Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
06/1984
06/12/1984US4453828 Apparatus and methods for measuring the optical thickness and index of refraction of thin, optical membranes
06/05/1984US4453086 Electron beam system with reduced charge buildup
06/05/1984US4452665 Polymeric halocarbons as plasma etch barriers
05/1984
05/29/1984US4451552 Impervious thin film covering the image surface; antisticking agents
05/29/1984US4451544 Mask structure for X-ray lithography and method for manufacturing the same
05/16/1984EP0108160A1 Method to adjust and monitor a light spot
05/15/1984US4448873 Negative working diazo contact film
05/15/1984US4448865 Shadow projection mask for ion implantation and ion beam lithography
05/15/1984US4448532 Automatic photomask inspection method and system
05/08/1984US4447830 Image scanning apparatus and method
05/02/1984EP0107331A2 Photomask
05/01/1984US4446184 Flexible non-extensible hinge for photomask assembly
05/01/1984CA1166507A1 Photoresist developer including an alkali metal hydroxide and a chelating agent for aluminium ion
04/1984
04/24/1984US4444853 Storage battery construction
04/24/1984US4444801 Metallization
04/24/1984CA1166057A1 Method of forming photoresist patterns
04/18/1984EP0105661A1 Apparatus for inspecting a circuit pattern drawn on a photomask used in manufacturing large scale integrated circuits
04/17/1984US4443096 On machine reticle inspection device
04/10/1984US4442188 System for specifying critical dimensions, sequence numbers and revision levels on integrated circuit photomasks
04/10/1984US4441791 Deformable mirror light modulator
04/04/1984EP0104685A2 Method of manufacturing a mask for obtaining texturised patterns in resist layers using X-ray lithography
04/04/1984EP0104684A2 Mask for obtaining textured patterns in resist layers using X-ray lithography and method of manufacturing the same
04/04/1984EP0104633A2 Method and apparatus for cleaning work pieces, in particular circuit boards
04/03/1984US4441020 Method for tracing an object
04/03/1984US4440841 Chemical resistance
04/03/1984US4440491 Photographic transparency supporting device
04/03/1984CA1164707A1 Dye imbibition imaging material including cationic mordant layer and photosensitive polyesterionomer layer
03/1984
03/28/1984EP0103844A2 X-ray mask
03/28/1984EP0103671A2 Method and apparatus for forming a subsequent metallization pattern on a ceramic substrate
03/27/1984US4439022 Arrangement for the point- and line-wise recording of image information
03/21/1984EP0103280A2 Fabrication method of membrane structure
03/13/1984US4436797 Foil of amorphous, hydrogenated carbon
03/07/1984EP0101752A1 Reversal process for the production of chromium masks
03/06/1984US4435491 Electroconductive support with hydrophilic surface with light sensitive layer and photoconductive insulation
03/06/1984US4435489 Cationic hydrazone derivatives, processes for their preparation and their use
02/1984
02/28/1984US4434223 Photopolymerizable, printing plates
02/28/1984US4434217 Chalcogenide product
02/28/1984US4433911 Method of evaluating measure precision of patterns and photomask therefor
02/21/1984US4433130 Cycloalkylsulfonates, polymers and processes relating to same
02/21/1984CA1162591A1 Apparatus for point to point and line by line recording of image information
02/14/1984US4431695 High resolution recording medium
01/1984
01/31/1984US4429027 In situ photomasking
01/24/1984US4427758 Sodium bisulfite-aldehyde adduct gelatin hardener
01/18/1984EP0098318A1 Process for the formation of grooves having essentially vertical lateral silicium walls by reactive ion etching
01/17/1984US4426437 Imageable material with radiation absorbing microstructured layers overcoated with photoresist layer
01/17/1984US4426152 Method and machine for positioning films on base sheets
01/11/1984EP0097831A2 Optical projection systems and methods of producing optical images
01/11/1984EP0097764A1 X-ray lithographic mask
