Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/1997
03/12/1997EP0761720A2 Process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides
03/12/1997EP0761719A2 Process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides
03/12/1997EP0761718A2 Process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides
03/12/1997EP0761717A2 Process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides
03/12/1997EP0761716A2 Process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides
03/12/1997EP0761429A1 Negative-working image recording material
03/12/1997EP0761428A2 Stamp-making apparatus, as well as function changeover mechanism, exposure system and stamp-making object material-detecting device therefor
03/12/1997EP0761318A2 Disk coating system
03/12/1997EP0760971A1 Dry-developable positive resist
03/12/1997EP0586373B1 Methods of fabricating dual anode, flat panel electrophoretic displays
03/12/1997CN1144971A Method for forming light absorbing layer of color cathode ray tube
03/12/1997CN1144915A Method of forming polyimide patterns on substrates
03/11/1997US5610965 Exposure method
03/11/1997US5610763 Illuminating optical apparatus
03/11/1997US5610754 Method and apparatus for photolithography by rotational scanning
03/11/1997US5610753 Optical design of laser scanner to reduce thermal sensitivity
03/11/1997US5610747 High density, three-dimensional, intercoupled circuit structure
03/11/1997US5610733 Beam-homogenizer
03/11/1997US5610718 Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes
03/11/1997US5610715 Displacement detecting system, an expose apparatus, and a device manufacturing method employing a scale whose displacement is detected by a selected detection head
03/11/1997US5610686 Exposure apparatus including an antivibration control system
03/11/1997US5610684 Projection exposure apparatus
03/11/1997US5610683 Immersion type projection exposure apparatus
03/11/1997US5610682 Photographing method and photosensitive material printing apparatus utilizing the same
03/11/1997US5610206 High molecular weight compound having a monomer chain forming a homopolymer rubber and a photopolymerizable resin composition containing the same
03/11/1997US5610082 Method for fabricating thin film transistor using back light exposure
03/11/1997US5609995 Method for forming a thin uniform layer of resist for lithography
03/11/1997US5609994 Method for patterning photoresist film having a stepwise thermal treatment
03/11/1997US5609992 Photopolymerizable composition
03/11/1997US5609991 Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
03/11/1997US5609989 Acid scavengers for use in chemically amplified photoresists
03/11/1997US5609988 Radiation sensitive resin composition
03/11/1997US5609987 Oleophilic tanning synthetic resin
03/11/1997US5609984 Radiation transparent, nonphotosensitive polymeric layer; adhesion, low gloss, and solvent compatibility
03/11/1997US5609983 Quinone diazide with n-sulfonamide
03/11/1997US5609982 Positive-working photoresist composition
03/11/1997US5609981 Waterless presensitized printing plate comprising four layers and method of making thereof
03/11/1997US5609980 Radiation-sensitive materials comprising a layer having core-shell particles and a second layer with a radiation sensitive component
03/11/1997US5609967 Decorative plate
03/11/1997US5609945 Partially translucent white film having metallized surface
03/11/1997US5609943 Liquid crystals
03/11/1997US5609939 Viewing screen formed using coherent light
03/11/1997US5609914 Method for preparing high resolution polyimide images using non-photosensitive layers of poly(amic acid) or salts thereof
03/11/1997US5609813 Method of making a three-dimensional object by stereolithography
03/11/1997US5609812 Method of making a three-dimensional object by stereolithography
03/06/1997WO1997008924A1 Laser write process for making a conductive metal circuit
03/06/1997WO1997008589A1 Film-stripping process
03/06/1997WO1997008588A1 Mask structure having offset patterns for alignment
03/06/1997WO1997008141A1 Novel sulfonium salt compounds, polymerization initiator, curable composition, and curing method
03/06/1997WO1997007986A2 Water-less lithographic plates
03/06/1997WO1997007970A2 Process for fabricating three-dimensionally structured polymer films for integrated optics
03/06/1997WO1997007926A1 Laser beam machining device and laser
03/06/1997DE19628353A1 Verfahren zur Verbesserung des Kontrastes bei der Strukturierung von 3-dimensionalen Oberflächen A method of improving the contrast in the structuring of 3-dimensional surfaces
