent |
| 02/05/1997 | EP0757289A1 A method for making a lithographic printing plate |
| 02/05/1997 | EP0757262A1 Convex ultra-fine particle surface structure |
| 02/05/1997 | EP0757061A2 Sulfonamido substituted acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| 02/05/1997 | EP0654149B1 Positive-acting radiation-sensitive mixture and recording material produced therewith |
| 02/05/1997 | CN1142124A Scale mask-plate for off-axis lighting |
| 02/05/1997 | CN1033955C Method for making three-dimension object and apparatus thereof |
| 02/04/1997 | US5600698 X-ray exposure apparatus |
| 02/04/1997 | US5600035 Photoresists; polymer monomers |
| 02/04/1997 | US5599695 Applying a print material onto a substrate for the biosynthesis of an oligonucleotide array |
| 02/04/1997 | US5599655 Crosslinking by radiation a coated copolymer of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane, 3,3',4,4'-tetracarboxy-benzophenone and 2,3,4,5-p-phenylenediamine; |
| 02/04/1997 | US5599654 Process for forming patterned layer of fluorinated resin and devices containing same |
| 02/04/1997 | US5599653 Using as undercoating layer a glycidyl methacrylate-methyl methacrylate copolymer |
| 02/04/1997 | US5599652 Peroxycarboxylic ester initiators derived from nitrogen heterocycles |
| 02/04/1997 | US5599651 Containing at least one acrylate group; coatings, adhesives, photoresists and stereolithography; good strength |
| 02/04/1997 | US5599650 Controlling free radicals using trapping overcoating |
| 02/04/1997 | US5599648 Transferring an polymeric overcoatings by laminating the overcoatings, light exposure to crosslink, peeling off |
| 02/04/1997 | US5599616 Good imaging performance |
| 02/04/1997 | US5599444 Curtain tube, filter, and pump |
| 02/04/1997 | CA2077359C X-ray mask and semiconductor device manufacturing method using the same |
| 02/02/1997 | CA2182463A1 Epoxy-containing waterborne photoimageable composition |
| 01/30/1997 | WO1997003453A2 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 01/30/1997 | WO1997003382A1 Making a photopolymer printing plate |
| 01/30/1997 | WO1997003381A1 Non-corrosive photoresist stripper composition |
| 01/30/1997 | WO1997003197A1 Novel secretion factors for gram-positive microorganisms, genes encoding them and methods of using it |
| 01/30/1997 | WO1997003175A1 Redox reagent-containing post-etch residue cleaning composition |
| 01/30/1997 | WO1997002958A1 Organic amine/hydrogen fluoride etchant composition and method |
| 01/30/1997 | DE19540010A1 Anlage und Verfahren zur Halbleiterbauelementherstellung System and method for semiconductor device fabrication |
| 01/30/1997 | CA2226966A1 Making a photopolymer printing plate |
| 01/29/1997 | EP0756315A1 A resist processing apparatus and a resist processing method |
| 01/29/1997 | EP0756207A2 Process for positioning of a mask relative to another mask or a workpiece and device for executing the process |
| 01/29/1997 | EP0756206A2 Scanning exposure apparatus and exposure method using the same |
| 01/29/1997 | EP0756205A2 Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters |
| 01/29/1997 | EP0756204A1 Photopolymerizable composition and photosensitive lithographic printing plate employing it |
| 01/29/1997 | EP0756203A1 Radiation-sensitive composition |
| 01/29/1997 | EP0755962A2 Photosensitive polyimidosiloxanes and compositions and insulating films made thereof |
| 01/29/1997 | EP0755949A1 Radiation curable masses containing covalently bonded photoinitiators |
| 01/29/1997 | EP0755803A1 Lithographic form plate |
| 01/29/1997 | EP0755781A1 Thin-metal lithographic printing members with visible tracking layers |
| 01/29/1997 | EP0755321A1 Process for producing a three-dimensional object |
| 01/29/1997 | EP0371123B1 Apparatus and process for processing printing plates |
| 01/29/1997 | CN1141501A High speed ashing method |
| 01/29/1997 | CN1141444A Top coats for shoot and run printing plates |
| 01/28/1997 | US5598341 Real-time in-line defect disposition and yield forecasting system |
| 01/28/1997 | US5598250 Prefabricated modified illumination apparatus for forming fine patterns in a semiconductor device |
| 01/28/1997 | US5597868 Phenol-formaldehyde novolac polymer, a methyl methacrylate copolymer for photolithography coatings |
| 01/28/1997 | US5597678 Tricine, bicine or (2-benzothiazolylthio)succinic acid mixed in solvent |
| 01/28/1997 | US5597677 Photosensitive material coated on substrate and protective overcoats comprising oxygen and moisture barriers |
| 01/28/1997 | US5597676 Method for making improved imaging elements suitable for use in silver salt diffusion transfer process |
| 01/28/1997 | US5597670 Exposure method and apparatus |
| 01/28/1997 | US5597668 Patterned filled photo mask generation for integrated circuit manufacturing |
| 01/28/1997 | US5597667 Photomask and photomask blank |
| 01/28/1997 | US5597613 Scale-up process for replicating large area diffractive optical elements |
| 01/28/1997 | US5597408 An organosilicon compound containing a dye structure having light-absorbing properties, solvent and water-soluble polymer; photoresist adhesion and prevention of notching |
| 01/23/1997 | WO1997002724A1 Procedure and device for the chemical and electrolytic treatment of printed circuit boards and films |
| 01/23/1997 | WO1997002511A1 Electrodepositable photoimageable compositions with improved edge coverage |