| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 02/15/2007 | WO2007019269A2 System and method for creating a focus-exposure model of a lithography process |
| 02/15/2007 | US20070037099 Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method |
| 02/15/2007 | US20070037080 Projection optical system, exposure apparatus, and exposure method |
| 02/15/2007 | US20070037079 Projection optical system, exposure apparatus, and exposure method |
| 02/15/2007 | US20070037078 Reference wafer for calibrating semiconductor equipment |
| 02/15/2007 | US20070037072 Levenson type phase shift mask and manufacturing method thereof |
| 02/15/2007 | US20070037071 Method for removing defect material of a lithography mask |
| 02/15/2007 | US20070037070 Light exposure mask and method for manufacturing semiconductor device using the same |
| 02/15/2007 | US20070037069 Exposure mask |
| 02/15/2007 | US20070035716 Exposure method |
| 02/14/2007 | EP1751624A1 Ultraviolet-transparent alkanes and processes using same in vacuum and deep ultraviolet applications |
| 02/14/2007 | EP1751587A2 Films for optical use and methods of making such films |
| 02/14/2007 | CN1914559A Silver halide color photographic light-sensitive material and color image-forming method |
| 02/13/2007 | US7177072 Optical wavelength converting device and process for producing the same |
| 02/13/2007 | US7176484 Use of an energy source to convert precursors into patterned semiconductors |
| 02/13/2007 | US7175978 Silver salt photothermographic dry imaging material |
| 02/13/2007 | US7175977 Stabilizers for use in thermographic recording materials |
| 02/13/2007 | US7175970 Forming trench above via from photoresist trench pattern in dielectric layer; treating locally base portions by a post treatment using trench pattern as mask to enhance mechanical strength; depositing seed and barrier layers; filling |
| 02/13/2007 | US7175952 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 02/13/2007 | US7175951 Two mask in-situ overlay checking method |
| 02/13/2007 | US7175947 surface for reflecting external light to be utilized, and a cured resin layer serving as a carrier for the reflection layer |
| 02/13/2007 | US7175945 Phase shifting zones for separation of light source used to determine the quality of photolithographic prints |
| 02/13/2007 | US7175943 Multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking |
| 02/13/2007 | US7175941 alternate phase shift mask suitable for projecting images of isolated holes, densely packed holes, and arbitrary mixes of isolated and densely packed holes |
| 02/08/2007 | WO2005101112A3 Optical films and methods of making the same |
| 02/08/2007 | US20070031761 Polymers, methods of use thereof, and methods of decomposition thereof |
| 02/08/2007 | US20070031759 Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor |
| 02/08/2007 | US20070031745 System and method for creating a focus-exposure model of a lithography process |
| 02/08/2007 | US20070031744 Lithography process optimization and system |
| 02/08/2007 | US20070031743 Alignment and alignment marks |
| 02/08/2007 | US20070031738 Method and system for printing lithographic images with multiple exposures |
| 02/08/2007 | DE112005000660T5 Methoden und Systeme zum Messen einer Eigenschaften eines Substrats oder zur Vorbereitung eines Substrats zur Analyse Methods and systems for measuring properties of a substrate or the preparation of a substrate for analysis |
| 02/06/2007 | US7173258 Radiation image conversion panel and preparation method thereof |
| 02/06/2007 | US7172855 Silver halide photographic light-sensitive material and package thereof |
| 02/06/2007 | US7172853 Method of manufacturing semiconductor integrated circuit devices |
| 02/06/2007 | US7172852 Thermographic recording material with improved developability |
| 02/06/2007 | US7172840 Photomask features with interior nonprinting window using alternating phase shifting |
| 02/06/2007 | US7172839 Preventing surface damage; coarse focused ion etching followed by gas assisted electron beam removal of thin film contaminated with gallium |
| 02/06/2007 | US7172838 Obtaining data for at least one feature from a layout database; assigning lithographic size identifier to feature; associating twin phase-edge pattern data with the at least one feature; exporting twin phase-edge pattern data to layout |
| 02/01/2007 | WO2006113135A3 Method for determining and correcting reticle variations |
| 02/01/2007 | US20070026349 Photothermographic material |
| 02/01/2007 | US20070026347 Method for fabricating thin film transistor and pixel structure |
| 02/01/2007 | US20070026346 Cleaning solution for lithography |
| 02/01/2007 | US20070026345 Irradiating a photoresist through a lens and an immersion liquid, removing the immersion liquid and charging the immersion space with a supercritical fluid; bubble-free fluid, improved resolution; reduced down time for cleaning |
| 02/01/2007 | US20070026325 Substrate distortion measurement |
| 02/01/2007 | US20070026321 forming first conductive layer, forming composition layer over first conductive layer by discharging a composition in which nanoparticles comprising conductive material covered with organic material are dispersed in solvent, drying the composition layer; and decomposing organic material |
| 02/01/2007 | US20070026320 Phase shift photomask performance assurance method |
| 02/01/2007 | US20070026134 Method for in situ photoresist thickness characterization |
| 02/01/2007 | US20070025522 Methods and apparatus for small footprint imaging system |
| 01/31/2007 | EP1586008A4 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 01/30/2007 | US7170604 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 01/30/2007 | US7170603 Position detection apparatus and exposure apparatus |
| 01/30/2007 | US7170122 Ferroelectric polymer memory with a thick interface layer |
| 01/30/2007 | US7170063 Scintillator panel, method of maufacturing scintillator panel, radiation detection device, and radiation detection system |
| 01/30/2007 | US7169544 black and white photographic materials comprising supports having imaging layers comprising polymer binders, photosensitive silver halides, non-photosensitive source of reducible silver ions, reducing agents and amide solvents; thermographic and photothermographic materials |