03/06/1997DE19532648A1 Verfahren und Vorrichtung zur Ansteuerung von diodengepumpten Festkörperlasern Method and apparatus for controlling the diode-pumped solid state lasers
03/06/1997CA2226782A1 Water-less lithographic plates
03/06/1997CA2226520A1 Method for film stripping
03/05/1997EP0760109A1 Method for particle wave reconstruction in a particle-optical apparatus
03/05/1997EP0759906A1 Stilbazolium salt, and preparation and use thereof
03/05/1997EP0654150B1 A flexographic printing element having an ir ablatable layer and process for making a flexographic printing plate
03/05/1997EP0465562B1 A near infrared laser absorbing coating and method for using same in color imaging and proofing
03/05/1997CN1144344A Method for forming photoresist pattern
03/04/1997US5608773 Mask holding device, and an exposure apparatus and a device manufacturing method using the device
03/04/1997US5608576 Projection method and projection system and mask therefor
03/04/1997US5608575 Image projection method and semiconductor device manufacturing method using the same
03/04/1997US5608492 Scanning type exposure apparatus and method and device manufacturing method
03/04/1997US5608441 Thermal-transfer recording process
03/04/1997US5608227 Mercury-vapor high-pressure short-arc discharge lamp, and method and apparatus for exposure of semiconductor wafers to radiation emitted from said lamp
03/04/1997US5607987 Photostability for electrocoating or clear finishes
03/04/1997US5607824 Antireflective coating for microlithography
03/04/1997US5607821 Optical exposure method
03/04/1997US5607817 Photopolymerizable composition
03/04/1997US5607816 On-press developable lithographic printing plates with high plasticizer content photoresists
03/04/1997US5607814 Process and element for making a relief image using an IR sensitive layer
03/04/1997US5607813 Urethane monomer
03/04/1997US5607811 Method for making a lithographic printing plate using ascorbic acid developer
03/04/1997US5607810 Method for making a lithographic printing plate requiring no wet processing
03/04/1997US5607801 Direct patterning method of resist film using electron beam
03/04/1997US5607800 E. g., irradiating arrangement so patterned layer reflects more radiation than underlying layer, which absorbs more radiation than patterned layer, measuring zeroth order reflected radiation, expressing as reflectance, comparing
03/04/1997US5607774 Phosphor screen made of particulate phosphors in binder on substrate; binder is radiation cured product of terminally difunctional organopolysiloxane formed by reacting polysiloxanediamine with unsaturated electrophile
03/04/1997CA1338966C Antistatic and electrically conductive relief images, processes for the production thereof, coating agents and radiation-sensitive polymers
03/04/1997CA1338955C Process for forming images
02/1997
02/27/1997WO1997007430A1 Water-less lithographic plates
02/27/1997WO1997007429A1 Self-assembled monolayer directed patterning of surfaces
02/27/1997WO1997007145A1 Thermosetting anti-reflective coatings and method for making same
02/27/1997DE19531068A1 Mask prodn. on semiconductor substrate
02/27/1997CA2229536A1 Water-less lithographic plates
02/26/1997EP0759578A1 Apparatus for the exposure of micropattern in a photosensitive layer and process for creating a pattern therein
02/26/1997EP0759577A1 Liquid photosensitive resin composition for flexography
02/26/1997EP0759564A1 Method of making a color filter array by lamination transfer
02/26/1997EP0759449A2 Process for the preparation of methyl-substituted polyalkylidene polyphenols
02/26/1997EP0759193A1 Vinylbenzyl thymine monomers and polymers and products prepared from same
02/26/1997EP0759192A1 Process control strip and a method of recording
02/26/1997EP0677183B1 Process for producing a developer having a low metal ion level
02/26/1997CN1143929A Stamp stock, method of forming stamp by use same, and stamp manufactured by stamp forming method
02/25/1997US5606720 Photographic processing apparatus
02/25/1997US5606586 X-ray exposure method and apparatus and device manufacturing method
02/25/1997US5606220 Visible lamp including selenium or sulfur
02/25/1997US5606172 Exposing apparatus and exposing method of works
02/25/1997US5605941 Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formulation of curable compositions
02/25/1997US5605783 Forming lenslet forming layer, forming etch stop layer, anisotropically plasma pattern etching lenslet forming layer