01/11/1984EP0097724A1 Scanning method and arrangement
01/03/1984US4423959 Positioning apparatus
12/1983
12/27/1983US4422898 Iron pentacarbonyl decomposition, patterns, etching
12/21/1983EP0096564A2 Forms manufacturing system
12/21/1983EP0096224A1 Positioning method for mask set used in IC fabrication
12/20/1983US4422153 Oblique projection original and oblique projection original forming apparatus and method
12/20/1983US4421836 Method for repairing silver image glass photomasks with Ni
12/20/1983US4421593 Reverse etching of chromium
12/06/1983US4419675 Imaging system and method for printed circuit artwork and the like
12/06/1983US4419438 Photochromic compound, free radicals, unsaturated monomer, actinic radiation absorber
11/1983
11/30/1983EP0095094A2 Photomask with corrected white defects
11/30/1983EP0095058A2 Device for positioning and registering print control bars on a lay-out film
11/29/1983US4417946 Method of making mask for structuring surface areas
11/29/1983CA1157700A1 Production of reverse reading positive images of a straight reading original
11/15/1983US4415262 Photomask
11/08/1983US4414317 Transparency, a method for forming it and a photographic mask whose optical densities are correlated with the contour of a surface
11/08/1983CA1156505A1 Method of directly manufacturing reticles on chrome-coated plates by means of a pattern generator
11/01/1983US4412739 Hinged glass photomask assembly
10/1983
10/25/1983US4411972 Tin or tin-indium dopes, transparent, dielectrics, electroconductivity, patterns, opacity
10/18/1983US4411013 System for transferring a fine pattern onto a target
10/18/1983US4410611 Ion bombardment, carbonization, integrated circuits
10/12/1983EP0090924A2 Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
10/11/1983US4409686 Method of serialization of dice
10/11/1983US4409305 Development
10/05/1983EP0090673A2 Image-forming elements
10/04/1983US4407891 Low temperature reduction process for large photomasks
09/1983
09/27/1983CA1154290A1 Method for producing a photomechanical color image using a strippable photostencil and water-permeable, water-insoluble color media
09/20/1983US4405701 Methods of fabricating a photomask
09/06/1983US4403043 Glass for photoetching mask
09/06/1983US4402600 Photomask for producing semiconductor devices
09/06/1983CA1153227A1 Method and apparatus for making grating
08/1983
08/31/1983EP0087309A1 Protected vapor-deposited metal layers
08/30/1983US4401750 Coating substrate with photoresists, projecting light, and etching
08/30/1983US4401738 X-Ray lithography mask
08/09/1983US4397543 Mask for imaging a pattern of a photoresist layer, method of making said mask, and use thereof in a photolithographic process
08/09/1983US4397078 Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits
08/02/1983US4396683 Metal coated with metal oxide
07/1983
07/19/1983US4393593 Register-pin-locating device
07/13/1983EP0083408A2 Methods and apparatus for testing lithographic masks using electron beam scanning
07/13/1983EP0020455B1 Arrangement with radiation window or mask structure
07/12/1983US4393127 Structure with a silicon body having through openings
07/06/1983EP0082977A1 Integrated circuit photomask
07/05/1983US4391916 Alkali-free glass for photoetching mask
07/05/1983US4391899 Method of making a half-tone gravure printing plate
07/05/1983US4391683 Mask structures for photoetching procedures
07/05/1983US4391034 Thermally compensated shadow mask
06/1983
06/29/1983EP0082588A2 Photolithographic elements for the production of metal images
06/29/1983EP0082479A1 Laser pattern generating system
06/28/1983US4390592 Low temperature reduction process for photomasks
06/28/1983US4390273 Projection mask as well as a method and apparatus for the embedding thereof and projection printing system
06/28/1983CA1149080A1 System and method for producing artwork for printed circuit boards
06/22/1983EP0081925A1 Cycloalkylsulfonates, cycloalkylsulfonate-containing polymers and processes for preparing them