Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/1997
01/02/1997EP0531292B1 Photoresist stripper
01/02/1997DE19626261A1 IC pattern and metal surface test object observation differential interference microscope
01/02/1997DE19626003A1 Enhanced resist compsn. for deep UV exposure and alkaline development
01/02/1997DE19625894A1 Lithographic photomask production apparatus for LSI semiconductor manufacture
01/02/1997DE19625669A1 Compatibility precision measurement mark for semiconductor photomask manufacture
01/02/1997DE19625595A1 Verfahren zur Bildung feiner Muster eines Halbleiterelements A method for forming fine patterns of a semiconductor element
01/02/1997DE19624649A1 Maske zur Überprüfung der Linsenverzerrung bei einem Stepper Mask to check the lens distortion with a stepper
01/02/1997DE19524099A1 Verfahren zur Herstellung von Formeinsätzen Process for the preparation of mold inserts
01/02/1997DE19522936A1 Verfahren und Vorrichtung zum Strukturieren einer photolithographischen Schicht Method and device for structuring a photolithographic layer
01/01/1997CN1139219A Ultraviolet transducing film and its production and use
12/1996
12/31/1996US5590239 Planar uniform heating surface with additional circumscribing ring
12/31/1996US5589735 Fluorescent tube in which are encapsulated a cathode, an anode and a buffer gas; power source
12/31/1996US5589553 Photoresists
12/31/1996US5589424 Photodefinable dielectric layers comprising poly(aromatic diacetylenes)
12/31/1996US5589319 Photosensitive polyimide resin composition
12/31/1996US5589315 Shelf life, screen printing
12/31/1996US5589306 Photosensitive resin composition for producing a relief printing plate
12/31/1996US5589270 Electroconductive polymer, semiconductors
12/31/1996US5589250 Resin compositions and printed circuit boards using the same
12/31/1996US5588359 Method for forming a screen for screen printing a pattern of small closely spaced features onto a substrate
12/27/1996WO1996042036A1 Self-trapping and self-focusing of optical beams in photopolymers
12/27/1996WO1996042035A1 Photosensitive paste, plasma display, and process for the production thereof
12/27/1996EP0750231A1 Exposure apparatus and exposure method using the same
12/27/1996EP0750230A2 Negative type photosensitive compositions
12/27/1996EP0750229A1 Liquid photosensitive resin composition for forming relief structures
12/27/1996EP0750227A1 Imaging element and method for making lithographic printing plates according to the silver salt diffusion transfer process
12/27/1996EP0750002A2 Process for the preparation of poly-o-hydroxy amides
12/27/1996EP0749594A1 Stable, ionomeric photoresist emulsion and process of preparation and use thereof
12/27/1996EP0749474A1 Microfabricated capsules for isolation of cell transplants
12/27/1996EP0749352A1 Microfabricated particle filter
12/27/1996EP0749347A1 Processes and devices for removing coating layers from printed circuit boards
12/25/1996CN1138524A FM and AM netting method
12/24/1996US5587834 Semiconductor device manufacturing method and projection exposure apparatus using the same
12/24/1996US5587794 Surface position detection apparatus
12/24/1996US5587492 Polyhydric phenol compound and positive resist composition comprising the same
12/24/1996US5587275 Photosensitive resin composition and a process for forming a patterned polyimide film using the same
12/24/1996US5587274 Polymer having an acid value of 2 to 200; a photoactivator which generates an acid in response to light irradiation
12/24/1996US5587273 Molecularly imprinted materials, method for their preparation and devices employing such materials
12/24/1996US5587272 Process for preparing multiple color proofs
12/24/1996US5587271 Damping solution contains clay incorporating inorganic polyphosphate peptiser
12/24/1996US5587267 Method of forming photoresist film exhibiting uniform reflectivity through electrostatic deposition
12/24/1996US5587261 UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating
12/24/1996US5587260 Method of forming a functional film
12/24/1996CA2011927C Microlithographic method for producing thick, vertically-walled photoresist patterns
12/24/1996CA2000070C Image forming method and image forming medium
12/19/1996WO1996041370A1 Removal of material by polarized radiation and back side application of radiation
12/19/1996WO1996041368A1 Multilayer high vertical aspect ratio thin film structures
12/19/1996WO1996041240A1 Water photoresist emulsions and methods of preparation thereof
12/19/1996WO1996041239A1 Photohardenable epoxy composition