| 01/30/2007 | US7169543 Blocked aliphatic thiol stabilizers for photothermographic materials |
| 01/30/2007 | US7169542 Compositions, systems, and methods for imaging |
| 01/25/2007 | WO2007010777A1 Method for image formation |
| 01/25/2007 | US20070020564 Forming metallic and sulfide reverse micelles by adding polymerizable surfactant, reacting to create monomeric sulfureted metal nanoparticle reverse micelles; aggregating to polymeric macromolecular nanoparticles; doping into a base material |
| 01/25/2007 | US20070020535 single reticle photolithography system suitable for exposing regions of the reticle having distinct patterns under different illumination conditions optimal for each respective region |
| 01/25/2007 | US20070020533 Method of manufacturing rim type of photomask and photomask made by such method |
| 01/25/2007 | US20070020532 Method for designing photomask |
| 01/25/2007 | US20070020531 Phase shift mask for patterning ultra-small hole features |
| 01/25/2007 | US20070020406 Antireflection film and method for manufacturing the same |
| 01/24/2007 | CN1902468A Phase shift photomask and method for improving printability of a structure on a wafer |
| 01/23/2007 | US7166484 Method for fabricating image sensor with inorganic microlens |
| 01/23/2007 | US7166422 Silver halide color photographic material, and method of image formation |
| 01/23/2007 | US7166421 Black-and-white; imaging layer has a hydrophilic water-dispersible polymer latex binder; photosensitive silver halide, tetrafluoroborate salt of alkali metal, alkaline earth metal, imidazolium pyrazolium, pyridinium, pyrimidinium, quaternary ammonium, quaternary phosphonium or tertiary sulfonium |
| 01/23/2007 | US7166408 Image forming method using photothermographic material |
| 01/18/2007 | WO2006026280A3 Method for reducing acrylamide formation in thermally processed foods |
| 01/18/2007 | WO2006026278A3 Method for reducing acrylamide formation in thermally processed foods |
| 01/18/2007 | US20070015094 Thin-line-state picture image; photosensitive silver halid emulsions |
| 01/18/2007 | US20070015093 Method for manufacturing printing plate |
| 01/18/2007 | US20070015091 Photoconductive sheet and radiation imaging panel |
| 01/18/2007 | US20070015090 Method of manufacturing a microlens substrate, a microlens substrate, a transmission screen, and a rear projection |
| 01/18/2007 | US20070015088 Method for lithographically printing tightly nested and isolated hole features using double exposure |
| 01/18/2007 | US20070015082 Process of making a lithographic structure using antireflective materials |
| 01/18/2007 | US20070015064 chromeless phase lithography (CPL), particularly to methods for making photomask useful in CPL applications; mask is utilized to impart pattern to a layer of photoresist disposed on a semiconductor substrate |
| 01/16/2007 | US7165233 Test ket layout for precisely monitoring 3-foil lens aberration effects |
| 01/16/2007 | US7164127 Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same |
| 01/16/2007 | US7163785 high sensitivity, excellent gradation, good storage stability and pressure resistance, exhibiting superiority in reproduction of text and colors |
| 01/16/2007 | US7163783 Rinse-processing composition for processing silver halide color photographic material, processing apparatus and processing method |
| 01/16/2007 | US7163782 high density and superior light radiated image stability, improved silver color tone, and storage stability at high temperature; use of reducing agent such as 2,2'-methylenebis(6-t-butyl-4-methylphenol) and coupler such as 2,5-bis(phenylcarbonylamino)-4-chlorophenol |
| 01/16/2007 | US7163778 Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern |
| 01/16/2007 | US7163634 Compositions for removing metal ions from aqueous process solutions and methods of use thereof |
| 01/11/2007 | WO2005043241A3 Method for simultaneous patterning of features with nanometer scale gaps |
| 01/11/2007 | US20070009835 Solvent for printing, pattern composition for printing comprising the solvent, and patterning method using the composition |
| 01/11/2007 | US20070009825 Bisstyryl compound and high density recording media utilizing the same |
| 01/11/2007 | US20070009814 Method for calibrating or qualifying a lithographic apparatus or part thereof, and device manufacturing method |
| 01/11/2007 | US20070009811 Irradiating the sample of the pattern in an electrically conductive state with an electron beam to detect a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample; acquiring an image of the sample surface and inspecting the mask pattern image |
| 01/11/2007 | US20070009808 Systems, masks, and methods for manufacturable masks |
| 01/10/2007 | EP1742106A1 Bleach concentrate composition for silver halide color- photographic materials, one-part type concentrate composition for replenishment color developers, and method of processing |
| 01/10/2007 | EP1741003A2 Optical films and methods of making the same |
| 01/10/2007 | CN1892417A Convex-pattern type thermosensitive/photosensitive plate developing liquid and preparing method |
| 01/09/2007 | US7160674 Photographic chemicals bundle |
| 01/09/2007 | US7160672 Forming a thin ceramic protective coating applied at relatively low temperature by selective coating of ceramic on an electrical or magnetic biocompatible implant; metallization; photolithographic polyamide coating; scribing and dissolving away polymerized polyamide and a ceramic mask; batch processing |
| 01/09/2007 | US7160657 Reference wafer and process for manufacturing same |
| 01/09/2007 | US7160655 In a middle portion of a wafer the mask is die-by-die aligned based on marks provided at the chips, while in the second region outside of the first the coordinates of the respective chip are decided by a global alignment method based on detection of alignment marks of the first step |
| 01/09/2007 | US7160654 Method of the adjustable matching map system in lithography |
| 01/09/2007 | US7160651 Enabling the pitch of features on the mask to be decreased by removing the chrome line between features, and thus remove the limit based on the size of the chrome line; may include primary features surrounded by a boundary region including sub resolution features; high precision lithography |