Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/1997
01/23/1997WO1997002108A1 Process for manufacturing mould inserts
01/23/1997DE4244838C2 Resist pattern coating on substrate by deep UV lithography
01/23/1997DE19628264A1 Formation of finely-detailed printed circuits esp. for semiconductor component mounting plates
01/23/1997CA2225829A1 Method and device for chemical and electrolytic treatment of printed circuit boards and conductor films
01/23/1997CA2181735A1 Radiation-curable compositions containing photoinitiators linked by a covalent bond
01/22/1997EP0755067A1 Method of fabrication for sublithographic etching masks
01/22/1997EP0754976A2 Surface activating process, and device and lamp for performing said process
01/22/1997EP0754975A2 Process of reducing trace levels of metal impurities from resist components
01/22/1997EP0754565A1 A concentrated dampening solution with an improved anti-staining activity for printing with a lithographic printing plate obtained according to the silver salt diffusion transfer process
01/22/1997EP0678201B1 Lithographic printing plates with photoreactive polymeric binders
01/22/1997EP0662222B1 Positive-working photoresist composition
01/22/1997EP0436617B1 Baking treatment of lithographic printing plate
01/22/1997CN1141088A Process for making an array of tapered photopolymerized waveguides
01/22/1997CN1140843A Photosensitive resin composition for sandblast resist
01/21/1997US5596618 Exposure apparatus and device manufacturing method using the same
01/21/1997US5596596 Narrow band excimer laser
01/21/1997US5595941 Semiconductors
01/21/1997US5595938 Method of manufacturing semiconductor device
01/21/1997US5595861 Method of selecting and applying a top antireflective coating of a partially fluorinated compound
01/21/1997US5595859 Process for preparing an article having deposited thereon a photoimageable electrodepositable photoresist composition
01/21/1997US5595858 Manufacturing method for double-sided wiring board
01/21/1997US5595857 Method of forming a pattern and projection exposure apparatus
01/21/1997US5595856 Polycarbodiimides with basic compounds and radiation
01/21/1997US5595855 Radiation sensitive composition
01/21/1997US5595843 Using horizonatal and vertical lines to locate position of device features, semiconductor, printed circuit manufacture
01/21/1997US5595790 Method for forming a reflective surface for a LCD
01/21/1997US5595703 Method for supporting an object made by means of stereolithography or another rapid prototype production method
01/21/1997CA2010030C Method for transferring patterns on silicone ladder type resin and etching solution used in such method
01/21/1997CA1338871C Radiation sensitive compounds
01/15/1997EP0753885A1 Improvements in or relating to semiconductor devices
01/15/1997EP0753796A1 Scanning exposure apparatus and device for manufacturing method using the same
01/15/1997EP0753795A1 Positive working photoresist composition
01/15/1997EP0753791A1 Diffusing, depixelating or projection screen and contrast enhancing means
01/15/1997EP0753765A2 Method for forming multiple-layer microlenses and use thereof
01/15/1997EP0753764A1 Improvements in or relating to semiconductor devices
01/15/1997EP0753763A1 Improvements in or relating to semiconductor devices
01/15/1997EP0753550A1 Conductive coating composition
01/15/1997EP0753415A2 Image forming method
01/15/1997EP0605407B1 Processing apparatus
01/15/1997CN1140493A Masks for lithographic patterning using off-axis illumination
01/15/1997CN1140187A Coatings and recording materials stabilized with benzotriazole UV absorbers
01/15/1997CN1140168A Novel 2-(2-hydroxy-3-alpha-cumyl-5-alkylphenyl)-2H-benzotriazoles
01/15/1997CN1140136A Stamp materials and method how to make stamp materials
01/14/1997US5594626 Partially-molded, PCB chip carrier package for certain non-square die shapes
01/14/1997US5594587 Illumination device with allowable error amount of telecentricity on the surface of the object to be illuminated and exposure apparatus using the same
01/14/1997US5594549 Position detecting method and projection exposure apparatus using the same
01/14/1997US5594526 Optical integrator and projection exposure apparatus using the same
01/14/1997US5594330 Movement actuator/sensor systems
01/14/1997US5594098 Passing formaldehyde solution through ion exchange resin