12/19/1996WO1996041238A1 Stabilizers for use with photoacid precursor formulations
12/19/1996WO1996041237A1 Sensitizers and photoacid precursors
12/19/1996WO1996041236A1 Therapeutic microdevices and methods of making and using same
12/19/1996WO1996041235A1 Molecularly imprinted materials, method for their preparation and devices employing such materials
12/19/1996WO1996041204A1 Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus
12/19/1996WO1996040800A1 Peroxide and radiation curable compositions containing isobutylene copolymers having acrylate functionality
12/19/1996WO1996040729A1 A method of cross-linking amino acid-containing polymers using photoactivatable chemical cross-linkers
12/19/1996WO1996040528A1 Thiol-containing photosensitive polymeric foam compositions
12/19/1996WO1996040420A1 Micromachined porous membranes with bulksupport
12/19/1996WO1996034745A3 Exposure process and device
12/19/1996CA2570713A1 Removal of material by polarized radiation and back side application of radiation
12/19/1996CA2222595A1 Therapeutic microdevices and methods of making and using same
12/19/1996CA2222239A1 A method of crosslinking amino acid-containing polymers using photoactivatable chemical cross-linkers
12/18/1996EP0749046A1 Positive-working photoresist composition
12/18/1996EP0749045A2 Photosensitive compositions and their use in lithographic plates
12/18/1996EP0749044A2 Positive-working photoresist composition
12/18/1996EP0749043A2 Process for production of ink jet head
12/18/1996EP0748951A1 Active anti-vibration apparatus and method of manufacturing the same
12/18/1996EP0738285A4 Cationic polymerization
12/18/1996EP0572524B1 Red sensitive photopolymerizable compositions
12/18/1996CN1137979A Support material for making color test prints in analog proof system
12/18/1996CN1137948A Liquid supplying apparatus
12/17/1996US5586159 Substrate holding system and exposure apparatus having the same
12/17/1996US5586059 Automated data management system for analysis and control of photolithography stepper performance
12/17/1996US5585972 Arbitrarily wide lens array with an image field to span the width of a substrate
12/17/1996US5585923 Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means
12/17/1996US5585904 Drum type image transfer apparatus
12/17/1996US5585886 Apparatus for printing a photosensitive material and positioning device
12/17/1996US5585507 Alkylsulfonium salts and photoresist compositions containing the same
12/17/1996US5585450 Photodefinable polymers
12/17/1996US5585416 UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications
12/17/1996US5585225 UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications
12/17/1996US5585224 Covering reverse surface having etched recesses with barrier film having controllable adhesion, then etching recesses in front surface to connect with those on reverse and treating film to reduce adhesion
12/17/1996US5585223 Radiation activation; heating; etching
12/17/1996US5585222 Resist composition and process for forming resist pattern
12/17/1996US5585221 Active energy ray-curing resin composition
12/17/1996US5585220 Resist composition with radiation sensitive acid generator
12/17/1996US5585219 Resist composition and process for forming resist pattern
12/17/1996US5585218 Photoresist composition containing alkyletherified polyvinylphenol
12/17/1996US5585217 Polyamic acid composition
12/17/1996US5585211 Fabrication and use of sub-micron dimensional standard
12/17/1996US5585210 Mask pattern of a semiconductor device and a method of manufacturing fine patterns using the same
12/12/1996WO1996039294A1 Vacuum lamination device and vacuum lamination method
12/12/1996WO1996031807A3 Platesetter
12/12/1996DE19622464A1 Licht- und wärmehärtbare Zusammensetzung, die mit einer wässerigen Alkalilösung entwickelbar ist Photocurable and thermosetting composition which is developable with an aqueous alkali solution
12/12/1996DE19521170A1 Mfg. channel structures in substrates for integrated optical components
12/11/1996EP0748009A2 Output control method for excimer laser
12/11/1996EP0747773A1 Method and apparatus for treating developer for pigment-containing nonsilver photosensitive material, and automatic developing machine
12/11/1996EP0747772A1 Illumination device for a projection microlithography tool
12/11/1996EP0747771A2 Photopolymerizable composition
12/11/1996EP0747770A2 One-package type photosolder resist composition developable with aqueous alkali solution and method for production of printed circuit board by use thereof