01/14/1997US5594086 Preparation and use of poly(3,5 disubstituted-4-hydroxystyrene/n-substituted maleimide)
01/14/1997US5593814 Having a pattern composed of a cell adhesive and a cell non-adhesive surface; medical technology
01/14/1997US5593813 Method for forming submicroscopic patterns
01/14/1997US5593812 Photoresist having increased sensitivity and use thereof
01/14/1997US5593811 Multilayer, sheet-like, photosensitive recording material for the production of printing plates
01/14/1997US5593808 LAT imaging onto intermediate/receptor elements/"LAT decalcomania"
01/14/1997US5593800 Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
01/14/1997US5593725 Anti-reflective layer and method for manufacturing semiconductor device using the same
01/14/1997CA2090099C Method of forming a multilayer printed circuit board and product thereof
01/14/1997CA2039257C Measuring method and apparatus
01/11/1997CA2180580A1 Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates
01/09/1997WO1997001184A1 Positioning method
01/09/1997WO1997001130A1 Method and device for producing features on a photolithographic layer
01/09/1997DE19524523A1 Anwendung eines Verfahrens und einer Vorrichtung zum Behandeln von Fluiden in der Leiterplattentechnik Use of a method and an apparatus for treating fluids in the circuit board art
01/08/1997EP0752623A2 Process for the formation of image
01/08/1997EP0752622A1 Acetal polymers useful in photosensitive compositions
01/08/1997EP0752430A2 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates
01/08/1997EP0403580B1 Light-sensitive novolac resins
01/08/1997CN1139767A Method of making pattern from thin film layer by utilizing intermediate medium layer
01/08/1997CN1139620A Print stamp material and package material thereof
01/08/1997CA2180581A1 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates
01/07/1997US5592329 Catadioptric optical system
01/07/1997US5592259 Photomask, an exposure method and a projection exposure apparatus
01/07/1997US5592211 Laser pattern/inspector with a linearly ramped chirp deflector
01/07/1997US5592018 Membrane dielectric isolation IC fabrication
01/07/1997US5592007 Membrane dielectric isolation transistor fabrication
01/07/1997US5591958 Scanning exposure method and apparatus
01/07/1997US5591871 Bislactone compound and a process for producing the same
01/07/1997US5591654 Quinonediazide-pyrogallol-acetone polymer
01/07/1997US5591566 Method of forming a resist pattern by using a silicon carbide anti-reflective layer
01/07/1997US5591564 Gamma ray techniques applicable to semiconductor lithography
01/07/1997US5591563 Photocurable resins for stereolithography and compositions containing same
01/07/1997US5591562 Water and acid developable photoresist composition exhibiting improved adhesion
01/07/1997US5591551 UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications
01/07/1997US5591490 Acoustic deposition of material layers
01/07/1997US5591264 Spin coating device
01/07/1997US5591262 Rotary chemical treater having stationary cleaning fluid nozzle
01/07/1997US5590942 Polarizing conversion unit, illuminating device and projector using them
01/07/1997CA2109275C Projection electron lithographic procedure
01/07/1997CA2079562C X-ray exposure apparatus
01/03/1997WO1997000534A1 Method of removing resist, and adhesive or adhesive sheet used for the method
01/03/1997WO1997000465A1 Resin compositions for photoresist applications
01/03/1997WO1997000295A1 Carbon black graft polymer, process for the production of the polymer and use thereof
01/03/1997WO1997000278A1 Process for preparing polyhydroxystyrene with a novolak type structure
01/02/1997EP0751548A1 Mercury lamp of the short arc type and process for operation thereof
01/02/1997EP0751433A2 Release composition and photosensitive rubber plate with layer of the same
01/02/1997EP0751432A1 Imaging element for making an improved printing plate according to the silver salt diffusion transfer process
01/02/1997EP0751430A1 Apparatus and method for making a lithographic printing plate by silver salt diffusion transfer processing
01/02/1997EP0751429A1 Image receiving layer for use in a silver salt diffusion transfer process
01/02/1997EP0750999A2 Thermal imaging apparatus and method for material dispensing and applicating
01/02/1997EP0697967B1 Thermosensitive recording material